Publications
Lin, Michael W.; Hellebusch, Daniel J.; Wu, Kai; Kim, Eui K; Lu, Kuan; Ekerdt, John G.; Liechti, Kenneth M.; Willson, C. Grant. The role of surfactants in adhesion reduction for step and flash imprint lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS (accepted for publication - Jun 2008).
Lin, Michael W.; Hellebusch, Daniel J.; Wu, Kai; Kim, Eui Kyoon; Lu, Kuan; Tao, Li; Liechti, Kenneth M.; Ekerdt, John G.; Ho, Paul S.; Hu, Walter; Willson, C. Grant. Interfacial adhesion studies for step and flash imprint lithography. Proceedings of SPIE-The International Society for Optical Engineering (2008), 6921(Pt. 1, Emerging Lithographic Technologies XII), 69210E-69210E-12.
Tao, Li; Ramachandran, S.; Nelson, C. T.; Lin, Michael; Overzet, L. J.; Goekner, M.; Lee, G.; Willson, C. Grant; Wu, W.; Hu, Walter. Durable diamond-like carbon templates for UV nanoimprint lithography. Nanotechnology 19(10) 105302/1-105302/7, 2008.