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Library -- 1980 - 1989

1984-1985
80-81 82-83 86-87 88-89 

  1. Ito, Hiroshi and Willson, C. Grant, "Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing,"  ACS Sym.Ser., 212(2), 11-23 (1984).
  2. Willson, Grant; Ito, Hiroshi; MacDonald, Scott.  "Resist Materials: A View of the Future,"  SEMI,   (1984).
  3. Miller, R. D.; McKean, D. R.; Tompkins, T. L.; Clecak, Nicholas; Willson, C. Grant.  Michl, J., and Downing, J., "Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers," Polymers in Electronics, ACS Sym.Ser., 242(3), 25-40 (1984).
  4. Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant; Neureuther, Andrew R.  "Contrast enhanced UV lithography with polysilanes," Advances in Resist Technology,  Proc.SPIE, 469, 108-116 (1984).
  5. Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant.  "Polysilane bilayer UV lithography," Advances in Resist Technology, Proc.SPIE, 469, 16-23 (1984).
  6. Thompson, L. F.; Willson, C. G.; Fréchet, J. M. J. (ed.) Materials for Microlithography: Radiation-Sensitive Polymers, ACS Symposium Series, 266,  (1984).
  7. Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H.  "Application of the Photo-Fries Rearrangement to Polymeric Imaging Systems," Polym.Prep., 25(1), 313-314 (1984).
  8. MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E.  "Radiolysis of Poly(isopropenyl t-butyl ketone)," Materials for Microlithography, ACS Symposium Series, 266(7), 179-186 (1984).
  9. Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G.  "Photochemistry of Ketone Polymers in the Solid Phase: Thin Film Studies of Vinyl Ketone Polymers," Materials for Microlithography, ACS Symposium Series, 266(19), 389-398 (1984).
  10. Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H.  "The Photo-Fries Rearrangement and Its Use in Polymeric Imaging Systems," Materials for Microlithography, ACS Symposium Series, 266(13), 269-292 (1984).
  11. Miller, R. D.; Hofer, D.; Willson, C. G.  "Soluble Polysilanes: A New Class of Radiation Sensitive Polymers,"  Polym.Prep., 25(1), 307-308 (1984).
  12. Willson,C.G. (ed.), "Advances in Resist Technology," Proc.SPIE, 469, 195-201 (1984).
  13. Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G.  "Photochemistry of Ketone Polymers.  18.  Thin Film Studies of Vinyl Ketone Polymers," Polym.Prep., 25(1), 296-297 (1984).
  14. Ito, H.; Willson, C. G.; Frechet, J. M. J.; Farrall, M. J.; Eichler, E.  "Synthesis of Poly(p-hydroxy-a-methylstyrene)," Polym.Prep., 25(1), 158-159 (1984).
  15. Miller, R. D.; Hofer, D.; McKean, D. R.; Willson, C. G.; West, R.; Trefonas, P. T.  "Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers," Materials for Microlithography, ACS Symposium Series, (14), 293-310 (1984).
  16. MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E.  "Radiolysis of Poly(t-butylisopropenyl ketone)," Polym.Prep., 25(1), 298-299 (1984).
  17. Hinsberg, W. D.; Willson, C. G.; Kanazawa, K. K.  "Use of a Quartz Crystal Microbalance Rate Monitor to Examine Photoproduct Effects of Resist Dissolution," Advances in Resist Technology and Processing II, Proc.SPIE, 539, 6-13 (1985).
  18. Willson, C. Grant; Hult, A.; MacDonald, Scott A.  "Photoinitiated Interfacial Cationic Polymerization," Polym.Mat.Sci.& Eng., 52, 339-344 (1985).
  19. MacDonald, Scott A.; Labadie, Jeff W.; Willson, C. Grant.  "Organotin Polymers: Synthesis and Resist Properties," Polymer Preprints, 26(2), 343-344 (1985).
  20. 63.          Fréchet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G.  "Chemical Amplification in the Design of Radiation-Sensitive Polymers," Society of Plastic Engineers, Inc.,   (1985).
  21. MacDonald, Scott A.; Ito, Hiroshi; Hiraoka, Hiroyuki; Willson, C. Grant.  "A New Oxygen Plasma Developable UV Sensitive Resist," Photopolymers Principles--Processes and Materials , Technical Papers, Regional Technical Conference, Society of Plastic Engineers,  177-196 (1985).
  22. Houlihan, F.; Bouchard, F.; Frechet, J. M. J.; Willson, C. G.  "Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, enols, and thiols with di-tert-butyl dicarbonate," Canadian J.Chemistry, 63(1), 153-162 (1985).
  23. Hult, Anders; MacDonald, Scott A.; Willson, C. Grant.  "Photoinitiated Interfacial Cationic Polymerization," Macromolecules, 18(10), 1804-1809 (1985).
  24. Fréchet, Jean M. J.; Tessier, T. G.; Willson, C. Grant; Ito, Hiroshi.  "Poly[p-(formyloxy)styrene]: Synthesis and Radiation-Induced Decarbonylation," Macromolecules, 18(3), 317-321 (1985).
  25. MacDonald, Scott A.; Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant.  "Resist Materials," Microelectronic Engineering, 3(104), 277-278 (1985).
  26. Fréchet, J. M. J.; Houlihan, F. M.; Willson, C. G.  "Polycarbonates Derived from o-Nitrobenzyl Glycidyl Ether: Synthesis and Radiation Sensitivity,"  Polym.Mat.Sci.& Eng., 53, 268-272 (1985).
  27. Fréchet, J. M. J.; Bouchard, F.; Houlihan, F.; Kryczka, B.; Willson, C. G.  "Novel Highly Substituted Polycarbonates: Synthesis and Properties of Polymers Derived from 1,4-bis-(2-hydroxy-2-propyl)benzyne and Analogs," Polym.Mat.Sci.& Eng., 53, 263-267 (1985).
  28. Fréchet, Jean M. J.; Houlihan, Francis M.; Bouchard, F.; Kryczka, Boguslaw; Willson, C. Grant.  "Design, Synthesis, and Study of Novel, Thermally Depolymerizable Polycarbonates," J.Chem.Soc., Chem.Commun.,  1514-1516 (1985).
  29. Neureuther, A. R.; Hofer, D.; Willson, C. G.  "Design of Contrast Enhancement Processes for Optical Lithography," Microcircuit Eng.,  53-60 (1985).

 



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