The list of equipment
designed and built specifically for SFIL is growing, and for convenience
has been divided into separate pages.
Original SFIL Imprint Press - designed and built by Stephen Johnson.
This machine was a press controlled through a LabVIEW interface, had
limited capabilities, and allowed screening of early imprint process
parameters and materials.
SFIL Multi Imprint Machine - designed and built primarily by Byung
Jin Choi, with assistance and modifications by Matthew Colburn, Stephen
Johnson, Todd Bailey, and Mario Meissl. This imprint stepper was
designed on a Ultratech 248 nm stepper platform for the purpose of
automated multiple imprinting on 8-in wafer substrates, primarily for a
study on the effect of multiple imprint on defect density. In its
current form, it can handle 2-in to 8-in substrates, and is configured
to run through a LabVIEW interface.
SFIL Overlay Alignment Machine - designed and built by Byung Jin Choi.
This machine was built for experiments requiring overlay alignment
capabilities, such as the MOSFET
SFIL Active Orientation Testbed - designed and built by Byung Jin
Choi and Allen Raines. This machine was built to explore active
orientation (parallelism) alignment between the template and the wafer
during imprinting, and also to explore the effect of non-parallel
separation following imprint/exposure. This tool is configured to run
through a LabVIEW interface.
Orientation Stage Design. Bringing the template
and wafer into parallelism during imprinting is of the utmost
importance, and may be achieved through a process of altering the
orientation of the template or wafer, or both. This section describes
the development of flexure-based passive stage designs as well as active
stage designs that use interferometry to sense orientation errors and
correct in real time.
SFIL Surface Treatment Machine - Designed and built by Todd Bailey.
This machine was built for the purpose of treating imprint templates
with a fluorocarbon monolayer to promote selective release of the
template from the wafer following imprint/exposure. This tool is
configured to run through a LabVIEW interface.