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Library -- 1980 - 1989

1988-1989
80-81 82-83 84-85 86-87

  1. Neureuther, Andrew R. and Willson, C. Grant.  "Reduction in x-ray lithography shot noise exposure limit by dissolution phenomena," J.Vac.Sci.Technol.B, 6(1), 167-173 (1988).
  2. Umbach, C. P.; Broers, A. N.; Willson, C. G.; Koch, R.; Laibowitz, R. B.  "Nanolithography with an acid catalyzed resist," J.Vac.Sci.Technol.B, 6(1), 319-322 (1988).
  3. McKean, Dennis R.; MacDonald, Scott A.; Clecak, Nicholas J.; Willson, C. Grant.  "Novolac based deep-UV resists," Advances in Resist Technology and Processing V, Proc.SPIE, 920, 60-66 (1988).
  4. Hinsberg, William D.; MacDonald, Scott A.; Pederson, L.; Willson, C. Grant.  "Zero-Misalignment Lithographic Process Using a Photoresist with Wavelength-Selected Tone," Advances in Resist Technology and Processing V, Proc.SPIE, 920, 2-12 (1988).
  5. Hinsberg, W. D.; MacDonald, S. A.; Pederson, L.; Willson, C. G.  "Self-Aligning Lithography using a Dual-Tone Resist:  A Lithographic Analogue of Color Photography," Photo.Sci.& Eng.,  94-97 (1988).
  6. Willson, C. G.; Schellenberg, F. M.; Sperley, K. M.; Brock, P. J.; Levenson, M. D.  "Photodeformable polymer system for holography," CLEO Conf.Lasers Electro Opt., Tech.Dig.,  7, 198 (1988).
  7. Ito, H.; Pederson, L. A.; MacDonald, S. A.; Cheng, Y. Y.; Lyerla, J. R.; Willson, C. G.  "A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System," J.Elecrochem.Soc.,  135(6), 1504-1508 (1988).
  8. Umbach, C. P.; Broers, A. N.; Koch, R.; Willson, C. G.; Laibowitz, R. B.  "Nanolithography with a high-resolution STEM," IBM J.Res.Develop., 32(4), 454-461 (1988).
  9. Iwayanagi, Takao; Ueno, Takumi; Nonogaki, Saburo; Ito, Hiroshi; Willson, C. Grant.  "Materials and Processes for Deep-UV Lithography," Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS, 218(3), 109-224 (1988).
  10. Willson, C. Grant and Bowden, Murrae.  "Organic Resist Materials," Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS, 218(2), 75-108 (1988).
  11. Fréchet, Jean M. J.; Kallman, Neil; Kryczka, Boguslav; Eichler, Eva; Houlihan, Francis M.; Willson, C. Grant.  "Novel derivatives of poly(4-hydroxystyrene) with easily removable teriary, allylic, or benzylic ethers," Polym.Bull.Berlin, 20(5) , 427-434 (1988).
  12. Seligson, Daniel; Ito, Hiroshi; Willson, C. Grant.  "The impact of high-sensitivity resist materials on x-ray lithography," J.Vac.Sci.Technol.B, 6(6), 2268-2273 (1988).
  13. Fréchet, Jean M. J.; Eichler, Eva; Gauthier, Sylvie; Kryczka, Boguslav; Willson, C. G.  "Imaging Processes Based on Side-Chain Modification of Polymers:  Synthesis and Study of Allylic and Benzylic Ethers Derived from Poly(vinylphenols)," The Effects of Radiation on High-Technology Polymers, ACS Symposium Series, 381(10), 155-171 (1989).
  14. Willson, C. Grant and Bowden, Murrae J.  "Resist materials for microelectronics (Part 1)," Chemtech, 19(2), 102-111 (1989).
  15. Willson, C. Grant and Bowden, Murrae J.  "Recent advances in organic resist materials (Part 2)," Chemtech, 19(3), 182-189 (1989).
  16. Fréchet, Jean M. J.; Willson, C. Grant; Iizawa, T.; Nishikubo, T.; Igarashi, K.; Fahey, J.  "New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals," Polymers in Microlithography: Materials and Processes, ACS Symposium Series, 412(7), 100-112 (1989).
  17. Fréchet, Jean M. J.; Matuszczak, Steven; Willson, C. Grant; Reck, B.  "Nonswelling Negative Resists Incorporating Chemical Amplification," Polymers in Microlithography: Materials and Processes, ACS Symposium Series, 412(5), 74-85 (1989).
  18. Fréchet, J. M. J.; Matuszczak, S.; Reck, B.; Willson, C. G.  "Photocrosslinking Based on Electrophilic Aromatic Substitution and its Application to Resists Incorporating Chemical Amplification," Polym.Mat.Sci.& Eng., 60, 147-150 (1989).
  19. Kutal, C. and Willson, C. G.  "Photosensitive materials for imaging applications," J.Inf.Rec.Mater., 17(5/6), 373-378 (1989).
  20. Fréchet, J. M. J.; Stanciulescu, M.; Iizawa, T.; Willson, C. G.  "Self-Developing Imaging Systems Based on Polyesters and Polyethers," Polym.Mat.Sci.& Eng., 60, 170-173 (1989).
  21. Fréchet, J. M. J.; Fahey, J.; Willson, C. G.; Iizawa, T.; Nishikubo, T.  "Synthesis of Polyformals and Their Use as Dry-Developing Imaging Systems," Polym.Mat.Sci.& Eng., 60, 174-178 (1989).
  22. Reck, B.; Allen, R. D.; Twieg, R. J.; Willson, C. G.  Matuszczak, S., Stover, H. D. H., Li, N. H., and Fréchet, J. M. J., "Novel Photoresist Design Based on Eletrophilic Aromatic Substitution," Polym.Eng.Sci., 29(14), 960-964 (1989).
  23. Hinsberg, W. D.; MacDonald, S. A.; Pederson, L. A.; Willson, C. G.  "A Lithographic Analog of Color Photography: Self-Aligning Photolithography Using a Resist with Wavelength-Dependent Tone," J.Imaging Sci., 33(4), 129-135 (1989).
  24. Kutal, Charles; Weit, Scott K.; Willson, C. Grant.  "New inorganic photoinitiators for deep-UV resist materials," Polym.Mat.Sci.& Eng., 61, 195-198 (1989).
  25. Stover, H.; Matuszczak, S.; Chin, R.; Shimizu, K.; Willson, C. G.; Fréchet, J. M. J.  "Acid-Catalyzed Rearrangement of Aromatic Ethers: Model Studies and Application to Imaging," Polym.Mat.Sci.& Eng., 61, 412-416 (1989).
  26. Eich, Manfred; Reck, Berndt; Yoon, Do Y.; Willson, C. Grant; Bjorklund, Gary C.  "Novel second-order nonlinear optical polymers via chemical cross-linking-induced vitrification under electric field," J.Applied Physics, 66(7), 3241-3247 (1989).
  27. Reck, Berndt; Eich, Manfred; Jungbauer, Dietmar; Twieg, Robert J.; Willson, C. Grant; Yoon, Do Y.; Bjorklund, Gary C.  "Crosslinked epoxy polymers with large and stable nonlinear optical susceptibilities," Nonlinear Optical Properties of Organic Materials II, Proc.SPIE, 1147(2), 74-83 (1989).
  28. Willson, C. Grant.  "Proceedings of The Almaden Symposium 4th International Conference on Unconventional Photoactive Solids,"  183, 511 (1989).
  29. Green, M. M.; Reidy, M. P.; Johnson, R. J.; Darling, G.; O'Leary, D. J.; Willson, C. G.  "Macromolecular Stereochemistry: The Out-of-Proportion Influence of Optically Active Comonomers on the Conformational Characteristics of Polyiscyanates," Journal of the American Chemical Society, 111, 3452 (1989).
  30. Fréchet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G.  "Chemical Amplification in the Design of Radiation-Sensitive Polymers," Functional Polymers, Proc.IUCCP Sym., 6, 193-200 (1989).
  31. Schellenberg, F. M.; Willson, C. G.; Levenson, M. D.; Sperley, K. M.; Brock P. J.  "Photosensitized Polystyrene as a High Efficiency Relief Hologram Medium," Practical Holography III, Proc.SPIE, 1051, 31-43 (1989).



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