SFIL


SFIL Team

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SFIL Equipment

The list of equipment designed and built specifically for SFIL is growing, and for convenience has been divided into separate pages.

  • Original SFIL Imprint Press - designed and built by Stephen Johnson. This machine was a press controlled through a LabVIEW interface, had limited capabilities, and allowed screening of early imprint process parameters and materials.

  • SFIL Multi Imprint Machine - designed and built primarily by Byung Jin Choi, with assistance and modifications by Matthew Colburn, Stephen Johnson, Todd Bailey, and Mario Meissl. This imprint stepper was designed on a Ultratech 248 nm stepper platform for the purpose of automated multiple imprinting on 8-in wafer substrates, primarily for a study on the effect of multiple imprint on defect density. In its current form, it can handle 2-in to 8-in substrates, and is configured to run through a LabVIEW interface.

  • SFIL Overlay Alignment Machine - designed and built by Byung Jin Choi. This machine was built for experiments requiring overlay alignment capabilities, such as the MOSFET project.

  • SFIL Active Orientation Testbed - designed and built by Byung Jin Choi and Allen Raines. This machine was built to explore active orientation (parallelism) alignment between the template and the wafer during imprinting, and also to explore the effect of non-parallel separation following imprint/exposure. This tool is configured to run through a LabVIEW interface.

  • Orientation Stage Design. Bringing the template and wafer into parallelism during imprinting is of the utmost importance, and may be achieved through a process of altering the orientation of the template or wafer, or both. This section describes the development of flexure-based passive stage designs as well as active stage designs that use interferometry to sense orientation errors and correct in real time.

  • SFIL Surface Treatment Machine - Designed and built by Todd Bailey. This machine was built for the purpose of treating imprint templates with a fluorocarbon monolayer to promote selective release of the template from the wafer following imprint/exposure. This tool is configured to run through a LabVIEW interface.

 



2003 Willson Research GroupUniversity of Texas at Austin
Last updated Thursday, March 20, 2003
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