Publications and Presentations

  1. B. M. Rathsack, C. E. Tabery, T. B. Stachowiak, J. Albelo and C.G. Willson, "Simulation Based Formulation of a Non- Chemically Amplified Resist for 257nm Laser Mask Fabrication " Advances in Resist Technology and Processing XVII, February 2000, SPIE Vol. 3999-61 ( Presentation)
  2. B. M. Rathsack, C. E. Tabery, T. B. Stachowiak, T. Dallas, C. B. Xu and C.G. Willson; "Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator." BACUS Symposium on Photomask Technology. September 1999. SPIE Vol. 3873 p. 80-91. (Presentation)
  3. B. M. Rathsack, C. E. Tabery, C. E. Philbin and C. G. Willson; " Lithography simulation of Sub-0.30 micron resist features for photomask fabrication uning I-line optical pattern generators."BACUS Symposium on Photomask Technology. September 1999. SPIE Vol. 3873 p. 484-492. (Presentation)
  4. B. M. Rathsack, C. E. Tabery, S. A. Scheer, C. L. Henderson, M. Pochkowski, C. Philbin, P. D. Buck and C. G. Willson; " Photoresist optimization and process simulation for laser photomask lithography." Proc. SPIE Vol. 3678, p. 1215-1226, 1999. ( Presentation)
  5. B. M. Rathsack, C. E. Tabery, S. A. Scheer, C. L. Henderson and C. G. Willson; " Photoresist optimization for laser photomask lithography." Techcon 1998.
  6. C. L. Henderson, S. A. Scheer, P. C. Tsiartas, B. M. Rathsack, J. P. Sagan, R. R. Dammel and C. G. Willson; "Modeling parameter extraction for DNQ-Novolac Thick Film Resists." Proc. SPIE Vol. 3333, p. 256-267, 1998.