Develop photoresist models for current 365 nm laser photomask resist processes

Expand models for the development of a 257 nm laser photomask resist process

Experimental Goals

Build hot plate that models the temperature profiles experienced by photomask resists

Characterize photoresists on photomask substrates (chromium oxide: chromium: quartz)

Model current 365 nm photoresists as a function of developer concentration for mask applications

Develop mathematical image and resist development models to maximize resist process latitudes

Expand photoresist models as a function of PAC concentration for the development of a 257 nm resist process

Construct a 257 nm laser exposure system for resist characterization

Complete manufacturing trials for 365 nm and 257 nm laser photomask processes