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Library -- 1990 - 1999
1992-1993
90-91 94-95 96-97
98-99
- Zentel, R.; Poths, H.; Kremer, F.;
Jungbauer, D.; Twieg, R.; Willson, C. G.; Yoon, D.
"Polymeric Liquid Crystals: Structural Basis for
Ferroelectric and Nonlinear Optical Properties," Polymers
for Advanced Technologies, 3, 211-217 (1992).
- Fréchet, J. M. J.; Lee, S. M.;
Matuszczak, S.; Shacham-Diamand, Y.; MacDonald, S. A.; Willson, C.
G. "Novel
Chemically Amplified Dry-Developing Imaging Materials for High
Resolution Microlithography," Journal of Photopolymer
Science and Technology, 5(1), 17-30 (1992).
- Betterton, K.; Ebert, M.; Haeussling,
L.; Lux, M. G.; Twieg, R. J.; Willson, C. G.; Yoon, D.;
"Strategies for Crosslinking NLO-Polymers Across the
Chromophore," Proc.Am.Chem.Soc.,
66, 312-313 (1992).
- MacDonald, Scott A.; Schlosser,
Hubert; Clecak, Nicholas J.; Willson, C. Grant.
"A Positive Tone Plasma-Developable Resist Obtained by
Gas-Phase Image Reversal," Chem.Mater., 4,
1364-1368 (1992).
- Wallraff, G. M.; Allen, R. D.;
Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.;
Sturtevant, J. L. "A
Chemically Amplified Photoresist for Visible Laser Direct
Imaging," J.Imaging Sci., 36(5), 468-476 (1992).
- Wallraff, G. M.; Allen, R. D.;
Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.;
Sturtevant, J. L. "A
Chemically Amplified Photoresist for Visible Laser Direct
Imaging," Polym.Mat.Sci.& Eng., 66, 49-51
(1992).
- Twieg, R.; Ebert, M.; Jungbauer, D.;
Lux, M.; Reck, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D.
Y.; Zentel, R. "Nonlinear
Optical Epoxy Polymers with Polar Tolan Chromophores," Mol.Cryst.Liq.Cryst.,
217, 19-24 (1992).
- Fahey, J. T.; Shimizu, K.; Fréchet,
J. M. J.; Clecak, N.; Willson, C. G.
"Resist System Based on the Cationic Photocrosslinking
of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles," Journal
of Polymer Science, Part A: Polymer Chemistry, 31(1),
1-11 (1993).
- MacDonald, Scott A.; Hinsberg,
William D.; Wendt, H. Russell; Clecak, Nicholas J.; Willson, C.
Grant; Snyder, Clinton D. "Airborne
Contamination of a Chemically Amplified Resist.
1. Identification
of Problem," Chem.Mater., 5, 348-356 (1993).
- Fréchet, J. M. J.; Cameron, J. F.;
Chung, C. M.; Haque, S. A.; Willson, C. G.
"Photogenerated Base as Catalyst for Imidization
Reactions: A new design of photosensitive polymers," Polym.Bull.Berlin,
30, 369-375 (1993).
- Leung, Man-kit; Fréchet, Jean M. J.;
Cameron, James F.; Willson, C. Grant.
"Photogenerated base and chemical amplification:
a new resist based on catalyzed decarboxylation," Polym.Mat.Sci.&
Eng., 68, 30-31 (1993).
- Zentel, Rudolf; Jungbauer, Dietmar;
Twieg, Robert J.; Yoon, Do Y.; Willson, C. Grant.
"Synthesis and non-linear optical characteristics of
crosslinked and linear epoxy polymers with pendant tolane
chromophores," Makromol.Chem., 194, 859-868
(1993).
- Willson, C. G., Cameron, J. F.,
MacDonald, S. A., Niesert, C. P., Frechet, J. M. J., Leung, M. K.,
and Ackmann, A., "Recent Advances in Chemically Amplified
Resist Materials," Polym.Mat.Sci.& Eng., Proc.ACS, 68,
60 (1993).
- Willson, C. G.; Cameron, J. F.;
MacDonald, S. A.; Niesert C.-P.; Fréchet, J. M. J.; Leung, M. K.,
Ackmann, A. "Resist
Materials Design: Base-catalyzed Chemical Amplification," Advances
in Resist Technology and Processing X, Proc.SPIE, 1925,
354-365 (1993).
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