Project Goals |
| Develop photoresist models for current 365 nm laser photomask resist processes |
| Expand models for the development of a 257 nm laser photomask resist process |
Experimental Goals |
| Build hot plate that models the temperature profiles experienced by photomask resists |
| Characterize photoresists on photomask substrates (chromium oxide: chromium: quartz) |
| Model current 365 nm photoresists as a function of developer concentration for mask applications |
| Develop mathematical image and resist development models to maximize resist process latitudes |
| Expand photoresist models as a function of PAC concentration for the development of a 257 nm resist process |
| Construct a 257 nm laser exposure system for resist characterization |
| Complete manufacturing trials for 365 nm and 257 nm laser photomask processes |