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Willson Research Group - The University of Texas at Austin

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Resist Modeling Parameters

Simulated Aerial Images from Alta 3500 Simulated CD (nm)
Alta3500 400.img 400
Alta3500 500.img 500
Alta3500 1000.img 1000
Hoya Substrate Optical Properties
l (nm) n k
257 2.0987 0.6460
365 1.6325 0.2832
Optical Properties of Photoresist's at i-line
Resist A
(1/mm)
B
(1/mm)
C
(cm2/mJ)
nune nexp
IP3600 0.8607 0.1074 010142 1.6947 1.6887
PF88A5 0.7044 0.0400 0.0105 1.7006 1.6863
PFI 88A dissolution properties
Notch Model Fit  
Developer 0.23N 0.26N
Rmax (nm/sec) 48 88
Rmin (nm/sec) 0.001 0.002
Mthnotch 0.411 0.503
n 3.39 3.36
n_notch 58.82 31.44
iP 3600 dissolution properties
Advanced Mack 
Model Fit
Developer 0.26N 0.23N 0.2N
Rmax (nm/sec) 253 120 45
Rmin (nm/sec) 0.008 0.001 0.001
Rresin (nm/sec) 14.3 5 5
n 3.6783 4.1664 5.6734
l 13.8612 10.5352 7.1904

Last updated Monday, February 14, 2000
© 2000 Photomask Lithography, Willson Research Group,
University of Texas at Austin
Phone: 512.471.6364
Email:
rathsack@mail.utexas.edu

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