Willson Research Group
The University of Texas at Austin
 

 

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   Publications
Available online (PDF format):
Copyrights of the following articles belong to the respective journals. These articles may be downloaded for personal use only. Any other use requires prior permission of the authors and the publishers. Please visit the publishers' online websites.
  1. Tsiartas, Pavlos C.; Flanagin, Lewis W.; Henderson, Clifford L.; Hinsberg, William D.; Sanchez, Isaac C.; Bonnecaze, Roger T.; Willson, C. Grant  "The Mechanism of Phenolic Polymer Dissolution: A New Perspective," Macromolecules, 30(16), 4656-4664 (1997).
  2. Flanagin, Lewis W.; McAdams, Christopher L.; Hinsberg, William D.; Sanchez, Isaac C.; Willson, C. Grant.  “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Macromolecules, 32(16), 5337-5343 (1999).
  3. Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant.  “Surface Roughness Development During Photoresists Dissolution,” J. Vac. Sci. Tech. B, 17(4), 1371-1379 (1999).
  4. Postnikov, Sergei V.; Stewart, Michael D.; Tran, Hoang Vi; Nierode, Mark A.; Medeiros, David R.; Cao, T.; Byers, Jeffrey; Webber, Stephen E.; Willson, C. Grant. "Study of resolution limits due to intrinsic bias in chemically amplified photoresists," J. Vac. Sci. & Tech. B, 17(6), 3335-3338 (1999).
  5. Schmid, Gerard M.; Singh, Vivek K.; Flanagin, Lewis W.; Stewart, Michael D.; Burns, Sean D.; Willson, C. Grant.  “Recent Advances in a Molecular Level Lithography Simulation,” Proc. SPIE, 3999, 675-685 (2000).
  6. Gardiner, Allen B.; Burns, Sean D.; Qin, Anwei; Willson, C. Grant. "Determination of residual casting solvent concentration gradients in resist films by a 'halt development' technique," J. Vac. Sci. & Tech. B, 19(1), 136-141 (2001).
  7. Schmid, Gerard M.; Smith, Mark D.; Mack, Chris A.; Singh, Vivek K.; Burns, Sean D.; Willson, C. Grant. “Understanding Molecular Level Effects during Post Exposure Processing,” Proc. SPIE, 4345, 1037-1047 (2001).
  8. Burns, Sean D.; Schmid, Gerard M.; Tsiartas, Pavlos C.; Willson, C. Grant. “Advancements to the Critical Ionization Dissolution Model,” J. Vac. Sci. & Tech. B, 20(2), 537-543 (2002).
  9. Gerard M. Schmid; Michael D. Stewart; Vivek K. Singh; C.G.Willson  “Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists,” J. Vac. Sci. Tech. B, 20(1), 185-190 (2002).
  10. Lin, Eric K.; Soles, Chris L.; Goldfarb, Dario L.; Trinque, Brian C.; Burns, Sean D.; Jones, Ron L.; Lenhart, Joseph L.; Angelopoulos, Marie; Willson, C. Grant; Satija, Sushil K.; Wu, Wen-li. “Direct Measurement of the Reaction Front in Chemically Amplified Photoresists,” Science, 297(5580), 372-375 (2002).
  11. Schmid, Gerard M., Sean D. Burns, Pavlos C. Tsiartas, and C. Grant Willson, “Electrostatic Effects during Dissolution of Positive Tone Photoresists,” J. Vac. Sci. Technol. B, 20(6), 2913-2919 (2002).
  12. Stewart, Michael D.; Tran, Hoang V.; Schmid, Gerard M.; Stachowiak, Timothy B.; Becker, Darren J.; Willson, C. Grant. “Acid Catalyst Mobility in Resist Resins,” J. Vac. Sci. Tech. B, 20(6), 2946-2952 (2002).

Additional publications:

  1. Flanagin, Lewis W.; McAdams, Christopher L.; Tsiartas, Pavlos C.; Henderson, Clifford L.; Hinsberg, William D.; and Willson, C. Grant.  "Probabilistic model for the mechanism of phenolic polymer dissolution," Proc. SPIE, 3333, 268-277 (1998).
  2. Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant.  “Molecular Model of Phenolic Polymer Dissolution in Photolithography,” Journ. Poly. Sci., Physics, 37, 2103-2113 (1999).
  3. Burns, Sean D.; Gardiner, Allen B.; Krukonis, V. J.; Wetmore, Paula M.; Qin, Anwei; Willson, C. Grant  “The Measurement of Concentration Gradients in Resist Films by a ‘Halt Development’ Technique”  Proceedings of the American Chemical Society Division of Polymeric Materials: Science and Engineering 81, 81-84 (1999).
  4. Stewart, Michael; Postnikov, Sergei; Tran, Hoang V.; Medeiros, David; Nierode, M. A.; Cao, T.; Byers, Jeff; Webber, Steven; Willson, C. Grant.  “Measurement of Acid Diffusivity in Thin Polymer Films Above and Below Tg”  Proc. ACS, Polym. Mat. Sci. Eng. Div., 81, 58 (1999).
  5. Lewis W. Flanagin; Christopher L. McAdams; William D. Hinsberg; Isaac C. Sanchez; C. Grant Willson  “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Polym. Mat. Sci. Eng., 81, 469-472 (1999).
  6. Stewart, Michael; Somervell, Mark; Tran, Hoang Vi; Postnikov, Sergei; and Willson, C. Grant.  “Study of Acid Transport Using IR Spectroscopy and SEM” Proc. SPIE, 3999, 665-674 (2000).
  7. Burns, Sean D.; Stewart, Michael D.; Hilfiker, J. N.; Synowicki, R. A.; Schmid,  Gerard M.; Brodsky, Colin; Willson, C. Grant.  “Determining Free Volume Changes During the PEB and PAB of a chemically Amplified Resist,”  Forefront of Lithographic Materials Research, Proc. of the 12th International Conference on photopolymers, McAfee, New Jersey, U.S.A, 323-334 (2000).
  8. Burns, S, Gardiner, A., Krukonis, V., Wetmore, P., Schmid, G., Lutkenhaus, J., Flanagin, L., and Willson, C. G. “Understanding Nonlinear Dissolution Rates in Photoresists” Proc. SPIE, 4345, 37-49 (2001).
  9. Stewart, M., Schmid, G., Postnikov, S., Willson, C. G. “Mechanistic Understanding of Line End Shortening” Proc. SPIE, 4345, 10-18 (2001).

 Pre-publications:

  1. Stewart, Michael D.; Becker, Darren J.; Stachowiak, Timothy B.; Schmid, Gerard M.; Michaelson, Timothy B.; Willson, C. Grant. “Acid Mobility in Chemically Amplified Photoresists,” presented at SPIE Microlithography 2002 annual meeting.
  2. Schmid, Gerard M.; Burns, Sean D.; Stewart, Michael D.; Willson, C. Grant. “Mesoscale simulation of positive tone chemically amplified photoresists,” presented at SPIE Microlithography 2002 annual meeting.
  3. Burns, Sean D.; Medeiros, David R.; Johnson, Heather F.; Wallraff, Greg A.; Hinsbeg, William D.; Willson, C. Grant. “The Effect of Humidity on the Deprotection Kinetics of Chemically Amplified Resists,” Proc. SPIE, 2002, (submitted February 2002)
   

Last updated February 21, 2003
© 2003 Willson Research Group,
The University of Texas at Austin
Phone: 512.471.6364
Email: schmid@che.utexas.edu