Dynamic Polymer Systems for Microelectronics |
Objective |
Develop and synthesize new thermal or acid degradable cross-linkers for Step and Flash Imprint Lithography (SFIL). These degradable/self healing materials will lend themselves to increase imprint mold lifetime and hopefully may even act as planarization layers in future SFIL processes. |
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Acid Degradable Motif |
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Reversible Isocyanate Motif |
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Reversible Diels-Alder Motif |
Version History |
Original page created 02/27/06 |