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Library -- 1980 - 1989

1986-1987
80-81 82-83 84-85 88-89 

  1. Willson, C. Grant; Ito, Hiroshi; Fréchet, Jean M. J.; Tessier, Theodore G.; Houlihan, Francis M.  "Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution," J.Elecrochem.Soc., 133(1) , 181-187 (1986).
  2. Houlihan, F. M.; Bouchard, F.; Fréchet, J. M. J.; Willson, C. G.  "Thermally Depolymerizable Polycarbonates.  2.  Synthesis of Novel Linear Tertiary Copolycarbonates by Phase-Transfer Catalysis," Macromolecules, 19(1), 13-19 (1986).
  3. Fréchet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Eichler, Eva; Kryczka, Boguslav; Willson, C. Grant.  "Design and synthesis of novel allylic and benzylic copolycarbonates susceptible to acidolytic or thermolytic depolymerization," Makromol.Chem., Rapid Commun., 7(3), 121-126 (1986).
  4. Ito, Hiroshi; MacDonald, Scott A.; Willson, C. Grant; Moore, J. W.; Gharapetian, H. M.; Guillet, James E.  "Reactivity and Polymerization of Isopropenyl tert-Butyl Ketone: A Twisted a,b-Unsaturated Enone," Macromolecules, 19(7), 1839-1844 (1986).
  5. Fréchet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Kryczka, Boguslaw; Eichler, Eva; Clecak, Nicholas; Willson, C. Grant.  "New Approach to Imaging Incorporating Chemical Amplification: Synthesis and Preliminary Evaluation of Novel Resists Based on Tertiary Copolycarbonates," J.Imaging Sci., 30(2), 59-64 (1986).
  6. Hinsberg, W. D.; Willson, C. G.; and Kanazawa, K. K.  "Measurement of Thin-Film Dissolution Kinetics Using a Quartz Crystal Microbalance," J.Elecrochem.Soc., 133(7), 1448-1451 (1986).
  7. Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant.  "Organotin Polymers: Synthesis and Resist Properties," J.Imaging Sci., 30(4), 169-173 (1986).
  8. Fréchet, Jean M. J.; Iizawa, Takashi; Bouchard, Francine; Stanciulescu, Maria; Willson, C. Grant; Clecak, Nicholas.  "New Condensation Polymers as Resist Materials Capable of Chemical Amplification," Polym.Mat.Sci.& Eng., 55, 299-303 (1986).
  9. Miller, R. D.; Hofer, D.; Fickes, G. N.; Willson, C. G.; Marinero, E.; Trefonas, P.; West, R.  "Soluble Polysilanes: An Interesting New Class of Radiation Sensitive Materials," Polym.Eng.Sci., 26(16), 1129-1134 (1986).
  10. Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant.  "Poly(alkylnylstannanes): A new class of main chain organotin polymers," Polymer Bulletin, Berlin, 16(5), 427-431 (1986).
  11. Allen, R. D.; MacDonald, S. A.; and Willson, C. G.; "A One Layer MLR Resist," Polym.Mat.Sci.& Eng.,  55, 290-291 (1986).
  12. Willson, C.G. (ed.), "Advances in Resist Technology and Processing III," Proc.SPIE, 631, 346 (1986).
  13. MacDonald, S. A.; Allen, R. D.; Clecak, Nicholas; Willson, C. G.; Frechet, J. M. J.  "A 2-layer resist system derived from trimethylsilystyrene," Advances in Resist Technology and Processing III, Proc.SPIE, 631, 28-33 (1986).
  14. Miller, R. D.; Fickes, G. N.; Hofer, D.; Sooriyakumaran, R.; Willson, C. G.; Guillet, J. E.; Moore, J.  "Soluble Polysilanes for Lithography," Polym.Mat.Sci.& Eng., 55, 599-603 (1986).
  15. MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. G.  "A Single Layer, Multilevel Resist:  Limited Penetration E-Beam Lithography," Polym.Mat.Sci.& Eng., (2559), 721-723 (1986).
  16. Willson, C. Grant.  "Polymers in Microlithography," Polym.Mat.Sci.& Eng., 55, 1-2 (1986).
  17. Jiang, Ying; Fréchet, Jean M. J.; Willson, C. Grant.  "Poly(vinyl-t-butyl carbonate)synthesis and thermolysis to poly(vinyl alcohol)," Polym.Bull.Berlin, 17(1), 1-6 (1987).
  18. Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant.  "Polymerization of 1-(Trimethylstannyl)alkyl Methacrylates: A New Class of Organotin Polymers and a Novel Case of Degradative Chain Transfer to Polymer," Macromolecules, 20(1), 10-15 (1987).
  19. Fréchet, Jean M. J.; Bouchard, Francine; Eichler, Eva; Houlihan, Francis M.; Iizawa, Takashi; Kryczka, Boguslaw; Willson, C. Grant.  "Thermally Depolymerizable Polycarbonates  V.  Acid Catalyzed Thermolysis of Allylic and Benzylic Polycarbonates:  A New Route to Resist Imaging," Polymer Journal, 19(1), 31-49 (1987).
  20. Miller, R. D.; Hofer, D.; Rabolt, J.; Sooriyakumaran, R.; Willson, C. G.; Fickes, G. N.; Guillet, J. E.; Moore, J.  "Soluble Polysilanes in Photolithography," Polymers for High Technology--Electronics and Photonics, ACS Sym.Ser., 346(15), 170-187 (1987).
  21. Turner, S. Richard; Ahn, K. D.; Willson, C. G.  "Thermally Stable, Deep-UV Resist Materials," Polymers for High Technology--Electronics and Photonics, ACS Symposium Series, 346(17), 200-210 (1987).
  22. Fréchet, J. M. J.; Eichler, E.; Stanciulescu, M.; Iizawa, T.; Bouchard, F.; Houlihan, F. M.; Willson, C. G.  "Acid-Catalyzed Thermolytic Depolymerization of Polycarbonates: A New Approach to Dry-Developing Resist Materials," Polymers for High Technology--Electronics and Photonics, ACS Symposium Series, 346(12), 138-148 (1987).
  23. Ito, Hiroshi; Willson, C. Grant; Frechet, Jean M. J.  "Positive/negative mid UV resists with high thermal stability," Advances in Resist Technology and Processing IV, Proc.SPIE, 771, 24-31 (1987).
  24. Allen, R. D.; MacDonald, S. A.; Willson, C. G.  "A "One-Layer" Multilayer Resist," Polymers for High Technology--Electronics and Photonics, ACS Symposium Series, 346(9), 101-109 (1987).
  25. MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. G., "A Single-Layer, Multilevel Resist: Limited-Penetration Elecron-Beam Lithography," Polymers for High Technology--Electronics and Photonics, ACS Symposium Series, 346(29), 350-357 (1987).
  26. Kutal, C. and Willson, C. Grant.  "Photoinitiated Cross-Linking and Image Formation in Thin Polymer Films Containing a Transition Metal Compound," J.Elecrochem.Soc., 134(9), 138-148 (1987).
  27. Kutal, C. and Willson, C. G.  "Crosslinking and Image Formation in Thin Polymer Films Containing a Photosensitive Transition Metal Compound," J.Chem.Soc., Chem.Ed.,  2280-2285 (1987).
  28. Kutal, C. and Willson, C. G.  "Inorganic Photoinitiators for Photolithographic Applications," Photochemistry and Photophysics of Coordination Compounds (Berlin),  307-312 (1987).
  29. Willson, C. G.; Miller, R. D.; McKean, D. R.; Pederson, L. A.  "New Diazoketone Dissolution Inhibitors for Deep UV Photolithography," Advances in Resist Technology and Processing IV, Proc.SPIE, 771, 2-11 (1987).
  30. Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant.  "New Synthetic Approach to Organotin Polymers," Proc.PMSE (Germany), 56, 867 (1987).



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