Publications and Presentations
- B. M. Rathsack, C. E. Tabery, T. B. Stachowiak, J. Albelo and C.G. Willson,
"Simulation Based Formulation of a
Non- Chemically Amplified Resist for 257nm Laser Mask Fabrication "
Advances in Resist Technology and Processing XVII, February 2000, SPIE
Vol. 3999-61 (
Presentation)
- B. M. Rathsack, C. E. Tabery, T. B. Stachowiak, T. Dallas, C. B. Xu and C.G. Willson;
"Characterization of a non-chemically amplified resist for photomask fabrication using a
257 nm optical pattern generator."
BACUS Symposium on Photomask Technology. September 1999. SPIE Vol. 3873 p. 80-91.
(Presentation)
- B. M. Rathsack, C. E. Tabery, C. E. Philbin and C. G. Willson; "
Lithography
simulation of Sub-0.30 micron resist features for photomask fabrication uning I-line optical pattern
generators."BACUS Symposium on Photomask Technology.
September 1999. SPIE Vol. 3873 p. 484-492.
(Presentation)
- B. M. Rathsack, C. E. Tabery, S. A. Scheer, C. L. Henderson, M. Pochkowski,
C. Philbin, P. D. Buck and C. G. Willson; "
Photoresist optimization and process simulation for laser
photomask lithography." Proc. SPIE Vol.
3678, p. 1215-1226, 1999. (
Presentation)
- B. M. Rathsack, C. E.
Tabery, S. A. Scheer, C. L. Henderson and C. G. Willson; " Photoresist optimization for laser
photomask lithography." Techcon 1998.
- C. L. Henderson, S. A. Scheer, P. C. Tsiartas, B. M. Rathsack, J. P. Sagan, R. R. Dammel and C. G. Willson; "Modeling
parameter extraction for DNQ-Novolac Thick Film Resists." Proc. SPIE Vol. 3333, p. 256-267,
1998.