SFIL Publications

Copyrights of the following articles belong to the respective journals or authors. These articles may be downloaded for personal use only. Any other use requires prior permission of the authors and the publishers. Please visit the publishers' online websites.

2003

S.C. Johnson, T.C. Bailey, M.D. Dickey, E.K. Kim, B.J. Smith, N.A. Stacey, J.G. Ekerdt, C.G. Wilson, A.T. Jamieson, D.J. Resnick, D.P. Mancini, W.J. Dauksher, K.J. Nordquist, Step and Flash Imprint Lithography: Materials and Process Developments, Proc. SPIE 5037: submitted (2003).
B.J. Smith, N.A. Stacey, J.P. Donnelly, D.M. Onsongo, T.C. Bailey, C.J. Mackay, S.V. Sreenivasan, S.K. Banerjee, J.G. Ekerdt, C.G. Willson, Employing Step and Flash Imprint Lithography for Gate Level Patterning of a MOSFET Device, Proc SPIE 5037: submitted (2003).
T.C. Bailey, M.E. Colburn, B.J. Choi, A. Grot, J.G. Ekerdt, S.V. Sreenivasan, C.G. Willson, Step and Flash Imprint Lithography: A Low-Pressure, Room Temperature Nanoimprint Patterning Process, in Alternative Lithography. Unleashing the Potentials of Nanotechnology, C. Sotomayor Torres, Editor. 2002, Elsevier.

2002

C.J. Mackay, Development of a Baseline Process for the Integration of Step and Flash Imprint Lithography into a MOSFET Fabrication Process. Department of Mechanical Engineering: M.S. Thesis. 2002, The University of Texas at Austin: Austin, TX.
T.C. Bailey, S.C. Johnson, M.D. Dickey, B.J. Smith, A.T. Jamieson, E.K. Kim, N.A. Stacey, D. Mancini, W.J. Dauksher, K. Nordquist, D.J. Resnick, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Recent Advances in Step and Flash Imprint Lithography." Proc. 39^th Interface Symposium: (2002).
T.C. Bailey, S.C. Johnson, D.J. Resnick, S.V. Sreenivasan, J.G. Ekerdt, C.G. Willson. "Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology." J. Photopolymer Sci. Tech. 15(3): 481 (2002).
D.J. Resnick, T.C. Bailey, W.J. Dauksher, D. Mancini, K.J. Nordquist, E. Ainley, K. Gehoski, J.H. Baker, S. Johnson, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "High Resolution Templates for Step and Flash Imprint Lithography." Proc. SPIE 4688: 205 (2002).
W.J. Dauksher, K.J. Nordquist, D.P. Mancini, D.J. Resnick, J.H. Baker, A.E. Hooper, A.A. Talin, T.C. Bailey, A.M. Lemonds, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Characterization of and Imprint Results using ITO-based Step and Flash Imprint Lithography Templates." J. Vac. Sci. Tech. B 20(6): 2857-2861 (2002).
D.P. Mancini, K.A. Gehoski, E.Ainley, K.J. Nordquist, D.J. Resnick, T.C. Bailey, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Hydrogen Silsesquioxane for Direct E-beam Patterning of Step and Flash Imprint Lithography Templates." J. Vac. Sci. Tech. B 20(6): 2896-2901 (2002).
S.V. Sreenivasan, C.G. Willson, N.E. Schumaker and D.J. Resnick. "Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography." Proc. SPIE: Proc. SPIE 4688: (2002).
D.J. Resnick, D.P. Mancini, S.V. Sreenivasan and C.G. Willson. "Release Layers for Contact and Imprint Lithography." Semiconductor International (June 1): (2002).

2001

M.E. Colburn, Step and Flash Imprint Lithography: A Low-Pressure, Room-Temperature Nanoimprint Lithography. Department of Chemical Engineering; Ph.D. Thesis. 2001, The University of Texas at Austin: Austin, TX.
A.Q. Nguyen, Asymmetric Fluid-Structure Dynamics in Nanoscale Imprint Lithography. Department of Mechanical Engineering: M.S. Thesis. 2001, The University of Texas at Austin: Austin, TX.
M. Colburn, T. Bailey, B.J. Choi, J.G. Ekerdt, S.V. Sreenivasan and C.G. Willson. "Development and advantages of step and flash imprint lithography." Solid State Technology 46(7): 67 (2001).
T. Bailey, B.J. Smith, B.J. Choi, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Step and Flash Imprint Lithography: Defect Analysis." J. Vac. Sci. Tech. B 19(6): 2806 (2001).
T.C. Bailey, D.J. Resnick, D. Mancini, K.J. Nordquist, W.J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Template Fabrication Schemes for Step and Flash Imprint Lithography." Microelectron. Eng. 61-62: 461 (2001).
B.J. Choi, M. Meissl, M. Colburn, T. Bailey, P. Ruchhoeft, S.V. Sreenivasan, F. Prins, S. Banerjee, J.G. Ekerdt and C.G. Willson. "Layer-to-Layer Alignment for Step and Flash Imprint Lithography." Proc. SPIE 4343: 436-439 (2001).
B.J. Choi, S. Johnson, M. Colburn, S.V. Sreenivasan and C.G. Willson. "Design of orientation stages for step and flash imprint lithography." Precision Engineering 25(3): 192 (2001).
M. Colburn, A. Grot, B.J. Choi, M. Amistoso, T. Bailey, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Patterning non-flat substrates with a low pressure, room temperature imprint lithography process." J. Vac. Sci. Tech. B 19(6): 2162 (2001).
M. Colburn, I. Suez, B.J. Choi, M. Meissl, T. Bailey, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers." J. Vac. Sci. Tech. B. 19(6): 2685 (2001).

2000

M. Colburn, A. Grot, M. Amistoso, B.J. Choi, T. Bailey, J. Ekerdt, S.V. Sreenivasan, J. Hollenhorst and C.G. Willson. "Step and Flash Imprint Lithography for sub-100nm Patterning." Proc. SPIE 3997: 453 (2000).
T. Bailey, B.J. Choi, M. Colburn, A. Grot, M. Meissl, S. Shaya, J.G. Ekerdt, S.V. Sreenivasan and C.G. Willson. "Step and Flash Imprint Lithography: Template surface treatment and defect analysis." J. Vac. Sci. Tech. B 18(6): 3572 (2000).
T. Bailey, B.J. Choi, M. Colburn, A. Grot, M. Meissl, M. Stewart, J.G. Ekerdt, S.V. Sreenivasan and C.G. Willson. "Step and Flash Imprint Lithography: A Technology Review." Future Electron Devices 11(4): 54 (2000).
B.J. Choi, S. Johnson, S.V. Sreenivasan, M. Colburn, T. Bailey and C.G. Willson. "Partially Constrained Compliant Stages for High Resolution Imprint Lithography." Proc. ASME DETC2000 7B: 861 (2000).

1999

S.C. Johnson, Selectively Compliant Orientation Stages for Step and Flash Imprint Lithography, Department of Mechanical Engineering; M.S. Thesis. 1999, The University of Texas at Austin: Austin, TX.
M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J.G. Ekerdt and C.G. Willson. "Step and Flash Imprint Lithography: A new approach to high resolution patterning." Proc. SPIE 3676(I): 379 (1999).
P. Ruchoeft, M. Colburn, B. Choi, H. Noinu, S. Johnson, T. Bailey, S. Damle, M. Stewart, J.G. Ekerdt, S.V. Sreenivasan, J.C. Wolfe and C.G. Willson. "Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by Step and Flash Imprint Lithography." J. Vac. Sci. Tech. B 17(6): 2965 (1999).

Related Publications

D.P. Mancini, D.J. Resnick, K.A. Gehoski, L.L. Popovich and D.Y. Chang. "Low surface energy polymeric release coating for improved contact print lithography." Proc. SPIE: 21st Annual BACUS Symposium on Photomask Technology 4562: 593-599 (2001).
C.J. Martin, R.L. Engelstad, E.G. Lovell, D.J. Resnick and E.J. Weisbrod. "Prediction of fabrication distortions in step and flash imprint lithography templates." J. Vac. Sci. Tech. B 20(6): 2891-2895 (2002).

Willson Research Group

The University of Texas at Austin