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Library -- 1990 - 1999

1990-1991
 92-93 94-95 96-97 98-99 

  1. Willson, C. G.; MacDonald, S. A.; Ito, H.; Frechet, J. M. J.  "Recent Progress in Organic Resist Materials,"  Polym.for Microelec., (1), 3-18 (1990).
  2. Maltabes, John G.; Holmes, Steven J.; Morrow, James R.; Barr, Roger L.; Hakey, Mark; Reynolds, Gregg; Brunsvold, William R.; Willson, C. Grant; Clecak, Nick; MacDonald, Scott; Ito, Hiroshi.  "1X Deep UV Lithography With Chemical Amplification for 1-Micron DRAM Production," Advances in Resist Technology and Processing VII, Proc.SPIE, 1262, 2-7 (1990).
  3. Brock, Phillip J.; Willson, C. Grant; Swalen, Jerome D.; Jurich, Mark C.; Miller, Robert D.; Clecak, Nick J.; Logan, Tony; Frechet, J. M. J.  "Generation of Optical Disk Servo Patterns by Lithographic Imaging of Photodeformable Polymers," Optical Data Storage, Proc.SPIE, 1316, 180-191 (1990).
  4. Fréchet, J. M. J.; Kryczka, B.; Matuszczak, S.; Reck, B.; Stanciulescu, M.; Willson, C. G.  "Chemically Amplified Imaging Materials Based on Acid-Catalyzed Reactions of Polyesters or Electrophilic Crosslinking Processes," J.Photopolym.Sci.& Tech., 3(3), 235-247 (1990).
  5. McKean, Dennis R.; Hinsberg, William D.; Sauer, Thomas P.; Willson, C. Grant; Vicari, Richard; Gordon, Douglas J.  "Methylated poly(4-hydroxystyrene) - A new resin for deep-ultraviolet resist application," J.Vac.Sci.Technol.B,  1466-1469 (1990).
  6. Jungbauer, D.; Reck, B.; Twieg, R.; Yoon, D. Y.; Willson, C. G.; Swalen, J. D.  "Highly efficient and stable nonlinear optical polymers via chemical crosslinking under electric field," Appl.Phys.Lett., 56(26), 2610-2612 (1990).
  7. Kutal, Charles; Weit, Scott K.; MacDonald, Scott A.; Willson, C. Grant.  "New Inorganic Photoinitiators For Deep-UV Resist Materials," J.Coat.Technol., 62(786), 63-67 (1990).
  8. Page, R. H.; Jurich, M. C.; Reck, B.; Sen, A.; Twieg, R. J.; Swalen, J. D.; Willson, C. G.  "Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films," J.Opt.Soc.Am.B, 7(7), 1239-1250 (1990).
  9. Bjorklund, G. C.; Ducharme, S.; Jungbauer, D.; Moerner, J. D.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D.  "Organic Nonlinear Optical Materials for Frequency Doubling, Modulation, and Switching,"  Proc.Symp.Optics & Electronics for Organic Materials,  (1990).
  10. Swalen, J. D.; Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Moerner, W. E.; Smith, B. A.; Twieg, R.; Yoon, D.; Willson, C. G.  "Organic nonlinear optical materials and their device applications for frequency doubling, modulation, and switching," Nonlinear Optical Properties of Organic Materials III, Proc.SPIE, 1337, 2-11 (1990).
  11. McKean, Dennis R.; MacDonald, Scott A.; Johnson, Robert D.; Clecak, Nicholas J.; Willson, C. Grant.  "Characterization of a Novolac-Based Three-Component Deep-UV Resist," Chem.Mater., 2(5), 619-6624 (1990).
  12. McKean, D. R.; Sauer, T. P.; Hinsberg, W. D.; Willson, C. G.  "Synthesis, Characterization, and Lithographic Behavior of Methylated Poly(4-hydroxystyrene)," Polym.Prep., 31(2), 599-600 (1990).
  13. Pawlowski, G.; Sauer, T.; Dammel, R.; Gordon, D. J.; Hinsberg, W.; McKean, D.; Lindley, C. R.; Merrem, H.-J.; Roschert, H.; Vicari, R.; Willson, C. G.  "Modified Polyhydroxystyrenes as Matrix Resins for Dissolution Inhibition Type Photoresists," Advances in Resist Technology and Processing VII, Proc.SPIE, 1262, 391-400 (1990).
  14. Kapitza, Heinrich; Zentel, Rudolf; Twieg, Robert J.; Nguyen, Cattien; Vallerien, Sven Uwe; Kremer, Friedrich; Willson, C. Grant.  "Ferroelectric Liquid Crystalline Polysiloxanes with High Spontaneous Polarization and Possible Applications in Nonlinear Optics," Advanced Materials, 2(11), 539-543 (1990).
  15. MacDonald, Scott A.; Schlosser, Hubert; Ito, Hiroshi; Clecak, Nicholas J.; Willson, C. Grant.  "Plasma-Developable Photoresist Systems Based on Chemical Amplification," Chem.Mater., 3, 435-442 (1991).
  16. Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Jungbauer, D.; Moerner, W. E.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D.  "Applications of Organic Second Order Nonlinear Optical Materials," Materials for nonlinear optics: chemical perspectives, ACS Sym.Ser., (13), 216-225 (1991).
  17. Embs, F. W.; Neher, D.; Wegner, G.; Miller, R. D.; Sooriyakumaran, R.; Willson, C. G.  "Preparation of Oriented Mono and Multilayers of Poly(bis-butoxyphenylsilane) by the Langmuir-Blodgett-Technique," Polym.Prep., 31(2), 298-299 (1991).
  18. Teraoka, I.; Jungbauer, D.; Reck, B.; Yoon, D. Y.; Twieg, R.; Willson, C. G.  "Stability of nonlinear optical characteristics and dielectric relaxations of poled amorphous polymers with main-chain chromophores," J.Applied Physics, 69(4), 2568-2576 (1991).
  19. Kutal, Charles; Weit, Scott K.; Allen, Robert D.; MacDonald, Scott A.; Willson, C. Grant.  "Novel Base-Generating Photoinitiators for Deep-UV Lithography," Advances in Resist Technology and Processing VIII, Proc.SPIE, 1466, 362-367 (1991).
  20. MacDonald, S. A.; Clecak, N. J.; Wendt, H. R.; Willson, C. G.; Snyder, C. D.; Knors, C. J.; Deyoe, N. B.; Maltabes, J. G.; Morrow, J. R.; McGuire, A. E.; Holmes, S. J.  "Airborne Chemical Contamination of a Chemically Amplified Resist," Advances in Resist Technology and Processing VIII, Proc.SPIE, 1466, 2-12 (1991).
  21. Fahey, J. T.; Fréchet, J. M. J.; Clecak, N.; Willson, C. G.  "Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles," Polym.Mat.Sci.& Eng., 64, 241-269 (1991).
  22. Zentel, Rudolf and Willson, C. Grant.  "New photoresists based on poly(trans-1,2-cyclohexylene diisocyanate)," Makromol.Chem., Rapid Commun., 12(8), 513-516 (1991).
  23. Willson, C. Grant.  "Advances in Organic Resist Materials," Polym.Mat.Sci.& Eng., 64, 18-20 (1991).
  24. Twieg, R.; Bjorklund, G.; Eich, M.; Herminghaus, S.; Jungbauer, D.; Reck, B.; Smith, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D.; Zentel, R.  "Polymeric Nonlinear Optoelectronic Materials, Challenges and Opportunities," Polym.Mat.Sci.& Eng., 64, 66-67 (1991).
  25. Jungbauer, D.; Teraoka, I.; Yoon, D. Y.; Reck, B.; Swalen, J. D.; Twieg, R.; Willson, C. G.  "Second-order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores," J.Applied Physics, 69(12), 8011-8017 (1991).
  26. Matuszczak, Steven; Cameron, James F.; Fréchet, Jean M. J.; Willson, C. Grant.  "Photogenerated Amines and their Use in the Design of a Positive-tone Resist Material based on Electrophilic Aromatic Substitution," J.Mater.Chem., 1(6), 1045-1050 (1991).
  27. Yoon, D. Y.; Jungbauer; D., Teraoka, I.; Reck, B.; Zentel, R.; Twieg, R.; Swalen, J. D.; and Willson, C. G.  "Second-Order NLO and Relaxation Properties of Poled Polymers," Polym.Prep., 32(3), 102-104 (1991).
  28. Embs, F. W.; Wegner, G.; Neher, D.; Albouy, P.; Miller, R. D.; Willson, C. G.; Schrepp, W.  "Preparation of Oriented Multilayers of Poly(silane)s by the Langmuir-Blodgett Technique," Macromolecules, 24(18), 5068-5075 (1991).
  29. Johannsmann, D.; Embs, F.; Willson, C. G.; Wegner, G.; Knoll, W.  "Visco-elastic properties of thin films probed with a quartz crystal resonator," Makromol.Chem., Makromol.Symp., 46, 247-251 (1991).
  30. Frechet, J. M. J.; Matuszczak, S.; Lee, S. M.; Fahey, J.; and Willson, C. G.  "Chemically Amplified Resists Based on Polymer Side-Chain Rearrangement or Electrophilic Crosslinking," Photopolymers: Principles - Processes and Materials, Society of Plastic Engineers, Inc.,  31-40 (1991).
  31. Fréchet, Jean M. J.; Matuszczak, Steven; Reck, Berndt; Stover, Harald D. H.; Willson, C. Grant.  "Chemically Amplified Imaging Materials Based on Electrophilic Aromatic Substitution: Poly[4-(acetoxymethyl)styrene-co-4-(hydroxy)styrene].," Macromolecules, 24(8), 1746-1754 (1991).
  32. Stöver, Harald D. H.; Matuszczak, Steven; Willson, C. Grant; Fréchet, Jean M. J.  "Design of Polymeric Imaging Materials Based on Electrophilic Aromatic Substitution: Model Studies,"  Macromolecules, 24(8), 1741-1745 (1991).
  33. Twieg, R.; Burland, D.; Lux, M.; Moylan, C.; Nguyen, C.; Walsh, P.; Willson, C. G.; Zentel, R.  "Synthetic Approaches to NLO Polymers," Polym.Prep., 32(3), 80-81 (1991).
  34. Swalen, J. D.; Bjorklund, G. C.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Jurich, M.; Moerner, W. E.; Reck, B.; Smith, B. A.; Twieg, R.; Willson, C. G.; Zentel, R.  "Poled Epoxy Polymers for Optoelectronics," Organic Molecules for Nonlinear Optics and Photonics, 94, 433-445 (1991).
  35. Neher, D.; Mittler-Neher S.; Cha, M.; Stegeman, G.; Embs, F. W.; Wegner, G.; Miller, R. D.; Willson, C. G., "Determination of the Orientational Order Parameters <P*2>, <P*4> in a Polysilane LB Film via Polarization Dependent THG," Nonlinear Optical Properties of Organic Materials IV, Proc.SPIE, 1560, 335-343 (1991).
  36. Ebert, M.; Lux, M.; Smith, B. A.; Twieg, R.; Willson, C. G.; Yoon, D. Y.  "Nonlinear Optical Properties of Linear Epoxy Polymers with Pendant Sulfonyl Tolan Groups," Polym.Prep., 32(3), 130-131 (1991).

 



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