Updates

Dynamic Polymer Systems for Microelectronics

Objective

Develop and synthesize new thermal or acid degradable cross-linkers for Step and Flash Imprint Lithography (SFIL). These degradable/self healing materials will lend themselves to increase imprint mold lifetime and hopefully may even act as planarization layers in future SFIL processes.
Acid Degradable Motif
Reversible Isocyanate Motif
Reversible Diels-Alder Motif

Version History

Original page created 02/27/06