B. M. Rathsack, C. E. Tabery, T. B. Stachowiak, T. Dallas, C. B. Xu and C.G. Willson; "Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator." BACUS Symposium on Photomask Technology. September 1999. SPIE Vol. 3873 p. 80-91. (Presentation)

B. M. Rathsack, C. E. Tabery, C. E. Philbin and C. G. Willson; "Lithography simulation of Sub-0.30 micron resist features for photomask fabrication uning I-line optical pattern generators." BACUS Symposium on Photomask Technology. September 1999. SPIE Vol. 3873 p. 484-492. (Presentation)

B. M. Rathsack, C. E. Tabery, S. A. Scheer, C. L. Henderson, M. Pochkowski, C. Philbin, P. D. Buck and C. G. Willson; "Photoresist optimization and process simulation for laser photomask lithography." Proc. SPIE Vol. 3678, p. 1215-1226, 1999. (Presentation)

B. M. Rathsack, C. E. Tabery, S. A. Scheer, C. L. Henderson and C. G. Willson; "Photoresist optimization for laser photomask lithography." Techcon 1998.

C. L. Henderson, S. A. Scheer, P. C. Tsiartas, B. M. Rathsack, J. P. Sagan, R. R. Dammel and C. G. Willson; "Modeling parameter extraction for DNQ-Novolac Thick Film Resists." Proc. SPIE Vol. 3333, p. 256-267, 1998.