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Library -- 1980 - 1989

1982-1983
80-81 84-85 86-87 88-89

  1. Jain, K.; Willson, C. G.; and Lin, B. J.  "Ultrafast high resolution contact lithography using excimer lasers,"  Proc.SPIE, 334, 259-262 (1982).
  2. Frechet, Jean M. J.; Farrall, Jean M.; Willson, C. Grant.  "Chemical Modification of Poly(Methyl Acrylate) via Metalation and a-substitution," Polym.Bull.Berlin, 7(11-12), 567-573 (1982).
  3. Frechet, J. M. J.; Ito, Hiroshi; Willson, C. Grant.  "Résines pour UV lointain mettant an oeuvre un mécanisme d'amplification chimique," Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82,  260 (1982).
  4. Willson, C. Grant; Ito, Hiroshi; Frechet, J. M. J.  "L'amplification chimique appliquée au développement de polymères utilisables comme résines de lithographie," Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82,  261 (1982).
  5. Frechet, Jean M. J.; Farrall, M. Jean; Willson, C. Grant.  "Preparation of Highly Substituted Polysulfones by Chemical Modification,"  Org.Coat.& Appl.Poly.Sci.Proc., 46, 335-339 (1982).
  6. MacDonald, S. A. and Willson, C. G., "Poly(N-alkyl-o-nitroamides): A New Class of Thermally Stable, Photosensitive Polymers," ACS Sym.Ser., 184(6), 73-81 (1982).
  7. Jain, K.; Willson, C. G.; Lin, B. J.  "Fine-Line High Speed Excimer Laser Lithography,"  Proc.IEEE,  92-93 (1982).
  8. Willson, C. Grant and Frechet, Jean M. J., "New UV Resists with Negative or Positive Tone,"  Proc.IEEE,  92-93 (1982).
  9. Jain, K.; Willson, C. G.; Lin, B. J.  "Ultrafast, High-Resolution Contact Lithography with Excimer Lasers," IBM J.Res.Develop., 26(2), 151-159 (1982).
  10. Ito, Hiroshi; Miller, Dolores C.; Willson, C. Grant.  "Polymerization of Methyl a-(Trifluoromethyl)acrylate and a-(Trifluoromethyl)acrylonitrile and Copolymerization of These Monomers with Methyl Methacrylate," Macromolecules, 1982(15), 915-920 (1982).
  11. Willson, C. Grant; Ito, Hiroshi; Frechet, Jean M. J.; Houlihan, Frank.  "Chemical Amplification in the Design of Polymers for Resist Applications," International Union of Pure and Applied Chemistry, 28, 448 (1982).
  12. Hofer, Donald C.; Willson, C. Grant; Neureuther, Andrew R.; Hakey, Mark.  "Characterization of the induction effect at mid-ultraviolet exposure:  application to AZ2400 at 313 nm," Optical Microlithography--Technology for the Mid-1980s, Proc.SPIE, 334, 196-205 (1982).
  13. O'Sullivan, D.; Price, P. B.; Kinoshita, K.; Willson, C. G.  "Predicting Radiation Sensitivity of Polymers," J.Elecrochem.Soc., 129(4), 811-813 (1982).
  14. MacDonald, Scott A.; Miller, Robert D.; Willson, C. Grant; Feinberg, G. M.; Gleason, R. T.; Halverson, R. M.; MacIntyre, M. W.; Motsiff, W. T.  "Image Reversal: The Production of a Negative Image in a Positive Photoresist," Kodak Microelectronics Sem., 23, 114-117 (1982).
  15. Jain, K.; Willson, C. G.; Lin, B. J.  "Ultrafast Deep UV Lithography with Excimer Lasers," IEEE Electron Device Lett., EDL-3(3), 53-55 (1982).
  16. Willson, C. Grant; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G.  "Poly(methyl a-trifluoromethylacrylate) as a positive electron beam resist," Technical Papers, Regional Technical Conference, Society of Plastic Engineers,  207-219 (1982).
  17. Ito, Hiroshi and Willson, C. Grant, "Chemical Amplification in the Design of Dry Developing Resist Materials," Technical Papers, Regional Technical Conference, Society of Plastic Engineers,  331-353 (1982).
  18. Willson, C. Grant, "Organic Resist Materials - Theory and Chemistry," ACS Sym.Ser., 219(3), 87-159 (1983).
  19. Ito, Hiroshi; MacDonald, Scott; Willson, C. Grant.  "Organic Resist Materials: Exploring the Limits of Sensitivity and Resolution," RJ 4083 (45481) (1983).
  20. Jain, K.; Rice, S.; Lin, B. J.  "Ultrafast Deep UV Lithography Using Excimer Lasers," Polym.Eng.Sci., 23(18), 1019-1021 (1983).
  21. Willson, C. Grant; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G.  "Poly(Methyl a-Trifluoromethylacrylate) as a Positive Electron Beam Resist," Polymer Eng.& Sci., 23(18), 1000-1003 (1983).
  22. Ito, Hiroshi and Willson, C. Grant, "Chemical Amplification in the Design of Dry Developing Resist Materials," Polymer Eng.& Sci., 23(18), 1012-1018 (1983).
  23. Willson, C. Grant; Miller, Robert; McKean, Dennis; Clecak, Nicholas; Tompkins, Terry; Hofer, Donald.  "Design of a Positive Resist for Projection Lithography in the Mid-UV," Polymer Eng.& Sci., 23(18), 1004-1011 (1983).
  24. MacDonald, Scott A.; Ito, Hiroshi; Willson, C. Grant, "Advances in the design of organic resist materials," Microelectron.Eng., 1(3), 269-293 (1983).
  25. Miller, R. D.; Willson, C. G.; McKean, D. R.; Tompkins, T.; Clecak, Nicholas; Michl, J.; Downing, J.  "Semiempirical Calculations of Electronic Spectra: Utility in the Design of Mid-UV Sensitizers,"  Org.Coat.& Appl.Poly.Sci.Proc., 48, 54-57 (1983).
  26. Jain, K.; Willson, C. G.; Rice, S.; Pederson, L.; and Lin, B. J.  "Ultrafast Deep UV Lithography with Excimer Lasers," Introduction to Microlithography:  Theory, Materials, and Processing, ACS Sym.Ser., 219 , 363 (1983).
  27. Willson, C. G.; Frechet, J. M. J.; and Farrall, M. J.; "Chemical Modification of Poly(styrenesulfone)," Polym.Sci.& Technol., 21, 25-31 (1983).
  28. Thompson, L. F.; Willson, C. G.; and Bowden, M. J.  (ed.), Introduction to Microlithography:  Theory, Materials, and Processing, ACS Symposium Series, 219,  (1983).
  29. Ito, Hiroshi; Eichler, E.; Willson, C. Grant.  "Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins,"  Polymer, 24, 998-1000 (1983).
  30. Ito, Hiroshi; Willson, C. Grant; Fréchet, Jean M.; Farrall, M. J.; and Eichler, Eva.  "Synthesis of Poly(p-hydroxy-a-methylstyrene) by Cationic Polymerization and Chemical Modification," Macromolecules, 16(4), 510-517 (1983).
  31. MacDonald, S. A.; Steinmann, F.; Ito, H.; Lee, W-Y.; and Willson, C. G.  "The Development of Oxygen Reactive Ion Etch Barriers Based on Poly(trimethylstannylstyrene)," Polym.Mat.Sci.& Eng.,  104-106 (1983).



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