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Library -- 1990 - 1999

1996-1997
90-91 92-93 94-95 98-99 

  1. Henderson, Clifford L.; Tsiartas, Pavlos C.; Simpson, Logan L.; Clayton, Kelly D.; Pancholi, Sanju; Pawloski, Adam R.; Willson, C. Grant.  "Factors Affecting the Dissolution Rate of Novolac Resins II: Developer Composition Effects," Advances in Resist Technology and Processing XIII, Proc.SPIE, 2724, 481-490 (1996).
  2. Lin, Quinhuang; Simpson, Logan; Steinhäusler, Thomas; Wilder, Michelle; Willson, C. Grant; Havard, Jennifer; Fréchet, Jean M. J.  "Water-Soluble Resist for "Environmentally Friendly" Lithography," Metrology, Inspection, and Process Control for Microlithography X, Proc.SPIE, 2725, 308-318 (1996).
  3. Willson, C. G.; Cameron, J. F.; Frechet, J. M. J.  "Photogeneration of amines and application to chemically amplified resist design," Polym.Mat.Sci.& Eng., Proc.ACS, 74, 437 (1996).
  4. Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J.  "Design and development of new photobase generators derived from a-keto carbamates," Polym.Mat.Sci.& Eng., Proc.ACS, 74, 284-285 (1996).
  5. Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J.  "Photogeneration of amines from a-keto carbamates:  New photocatalysis for polymer modification," Polym.Mat.Sci.& Eng., Proc.ACS, 74, 323-324 (1996).
  6. Cameron, James F.; Willson, C. Grant; Fréchet, Jean M. J.  "Photogeneration of Amines from a-Keto Carbamates:  Photochemical Studies," Journal of the American Chemical Society, 118(51), 12925-12937 (1996).
  7. Willson, C. Grant "Comments on "Photoinitiated Cationic Polymerization with Triarylsulfonium Salts," by J.V. Crivello and J.H.W. Lam, J. Polym. Sci.: Polym. Chem. Ed., 17, 977 (1979)," Journal of Polymer Science, Part A: Polymer Chemistry, 34, 3229-3230 (1996).
  8. Allen, Robert D.; Sooriyakumaran, Ratnam; Opitz, Juliann; Wallraff, Gregory M.; DiPietro, Richard A.; Breyta, Gregory; Hofer, Donald C.; Kunz, Roderick R.; Jayaraman, Saikumar; Shick, Robert; Goodall, Brian; Okoroanyanwu, Uzodinma; and Willson, C. Grant.  "Protecting Groups for 193-nm Photoresists," Advances in Resist Technology and Processing XIII, Proc.SPIE, 2724, 334-343 (1996).
  9. Allen, R. D.; Sooriyakumaran, R.; Opitz J.; Wallraff G. M.; Breyta G.; DiPietro R. A.; Hofer D. C.; Okoroanyanwu U. and Willson C. G.  “Progress in 193 nm Positive Resists,” Journal of Photopolymer Science and Technology, 9(3), 465-474 (1996). 
  10. Erdmann, Andreas; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang.  "Influence of optical nonlinearities of photoresists on the photolithographic process:  Basics," Optical Microlithography X, Proc.SPIE, 3051, 529-540 (1997).
  11. Willson, C. Grant; Dammel, Ralph A.; and Reiser, Arnost; "Photoresist Materials:  A Historical Perspective,"  Proc.SPIE, 3049, 28-41 (1997).
  12. McAdams, Christopher L., Tsiartas, Pavlos C., and Willson, C. Grant, "Structure-Function Correlation Studies of Dissolution Inhibitors for Novolac-based Photoresists," Polym.Mat.Sci.& Eng., 77, 437-438 (1997).
  13. Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; Willson, C. Grant; Schröeder, U. Paul  "Synthesis, Polymorphism and Electro-optic Properties of a New Class of Ligated Twin Sc* Liquid Crystals," Polym.Prep., 38(1), 412-413 (1997).
  14. Tsiartas, Pavlos C.; Flanagin, Lewis W.; Henderson, Clifford L.; Hinsberg, William D.; Sanchez, Isaac C.; Bonnecaze, Roger T.; Willson, C. Grant  "The Mechanism of Phenolic Polymer Dissolution: A New Perspective," Macromolecules, 30(16), 4656-4664 (1997).
  15. Fréchet, Jean M. J.; Leung, Man-kit; Urankar, Edward J.; Willson, C. Grant; Cameron, James F.; MacDonald, Scott A.; Niesert, Claus P.  "Photogenerated Base in Resist and Imaging Materials:  Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation," Chem.Mater., 9(12), 2887-2893 (1997).
  16. Mack, C. A.; Mueller, K. E.; Gardiner, A. B.; Qiu, A.; Dammel, R. R.; Koros, W. G.; Willson, C. G.  "Diffusivity Measurements in Polymers, Part 1:  Lithographic Modeling Results,"  Proc.SPIE, 3049, 355-362 (1997).
  17. Gardiner, Allen B.; Qin, Anwei; Henderson, Clifford L.; Pancholi, Sanju; Koros, William J.; Willson, C. Grant; Dammel, Ralph R.; Mack, Chris; Hinsberg, William D.  "Diffusivity Measurements in Polymers II: Residual Casting Solvent Measurement by Liquid Scintillation Counting,"  Proc.SPIE, 3049, 850-860 (1997).
  18. Mueller, Katherine E.; Koros, William J.; Wang, Yvonne Y.; and Willson, C. Grant.  "Diffusivity Measurements in Polymers, Part III: Quartz Crystal Microbalance Techniques,"  Proc.SPIE, 3049, 871-878 (1997).
  19. Mueller, Katherine E.; Koros, William J.; Mack, Chris A.; and Willson, C. Grant.  "Diffusivity Measurements in Polymers, Part IV:  Acid Diffusion in Chemically Amplified Resists,"  Proc.SPIE, 3049, 706-711 (1997).
  20. Henderson, Clifford L.; Willson, C. Grant; Dammel, Ralph R.; Synowicki, Ron A.  "Bleaching-Induced Changes in the Dispersion Curves of DNQ Photoresists,"  Proc.SPIE, 3049, 585-595 (1997).
  21. Henderson, Clifford L.; Pancholi, Sanju; Chowdhury, Sajed A.; Willson, C. Grant; Dammel, Ralph R.  "Photoresist Characterization for Lithography Simulation Part 2:  Exposure Parameter Measurements,"  Proc.SPIE, 3049, 816-828 (1997).
  22. Henderson, Clifford L.; Tsiartas, Pavlos C.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Willson, C. Grant; Dammel, Ralph R.  "Photoresist Characterization for Lithography Simulation Part 3:  Development Parameter Measurements,"  Proc.SPIE, 3049, 805-815 (1997).
  23. Henderson, Clifford L.; Tsiartas, Pavlos C.; Flanagin, Lewis W.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Chinwalla, Ammar N.; and Willson, C. Grant.  "Photoresist Characterization for Lithography Simulation Part 4:  Processing Effects on Resist Parameters,"  Proc.SPIE, 3049, 212-223 (1997).
  24. Erdmann, Andreas; Henderson, Clifford L.; Willson, C. Grant; Henke, Wolfgang, "Influence of optical nonlinearities of photoresists on the photolithographic process: applications," Emerging Lithographic Technologies, Proc.SPIE, 3048, (1997).
  25. Lin, Quinhuang; Steinhäusler, Thomas; Simpson, Logan; Wilder, Michelle; Medeiros, David R.; Willson, C. Grant; Havard, Jennifer; and Fréchet, Jean M. J.  "A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist,"  Chem.Mater., 9(8), 1725-1730 (1997).
  26. Okoroanyanwu, Uzodinma; Shimokawa, Tsutomu; Byers, Jeffrey; Medeiros, David; Willson, C. Grant; Niu, Quingshang J.; Frechet, Jean M. J.; Allen, Robert.  "New Single Layer Positive Photoresists for 193 nm Photolithography,"  Proc.SPIE, 3049, 92-103 (1997).
  27. Havard, Jennifer M.; Fréchet, Jean M. J.; Pasini, Dario; Mar, Brenda; Yamada, Shintaro; Medeiros, David; Willson, C. Grant.  "Design of a positive tone water-soluble resist,"  Proc.SPIE, 3049, 437-447 (1997).
  28. Ficner, Stanley; Dammel, Ralph R.; Perez, Yvette; Gardiner, Allen; Willson, C. Grant.  "Refractive Indices In Thick Photoresist Films As A Function Of Bake Conditions And Film Exposures,"  Proc.SPIE, 3049, 838-849 (1997).
  29. Willson, C. G.; Yueh, W.; Leeson, M. J.; Steinhäusler, T.; McAdams, C. L.; Dammel, R. R.; Sounik, J. R.; Aslam, M.; Vicari, R.; and Sheehan, M. T.  "Non-chemically amplified 248 nm resist materials,"  Proc.SPIE, 3049, 226-237 (1997).
  30. Leeson, Michael J.; Pawloski, Adam; Levering, Vrad; Yueh, Wang; and Willson, C. Grant.  "Tailoring of a Photoactive Compound For Non-Chemically Amplified 248nm Resist Formulations,"  Proc.SPIE, 3049, 861-870 (1997).
  31. Zhang, P. Linda; Eckert, Andrew R.; Willson, C. Grant; Webber, Stephen E.; Byers, Jeffrey.  "Acid Diffusion through Polymer Films,"  Proc.SPIE, 3049, 898-909 (1997).
  32. Lin, Quinhuang; Katnani, Ahmad; Willson, C. Grant.  "Effects of Crosslinking Agent on Lithographic Performance of Negative-Tone Resists Based on Poly(p-hydroxystyrene),"  Proc.SPIE, 3049, 974-987 (1997).
  33. Niu, Q. Jason; Fréchet, Jean M. J.; Okoroanyanwu, U.; Byers, J. D.; Willson, C. Grant.  "Novel functional nortricyclene polymers and copolymers for 248 and 193 nm chemically amplified resists,"  Proc.SPIE, 3049, 113-123 (1997).
  34. Okoroanyanwu, U.; Byers, J.; Shimokawa, T.; Patterson, K.; Willson, C.G.  “Alicyclic Polymers for 193 nm Lithography”  Proc. 11th International Conference on Photopolymers, SPE, Mid-Hudson Section of SPE, McAfee, New Jersey, USA, 1 (1997).
  35. Okoroanyanwu,  U.;  Byers,  J.;  Shimokawa,  T.;  Webber,  S.;  Willson,  C.G.  “Deprotection Kinetics of New 193 nm Resists Derived from Alicyclic Polymers”  Proc. Am. Chem. Soc. Div. Polym. Mater.: Sci. and Eng., Las Vegas, 77, 469-470 (1997).
  36. Erdmann, Andreas; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang.  “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc. SPIE, 3051, 529-540 (1997).

 



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