Motivations

Process Flow
Film Creation
Exposure
Post-Exposure Bake
Development

Collaborations

Support

Publications

Willson Research

• Funding for this work has been provided by:

            - Semiconductor Research Corporation

            - DARPA

            - International SEMATECH

            - Eastman Kodak Corporation

• PROLITH® software was donated by KLA-Tencor.
   

• Materials donations have been provided by:

            - Sachem

            - ChemFirst

            - ShinEtsu MicroSi

            - Midori Kagaku

• Computers have been donated by Intel Corporation.
   

• Software has been donated by Microsoft.
  

Last updated September 11, 2002
© 2002 Willson Research Group,
The University of Texas at Austin
Phone: 512.471.6364
Email: schmid@che.utexas.edu