Past Research Areas
- 157 nm Photoresist Materials
- Acid Diffusion
- Cationic Graft Polymerization
- Dissolution Studies
- Ellipsometry
- Houston
- Liquid Crystals
- Lithography (Chris Mack on lithoguru.com)
- Mass Persistent Photoresists
- NLO
- Photomask Lithography
- Step and Flash Imprint Lithography
- Top Surface Imaging
- Two Tone Resist
- Vacuum UV
- Water Soluble Resist