Willson Research Group
The University of Texas at Austin
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Photomask Lithography
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Project Goals
The Process
Research
257 nm Laser Exposure System
Gain Schedule Controlled Hot Plate
Development Rate Monitor
Resist Modeling Process
Lithographic Optimization
Resist Modeling Parameters
Resist Images (365nm)
Publications
Meet the Team
Ben Rathsack
Cyrus Tabery
Tim Stachowiak
Collaborators
