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Lithographic
Optimization
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Lithographic
Imaging Equation
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1. Image Transfer
Position steepest slope (inflection point) of the
aerial image at
the feature edge
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2. Dissolution
Contrast
Maximize dissolution change with dose through R(m)
analysis of photoresists
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3. Dissolution
Threshold
Position the dissolution threshold at the inflection
point of the
image with developer concentration
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R = Dissolution rate
x = Horizontal position
m = Relative PAC concentration
gR
= Resist
contrast
x* = Nominal edge of resist features
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Last
updated Monday, February 14, 2000
© 2000 Photomask Lithography, Willson Research
Group,
University of Texas at Austin
Phone: 512.471.6364
Email:
rathsack@mail.utexas.edu
Site design by Arrion Smith
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