Willson Research Group

Published Articles
	1. (1)	Jacobson, S. J.; Willson, C. Grant; Rapoport, H. “Mechanism of Cystine Racemization in Strong Acid,” Journal of Organic Chemistry 39(8) 1074-1077 (1974)
	2. (2)	Slama, J. T.; Willson, C. Grant; Rapoport, H. “Porphyrin-Protein Bond of Cytochrome,” Journal of the American Chemical Society 97(22) 6556-6562 (1975)
	3. (3)	Willson, C. Grant; Gilon, C.; Donzel, B.; and Goodman, M. “Synthesis of Pyroglutamyl-histidyl-thiazolidine-4--carboxamide, a Biologically Active Analog of Thyrotrophin Releasing Factor,” Biopolymers 15(11) 2317-2322 (1976)
	4. (5)	Chorev, M. ; Willson, C. Grant; Goodman, M. “A General Approach to Retro-Isometric Linear Peptide Synthesis,” Journal of the American Chemical Society 99(24) 8075-8076 (1977)
	5. (6)	Chorev, M. ; Willson, C. Grant; Goodman, M. “A Three-Point Model for the Dipeptide Sweetner-Receptor Interaction,” Peptides - Proceedings of the Fifth American Peptide Symposium 572-574 (1977)
	6. (4)	Slama, J. T.; Willson, C. Grant; Grimshaw, C. E.; Rapoport, H. “Stereochemistry of the Porphyrin-Protein Bond of Cytochrome c. Stereochemistry Comparison of Rhodospirillum Rubrum, Yeast and Horse Heart Porphyrins c,” Biochemistry 16(8) 1750-1754 (1977)
	7. (7)	Willson, C. Grant; Goodman, M.; Rivier, J.; Vale, W. “Topochemically Related Hormone Structures. The Synthesis of Retro-Analogs of LRF.,” Peptides - Proceedings of the Fifth American Peptide Symposium 579-581 (1977)
	8. (9)	Gipstein, E. ; Willson, C. Grant., and Sachdev, H. S. “Synthesis and Polymerization of Alkyl a-(Alkylsulfonyl)acrylates,” Journal of Organic Chemistry 45(8) 1486-1489 (1980)
	9. (8)	MacDonald, Scott. A.; Willson, C. Grant; Chorev, Michael.; Vernacchia, Fred. S.; Goodman, Murray. “Peptide Sweetners. 3. Effect of Modifying the Peptide Bond on the Sweet Taste of L-Aspartyl-L-phenylalanine Methyl Ester and Its Analogues,” Journal of Medical Chemistry 23(4) 413-420 (1980)
	10. (10)	MacDonald, S. A.; Schierling, T. D.; Willson, C. Grant. “Poly-(N-alkyl)-o-nitroamides): A New Class of Photosensitive Polymers,” Journal of Organic Coatings and Plastics Chemistry 43 264-267 (1980)
	11. (11)	Grant, Barbara D.; Clecak, Nicholas J.; Twieg, Robert J.; Willson, C. Grant. “Deep UV Photoresists I. Meldrum's Diazo Sensitizer,” IEEE Transactions on Electron Devices(11) 1300-1305 (1981)
	12. (12)	O'Sullivan, D. ; Price, P. B.; Kinoshita, K.; Willson, C. G. “Correlative Studies of Track-Etch Behaviour and Chemical Development of Lithographic Polymer Resists,” Nucl.Tracks, Meth., Inst.Appl. 344-345 (1981)
	13. (14)	Frechet, Jean M. J.; Farrall, Jean M.; Willson, C. Grant. “Chemical Modification of Poly(Methyl Acrylate) via Metalation and a-substitution,” Polym.Bull.Berlin 7(11) 567-573 (1982)
	14. (15)	Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant. “Résines pour UV lointain mettant an oeuvre un mécanisme d'amplification chimique,” Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82 260 (1982)
	15. (17)	Frechet, Jean M. J.; Farrall, M. Jean; Willson, C. Grant. “Preparation of Highly Substituted Polysulfones by Chemical Modification,” Org.Coat.& Appl.Poly.Sci.Proc. 46 335-339 (1982)
	16. (24)	Hofer, Donald C.; Willson, C. Grant; Neureuther, Andrew R.; Hakey, Mark. “Characterization of the induction effect at mid-ultraviolet exposure: application to AZ2400 at 313 nm,” Optical Microlithography--Technology for the Mid-1980s, Proc.SPIE 334 196-205 (1982)
	17. (22)	Ito, Hiroshi ; Dolores C.; Willson, C. Grant. “Polymerization of Methyl a-(Trifluoromethyl)acrylate and a-(Trifluoromethyl)acrylonitrile and Copolymerization of These Monomers with Methyl Methacryl,” Macromolecules 1982(15) 915-920 (1982)
	18. (29)	Ito, Hiroshi ; Willson, C. Grant “Chemical Amplification in the Design of Dry Developing Resist Materials,” Technical Papers, Regional Technical Conference, Society of Plastic Engineers 331-353 (1982)
	19. (13)	Jain, K. ; Willson, C. G.; and Lin, B. J. “Ultrafast high resolution contact lithography using excimer lasers,” Proc.SPIE 334 259-262 (1982)
	20. (19)	Jain, K. ; Willson, C. G.; Lin, B. J. “Fine-Line High Speed Excimer Laser Lithography,” Proc.IEEE 92-93 (1982)
	21. (21)	Jain, K. ; Willson, C. G.; Lin, B. J. “Ultrafast, High-Resolution Contact Lithography with Excimer Lasers,” IBM J.Res.Develop. 26(2) 151-159 (1982)
	22. (27)	Jain, K. ; Willson, C. G.; Lin, B. J. “Ultrafast Deep UV Lithography with Excimer Lasers,” IEEE Electron Device Lett.(3) 53-55 (1982)
	23. (18)	MacDonald, S. A.; Willson, C. Grant. “Poly(N-alkyl-o-nitroamides): A New Class of Thermally Stable, Photosensitive Polymers,” ACS Sym.Ser. 184(6) 73-81 (1982)
	24. (26)	MacDonald, Scott A.; Miller, Robert D.; Willson, C. Grant; Feinberg, G. M.; Gleason, R. T.; Halverson, R. M.; MacIntyre, M. W.; Motsiff, W. T. “Image Reversal: The Production of a Negative Image in a Positive Photoresist,” Kodak Microelectronics Sem. 23 114-117 (1982)
	25. (25)	O'Sullivan, D. ; Price, P. B.; Kinoshita, K.; Willson, C. G. “Predicting Radiation Sensitivity of Polymers,” J.Elecrochem.Soc. 129(4) 811-813 (1982)
	26. (16)	Willson, C. Grant; Ito, Hiroshi; Frechet, J. M. J. “L\\\\\\\\\\\\\\\'amplification chimique appliquée au développement de polymères utilisables comme résines de lithographie,” Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82 261 (1982)
	27. (20)	Willson, C. Grant; Frechet, Jean M. J. “New UV Resists with Negative or Positive Tone,” Proc.IEEE 92-93 (1982)
	28. (23)	Willson, C. Grant; Ito, Hiroshi; Frechet, Jean M. J.; Houlihan, Frank. “Chemical Amplification in the Design of Polymers for Resist Applications,” International Union of Pure and Applied Chemistry 28 448 (1982)
	29. (28)	Willson, C. Grant; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G. “Poly(methyl a-trifluoromethylacrylate) as a positive electron beam resist,” Technical Papers, Regional Technical Conference, Society of Plastic Engineers 207-219 (1982)
	30. (31)	Ito, Hiroshi ; MacDonald, Scott; Willson, C. Grant. “Organic Resist Materials: Exploring the Limits of Sensitivity and Resolution,” RJ 4083(45481) (1983)
	31. (34)	Ito, Hiroshi ; Willson, C. Grant “Chemical Amplification in the Design of Dry Developing Resist Materials,” Polymer Eng.& Sci. 23(18) 1012-1018 (1983)
	32. (41)	Ito, Hiroshi ; Eichler, E.; Willson, C. Grant. “Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins,” Polymer 24 998-1000 (1983)
	33. (42)	Ito, Hiroshi ; Willson, C. Grant; Fréchet, Jean M.; Farrall, M. J.; and Eichler, Eva. “Synthesis of Poly(p-hydroxy-a-methylstyrene) by Cationic Polymerization and Chemical Modification,” Macromolecules 16(4) 510-517 (1983)
	34. (32)	Jain, K. ; Rice, S.; Lin, B. J. “Ultrafast Deep UV Lithography Using Excimer Lasers,” Polym.Eng.Sci. 23(18) 1019-1021 (1983)
	35. (38)	Jain, K. ; Willson, C. G.; Rice, S.; Pederson, L.; and Lin, B. J. “Ultrafast Deep UV Lithography with Excimer Lasers,” Introduction to Microlithography: Theory, Materials, and Processing, ACS Sym.Ser. 219 363 (1983)
	36. (36)	MacDonald, Scott A.; Ito, Hiroshi; Willson, C. Grant “Advances in the design of organic resist materials,” Microelectron.Eng. 1(3) 269-293 (1983)
	37. (43)	MacDonald, S. A.; Steinmann, F.; Ito, H.; Lee, W-Y.; and Willson, C. G. “The Development of Oxygen Reactive Ion Etch Barriers Based on Poly(trimethylstannylstyrene),” Polym.Mat.Sci.& Eng. 104-106 (1983)
	38. (37)	Miller, R. D.; Willson, C. G.; McKean, D. R.; Tompkins, T.; Clecak, Nicholas; Michl, J.; Downing, J. “Semiempirical Calculations of Electronic Spectra: Utility in the Design of Mid-UV Sensitizers,” Org.Coat.& Appl.Poly.Sci.Proc. 48 54-57 (1983)
	39. (40)	Thompson, L. F.; Willson, C. G.; and Bowden, M. J. “,” Introduction to Microlithography: Theory, Materials, and Processing, ACS Symposium Series 219 (1983)
	40. (30)	Willson, C. Grant; “Organic Resist Materials - Theory and Chemistry,” ACS Sym.Ser. 219(3) 87-159 (1983)
	41. (33)	Willson, Grant C.; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G. “Poly(Methyl a-Trifluoromethylacrylate) as a Positive Electron Beam Resist,” Polymer Eng.& Sci. 23(18) 1000-1003 (1983)
	42. (35)	Willson, Grant C.; Miller, Robert; McKean, Dennis; Clecak, Nicholas; Tompkins, Terry; Hofer, Donald. “Design of a Positive Resist for Projection Lithography in the Mid-UV,” Polymer Eng.& Sci. 23(18) 1004-1011 (1983)
	43. (39)	Willson, G. C.; Frechet, J. M. J.; and Farrall, M. J. “Chemical Modification of Poly(styrenesulfone),” Polym.Sci.& Technol. 21 25-31 (1983)
	44. (52)	Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G. “Photochemistry of Ketone Polymers in the Solid Phase: Thin Film Studies of Vinyl Ketone Polymers,” Materials for Microlithography, ACS Symposium Series 266(19) 389-398 (1984)
	45. (56)	Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G. “Photochemistry of Ketone Polymers. 18. Thin Film Studies of Vinyl Ketone Polymers,” Polym.Prep. 25(1) 296-297 (1984)
	46. (47)	Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant; Neureuther, Andrew R. “Contrast enhanced UV lithography with polysilanes,” Advances in Resist Technology, Proc.SPIE 469 108-116 (1984)
	47. (48)	Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant. “Polysilane bilayer UV lithography,” Advances in Resist Technology, Proc.SPIE 469 16-23 (1984)
	48. (44)	Ito, Hiroshi ; Willson, C. Grant “Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing,” ACS Sym.Ser. 212(2) 11-23 (1984)
	49. (57)	Ito, H. ; Willson, C. G.; Frechet, J. M. J.; Farrall, M. J.; Eichler, E. “Synthesis of Poly(p-hydroxy-a-methylstyrene),” Polym.Prep. 25(1) 158-159 (1984)
	50. (51)	MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E. “Radiolysis of Poly(isopropenyl t-butyl ketone),” Materials for Microlithography, ACS Symposium Series 266(7) 179-186 (1984)
	51. (59)	MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E. “Radiolysis of Poly(t-butylisopropenyl ketone),” Polym.Prep. 25(1) 298-299 (1984)
	52. (46)	Miller, R. D.; McKean, D. R.; Tompkins, T. L.; Clecak, Nicholas; Willson, C. Grant. Michl, J., and Downing, J. “Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers,” Polymers in Electronics, ACS Sym.Ser. 243(3) 25-40 (1984)
	53. (54)	Miller, R. D.; Hofer, D.; Willson, C. G. “Soluble Polysilanes: A New Class of Radiation Sensitive Polymers,” Polym.Prep. 25(1) 307-308 (1984)
	54. (58)	Miller, R. D.; Hofer, D.; McKean, D. R.; Willson, C. G.; West, R.; Trefonas, P. T. “Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers,” Materials for Microlithography, ACS Symposium Series(14) 293-310 (1984)
	55. (50)	Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H. “Application of the Photo-Fries Rearrangement to Polymeric Imaging Systems,” Polym.Prep. 25(1) 313-314 (1984)
	56. (53)	Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H. “The Photo-Fries Rearrangement and Its Use in Polymeric Imaging Systems,” Materials for Microlithography, ACS Symposium Series 266(13) 269-292 (1984)
	57. (49)	Thompson, L. F.; Willson, C. G.; Fréchet, J. M. J. “,” (ed.) Materials for Microlithography: Radiation-Sensitive Polymers, ACS Symposium Series 266 (1984)
	58. (45)	Willson, C. Grant; Ito, Hiroshi; MacDonald, Scott. “Resist Materials: A View of the Future,” SEMI (1984)
	59. (55)	Willson, C. Grant; “Advances in Resist Technology,” Proc.SPIE 469 195-201 (1984)
	60. (63)	Fréchet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G. “Chemical Amplification in the Design of Radiation-Sensitive Polymers,” Society of Plastic Engineers, Inc. (1985)
	61. (67)	Fréchet, Jean M. J.; Tessier, T. G.; Willson, C. Grant; Ito, Hiroshi. “Poly[p-(formyloxy)styrene]: Synthesis and Radiation-Induced Decarbonylation,” Macromolecules 18(3) 317-321 (1985)
	62. (69)	Fréchet, J. M. J.; Houlihan, F. M.; Willson, C. G. “Polycarbonates Derived from o-Nitrobenzyl Glycidyl Ether: Synthesis and Radiation Sensitivity,” Polym.Mat.Sci.& Eng. 53 268-272 (1985)
	63. (70)	Fréchet, J. M. J.; Bouchard, F.; Houlihan, F.; Kryczka, B.; Willson, C. G. “Novel Highly Substituted Polycarbonates: Synthesis and Properties of Polymers Derived from 1,4-bis-(2-hydroxy-2-propyl)benzyne and Analogs,” Polym.Mat.Sci.& Eng. 53 263-267 (1985)
	64. (71)	Fréchet, Jean M. J.; Houlihan, Francis M.; Bouchard, F.; Kryczka, Boguslaw; Willson, C. Grant. “Design, Synthesis, and Study of Novel, Thermally Depolymerizable Polycarbonates,” J.Chem.Soc., Chem.Commun. 1514-1516 (1985)
	65. (60)	Hinsberg, W. D.; Willson, C. Grant.; Kanazawa, K. K. “Use of a Quartz Crystal Microbalance Rate Monitor to Examine Photoproduct Effects of Resist Dissolution,,” Advances in Resist Technology and Processing II, Proc.SPIE 539 6-13 (1985)
	66. (65)	Houlihan, F. ; Bouchard, F.; Frechet, J. M. J.; Willson, C. Grant. “Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, enols, and thiols with di-tert-butyl dicarbonate,” Canadian J.Chemistry 63(1) 153-162 (1985)
	67. (66)	Hult, Anders. ; MacDonald, Scott A.; Willson, C. Grant. “Photoinitiated Interfacial Cationic Polymerization,” Macromolecules 18(10) 1804-1809 (1985)
	68. (62)	MacDonald, Scott A.; Labadie, Jeff W.; Willson, C. Grant. “Organotin Polymers: Synthesis and Resist Properties,” Polymer Preprints 26(2) 343-344 (1985)
	69. (64)	MacDonald, Scott A.; Ito, Hiroshi; Hiraoka, Hiroyuki; Willson, C. Grant. “A New Oxygen Plasma Developable UV Sensitive Resist,” Photopolymers Principles--Processes and Materials , Technical Papers, Regional Technical Conference, 177-196 (1985)
	70. (68)	MacDonald, Scott A.; Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant. “Resist Materials,” Microelectronic Engineering 3(104) 277-278 (1985)
	71. (72)	Neureuther, A. R.; Hofer, D.; Willson, C. G. “Design of Contrast Enhancement Processes for Optical Lithography,” Microcircuit Eng. 53-60 (1985)
	72. (61)	Willson, C. Grant; Hult, A.; MacDonald, Scott A. “Photoinitiated Interfacial Cationic Polymerization,” Polym.Mat.Sci.& Eng. 52 339-344 (1985)
	73. (83)	Allen, R. D.; MacDonald, S. A.; and Willson, C. Grant. “A One Layer MLR Resist,” Polym.Mat.Sci.& Eng. 55 290-291 (1986)
	74. (75)	Fréchet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Eichler, Eva; Kryczka, Boguslav; Willson, C. Grant. “Design and synthesis of novel allylic and benzylic copolycarbonates susceptible to acidolytic or thermolytic depolymerization,” Makromol.Chem., Rapid Commun. 7(3) 121-126 (1986)
	75. (77)	Fréchet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Kryczka, Boguslaw; Eichler, Eva; Clecak, Nicholas; Willson, C. Grant. “New Approach to Imaging Incorporating Chemical Amplification: Synthesis and Preliminary Evaluation of Novel Resists Based on Tertiary Copolycarbonates,” J.Imaging Sci. 30(2) 59-64 (1986)
	76. (80)	Fréchet, Jean M. J.; Iizawa, Takashi; Bouchard, Francine; Stanciulescu, Maria; Willson, C. Grant; Clecak, Nicholas. “New Condensation Polymers as Resist Materials Capable of Chemical Amplification,” Polym.Mat.Sci.& Eng. 55 299-303 (1986)
	77. (78)	Hinsberg, W. D.; Willson, C. Grant.; and Kanazawa, K. K. “Measurement of Thin-Film Dissolution Kinetics Using a Quartz Crystal Microbalance,” J.Elecrochem.Soc. 133(7) 1448-1451 (1986)
	78. (74)	Houlihan, F. M.; Bouchard, F.; Fréchet, J. M. J.; Willson, C. Grant. “Thermally Depolymerizable Polycarbonates. 2. Synthesis of Novel Linear Tertiary Copolycarbonates by Phase-Transfer Catalysis,” Macromolecules 19(1) 13-19 (1986)
	79. (76)	Ito, Hiroshi ; MacDonald, Scott A.; Willson, C. Grant; Moore, J. W.; Gharapetian, H. M.; Guillet, James E. “Reactivity and Polymerization of Isopropenyl tert-Butyl Ketone: A Twisted a,b-Unsaturated Enone,” Macromolecules 19(7) 1839-1844 (1986)
	80. (79)	Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Organotin Polymers: Synthesis and Resist Properties,” J.Imaging Sci. 30(4) 169-173 (1986)
	81. (82)	Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Poly(alkylnylstannanes): A new class of main chain organotin polymers,” Polymer Bulletin, Berlin, 16(5) 427-431 (1986)
	82. (85)	MacDonald, S. A.; Allen, R. D.; Clecak, Nicholas; Willson, C. Grant.; Frechet, J. M. J. “A 2-layer resist system derived from trimethylsilystyrene,” Advances in Resist Technology and Processing III, Proc.SPIE 631 28-33 (1986)
	83. (87)	MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. Grant. “A Single Layer, Multilevel Resist: Limited Penetration E-Beam Lithography,” Polym.Mat.Sci.& Eng.(2559) 721-723 (1986)
	84. (81)	Miller, R. D.; Hofer, D.; Fickes, G. N.; Willson, C. Grant.; Marinero, E.; Trefonas, P.; West, R. “Soluble Polysilanes: An Interesting New Class of Radiation Sensitive Materials,” Polym.Eng.Sci. 26(16) 1129-1134 (1986)
	85. (86)	Miller, R. D.; Fickes, G. N.; Hofer, D.; Sooriyakumaran, R.; Willson, C. Grant.; Guillet, J. E.; Moore, J. “Soluble Polysilanes for Lithography,” Polym.Mat.Sci.& Eng. 55 599-603 (1986)
	86. (73)	Willson, Grant C.; Ito, Hiroshi; Fréchet, Jean M. J.; Tessier, Theodore G.; Houlihan, Francis M. “Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution,” J.Elecrochem.Soc. 133(1) 181-187 (1986)
	87. (84)	Willson, C. G.; (ed.) “Advances in Resist Technology and Processing III,” Proc.SPIE 631 346 (1986)
	88. (88)	Willson, C. G.; “Polymers in Microlithography,” Polym.Mat.Sci.& Eng. 55 1-2 (1986)
	89. (96)	Allen, R. D.; MacDonald, S. A.; Willson, C. G. “A "One-Layer" Multilayer Resist,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(9) 101-109 (1987)
	90. (91)	Fréchet, Jean M. J.; Bouchard, Francine; Eichler, Eva; Houlihan, Francis M.; Iizawa, Takashi; Kryczka, Boguslaw; Willson, C. Grant. “Thermally Depolymerizable Polycarbonates V. Acid Catalyzed Thermolysis of Allylic and Benzylic Polycarbonates: A New Route to Resist Imaging,” Polymer Journal 19(1) 31-49 (1987)
	91. (94)	Fréchet, J. M. J.; Eichler, E.; Stanciulescu, M.; Iizawa, T.; Bouchard, F.; Houlihan, F. M.; Willson, C. G. “Acid-Catalyzed Thermolytic Depolymerization of Polycarbonates: A New Approach to Dry-Developing Resist Materials,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(12) 138-148 (1987)
	92. (95)	Ito, Hiroshi ; Willson, C. Grant; Frechet, Jean M. J “Positive/negative mid UV resists with high thermal stability,” Advances in Resist Technology and Processing IV, Proc.SPIE, 771 24-31 (1987)
	93. (89)	Jiang, Ying ; Fréchet, Jean M. J.; Willson, C. Grant. “Poly(vinyl-t-butyl carbonate)synthesis and thermolysis to poly(vinyl alcohol),” Polym.Bull.Berlin 17(1) 1-6 (1987)
	94. (98)	Kutal, C. ; Willson, C. Grant. “Photoinitiated Cross-Linking and Image Formation in Thin Polymer Films Containing a Transition Metal Compound,” J.Elecrochem.Soc. 134(9) 138-148 (1987)
	95. (99)	Kutal, C. ; Willson, C. G. “Crosslinking and Image Formation in Thin Polymer Films Containing a Photosensitive Transition Metal Compound,” J.Chem.Soc., Chem.Ed. 2280-2285 (1987)
	96. (100)	Kutal, C. ; Willson, C. G. “Inorganic Photoinitiators for Photolithographic Applications,” Photochemistry and Photophysics of Coordination Compounds (Berlin) 307-312 (1987)
	97. (90)	Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Polymerization of 1-(Trimethylstannyl)alkyl Methacrylates: A New Class of Organotin Polymers and a Novel Case of Degradative Chain Transfer to Polymer,” Macromolecules 20(1) 10-15 (1987)
	98. (102)	Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “New Synthetic Approach to Organotin Polymers,” Proc.PMSE (Germany) 56 867 (1987)
	99. (97)	MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. G. “A Single-Layer, Multilevel Resist: Limited-Penetration Elecron-Beam Lithography,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(29) 350-357 (1987)
	100. (92)	Miller, R. D.; Hofer, D.; Rabolt, J.; Sooriyakumaran, R.; Willson, C. G.; Fickes, G. N.; Guillet, J. E.; Moore, J. “Soluble Polysilanes in Photolithography,” Polymers for High Technology--Electronics and Photonics, ACS Sym.Ser. 346(15) 170-187 (1987)
	101. (93)	Turner, Richard S.; Ahn, K. D.; Willson, C. G. “Thermally Stable, Deep-UV Resist Materials,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(17) 200-210 (1987)
	102. (101)	Willson, C. G.; Miller, R. D.; McKean, D. R.; Pederson, L. A. “New Diazoketone Dissolution Inhibitors for Deep UV Photolithography,” Advances in Resist Technology and Processing IV, Proc.SPIE 771 2-11 (1987)
	103. (113)	Fréchet, Jean M. J.; Kallman, Neil; Kryczka, Boguslav; Eichler, Eva; Houlihan, Francis M.; Willson, C. Grant. “Novel derivatives of poly(4-hydroxystyrene) with easily removable teriary, allylic, or benzylic ethers,” Polym.Bull.Berlin 20(5) 427-434 (1988)
	104. (106)	Hinsberg, William D.; MacDonald, Scott A.; Pederson, L.; Willson, C. Grant. “Zero-Misalignment Lithographic Process Using a Photoresist with Wavelength-Selected Tone,” Advances in Resist Technology and Processing V, Proc.SPIE 920 2-12 (1988)
	105. (107)	Hinsberg, W. D.; MacDonald, S. A.; Pederson, L.; Willson, C. G. “Self-Aligning Lithography using a Dual-Tone Resist: A Lithographic Analogue of Color Photography,” Photo.Sci.& Eng. 94-97 (1988)
	106. (109)	Ito, H. ; Pederson, L. A.; MacDonald, S. A.; Cheng, Y. Y.; Lyerla, J. R.; Willson, C. G. “A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System,” J.Elecrochem.Soc. 135(6) 1504-1508 (1988)
	107. (111)	Iwayanagi, Takao ; Ueno, Takumi; Nonogaki, Saburo; Ito, Hiroshi; Willson, C. Grant. “Materials and Processes for Deep-UV Lithography,” Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS 218(3) 109-224 (1988)
	108. (105)	McKean, Dennis R.; MacDonald, Scott A.; Clecak, Nicholas J.; Willson, C. Grant. “Novolac based deep-UV resists,” Advances in Resist Technology and Processing V, Proc.SPIE 920 60-66 (1988)
	109. (103)	Neureuther, Andrew R.; Willson, C. Grant. “Reduction in x-ray lithography shot noise exposure limit by dissolution phenomena,” J.Vac.Sci.Technol.B 6(1) 167-173 (1988)
	110. (114)	Seligson, Daniel ; Ito, Hiroshi; Willson, C. Grant. “The impact of high-sensitivity resist materials on x-ray lithography,” J.Vac.Sci.Technol.B 6(6) 2268-2273 (1988)
	111. (104)	Umbach, C. P.; Broers, A. N.; Willson, C. G.; Koch, R.; Laibowitz, R. B. “Nanolithography with an acid catalyzed resist,” J.Vac.Sci.Technol.B 6(1) 319-322 (1988)
	112. (110)	Umbach, C. P.; Broers, A. N.; Koch, R.; Willson, C. G.; Laibowitz, R. B. “Nanolithography with a high-resolution STEM,” IBM J.Res.Develop. 32(4) 454-461 (1988)
	113. (108)	Willson, G. C.; Schellenberg, F. M.; Sperley, K. M.; Brock, P. J.; Levenson, M. D. “Photodeformable polymer system for holography,” CLEO Conf.Lasers Electro Opt., Tech.Dig. 7 198 (1988)
	114. (112)	Willson, Grant C.; Bowden, Murrae “Organic Resist Materials,” Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS 218(2) 75-108 (1988)
	115. (128)	Eich, Manfred ; Reck, Berndt; Yoon, Do Y.; Willson, C. Grant; Bjorklund, Gary C. “Novel second-order nonlinear optical polymers via chemical cross-linking-induced vitrification under electric field,” J.Applied Physics 66(7) 3241-3247 (1989)
	116. (115)	Fréchet, Jean M. J.; Eichler, Eva; Gauthier, Sylvie; Kryczka, Boguslav; Willson, C. G. “Imaging Processes Based on Side-Chain Modification of Polymers: Synthesis and Study of Allylic and Benzylic Ethers Derived from Poly(vinylphenols),” The Effects of Radiation on High-Technology Polymers, ACS Symposium Series 381(10) 155-171 (1989)
	117. (118)	Fréchet, Jean M. J.; Willson, C. Grant; Iizawa, T.; Nishikubo, T.; Igarashi, K.; Fahey, J. “New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals,” Polymers in Microlithography: Materials and Processes, ACS Symposium Series 412(7) 100-112 (1989)
	118. (119)	Fréchet, Jean M. J.; Matuszczak, Steven; Willson, C. Grant; Reck, B. “Nonswelling Negative Resists Incorporating Chemical Amplification,” Polymers in Microlithography: Materials and Processes, ACS Symposium Series 412(5) 74-85 (1989)
	119. (120)	Fréchet, J. M. J.; Matuszczak, S.; Reck, B.; Willson, C. G. “Photocrosslinking Based on Electrophilic Aromatic Substitution and its Application to Resists Incorporating Chemical Amplification,” Polym.Mat.Sci.& Eng. 60 147-150 (1989)
	120. (122)	Fréchet, J. M. J.; Stanciulescu, M.; Iizawa, T.; Willson, C. G. “Self-Developing Imaging Systems Based on Polyesters and Polyethers,” Polym.Mat.Sci.& Eng. 60 170-173 (1989)
	121. (123)	Fréchet, J. M. J.; Fahey, J.; Willson, C. G.; Iizawa, T.; Nishikubo, T. “Synthesis of Polyformals and Their Use as Dry-Developing Imaging Systems,” Polym.Mat.Sci.& Eng. 60 174-178 (1989)
	122. (132)	Fréchet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G. “Chemical Amplification in the Design of Radiation-Sensitive Polymers,” Functional Polymers, Proc.IUCCP Sym. 6 193-200 (1989)
	123. (131)	Green, M. M.; Reidy, M. P.; Johnson, R. J.; Darling, G.; O'Leary, D. J.; Willson, C. G. “Macromolecular Stereochemistry: The Out-of-Proportion Influence of Optically Active Comonomers on the Conformational Characteristics of Polyiscyanates,” Journal of the American Chemical Society 111 3452 (1989)
	124. (125)	Hinsberg, W. D.; MacDonald, S. A.; Pederson, L. A.; Willson, C. G. “A Lithographic Analog of Color Photography: Self-Aligning Photolithography Using a Resist with Wavelength-Dependent Tone,” J.Imaging Sci. 33(4) 129-135 (1989)
	125. (121)	Kutal, C. ; Willson, C. G. “Photosensitive materials for imaging applications,” J.Inf.Rec.Mater. 17(5/6) 373-378 (1989)
	126. (126)	Kutal, Charles ; Weit, Scott K.; Willson, C. Grant. “New inorganic photoinitiators for deep-UV resist materials,” Polym.Mat.Sci.& Eng. 61 412-416 (1989)
	127. (124)	Reck, B. ; Allen, R. D.; Twieg, R. J.; Willson, C. G. Matuszczak, S., Stover, H. D. H., Li, N. H., and Fréchet, J. M. J. “Novel Photoresist Design Based on Eletrophilic Aromatic Substitution,” Polym.Eng.Sci. 29(14) 960-964 (1989)
	128. (129)	Reck, Berndt ; Eich, Manfred; Jungbauer, Dietmar; Twieg, Robert J.; Willson, C. Grant; Yoon, Do Y.; Bjorklund, Gary C. “Crosslinked epoxy polymers with large and stable nonlinear optical susceptibilities,” Nonlinear Optical Properties of Organic Materials II, Proc.SPIE 1147(2) 74-83 (1989)
	129. (133)	Schellenberg, F. M.; Willson, C. G.; Levenson, M. D.; Sperley, K. M.; Brock P. J. “Photosensitized Polystyrene as a High Efficiency Relief Hologram Medium,” Practical Holography III, Proc.SPIE 1051 31-43 (1989)
	130. (127)	Stover, H. ; Matuszczak, S.; Chin, R.; Shimizu, K.; Willson, C. G.; Fréchet, J. M. J. “Acid-Catalyzed Rearrangement of Aromatic Ethers: Model Studies and Application to Imaging,” Polym.Mat.Sci.& Eng. 61 412-416 (1989)
	131. (116)	Willson, Grant C.; Bowden, Murrae J. “Resist materials for microelectronics (Part 1),” Chemtech 19(2) 102-111 (1989)
	132. (117)	Willson, Grant C.; Bowden, Murrae J. “Recent advances in organic resist materials (Part 2),” Chemtech 19(3) 182-189 (1989)
	133. (130)	Willson, Grant C.; “Proceedings of The Almaden Symposium 4th International Conference on Unconventional Photoactive Solids,” 183 511 (1989)
	134. (142)	Bjorklund, G. C.; Ducharme, S.; Jungbauer, D.; Moerner, J. D.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D. “Organic Nonlinear Optical Materials for Frequency Doubling, Modulation, and Switching,” Proc.Symp.Optics & Electronics for Organic Materials (1990)
	135. (136)	Brock, Phillip J.; Willson, C. Grant; Swalen, Jerome D.; Jurich, Mark C.; Miller, Robert D.; Clecak, Nick J.; Logan, Tony; Frechet, J. M. J. “Generation of Optical Disk Servo Patterns by Lithographic Imaging of Photodeformable Polymers,” Optical Data Storage, Proc.SPIE 1316 235-247 (1990)
	136. (137)	Fréchet, J. M. J.; Kryczka, B.; Matuszczak, S.; Reck, B.; Stanciulescu, M.; Willson, C. G. “Chemically Amplified Imaging Materials Based on Acid-Catalyzed Reactions of Polyesters or Electrophilic Crosslinking Processes,” J.Photopolym.Sci.& Tech 3(3) 235-247 (1990)
	137. (139)	Jungbauer, D. ; Reck, B.; Twieg, R.; Yoon, D. Y.; Willson, C. G.; Swalen, J. D. “Highly efficient and stable nonlinear optical polymers via chemical crosslinking under electric field,” Appl.Phys.Lett. 56(26) 2610-2612 (1990)
	138. (147)	Kapitza, Heinrich ; Zentel, Rudolf; Twieg, Robert J.; Nguyen, Cattien; Vallerien, Sven Uwe; Kremer, Friedrich; Willson, C. Grant. “Ferroelectric Liquid Crystalline Polysiloxanes with High Spontaneous Polarization and Possible Applications in Nonlinear Optics,” Advanced Materials 2(11) 539-543 (1990)
	139. (140)	Kutal, Charles ; Weit, Scott K.; MacDonald, Scott A.; Willson, C. Grant. “New Inorganic Photoinitiators For Deep-UV Resist Materials,” J.Coat.Technol. 62(786) 63-67 (1990)
	140. (135)	Maltabes, John G.; Holmes, Steven J.; Morrow, James R.; Barr, Roger L.; Hakey, Mark; Reynolds, Gregg; Brunsvold, William R.; Willson, C. Grant; Clecak, Nick; MacDonald, Scott; Ito, Hiroshi. “1X Deep UV Lithography With Chemical Amplification for 1-Micron DRAM Production,” Advances in Resist Technology and Processing VII, Proc.SPIE 1262 2-7 (1990)
	141. (138)	McKean, Dennis R.; Hinsberg, William D.; Sauer, Thomas P.; Willson, C. Grant; Vicari, Richard; Gordon, Douglas J. “Methylated poly(4-hydroxystyrene) - A new resin for deep-ultraviolet resist application,” J.Vac.Sci.Technol.B 1466-1469 (1990)
	142. (144)	McKean, Dennis R.; MacDonald, Scott A.; Johnson, Robert D.; Clecak, Nicholas J.; Willson, C. Grant. “Characterization of a Novolac-Based Three-Component Deep-UV Resist,” Chem.Mater. 2(5) 619-624 (1990)
	143. (145)	McKean, D. R.; Sauer, T. P.; Hinsberg, W. D.; Willson, C. G. “Synthesis, Characterization, and Lithographic Behavior of Methylated Poly(4-hydroxystyrene),” Polym.Prep. 31(2) 599-600 (1990)
	144. (141)	Page, R. H.; Jurich, M. C.; Reck, B.; Sen, A.; Twieg, R. J.; Swalen, J. D.; Willson, C. G. “Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films,” J.Opt.Soc.Am.B 7(7) 1239-1250 (1990)
	145. (146)	Pawlowski, G. ; Sauer, T.; Dammel, R.; Gordon, D. J.; Hinsberg, W.; McKean, D.; Lindley, C. R.; Merrem, H.-J.; Roschert, H.; Vicari, R.; Willson, C. G. “Modified Polyhydroxystyrenes as Matrix Resins for Dissolution Inhibition Type Photoresists,” Advances in Resist Technology and Processing VII, Proc.SPIE 1262 391-400 (1990)
	146. (143)	Swalen, J. D.; Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Moerner, W. E.; Smith, B. A.; Twieg, R.; Yoon, D.; Willson, C. G. “Organic nonlinear optical materials and their device applications for frequency doubling, modulation, and switching,” Nonlinear Optical Properties of Organic Materials III, Proc.SPIE 1337 2-11 (1990)
	147. (134)	Willson, G. C.; MacDonald, S. A.; Ito, H.; Frechet, J. M. J. “Recent Progress in Organic Resist Materials,” Polym.for Microelec.(1) 3-18 (1990)
	148. (149)	Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Jungbauer, D.; Moerner, W. E.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D. “Applications of Organic Second Order Nonlinear Optical Materials,” Materials for nonlinear optics: chemical perspectives, ACS Sym.Ser.(13) 216-225 (1991)
	149. (169)	Ebert, M. ; Lux, M.; Smith, B. A.; Twieg, R.; Willson, C. G.; Yoon, D. Y. “Nonlinear Optical Properties of Linear Epoxy Polymers with Pendant Sulfonyl Tolan Groups,” Polym.Prep. 32(3) 130-131 (1991)
	150. (150)	Embs, F. W.; Neher, D.; Wegner, G.; Miller, R. D.; Sooriyakumaran, R.; Willson, C. G. “Preparation of Oriented Mono and Multilayers of Poly(bis-butoxyphenylsilane) by the Langmuir-Blodgett-Technique,” Polym.Prep. 31(2) 298-299 (1991)
	151. (161)	Embs, F. W.; Wegner, G.; Neher, D.; Albouy, P.; Miller, R. D.; Willson, C. G.; Schrepp, W. “Preparation of Oriented Multilayers of Poly(silane)s by the Langmuir-Blodgett Technique,” Macromolecules 24(18) 5068-5075 (1991)
	152. (154)	Fahey, J. T.; Fréchet, J. M. J.; Clecak, N.; Willson, C. G. “Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles,” Polym.Mat.Sci.& Eng. 64 241-269 (1991)
	153. (163)	Fréchet, J. M. J.; Matuszczak, S.; Lee, S. M.; Fahey, J.; and Willson, C. G. “Chemically Amplified Resists Based on Polymer Side-Chain Rearrangement or Electrophilic Crosslinking,” Photopolymers: Principles - Processes and Materials, Society of Plastic Engineers, Inc. 31-40 (1991)
	154. (164)	Fréchet, Jean M. J.; Matuszczak, Steven; Reck, Berndt; Stover, Harald D. H.; Willson, C. Grant. “Chemically Amplified Imaging Materials Based on Electrophilic Aromatic Substitution: Poly[4-(acetoxymethyl)styrene-co-4-(hydroxy)styrene],” Macromolecules 24(8) 1746-1754 (1991)
	155. (162)	Johannsmann, D. ; Embs, F.; Willson, C. G.; Wegner, G.; Knoll, W. “Visco-elastic properties of thin films probed with a quartz crystal resonator,” Makromol.Chem., Makromol.Symp. 46 247-251 (1991)
	156. (158)	Jungbauer, D. ; Teraoka, I.; Yoon, D. Y.; Reck, B.; Swalen, J. D.; Twieg, R.; Willson, C. G. “Second-order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores,” J.Applied Physics 69(12) 8011-8017 (1991)
	157. (152)	Kutal, Charles ; Weit, Scott K.; Allen, Robert D.; MacDonald, Scott A.; Willson, C. Grant. “Novel Base-Generating Photoinitiators for Deep-UV Lithography,” Advances in Resist Technology and Processing VIII, Proc.SPIE 1466 362-367 (1991)
	158. (148)	MacDonald, Scott A.; Schlosser, Hubert; Ito, Hiroshi; Clecak, Nicholas J.; Willson, C. Grant. “Plasma-Developable Photoresist Systems Based on Chemical Amplification,” Chem.Mater. 3 435-442 (1991)
	159. (153)	MacDonald, S. A.; Clecak, N. J.; Wendt, H. R.; Willson, C. G.; Snyder, C. D.; Knors, C. J.; Deyoe, N. B.; Maltabes, J. G.; Morrow, J. R.; McGuire, A. E.; Holmes, S. J. “Airborne Chemical Contamination of a Chemically Amplified Resist,” Advances in Resist Technology and Processing VIII, Proc.SPIE 1466 2-12 (1991)
	160. (159)	Matuszczak, Steven ; Cameron, James F.; Fréchet, Jean M. J.; Willson, C. Grant. “Photogenerated Amines and their Use in the Design of a Positive-tone Resist Material based on Electrophilic Aromatic Substitution,” J.Mater.Chem. 1(6) 1045-1050 (1991)
	161. (168)	Neher, D. ; Mittler-Neher S.; Cha, M.; Stegeman, G.; Embs, F. W.; Wegner, G.; Miller, R. D.; Willson, C. G. “Determination of the Orientational Order Parameters , in a Polysilane LB Film via Polarization Dependent THG,” Nonlinear Optical Properties of Organic Materials IV, Proc.SPIE 1560 335-343 (1991)
	162. (165)	Stöver, Harald D. H.; Matuszczak, Steven; Willson, C. Grant; Fréchet, Jean M. J. “Design of Polymeric Imaging Materials Based on Electrophilic Aromatic Substitution: Model Studies,” Macromolecules 24(8) 1741-1745 (1991)
	163. (167)	Swalen, J. D.; Bjorklund, G. C.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Jurich, M.; Moerner, W. E.; Reck, B.; Smith, B. A.; Twieg, R.; Willson, C. G.; Zentel, R. “Poled Epoxy Polymers for Optoelectronics,” Organic Molecules for Nonlinear Optics and Photonics 94 433-445 (1991)
	164. (151)	Teraoka, I. ; Jungbauer, D.; Reck, B.; Yoon, D. Y.; Twieg, R.; Willson, C. G. “Stability of nonlinear optical characteristics and dielectric relaxations of poled amorphous polymers with main-chain chromophores,” J.Applied Physics 69(4) 2568-2576 (1991)
	165. (157)	Twieg, R. ; Bjorklund, G.; Eich, M.; Herminghaus, S.; Jungbauer, D.; Reck, B.; Smith, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D.; Zentel, R. “Polymeric Nonlinear Optoelectronic Materials, Challenges and Opportunities,” Polym.Mat.Sci.& Eng. 64 66-67 (1991)
	166. (166)	Twieg, R. ; Burland, D.; Lux, M.; Moylan, C.; Nguyen, C.; Walsh, P.; Willson, C. G.; Zentel, R. “Synthetic Approaches to NLO Polymers,” Polym.Prep. 32(3) 80-81 (1991)
	167. (156)	Willson, Grant C.; “Advances in Organic Resist Materials,” Polym.Mat.Sci.& Eng. 64 18-20 (1991)
	168. (160)	Yoon, D. Y.; Jungbauer; D., Teraoka, I.; Reck, B.; Zentel, R.; Twieg, R.; Swalen, J. D.; and Willson, C. G. “Second-Order NLO and Relaxation Properties of Poled Polymers,” Polym.Prep. 32(3) 102-104 (1991)
	169. (155)	Zentel, Rudolf ; Willson, C. Grant “New photoresists based on poly(trans-1,2-cyclohexylene diisocyanate),” Makromol.Chem., Rapid Commun. 12(8) 513-516 (1991)
	170. (172)	Betterton, K. ; Ebert, M.; Haeussling, L.; Lux, M. G.; Twieg, R. J.; Willson, C. G.; Yoon, D. “Strategies for Crosslinking NLO-Polymers Across the Chromophore,” Proc.Am.Chem.Soc. 66 312-313 (1992)
	171. (171)	Fréchet, J. M. J.; Lee, S. M.; Matuszczak, S.; Shacham-Diamand, Y.; MacDonald, S. A.; Willson, C. G. “Novel Chemically Amplified Dry-Developing Imaging Materials for High Resolution Microlithography,” Journal of Photopolymer Science and Technology 5(1) 17-30 (1992)
	172. (173)	MacDonald, Scott A.; Schlosser, Hubert; Clecak, Nicholas J.; Willson, C. Grant. “A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal,” Chem.Mater. 4 1364-1368 (1992)
	173. (176)	Twieg, R. ; Ebert, M.; Jungbauer, D.; Lux, M.; Reck, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D. Y.; Zentel, R. “Nonlinear Optical Epoxy Polymers with Polar Tolan Chromophores,” Mol.Cryst.Liq.Cryst. 217 19-24 (1992)
	174. (174)	Wallraff, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturtevant, J. L. “A Chemically Amplified Photoresist for Visible Laser Direct Imaging,” J.Imaging Sci. 36(5) 468-476 (1992)
	175. (175)	Wallraff, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturtevant, J. L. “A Chemically Amplified Photoresist for Visible Laser Direct Imaging,” Polym.Mat.Sci.& Eng. 66 49-51 (1992)
	176. (170)	Zentel, R. ; Poths, H.; Kremer, F.; Jungbauer, D.; Twieg, R.; Willson, C. G.; Yoon, D. “Polymeric Liquid Crystals: Structural Basis for Ferroelectric and Nonlinear Optical Properties,” Polymers for Advanced Technologies 3 211-217 (1992)
	177. (177)	Fahey, J. T.; Shimizu, K.; Fréchet, J. M. J.; Clecak, N.; Willson, C. G. “Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles,” Journal of Polymer Science, Part A: Polymer Chemistry 31(1) 1-11 (1993)
	178. (179)	Fréchet, J. M. J.; Cameron, J. F.; Chung, C. M.; Haque, S. A.; Willson, C. G. “Photogenerated Base as Catalyst for Imidization Reactions: A new design of photosensitive polymers,” Polym.Bull.Berlin 30 369-375 (1993)
	179. (180)	Leung, Man-kit ; Fréchet, Jean M. J.; Cameron, James F.; Willson, C. Grant. “Photogenerated base and chemical amplification: a new resist based on catalyzed decarboxylation,” Polym.Mat.Sci.& Eng. 68 30-31 (1993)
	180. (178)	MacDonald, Scott A.; Hinsberg, William D.; Wendt, H. Russell; Clecak, Nicholas J.; Willson, C. Grant; Snyder, Clinton D. “Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem,” Chem.Mater. 5 348-356 (1993)
	181. (182)	Willson, C. G.; Cameron, J. F., MacDonald, S. A., Niesert, C. P., Frechet, J. M. J., Leung, M. K., and Ackmann, A. “Recent Advances in Chemically Amplified Resist Materials,” Polym.Mat.Sci.& Eng., Proc.ACS 68 60 (1993)
	182. (183)	Willson, C. G.; Cameron, J. F.; MacDonald, S. A.; Niesert C.-P.; Fréchet, J. M. J.; Leung, M. K., Ackmann, A. “Resist Materials Design: Base-catalyzed Chemical Amplification,” Advances in Resist Technology and Processing X, Proc.SPIE 1925 354-365 (1993)
	183. (181)	Zentel, Rudolf ; Jungbauer, Dietmar; Twieg, Robert J.; Yoon, Do Y.; Willson, C. Grant. “Synthesis and non-linear optical characteristics of crosslinked and linear epoxy polymers with pendant tolane chromophores,” Makromol.Chem. 194 859-868 (1993)
	184. (185)	Lee, Ming S.; Fréchet, Jean M. J.; Willson, C. Grant. “Photocrosslinking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities,” Macromolecules 27 5154 (1994)
	185. (184)	MacDonald, Scott A.; Willson, C. Grant; Fréchet, Jean M. J. “Chemical Amplification in High-Resolution Imaging Systems,” Accounts of Chemical Research 27(6) 151-158 (1994)
	186. (189)	Ahn, Kwang-Duk ; Willson, C. Grant. “Synthesis of Polymers Having N-Hydroxymaleimide Units by Thermolysis of N-(Isopropyloxycarbonyloxy)maleimide Polymers,” Bull.Korean Chem.Soc. 16(5) 443-449 (1995)
	187. (191)	Ahn, Kwang-Duk ; Koo, Deok-II; Willson, C. Grant. “Synthesis and polymerization of t-BOC protected maleimide monomers: N-(t-butyloxycarbonyloxy)maleimide and N-[p-(t-butyloxycarbonyloxy)phenyl]-maleimide,” Polymer 36(13) 2621-2628 (1995)
	188. (195)	Brown, Smart ; Ackmann, Paul; Wenner, Val; Lowell, John; Ostrout, Wayne; Willson, C. Grant. “Passive evaluation of surface and bulk ionic deposition from resist removal using surface photovoltage,” Proc.SEMI/IEEE Advanced Semiconductor Manufacturing Conference and Workshop (ASMC) 316-321 (1995)
	189. (192)	Cameron, James F.; Willson, C. Grant; Fréchet, Jean M. J. “New Photolabile Amino Protecting Groups: Photogeneration of Amines from [(3',5'-Dimethoxybenzoinyl)oxy]carbonyl Carbamates,” J.Chem.Soc., Chem.Commun. 923-924 (1995)
	190. (190)	Leung, Man-kit ; Fréchet, Jean M. J.; Cameron, James F.; Willson, C. Grant. “Design and Synthesis of Photoactive Polymer Systems Base on Amine-Catalyzed Intramolecular Imidization of Polymer Side Chains,” Macromolecules 28(13) 4693-4700 (1995)
	191. (196)	McKean, Dennis R.; Russell, Thomas P.; Hinsberg, William D.; Hofer, Don; Renaldo, Alfred E.; Willson, C. Grant. “Thick film positive photoresist. Development and resolution enhancement technique,” J.Vac.Sci.Technol.B 13(6) 3000-3006 (1995)
	192. (186)	Renaldo, Alfred F.; Lauchlan, Laurie J., Hofer, Donald C., Hinsberg, William D., McKean, Dennis R., Santini, Hugo A., and Willson, C. Grant. “Lithographic performance of a positive photoresist for thick-film applications,” Advances in Resist Technology and Processing XII, Proc.SPIE 2438 853-866 (1995)
	193. (187)	Tsiartas, Pavlos C.; Simpson, Logan L.; Qin, Anwei; Willson, C. Grant; Krukonis, Val J.; Gallagher-Wetmore, P. M. “Effect of Molecular Weight Distribution on the Dissolution Properties of Novolac Blends,” Advances in Resist Technology and Processing XII, Proc.SPIE 2438 261-271 (1995)
	194. (188)	Tsiartas, P. C.; Simpson, L. L.; Willson, C. G.; Allen, R. D.; Krukonis, V. J. Gallagher-Wetmore, P. M. “Molecular weight, ionic strength and temperature effects on the dissolution rate of low molecular weight Novolac fractions,” Proc.PMSE 72 209 (1995)
	195. (193)	Willson, Grant C.; Herr, Daniel. “Advances in photoresists will require coordinated university research effort,” Solid State Technology 199-200 (1995)
	196. (194)	Willson, G. C.; “Polymeric photoimaging materials,” Proc.PMSE 73 455 (1995)
	197. (204)	Allen, Robert D.; Sooriyakumaran, Ratnam; Opitz, Juliann; Wallraff, Gregory M.; DiPietro, Richard A.; Breyta, Gregory; Hofer, Donald C.; Kunz, Roderick R.; Jayaraman, Saikumar; Shick, Robert; Goodall, Brian; Okoroanyanwu, Uzodinma; and Willson, C. Grant. “Protecting Groups for 193-nm Photoresists,” Advances in Resist Technology and Processing XIII, Proc.SPIE 2724 334-343 (1996)
	198. (205)	Allen, R. D.; Sooriyakumaran, R.; Opitz J.; Wallraff G. M.; Breyta G.; DiPietro R. A.; Hofer D. C.; Okoroanyanwu U. and Willson C. G. “Progress in 193 nm Positive Resists,” Journal of Photopolymer Science and Technology 9(3) 465-474 (1996)
	199. (200)	Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J. “Design and development of new photobase generators derived from a-keto carbamates,” Polym.Mat.Sci.& Eng., Proc.ACS 74 284-285 (1996)
	200. (201)	Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J. “Photogeneration of amines from a-keto carbamates: New photocatalysis for polymer modification,” Polym.Mat.Sci.& Eng., Proc.ACS 74 323-324 (1996)
	201. (202)	Cameron, James F.; Willson, C. Grant; Fréchet, Jean M. J. “Photogeneration of Amines from a-Keto Carbamates: Photochemical Studies,” Journal of the American Chemical Society 118(51) 12925-12937 (1996)
	202. (197)	Henderson, Clifford L.; Tsiartas, Pavlos C.; Simpson, Logan L.; Clayton, Kelly D.; Pancholi, Sanju; Pawloski, Adam R.; Willson, C. Grant. “Factors Affecting the Dissolution Rate of Novolac Resins II: Developer Composition Effects,” Advances in Resist Technology and Processing XIII, Proc.SPIE 2724 481-490 (1996)
	203. (198)	Lin, Quinhuang ; Simpson, Logan; Steinhäusler, Thomas; Wilder, Michelle; Willson, C. Grant; Havard, Jennifer; Fréchet, Jean M. J. “Water-Soluble Resist for "Environmentally Friendly" Lithography,” Metrology, Inspection, and Process Control for Microlithography X, Proc.SPIE 2725 308-318 (1996)
	204. (199)	Willson, C. G.; Cameron, J. F.; Frechet, J. M. J. “Photogeneration of amines and application to chemically amplified resist design,” Polym.Mat.Sci.& Eng., Proc.ACS 74 437 (1996)
	205. (203)	Willson, C. G.; “Comments on,” Journal of Polymer Science, Part A: Polymer Chemistry 34 3229-3230 (1996)
	206. (206)	Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang. “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc.SPIE 3051 529-540 (1997)
	207. (220)	Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; Henke, Wolfgang. “Influence of optical nonlinearities of photoresists on the photolithographic process: applications,” Emerging Lithographic Technologies, Proc.SPIE 3048 (1997)
	208. (232)	Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc. SPIE 3051 529-540 (1997)
	209. (224)	Ficner, Stanley ; Dammel, Ralph R.; Perez, Yvette; Gardiner, Allen; Willson, C. Grant. “Refractive Indices In Thick Photoresist Films As A Function Of Bake Conditions And Film Exposures,” Proc.SPIE 3049 838-849 (1997)
	210. (211)	Fréchet, Jean M. J.; Leung, Man-kit; Urankar, Edward J.; Willson, C. Grant; Cameron, James F.; MacDonald, Scott A.; Niesert, Claus P. “Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation,” Chem.Mater. 9(12) 2887-2893 (1997)
	211. (213)	Gardiner, Allen B.; Qin, Anwei; Henderson, Clifford L.; Pancholi, Sanju; Koros, William J.; Willson, C. Grant; Dammel, Ralph R.; Mack, Chris; Hinsberg, William D. “Diffusivity Measurements in Polymers II: Residual Casting Solvent Measurement by Liquid Scintillation Counting,” Proc.SPIE 3049 850-860 (1997)
	212. (223)	Havard, Jennifer M.; Fréchet, Jean M. J.; Pasini, Dario; Mar, Brenda; Yamada, Shintaro; Medeiros, David; Willson, C. Grant. “Design of a positive tone water-soluble resist,” Proc.SPIE 3049 437-447 (1997)
	213. (216)	Henderson, Clifford L.; Willson, C. Grant; Dammel, Ralph R.; Synowicki, Ron A. “Bleaching-Induced Changes in the Dispersion Curves of DNQ Photoresists,” Proc.SPIE 3049 585-595 (1997)
	214. (217)	Henderson, Clifford L.; Pancholi, Sanju; Chowdhury, Sajed A.; Willson, C. Grant; Dammel, Ralph R. “Photoresist Characterization for Lithography Simulation Part 2: Exposure Parameter Measurements,” Proc.SPIE 3049 816-828 (1997)
	215. (218)	Henderson, Clifford L.; Tsiartas, Pavlos C.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Willson, C. Grant; Dammel, Ralph R. “Photoresist Characterization for Lithography Simulation Part 3: Development Parameter Measurements,” Proc.SPIE 3049 805-815 (1997)
	216. (219)	Henderson, Clifford L.; Tsiartas, Pavlos C.; Flanagin, Lewis W.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Chinwalla, Ammar N.; and Willson, C. Grant. “Photoresist Characterization for Lithography Simulation Part 4: Processing Effects on Resist Parameters,” Proc.SPIE 3049 212-223 (1997)
	217. (226)	Leeson, Michael J.; Pawloski, Adam; Levering, Vrad; Yueh, Wang; and Willson, C. Grant. “Tailoring of a Photoactive Compound For Non-Chemically Amplified 248nm Resist Formulations,” Proc.SPIE 3049 861-870 (1997)
	218. (221)	Lin, Quinhuang ; Steinhäusler, Thomas; Simpson, Logan; Wilder, Michelle; Medeiros, David R.; Willson, C. Grant; Havard, Jennifer; and Fréchet, Jean M. J. “A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist,” Chem.Mater. 9(8) 1725-1730 (1997)
	219. (228)	Lin, Quinhuang ; Katnani, Ahmad; Willson, C. Grant. “Effects of Crosslinking Agent on Lithographic Performance of Negative-Tone Resists Based on Poly(p-hydroxystyrene),” Proc.SPIE 3049 974-987 (1997)
	220. (212)	Mack, C. A.; Mueller, K. E.; Gardiner, A. B.; Qiu, A.; Dammel, R. R.; Koros, W. G.; Willson, C. G. “Diffusivity Measurements in Polymers, Part 1: Lithographic Modeling Results,” Proc.SPIE 3049 355-362 (1997)
	221. (208)	McAdams, Christopher L.; Tsiartas, Pavlos C., and Willson, C. Grant. “Structure-Function Correlation Studies of Dissolution Inhibitors for Novolac-based Photoresists,” Polym.Mat.Sci.& Eng. 77 437-438 (1997)
	222. (209)	Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; Willson, C. Grant; Schröeder, U. Paul. “Synthesis, Polymorphism and Electro-optic Properties of a New Class of Ligated Twin Sc* Liquid Crystals,” Polym.Prep. 38(1) 412-413 (1997)
	223. (214)	Mueller, Katherine E.; Koros, William J.; Wang, Yvonne Y.; and Willson, C. Grant. “Diffusivity Measurements in Polymers, Part III: Quartz Crystal Microbalance Techniques,” Proc.SPIE 3049 871-878 (1997)
	224. (215)	Mueller, Katherine E.; Koros, William J.; Mack, Chris A.; and Willson, C. Grant. “Diffusivity Measurements in Polymers, Part IV: Acid Diffusion in Chemically Amplified Resists,” Proc.SPIE 3049 706-711 (1997)
	225. (229)	Niu, Jason Q.; Fréchet, Jean M. J.; Okoroanyanwu, U.; Byers, J. D.; Willson, C. Grant. “Novel functional nortricyclene polymers and copolymers for 248 and 193 nm chemically amplified resists,” Proc.SPIE 3049 113-123 (1997)
	226. (222)	Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey; Medeiros, David; Willson, C. Grant; Niu, Quingshang J.; Frechet, Jean M. J.; Allen, Robert. “New Single Layer Positive Photoresists for 193 nm Photolithography,” Proc.SPIE 3049 92-103 (1997)
	227. (230)	Okoroanyanwu, U. ; Byers, J.; Shimokawa, T.; Patterson, K.; Willson, C.G. “Alicyclic Polymers for 193 nm Lithography,” Proc. 11th International Conference on Photopolymers, SPE 1 (1997)
	228. (231)	Okoroanyanwu, U. ; Byers, J.; Shimokawa, T.; Webber, S.; Willson, C. G. “Deprotection Kinetics of New 193 nm Resists Derived from Alicyclic Polymers,” Proc. Am. Chem. Soc. Div. Polym. Mater.: Sci. and Eng., Las Vegas 77 469-470 (1997)
	229. (210)	Tsiartas, Pavlos C.; Flanagin, Lewis W.; Henderson, Clifford L.; Hinsberg, William D.; Sanchez, Isaac C.; Bonnecaze, Roger T.; Willson, C. Grant. “The Mechanism of Phenolic Polymer Dissolution: A New Perspective,” Macromolecules 30(16) 4656-4664 (1997)
	230. (207)	Willson, Grant C.; Dammel, Ralph A.; and Reiser, Arnost. “Photoresist Materials: A Historical Perspective,” Proc.SPIE 3049 28-41 (1997)
	231. (225)	Willson, G. C.; Yueh, W.; Leeson, M. J.; Steinhäusler, T.; McAdams, C. L.; Dammel, R. R.; Sounik, J. R.; Aslam, M.; Vicari, R.; and Sheehan, M. T. “Non-chemically amplified 248 nm resist materials,” Proc.SPIE 3049 226-237 (1997)
	232. (227)	Zhang, Linda P.; Eckert, Andrew R.; Willson, C. Grant; Webber, Stephen E.; Byers, Jeffrey. “Acid Diffusion through Polymer Films,” Proc.SPIE 3049 898-909 (1997)
	233. (242)	Byers, Jeffrey ; Patterson, Kyle; Cho, Sungseo, McCallum; Martin, and Willson, C. Grant. “Recent Advancements In Cycloolefin Based Resists For ArF Lithography,” J.Photopolym.Sci.& Tech. 11(3) 465-474 (1998)
	234. (247)	Erdmann, Andreas ; Henderson, Clifford; Willson, C. Grant; Dammel, Ralph R. “Some aspects of thick film resist performance and modeling,” Proc. SPIE 3333 1201-1211 (1998)
	235. (238)	Flanagin, Lewis W.; McAdams, Christopher L.; Tsiartas, Pavlos C.; Henderson, Clifford L.; Hinsberg, William D.; and Willson, C. Grant. “Probabilistic model for the mechanism of phenolic polymer dissolution,” Proc. SPIE 3333 268-277 (1998)
	236. (234)	Hashemi, Javad ; Wilson, James; James, Darryl; Kamala, Girish, Holtz, Mark; Khurts, Kurtis; Combs, Bret; Hale, Michael; Willson, C. Grant. “Design and Testing of a Three Dimensional Shock—Recovery System,” Proc. of the 3rd World Conference on Integrated Design and Proc. Tech., Berlin Germany 5 29-43 (1998)
	237. (237)	Havard, Jennifer M.; Pasini, Dario; Fréchet, Jean M. J.; Medeiros, David; Yamada, Shintaro; Willson, C. Grant. “Design and Preliminary Studies of Environmentally Enhanced Water-castable, Water-developable Positive Tone Resists: Model and Feasibility Studies,” Polymers for Micro- and Nano- Patterning Science Technology, ACS Symp. Series 706 262-275 (1998)
	238. (245)	Havard, Jennifer ; Pasini, Dario; Frechet, Jean M. J.; Medeiros, David; Patterson, Kyle; Yamada, Shintaro. “The design and study of water-soluble positive- and negative-tone imaging materials,” Proc. SPIE 3333 111-121 (1998)
	239. (252)	Henderson, C. L.; Scheer, S. A.; Tsiartas, P. C.; Rathsack, B. M.; Sagan, J. P.; Dammel, R. R.; Erdmann, A.; Willson, C. G. “Modeling Parameter Extraction for DNQ-Novolac Thick Film Resists,” Proc. SPIE 3333 256-267 (1998)
	240. (246)	Mack, Chris A.; Mueller, Katherine E.; Gardiner, Allen; Sagan, J. P.; Dammel, Ralph R.; Willson, C. Grant. “Modeling of solvent diffusion in photoresist,” J. Vac. Sci. Technol., B 16(6) 3779-3783 (1998)
	241. (241)	McAdams, Christopher L.; Tsiartas, Pavlos; and Willson, C. Grant. “The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: An Adaptation of the Probabilistic Approach,” Polymeric Materials for Micro- and Nano- Patterning, ACS Symp Series 706 292-305 (1998)
	242. (251)	McAdams, Christopher L.; Flanagin, Lewis W.; Henderson, Clifford L.; Pawloski, Adam R.; Tsiartas, Pavlos; Willson, C. Grant. “The Dissolution of Phenolic Polymers in Aqueous Base: The Influence of Polymer Structure,” Proc. SPIE 3333 1171-1179 (1998)
	243. (240)	Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; and Willson, C. Grant. “Laterally Linked Liquid Crystal Dimers with Electro-optic Properties,” Chem.Mater. 10(7) 1805-1813 (1998)
	244. (233)	Okoroanyanwu, Uzodinma ; Byers, Jeffrey D.; Cao, Ti; Webber, Stephen E.; Willson, C. Grant. “Deprotection Kinetics of Alicylic Polymer Resist Systems Designed for 193 nm Lithography,” ACS Symp Ser. 706 174-190 (1998)
	245. (235)	Okoroanyanwu, Uzodinma ; Byers, Jeffrey D.; Cao, Ti; Webber, Stephen E.; Willson, C. Grant. “Monitoring Photoacid Generation in Chemically Amplified Resist Systems,” Proc. SPIE 3333 747-757 (1998)
	246. (243)	Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey; and Willson, C. Grant. “Alicylic Polymers for 193 nm Resist Applications: Synthesis and Characterization,” Chemistry of Materials 10(11) 3319-3327 (1998)
	247. (244)	Okoroanyanwu, Uzodinma ; Byers, Jeffrey; Shimokawa, Tsutomu; and Willson, C. Grant. “Alicylic Polymers for 193 nm Resist Applications: Lithographic Evaluation,” Chemistry of Materials 10(11) 3328-3333 (1998)
	248. (250)	Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey D.; Willson, C. Grant. “Pd(II) catalyzed addition polymerization an ring opening metathesis polymerization of alicyclic monomers: routes to new matrix resins for 193nm photolithography,” J. Mol. Catal. A: Chem. 133(1-2) 93-114 (1998)
	249. (239)	Patterson, Kyle ; Okoroanyanwu, Uzodinma; Shimokawa, Tsutomu; Cho, Sungseo; Byers, Jeffrey; Willson, C. Grant. “Improving the Performance of 193nm Photoresists Based on Alicyclic Polymers,” Proc. SPIE 3333 425-437 (1998)
	250. (249)	Postnikov, Sergei V.; Somervell, Mark H.; Henderson, Clifford L.; Katz, Steven; Willson, C. Grant; Byers, Jeffrey; Qin, Anwei; Lin, Qinghuang “Top surface imaging through silylation,” Proc. SPIE 3333 997-1008 (1998)
	251. (236)	Rau, Nicholas ; Neureuther, Andrew; Ogawa, Taro; Kubena, Randy; Stratton, Fred; Fields, Charles; Willson, C. Grant. “Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure,” Proc. SPIE 3333 1413-1419 (1998)
	252. (248)	Yamada, Shintaro ; Medeiros, David R.; Patterson, Kyle; Jen, Wei-Lun K.; Rager, Timo; Lin, Qinghuang; Lenci, Carlos; Byers, Jeffrey; Havard, Jennifer M.; Pasini, Dario; Frechet, Jean M. J.; Willson, C. Grant. “Postitive and negative tone water processable photoresists: a progress report,” Proc. SPIE 3333 245-253 (1998)
	253. (274)	Brodsky, Colin J.; C. Grant Willson. “Interfacial Cationic Graft Polymerization Lithography,” Polym. Mat. Sci. Eng. 81 83-84 (1999)
	254. (265)	Burns, Sean D.; Gardiner, Allen B.; Krukonis, V.J.; Wetmore, Paula M.; Qin, Anwei; Willson, C. Grant. “The Measurement of Concentration Gradients in Resist Films by a ‘Halt Development’ Technique,” Proceedings of the American Chemical Society Division of Polymeric Materials: Science and Engineerin 81 81-84 (1999)
	255. (262)	Colburn, M. ; Johnson, S.; Damle, S.; Bailey, T.; Choi, B.; Wedlake, M.; Michaelson, T.; Sreenivasan, S.V.; Ekerdt, J.; and Willson, C. G. “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning,” Proc. SPIE 3676 379-389 (1999)
	256. (256)	Flanagin, Lewis W.; McAdams, Christopher L.; Hinsberg, William D.; Sanchez, Isaac C.; Willson, C. Grant. “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Macromolecules 32(16) 5337-5343 (1999)
	257. (257)	Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant. “Molecular Model of Phenolic Polymer Dissolution in Photolithography,” Journ. Poly. Sci., Physics 37 2103-2113 (1999)
	258. (270)	Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant. “Surface Roughness Development During Photoresists Dissolution,” J. Vac. Sci. & Tech., B 17(4) 1371-1379 (1999)
	259. (273)	Flanagin, Lewis W.; Christopher L. McAdams; William D. Hinsberg; Isaac C. Sanchez; Willson, C. Grant. “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Polym. Mat. Sci. Eng. 81 469-472 (1999)
	260. (260)	Hale, Michael A.; Medeiros, David R.; Dombrowski, Katherine D.; Willson, C. Grant. “X-Ray Diffraction and Torsional Viscosity Investigations of Laterally Linked Sc* Liquid Crystal Dimers,” Chem. Matls. 11(9) 2515-2519 (1999)
	261. (253)	Havard, Jennifer M.; Vladimirov, Nikolay; and Frechet, Jean M. J. “Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate,” Macromolecules 32 86-94 (1999)
	262. (254)	Havard, Jennifer ; Shim, S. Y.; Frechet, J.M.J.; Lin, Qinghuang; Medeiros, David R.; Willson, C. Grant; Byers, Jeffrey D. “Design of Photoresists with Reduced Environmental Impact. I. Water-soluble Resists Based on Photocrosslinking of Poly (vinyl alcohol),” Chem. Matls. 11 719-725 (1999)
	263. (255)	Havard, Jennifer ; Yoshida, M., Pasini; D., Vladimirov, N.; Frechet, Jean M. J.; Medeiros, David R.; Patterson, Kyle; Yamada, Shintaro; Willson, C. Grant; Byers, Jeffrey D. “Design of Photoresists with Reduced Environmental Impact. II. Water-Soluble Resists Based on Photocrosslinking of Poly (2-Isopropenyl-2-oxazoline),” Journ. Poly. Sci. 37(9) 1225-1236 (1999)
	264. (272)	Kyle, Patterson ; Mikio Yamachika; Sungseo Cho; Timo Rager; Shintaro Yamada; Jeffery Byers; Willson,C. Grant. “Design of Alicyclic Polymers for 193 nm Photoresists Offering Enhanced Post-Exposure Delay Stability,” Polym. Mat. Sci. Eng. 81 43-44 (1999)
	265. (269)	Medeiros, David R.; Hale, Michael A..; Hung, Raymond J.P.; Leitko, Jeffrey K.; Willson, C. Grant. “Ferroelectric cyclic oligosiloxane liquid crystals,” J. Matls. Chem. 9 1453-1460 (1999)
	266. (258)	Pasini, Dario ; Low, Eric; Meagley, Robert P.; Frechet, Jean M. J.; Willson, C. Grant; Byers, Jeffrey D. “Carbon-Rich Cyclopolymers: Their Synthesis, Etch Resistance, and Application to 193nm Microlithography,” Proc. SPIE 3678 94-101 (1999)
	267. (266)	Postnikov, Sergei ; Stewart, Michael; Tran, Hoang Vi; Nierode, Mark; Medeiros, David; Cao, T.; Byers, Jeffrey; Webber, Stephen; Willson, C. Grant. “Study of resolution limits due to intrinsic bias in chemically amplified photoresists,” J. Vac. Sci. Technol. B 17(6) 3335-3338 (1999)
	268. (259)	Rathsack, B. M.; C. E. Tabery, S. A. Scheer, C. L. Henderson; M. Pochkowski, C. Philbin, F. Kalk; P. D. Buck and Willson,C. G. “Optical Lithography Simulation and Photoresist Optimization for Photomask Fabrication,” Proc. SPIE 3678 1215-1226 (1999)
	269. (263)	Rathsack, Benjamin M.; Tabery, Cyrus E.; Philbin, CeCe; Willson, C. Grant. “Lithography Simulation of Sub-0.30 Micron Resist Features for Photomask Fabrication using I-line Optical Pattern Generators,” Proc. SPIE 3873 484-492 (1999)
	270. (264)	Rathsack, Benjamin M.; Tabery, Cyrus E.; Stachowiak, Timothy B; Dallas, Tim; Xu, Cheng-Bai; Pochkowski, Mike; Willson, C. Grant. “Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator,” Proc. SPIE 3873 80-91 (1999)
	271. (267)	Ruchhoeft, P. ; Colburn, Matthew; Choi, Byung; Johnson, Stephen; Bailey, Todd; Damle, Shilpa; Stewart, Michael; Ekerdt, John; Sreenivasan, S. V., Wolfe, Jack; Willson, C. Grant. “Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography,” J. Vac. Sci. Technol. B 17(6) 2965-2969 (1999)
	272. (275)	Somervell, Mark H.; Jeffery Byers; Willson, C. Grant. “Sources of Line Edge Roughness in a Negative Tone, top Surface Imaging System,” Polym. Mat. Sci. Eng. 81 28-29 (1999)
	273. (268)	Stewart, Michael ; Postnikov, Sergei; Tran, Hoang V.; Medeiros, David; Nierode, M. A.; Cao, T.; Byers, Jeff; Webber, Steven; Willson, C. Grant. “Measurement of Acid Diffusivity in Thin Polymer Films Above and Below Tg,” Proc. ACS, Polym. Mat. Sci. Eng. Div. 81 58 (1999)
	274. (261)	Yamachika, Mikio ; Patterson, Kyle; Cho, Sungseo; Rager, Timo; Yamada, Shintaro; Byers, Jeffrey; Paniez, P. J.; Mortini, B.; Gally, S.; Sassoulas, P-O.; Willson, C. Grant. “Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists,” Jour. Photopoly. Sci. and Tech. 12(4) 553-559 (1999)
	275. (271)	Yamada, Shintaro ; Timo Rager; Jordan Owens; Jeffery Byers; Morton Nielsen; Willson, C. Grant. “The design and study of water-processable positive-tone photoresists,” Polym. Mat. Sci. Eng. 81 87-88 (1999)
	276. (290)	Bailey, Todd ; Choi, Byung Jin; Colburn, Matthew; Meissl, Mario; Shaya, S.; Ekerdt, John G.; Sreenivasan, S.V.; Willson, C. G. “Step and flash imprint lithography: Template suface treatment and defect analysis,” J. Vac. Sci. Tech. B. 18(6) 3572-3577 (2000)
	277. (295)	Bailey, T. ; B. J. Choi; M. Colburn; A. Grot; M. Meissl; M. Stewart; J. G. Ekerdt; S. V. Sreenivasan; Willson, C. G. “Step and Flash Imprint Lithography: A Technology Review,” Future Electron Devices, Tokyo 11(4) 54 (2000)
	278. (291)	Brodsky, Colin ; Byers, Jeff; Conley, Will; Hung, Raymond; Yamada, Shintaro; Patterson, Kyle; Somervell, Mark; Trinque, Brian; Tran, Hoang Vi; Cho, Sungseo; Chiba, Takashi; Lin, Shang-Ho; Jamieson, Andrew; Johnson, Heather; Vander Heyden, Tony; Willson, C. Grant. “157nm Resist Materials: A Progress Report,” J. Vac. Sci. Technol. B 18 3396-3401 (2000)
	279. (292)	Brodsky, Colin ; Heather F. Johnson; Brian C. Trinque; Willson, C. Grant. “Graft Polymerization Lithography: Extending Top Surface Imaging,” Forefront of Lithographic Materials Research 187-196 (2000)
	280. (294)	Burns, S. D.; M .D. Stewart; J. N. Hilfiker; R. A. Synowicki; G. M. Schmid; C. Brodsky; Willson, C. G. “Determining Free Volume Changes During the PEB and PAB of a chemically Amplified Resist,” Forefront of Lithographic Materials Research 323-334 (2000)
	281. (283)	Chiba, Takashi ; Hung, Raymond; Yamada, Shintaro; Trinque, Brian; Yamachika, Mikio; Brodsky, Colin; Patterson, Kyle; Vander Heyden, Anthony; Jamieson, Andrew, Lin, Shang-Ho, Somervell, Mark; Byers, Jeffrey; Conley, Will; Willson, C. Grant. “157 nm Resist Materials: A Progress Report,” J. Photopolym Sci Technol. 13(4) 657-664 (2000)
	282. (281)	Cho, Sungseo ; Vander Heyden, Anthony; Byers, Jeffrey; Willson, C. Grant. “Negative tone 193 nm resists,” Proc. SPIE 3999 62-73 (2000)
	283. (286)	Colburn, Matthew ; Grot, Annette; Amistoso, Marie; Choi, Byung Jin; Bailey, Todd; Ekerdt, John; Sreenivasan, S.V.; Hollenhorst, James; Willson, C. Grant. “Step and Flash Imprint Lithography for sub-100nm Patterning,” Proc. SPIE 3999 453-457 (2000)
	284. (282)	Hale, Michael ; Clausi, Dominic; Willson, C. Grant; Dallas, Tim. “Ultrahigh pressure cell for materials synthesis,” Review of Scientific Instruments 71(7) 2784-2790 (2000)
	285. (293)	Owens, J. ; S. Yamada; Willson, C. Grant. “The design and study of aqueous – processable positive – tone photoresists,” Forefront of Lithographic Materials Research 229-238 (2000)
	286. (284)	Patterson, Kyle ; Somervell, Mark; Willson C. Grant. “Challenges in Materials Design for 157 nm Photoresists,” Solid State Technology 43 41 (2000)
	287. (287)	Patterson, Kyle ; Yamachika, Mikio; Hung, Raymond; Brodsky, Colin; Yamada, Shintaro; Somervell, Mark; Osborn Brian; Hall, Daniel; Dukovic, Gordana; Byers, Jeffrey; Conley, Willard; and Willson, C. Grant. “Polymers for 157nm Photoresist Applications: A Progress Report,” Proc. SPIE 3999 365-374 (2000)
	288. (289)	Rager, Timo ; Willson, C. Grant. “Synthesis and Characterization of Diastereomerically Pure Tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylic acid Derivatives,” Helvetica Chemica Acta 83 2769-2782 (2000)
	289. (277)	Rathsack, Benjamin ; Tabery, Cyrus; Stachowiak, Timothy; Albelo, Jeff; and Willson, C. Grant. “Simulation Based Formulation of a Non-Chemically Amplified Resist for 257 nm Laser Mask Fabrication,” Proc. SPIE 3999 598-608 (2000)
	290. (279)	Schmid, Gerard ; Singh, Vivek; Flanagin, Lewis; Stewart, Michael; Burns, Sean; and Willson, C. Grant “Recent Advances in a Molecular Level Lithography Simulation,” Proc. SPIE 3999 675-685 (2000)
	291. (278)	Somervell, Mark ; Fryer, David; Osborn, Brian; Patterson, Kyle; Cho, Sungseo; Byers, Jeffrey; and Willson, C. Grant. “Using Alicyclic Polymers in Top Surface Imaging Systems to Reduce Line Edge Roughness,” Proc. SPIE 3999 270-282 (2000)
	292. (285)	Somervell, Mark ; Fryer, David; Osborn, Brian; Patterson, Kyle; Byers, Jeffrey; Willson, C. Grant “A Study of the Fundamental Contributions to Line Edge Roughness in a 193nm, Top Surface Imaging System,” J. Vac. Sci. & Tech. B 18(5) 2251-2559 (2000)
	293. (280)	Stewart, Michael ; Somervell, Mark; Tran, Hoang Vi; Postnikov, Sergei; and Willson, C. Grant. “Study of Acid Transport Using IR Spectroscopy and SEM,” Proc. SPIE 3999 665-674 (2000)
	294. (288)	Stewart, Michael D.; Patterson, Kyle; Somervell, Mark H.; Willson, C. Grant. “Organic imaging materials: A view of the future,” J. of Physical Organic Chemistry 13(12) 767-774 (2000)
	295. (296)	Willson, Grant C.; McAdams Christopher L.; Yueh Wang.; Osborn Brian P. “Synthesis of comb poly (4-hydroxystyrene) using conventional and “living” free-radical polymerization,” Polym. Prepr. (ACS, DIV. Polym. Chem.) 41 946-947 (2000)
	296. (297)	Wilson, James N.; Hashemi, Javad; James, Darryl; Guven, Necip; Dallas, Tim; Kuhrts, Kurtis; Combs, Bret; Hale, Michael; Willson, C. Grant. “Metallurgical analysis and computer simulation of a solid steel sphere under shock loading,” AIP Conference Proceedings 505 479-482 (2000)
	297. (276)	Yamada, Shintaro ; Owens, Jordan; Rager, Timo; Nielsen, Morton; Byers, Jeffery D.; Willson, C. Grant. “The Design and Study of Aqueous-Processable Positive Tone Photoresists,” Proc. SPIE 3999 569-578 (2000)
	298. (298)	Bailey, T. ; Smith, B. J.; Colburn, M.; Meissl; M.; Sreenivasan, S. V.; Ekerdt, J. G.; Willson, C. G. “Step and Flash Imprint Lithography: Defect Analysis,” J. Vac. Sci. Tech. B 19(6) 2806 (2001)
	299. (301)	Brodsky, C. ; Trinque, B., Johnson, H. and Willson, C. G. “Advances in Graft Polymerization Lithography,” Proc. SPIE 4343 415-420 (2001)
	300. (311)	Burns, S. ; Gardiner, A.; Krukonis, V.; Wetmore, P.; Schmid, G.; Lutkenhaus, J.; Flanagin, L.; and Willson, C. G. “Understanding Nonlinear Dissolution Rates in Photoresists,” Proc. SPIE 4345 37-49 (2001)
	301. (299)	Choi, B. J.; Sreenivasan, S. V.; Johnson,S.; Colburn, M.; Willson, C. G. “Design of Orientation Stages for Step and Flash Imprint Lithography,” Amer Soc Precision Eng 25(3) 192-199 (2001)
	302. (300)	Choi, B. J.; Meissl, M., Colburn, M., Bailey, T., Ruchhoeft, P., Sreenivasan, S.V., Prins, F. Banerjee, S., Ekerdt, J. and Willson, C. G. “Layer-to-Layer Alignment for Step and Flash Imprint Lithography,” Proc. SPIE 4343 436-439 (2001)
	303. (305)	Colburn, M. ; T. Bailey, B.J. Choi, J.G. Ekerdt, S.V. Sreenivasan, Willson, C.G. “Development and Advantages of Step-and-Flash Lithography,” Solid State Technology 46(7) 67 (2001)
	304. (317)	Colburn, M. ; Grot, A., Choi, B. J., Amistoso, M., Bailey, T., Sreenivasan, S.V., Ekerdt, J., and Willson, C. G. “Patterning non-flat substrates with a low pressure, room temperature imprint lithography process,” Jour. of Vac. Sci. & Tech. B 19(6) 2162-2172 (2001)
	305. (318)	Colburn, M. ; Suez, I., Choi, B. J., Meissl, M., Bailey, T., Sreenivasan, S.V., Ekerdt, J. G., and Willson, C. G. “Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers,” Jour. of Vac. Sci. & Tech. B 19(6) 2685-2689 (2001)
	306. (303)	Erdmann, Andreas ; Henderson, Clifford; Willson, C. Grant. “Impact of exposure induced refractive index changes of photoresists on the photolithographic process,” Journal of Applied Physics 89(12) 8163-8168 (2001)
	307. (304)	Gardiner, Allen ; Burns, Sean; Qin, Anwei; Willson, C. Grant. “Determination of Residual Casting Solvent Concentration Gradients in Resist Films by a ‘Halt Development’ Technique,” Jour. of Vac. Scie. & Tech. B 19(1) 136-141 (2001)
	308. (313)	Hall, D. ; Osborn, B., Patterson, K., Burns, S., and Willson, C. G. “Dissolution Behavior of Fluoroalcohol-Substituted Polystyrenes,” Proc. SPIE 4345 1066-1072 (2001)
	309. (308)	Hung, R. ; Tran, H.V., Trinque, B., Chiba, T., Yamada, S., Sanders, D., Connor, E., Grubbs, R., Klopp, J., Frechet, M.J., Thomas, B., Shafer, G., DesMarteau, Conley, W., Willson, C. G. “Resist Materials for 157 nm Microlithography: An Update,” Proc. SPIE 4345 385-395 (2001)
	310. (310)	Jamieson, A. ; Somervell, M., Tran, H.V., Hung, R., MacDonald, S., Willson, C. G. “Top Surface Imaging at 157 nm,” Proc. SPIE 4345 406-416 (2001)
	311. (316)	Klopp, John ; Pasini, Dario; Byers, Jeffrey; Willson, C. Grant; Frechet, Jean M.J. “Microlithographic Assessment of a Novel Family Transparent and Etch Resistant Chemically Amplified 193nm Resists Based on Cyclopolymers,” Chem Mater. 13 4147-4153 (2001)
	312. (315)	Lehar, Octavia P.; Mark Spak, Stephen Meyer, Ralph R. Dammel, Colin Brodsky and Willson, C. Grant. “Resist Re-Hydration During Thick Film Processing,” Proc. SPIE 4345 463-474 (2001)
	313. (302)	Rathsack, B. ; Tabery, C., Albelo, Jeff, Buck, P., and Willson, C. G. “Characterization of an Acetal Based Chemically Amplified Resist for 257 nm Laser Mask Fabrication,” Proc. SPIE 4186 8163-8168 (2001)
	314. (314)	Rathsack, Benjamin M.; Peter I. Tattersall, Cyrus E. Tabery, Kathleen Lou, Tim B. Stachowiak, David R. Medeiros, Jeff A. Albelo, Peter Y. Pirogovsky, Dennis R. Mckean and Willson, C. Grant. “The Rational Design of Bleachable Non-Chemically Amplified DUV Photoactive Compunds,” Proc. SPIE 4345 543- xx (2001)
	315. (309)	Schmid, G. ; Smith, M., Mack, C., Singh, V., Burns, S. and Willson, C. G. “Understanding Molecular Level Effects during Post Exposure Processing,” Proc. SPIE 4345 1037-1047 (2001)
	316. (312)	Stewart, M. ; Schmid, G., Postnikov, S., Willson, C. G. “Mechanistic Understanding of Line End Shortening,” Proc. SPIE 4345 10-18 (2001)
	317. (319)	Stewart, M. D.; Willson, C. G. “Photoresists,” Encyclopedia of Materials: Science and Technology (Book Chapter) 6973-6978 (2001)
	318. (307)	Tran, H. V.; Hung, R.J., Chiba, T., Yamada, S., Mrozek, T., Hsieh, Y-T., Chambers, C.R. Osborn, B.P.,Trinque, B.C., Pinoow, M.J., Sanders, D.P., Conner, E.F., Grubbs, R.H., Conley, W., MacDonald, S.A., Willson, C. G. “Fluoropolymer Resist Materials for 157 nm Microlithography,” J. Photopolym. Sci. Technol 14 669-674 (2001)
	319. (306)	Willson, C. G.; Stewart, M. “Future resists,” Microlithography World (Special 10th Anniversary Issue) 10(3) 14 (2001)
	320. (324)	Bailey, T. C.; D.J. Resnick, D. Mancini, K.J. Nordquist, W.J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, and Willson, C.G. “Template Fabrication Schemes for Step and Flash Imprint Lithography,” Microelectronic Engineering 61-62 461-467 (2002)
	321. (326)	Bailey, T. C.; Johnson, S. C.; Sreenivasan, S. V.; Ekerdt, J. G.; Willson, C. G. “Step and Flash Imprint Lithography: An Effective Nanoscale Patterning Method,” J. Photopolymer Sci. Tech. 15(3) 481 (2002)
	322. (321)	Burns, S. ; Schmid G.; Tsiartas P.; Willson C. G. “Advancements to the Critical Ionization Dissolution Model,” Jour. of Vac. Sci. & Tech. B 20(2) 537-543 (2002)
	323. (330)	Dauksher, W. J.; Nordquist, K. J.; Mancini, D. P., Resnick, D. J., Baker, J. H.; Hooper, A. E.; Talin, A. A.; Bailey, T. C.; Lemonds, A. M.; Sreenivasan, S.V.; Ekerdt, J. G.; Willson, C. G. “Characterization of and Imprint Results using ITO-based Step and Flash Imprint Lithography Templates,” J. Vac. Sci. Tech. B 20(6) (2002)
	324. (334)	Lin, Eric K.; Soles, Christopher L.; Goldfarb, Dario L.; Trinque, Brian C.,: Burns, Sean D.; Jones, Ronald L.; Lenhart, Joseph L.; Angelopoulos, Marie; Willson, C. Grant; Satija, Shil K.; Wu, Wen-li. “Direct Measurement of the Reaction Front in Chemically Amplified Photoresists,” Science 297 372-375 (2002)
	325. (331)	Mancini, D. P.; Gehoski, K. A., Ainley, E., Nordquist, K. J., Resnick, D. J., Bailey, T. C., Sreenivasan S. V., Ekerdt, J. G., Willson, C. G. “Hydrogen Silsesquioxane for Direct E-beam Patterning of Step and Flash Imprint Lithography Templates,” J. Val. Sci. Tech. B 20(6) (2002)
	326. (323)	Resnick, D. J.; D.P. Mancini, S.V. Sreenivasan, Willson, C.G. “Release Layers for Contact and Imprint Lithography,” Semiconductor International, June 2002 71-80 (2002)
	327. (329)	Resnick, D. J.; Dauksher, W. J.; Mancini, D.; Nordquist, K. J.; Ainley, E.; Gehoski, K.; Baker, J. H.; Bailey T. C.; Choi, B. J.; Johnson, S.; Sreenivasan, S. V.; Ekerdt, J. G.; and Willson, C. G. “High Resolution Templates for Step and Flash Imprint Lithography,” Proc. SPIE: Emerging Lithographic Technologies VI 4688 205-213 (2002)
	328. (332)	Resnick, D. J.; Bailey, T.C., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissi, M. Sreenivasan, S.V., Ekert, J.G., Willson.C. G. “New Methods for Fabricating Step and Flash Imprint Lithography Templates,” Proc .SPIE 4608 176-181 (2002)
	329. (320)	Schmid, Gerard M.; Michael D. Stewart; Vivek K. Singh; Willson, C.G. “Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists,” Jour. of Vac. Sci. & Tech. B 20(1) 185-190 (2002)
	330. (335)	Schmid, Gerard M.; Burns, Sean D., Tsiartas, Pavlos C., and Willson, C. Grant. “Electrostatic Effects During Dissolution Of Positive Tone Photoresists,” Journal of Vacuum Science & Technology, B 20(6) 2913 (2002)
	331. (327)	Sreenivasan, S. V.; Willson, C. G.; Schumaker, N. E.; and Resnick, D. J. “Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography,” Proc. SPIE 4688 903-909 (2002)
	332. (336)	Sreenivasan, S. V.; Willson, C. G.; Schumaker, N. E.; Resnick, D. J. “Low-cost nanostructure patterning using step and flash imprint lithography,” Proc. SPIE 4608 187-194 (2002)
	333. (325)	Tran, H. V.; Hung, R. J.; Chiba, T.; Yamada, S.; Mrozek, T.; Hsieh, Y.-T.; Chambers, C. R.; Osborn, B. P.; Trinique, B. C.; Pinnow, M. J.; MacDonald, S. A.; and Willson, C. G. “Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications: II. Fluorinated Norbornenes - Synthesis, Polymerization, and Initial Imaging Results,” Macromolecules 35(17) 6539-6549 (2002)
	334. (322)	Trinque, B. ; Chiba, T., Hung, R., Chambers, C., Pinnow, M., Tran, H.V., Wunderlich, J., Hsieh, Y., Thomas, B., Shafer, G., Shafer, D., DesMartequ, D., Conley, W. and Willson, C. G. “Recent Advances in Resists for 157nm Microlithography,” Jour. of Vac. Sci. & Tech. B 20(2) 531-536 (2002)
	335. (328)	Willson, G. C.; Trinique, B. C., Osborn, B. P., Chambers, C. R., Hsieh, Y., Kusumoto, S., Zimmerman, P., Miller, D. and Conley, W. “Fluorinated Polymers and Dissolution Inhibitors for 157nm Microlithography,” ACS Preprint, 224:012-Fluor Part 1, Aug. 18 (2002)
	336. (333)	Willson, G. C.; Trinque, B. C., Osborn, B. P., Chambers, C. R, Hsieh, Y. T., Chiba, T., Zimmerman, P., Miller, D., Conley, W. “The Design of Resist Materials for 157nm Lithography,” J. of Photopolymer Sci. and Tech. 15(4) 583-590 (2002)
	337. (347)	Burns, Sean D.; Schmid, Gerard M.; Trinque, Brian C.; Willson, James; Wunderlich, Jennifer; Tsiartas, Pavlos C.; Taylor, James C.; Burns, Ryan L.; Willson, C. Grant. “Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry,” Proc. SPIE 5039 1063-1075 (2003)
	338. (357)	Burns, Sean D.; Medeiros, David R.; Johnson, Heather F.; Wallraff, Gregory M.; Hinsberg, William D.; Willson, C. Grant. “The Effect of Humidity on Deprotection Kinetics in Chemically Amplified Resists,” Proc. SPIE 4690 321-331 (2003)
	339. (346)	Chambers, Charles R.; Kusumoto, Shiro; Lee, Guen Su; Vasudev, Alok; Walthal, Leonidas; Osborn, Brian P.; Zimmerman, Paul; Conley, Will; Willson, C. Grant. “Dissolution inhibitors for 157-nm photolithography,” Proc. SPIE 5039 93-102 (2003)
	340. (345)	Conley, Will ; Trinque, Brian C.; Miller, Daniel; Caporale, Stefan; Osborn, Brian P.; Kumamoto, Shiro; Pinnow, Matthew J.; Callahan, Ryan; Chambers, Charles R.; Lee, Guen Su; Zimmerman, Paul; Willson, C. Grant. “Negative photoresist for 157-nm microlithography: a progress report,” Proc. SPIE 5039 622-626 (2003)
	341. (354)	Conley, Willard ; Miller, Daniel; Chambers, Charles; Osborn, Brian; Hung, Raymond J.; Tran, Hoang Vi; Trinque, Brian C.; Pinnow, Matthew; Chiba, Takashi; McDonald, Scott; Zimmerman, Paul; Dammel, Ralph; Rmano, Andrew; Willson, C. Grant. “Dissolution Inhibitors for 157nm Microlithography,” Proc. SPIE 4690 69-75 (2003)
	342. (355)	Conley, Will ; Trinque, Brian C.; Miller, Daniel; Zimmerman, Paul; Kudo, Takanori; Dammel, Ralph; Romano, Andrew; and Willson, C. Grant. “Negative Photoresist for 157nm Microlithography: A Progress Report,” Proc. SPIE 4690 94-109 (2003)
	343. (340)	Grayson, S. M.; Willson, C. G. “Self-orienting and self-assembling mesoscale amphiphilic hydrogels,” Polym. Mat. Sci. Eng. 89 219-220 (2003)
	344. (360)	Jamieson, Andrew ; Willson, C. Grant; Hsu, Yautzong; Brodie, Alan. “A Hydrogen Silsesquioxane Bilayer Resist Process for Low-Voltage Electron Beam Lithography,” Proc. SPIE 4690 1171-1179 (2003)
	345. (351)	Johnson, Stephen C.; Bailey, Todd C.; Dickey, Michael D.; Smith, Britain J.; Kim, Eunha K.; Jamieson, Andrew T.; Stacey, Nicholas A.; Ekerdt, John G.; Willson, C. Grant; Mancini, David P.; Dauksher, William J.; Nordquist, Kevin J.; Resnick, Douglas J. “Advances in Step and Flash Imprint Lithography,” Proc. SPIE 5037 197-202 (2003)
	346. (352)	Johnson, Heather F.; Ozair, Sahban N.; Jamieson, Andrew T.; Trinque, Brian C.; Brodsky, Colin C.; Willson, C. Grant. “Cationic graft polymerization lithography,” Proc. SPIE 5037 943-951 (2003)
	347. (361)	Johnson, S. ; Resnick, D. J.; Mancini, D.; Nordquist, K.; Dauksher, W. J.; Gehoski, K.; Baker, J.H.; Baker, L.; Dues, A.; Hooper, A.; Bailey, T.C.; Sreenivasan, S.V.; Ekerdt, J.G.; Willson, C. G. “Fabrication of Multi-tiered structures on step and flash imprint lithography templates,” Microelectronic Engineering 67-68 221-228 (2003)
	348. (348)	Jones, Ronald L.; Hu, Tengjiao; Prabhu, Vivek M.; Soles, Christopher L.; Lin, Eric K.; Wu, Wen-li; Goldfarb, Dario L.; Angelopoulos, Marie; Trinque, Brian; Willson, C. Grant. “Deprotection volume characteristics and line-edge morphology in chemically amplified resists,” Proc. SPIE 5039 1031-1040 (2003)
	349. (356)	Lin, Eric K.; Soles, Christopher L.; Goldfarb, Dario L.; Trinque, Brian C.; Burns, Sean D.; Jones, Ronald L.; Lenhart, Joseph L., Angelopoulos, Marie; Willson, C. Grant; Satija, Sushil K; Wu, Wen-li. “Measurement of the Spatial Evolution of the deprotection Reaction Front with Nanometer Resolution using Neutron Reflectometry,” Proc. SPIE 4690 313-320 (2003)
	350. (341)	Meiring, Jason E.; Matthew J. Schmid, Scott Grayson; Benjamen M. Rathsack; David M. Johnson, Romy Kirby, , Ramakrishnan Kannappan, Kalpana Manthiram; Jennifer Stotts; Zachary Hogan; Ryan J. Russell, Michael V. Pishko, Andrew D. Ellington, Willson, C. Grant. “Hydrogel biosensors arrays indexed through shape recognition,” Polym. Mat. Sci. Eng. 89 217-218 (2003)
	351. (350)	Resnick, Douglas J.; Dauksher, William J.; Mancini, David P.; Nordquist, Kevin J.; Bailey, Todd C.; Johnson, Stephen C.; Stacey, Nicholas A.; Ekerdt, John G.; Willson, C. Grant; Sreenivasan, S. V.; Schumaker, Norman E. “Imprint lithography: lab curiosity or the real NGL,” Proc. SPIE 5037 12-23 (2003)
	352. (362)	Resnick, D. J.; Dauksher, W.J.; Mancini, D. P.; Nordquist, K. J.; Bailey, T.C.; Johnson, S. C.; Stacey, N. A.; Ekerdt, J. G.; Willson, C. G.; Sreenivasan, S.V.; Schumaker, N. E. “Imprint lithography for integrated circuit fabrication,” Jour. of Vac. Sci. & Tech., B: Microelectronics and Nanometer Structures—Processing, Measurement, an 21(6) (2003)
	353. (363)	Resnick, D. J.; Dauksher, W.J.; Mancini, D. P.; Nordquist, K. J.; Bailey, T.C.; Johnson, S. C.; Stacey, N. A.; Ekerdt, J. G.; Willson, C. G.; Sreenivasan, S. V. “Improved step and flash imprint lithography templates for nanofabrication,” Microelectronic Engineering 69(2-4) (2003)
	354. (339)	Sanders, D. P.; Connor, E. F.; Grubbs, R. H.; Hung, R. J.; Osborn, B. P.; Chiba, T.; Mac Donald, S. A.; Willson, C. G.; Conley, W. “Metal-Catalyzed Addition Polymers for 157nm Resist Applications. Synthesis and Polymerization of Partially Flourinated, Ester-Functionalized Tricyclo[4.2.1.02,5]non-7-enes.,” Macromolecules 36(5) 1534-1542 (2003)
	355. (358)	Schmid, Gerard M.; Burns, Sean D.; Stewart, Michael D.; Willson, C. Grant. “Mesoscale Simulation of Positive Tone Chemically Amplified Photoresists,” Proc. SPIE 4690 381-390 (2003)
	356. (364)	Schmid, Matthew ; Meiring, Jason; Kirby, Romy; Manthiram, Kalpana; Grayson, Scott; Ellington, Andrew; Willson, C. Grant. “Functionalizing hydrogel based biosensors with DNA oligomers for single nucleotide polymorphism detection,” Polym. Mater. Sci. Eng. 89 215-216 (2003)
	357. (365)	Schmid, Gerard M.; Burns, Sean D., Tsiartas, Pavlos C., and Willson, C. Grant. “Electrostatic Effects During Dissolution Of Positive Tone Photoresists,” Virtual Journal of Nanoscale Science & Technology (2003)
	358. (343)	Sharif, Iqbal ; DesMarteau, Darryl; Ford, Larry; Shafer, Gregory J.; Thomas, Brian; Conley, Will; Zimmerman, Paul; Miller, Daniel; Lee, Guen Su; Chambers, Charles R.; Trinque, Brian C.; Chiba, Takashi; Osborn, Brian P.; Willson, C. Grant. “Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report,” Proc. SPIE 5039 33-42 (2003)
	359. (349)	Smith, Britain J.; Stacey, Nicholas A.; Donnelly, J. P.; Onsongo, David M.; Bailey, Todd C.; Mackay, Chris J.; Resnick, Douglas J.; Dauksher, William J.; Mancini, David P.; Nordquist, Kevin J.; Sreenivasan, S. V.; Banerjee, Sanjay K.; Ekerdt, John G.; Willson, C. Grant. “Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device,” Proc. SPIE 5037 1029-1034 (2003)
	360. (337)	Stewart, Michael D.; Tran, Hoang Vi, Schmid, Gerard M., Stachowiak, Timothy B., Becker, Darren J., Willson, C. Grant. “Acid Catalyst Mobility in Resist Resins,” Journal of Vacuum Science & Technology, B 20(6) (2003)
	361. (344)	Stewart, Michael D.; Schmid, Gerard M.; Goldfarb, Dario L.; Angelopoulos, Marie; Willson, C. Grant. “Diffusion-induced line-edge roughness,” Proc. SPIE 5039 415-422 (2003)
	362. (359)	Stewart, Michael D.; Becker, Darren J.; Stachowiak, Timothy B.; Schmid, Gerard M.’ Michaelson, Timothy B.; Tran, Hoang Vi; Willson, C. Grant. “Acid Mobility in Chemically Amplified Photoresists,” Proc. SPIE 4690 943-951 (2003)
	363. (338)	Trinque, Brian C.; Chambers, Charles R., Osborn, Brian P., Callahan, Ryan P., Lee, Geun Su, Kusumoto, Shiro, Sanders, Daniel P., Grubbs, Robert H., Conley, Willard E., Willson, C. Grant. “Vacuum-UV Influenced Design of Polymers and Dissolution Inhibitors For Next Generation Photolithography,” J. of Florida Chem. 122 17-26 (2003)
	364. (353)	Trinque, Brian C.; Osborn, Brian P.; Chambers, Charles R.; Hsieh, Yu-Tsai; Corry, Schuyler; Chiba, Takashi; Hung, Ryamond J.; Tran, Hoang Vi; Zimmerman, Paul; Miller, Daniel; Conley, Willard; Willson, C. Grant. “Advances in Resists for 157nm Microlithography,” Proc. SPIE 4690 58-68 (2003)
	365. (342)	Willson, Grant C.; Trinque, Brian C. “The evolution of materials for the photolithographic process,” J. Photopoly. Sci. Tech. 16(4) 621-627 (2003)
	366. (375)	Burns, R. L.; Johnson, S. C.; Schmid, G. M.; Kim, E. K.; Dickey, M. D.; Meiring, J.; Burns, S. D.; Stacey, N. A.; Willson, C. G. “Mesoscale modeling for SFIL simulating polymerization kinetics and densification,” Proc. SPIE 5374 348-360 (2004)
	367. (368)	Chambers, C. R.; Kusumoto, S.; Osborn, B. P.; Vasudeve, A.; Ootani, M.; Walthal, L.; McMichael, H.; Zimmerman, P. A.; Conley, W. E.; Willson, C. G. “Design of dissolution inhibitors for chemically amplified photolithographic systems,” Proc. SPIE 5376 360-368 (2004)
	368. (374)	Colburn, Matthew ; Choi, Byung Jin; Sreenivasan, S.V.; Bonnecaze, Roger T.; Willson, C. Grant. “Ramifications of Lubrication Theory on Imprint Lithography,” Microelectronic Engineering 75(3) 321-329 (2004)
	369. (386)	Dickey, Michael ; Willson, C. G. “Effects of oxygen on step and flash imprint lithography photopolymerization kinetics,” Polym. Mater. Sci. Eng. 90 24-25 (2004)
	370. (381)	Jamieson, A. T.; Willson, C. G.; Brodie, A.; Hsu, Y. “Low voltage Electron Beam Lithography Resist Processes: Top Surface Imaging and Hydrogen Silisequioxane Bilayer,” JM3 3(3) 442-449 (2004)
	371. (387)	Johnson, Heather ; Ozair, Sahban; Winters, Kristina; Willson, C. G. “Designing materials for cationic graft lithography,” Polym. Mater. Sci. Eng. 42 3063-3069 (2004)
	372. (378)	Jones, Ronald L.; Hu, Tengjiao; Lin, Eric K.; Wu, Wen-Li; Goldfarb, Dario L.; Angelopoulos, Marie; Trinque, Brian; Schmid, Gerard M.; Stewart, Michael D.; Willson, C. Grant. “Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists,” Journal of Polymer Science, Part B: Polymer Physics 42 3063-3069 (2004)
	373. (367)	Kim, Eui K.; Stacey, N.A.; Smith, B. J.; Dickey, M.D., Johnson, S.C.; Trinque, B.C.; Willson, C. G. “Vinyl Ethers in Ultraviolet Curable Formulations for Step and Flash Imprint Lithography,” Jour. Vac. Sci. & Tech., B: Microelectronics and Nanometer Structures—Processing, Measurement, and Phenomena 22 131-135 (2004)
	374. (371)	Leeson, M. J.; Yueh, W.; Tattersall, P. I.; Pawloski, A.; Grayson, S. M.; Willson, C. G. “Synthesis and Reactivity of 3-Diazo-4-oxocoumarins for Photolithographic Applications,” Chem. Mater. 16(9) 1763-1769 (2004)
	375. (372)	LeSuer, R. J.; Fan, F. F.; Bard, A. J.; Taylor, C.; Tsiartas, P.; Willson, C. G.; Conley, W.; Feit, G.; Kunz, R. “Using scanning electrochemical microscopy t probe chemistry at the solid-liquid interface in chemically amplified immersion lithography,” Proc. SPIE 5376 115-125 (2004)
	376. (380)	Meiring, J. E.; Schmid, M. J.; Grayson, S. M.; Rathsack, B. M.; Johnson, D. M.; Kirby, R.; Kannappan, R.; Manthiram, K.; Hsia, B.; Hogan, Z. L.; Ellington, A. D.; Pishko, M. V. and Willson, C. G. “Hydrogel Biosensor Array Platform Indexed by Shape,” Chem. Mater. 16 5574-5580 (2004)
	377. (377)	Michaelson, Timothy ; Jamieson, Andrew; Pawloski, Adam R.; Byers, Jeffrey; Acheta, Alden; Willson, C. Grant. “Understanding the Role of Base Quenchers in Photoresists,” Proc. SPIE 5376 1282-1293 (2004)
	378. (382)	Schmid, Gerard M.; Stewart, Michael D.; Burns, Sean D.; Willson, C. Grant. “Mesoscale Monte Carlo Simulation of Photoresist Processing,” J. Electrochemical Soc. 151(2) (2004)
	379. (373)	Schmid, G. M.; Stewart, M. D.; Wang, C. Y.; Vogt, B. D.; Prabhu, V. M.; Lin, E. K.; Willson, C. G. “Resolution limitations in chemically amplified photoresist systems,” Proc. SPIE 5376 333-341 (2004)
	380. (385)	Schmid, Gerard ; Burns, Sean; Stewart, Michael; Stewart, Michael; Tsiartas, Pavlos; Meiring, Jason; and Willson, C. Grant. “Mesoscale Monte Carlo simulation of positive-tone, chemically amplified photoresist processing,” Polym. Mater. Sci. Eng. 90 285-286 (2004)
	381. (370)	Tatersall, P. I.; Breslin, D.; Grayson, S. M.; Heath, W. H.; Lou, K.; McAdams, C.L.; McKean, D.; Rathsack, B. M.; Willson, C. G. “Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists,” Chem. Mater. 16(9) 1770-1774 (2004)
	382. (369)	Taylor, J. C.; Chambers, C. R.; Deschner, Ryan; LeSuer, R. J.; Conley, W. E.; Burns, S. D.; Willson, C. G. “Implications of immersion lithography on 193nm photoresists,” Proc. SPIE 5376 34-43 (2004)
	383. (376)	Xu, F. ; Stacey, N.; Watts, M.; Truskett, V.; McMackin, I.; Choi, Jin; Schumaker, P.; Thompson, E.; Babs, D.; Sreenivasan, S.V.; Willson, C. G.; Schumaker, N. “Development of Imprint Materials for the Step and Flash Imprint Lithography Process,” Proc. SPIE 5374 232-241 (2004)
	384. (366)	Yamada, Shintaro ; Mrozek, Thomas; Rager, Timo; Owens, Jordan; Rangel, Jose; Willson, C. Grant; Byers, Jeffery. “Toward Environmentally Friendly Photolithographic Materials: A New Class of Water-Soluble Photoresists,” Macromolecules 37(2) 377-384 (2004)
	385. (379)	Yan, X. ; Liu, G.; Dickey, M.; Willson, C. G. “Preparation of Porous Polymer Membranes Using Nano- or Micro-pillar Arrays as Templates,” Polymer 45 8469-8474 (2004)
	386. (384)	Yan, Xiaohu Yan; Liu, Guojun; Dickey, Michael; Willson, C. Grant. “Preparation of porous polymer membranes using nano- or micro-pillar arrays as templates,” Polymer 45 8469-8474 (2004)
	387. (394)	Conley, Will ; LeSuer, Robert J.; Fan, Frank F.; Bard, Allen J.; Taylor, Chris; Tsiartas, Pavlos; Willson, C. Grant; Romano, Andrew; Dammel, Ralph. “Understanding the Photoresist Surface-Liquid Interface for ArF Immersion Lithography,” Proc. SPIE 5753 64-77 (2005)
	388. (401)	Conley, N. R.; Hung, R. J.; Willson, C. Grant. “A New Synthetic Route to Authentic N-Substituted Aminomaleimides,” J. Org. Chem. 70(11) 4553-4555 (2005)
	389. (400)	Dickey, M. D.; Burns, R. L.; Kim, E. K.; Johnson, S. C.; Stacey, N. A.; Willson, C. G. “A Study of the Kinetics of Step and Flash Imprint Lithography Photopolymerization,” AIChE Journal 51(8) 2547-2555 (2005)
	390. (389)	Gates, B. D.; Xu, Q.; Stewart, M.; Deschner, R.; Willson, C. G.; Whitesides, G. M. “New Approaches to Nanofabrication: Molding, Printing, and Other Techniques,” Chem. Rev. 105 1171-1196 (2005)
	391. (407)	Holcombe, Thomas W; Dickey, Michael; Willson, C. Grant. “A New Method for Covalently Bonding Functionality to ITO Films,” Southwest Joint Regional Meeting of ACS (2005)
	392. (409)	Johnson, S. ; Burns, R.; Kim, E. K.; Dickey, M.; Schmid, G.; Meiring, J.; Burns, S.; Willson, C. G. “Effects of etch barrier densification on step and flash imprint lithography,” J. Vac. Sci. Technol. B 23(6) 2553-2556 (2005)
	393. (395)	Kim, E. K.; Ekerdt, J. E.; Willson, C. G. “Importance of evaporation in the design of materials for step and flash imprint lithography,” J. Vac Sci. Technol. B 23(4) (2005)
	394. (406)	Kim, E. K.; Stewart, M. D.; Wu, K.; Palmieri, F.L.; Dickey, M. D.; Ekerdt, J. G. and Willson, C. G. “Vinyl Ether Formulations for Step and Flash Imprint Lithography,” J. Vac. Sci. Technol. B 23(6) 2967-2971 (2005)
	395. (402)	MacDonald, Susan ; Hughes, Greg; Stewart, Michael; Palmieri, Frank; Willson, C. Grant. “Design and Fabrication of Highly Complex Topographic Nano-imprint Template for Dual Damascene Full 3-D Imprinting,” Proc. SPIE 5992 59922 (2005)
	396. (392)	Meiring, Jason ; Michaelson, Timothy B.; Jamieson, Andrew; Schmid, Gerard M.; Willson, C. Grant. “Using Mesoscale Simulation to Explore Photoresist Line Edge Roughness,” Proc. SPIE 5753 350-360 (2005)
	397. (391)	Michaelson, Tim ; Pawloski, Adam; Acheta, Alden; Nishimura, Yukio; Willson, C. G. “The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness,” Proc. SPIE 368-379 (2005)
	398. (398)	Nishimura, Yukio ; Michaelson, Timothy B.; Meiring, Jason E.; Stewart, Michael D.; Willson, C. Grant. “Line Edge Roughness in Chemically Amplified Resist: Speculation, Simulation and Application,” Jour. of Photopolymer Science and Technology 18(4) 457-465 (2005)
	399. (388)	Rathsack, Benjamin ; Medeiros, David; Willson, C. Grant. “Resists for Mask Making,” (Chapter 15) Handbook of PHotomask Manufacturing Technology. CRC Press, ISBN 0-8247-5274-7 (2005)
	400. (383)	Resnick, Douglas J.; Sreenivasan, S.V.; Willson, C. Grant. “Step and Flash Imprint Lithography,” Materials Today 8(2) 34-42 (2005)
	401. (390)	Stewart, M. D.; Johnson, S. C.; Sreenivasan, S. V.; Resnick, D. J.; Willson, C. G. “Nanofabrication with step and flash imprint lithography,” J. Microlith., Microfab., Microsyst. 4(1) 011002 (2005)
	402. (396)	Stewart, Michael D.; Wetzel, J.T.; Schmid, G.M.; Palmieri, F.; Thompson, E.; Kim, E. K.; Wang, D.; Sotoodeh, K.; Jen, K.; Johnson, S.C.; Hao, J.; Dickey, M.D.; Nishimura, Y.; Laine, R.M.; Resnick, D.J.; Willson, C. Grant. “Direct Imprinting of Dielectric Materials for Dual Damascene Processing,” Proc. SPIE 5751 210-218 (2005)
	403. (412)	Stewart, Michael D.; Willson, C. Grant. “Imprint Materials for Nanoscale Devices,” MRS Bulletin 30 947-951 (2005)
	404. (393)	Taylor, Christopher J.; Shayib, Ramzy; Goh, Sumarlin; Chambers, Charles R.; Conley, Will; Lin, Shang-Ho; Willson, C. Grant. “Fluids and resists for hyper NA immersion lithography,” Proc. SPIE 5753 836-846 (2005)
	405. (399)	Taylor, Christopher ; LeSuer, Robert J.; Chambers, Charles R.; Fan, Fu-Ren F.; Bard, Allen J.; Conley, Willard E.; Willson, C. Grant. “Experimental Techniques for Detection of Components Extracted from Model 193 nm Immersion Lithography Photoresists,” Chem. Mater. 17 4194-4203 (2005)
	406. (397)	Tsiartas, Pavlos C.; Schmid, Gerard M.; Johnson, Heather F.; Stewart, Michael D.; Willson, C. Grant. “Quantifying acid generation efficiency for photoresist applications,” J. Vac. Sci Technol. B 23(1) 224-228 (2005)
	407. (408)	Wu, K. ; Bailey, T. C.; Willson, C. G.; Ekerdt, J. G. “Surface Hydration and Its Effect on Fluorinated SAM Formation on SiO2 Surfaces,” Langmuir 21 11795-11801 (2005)
	408. (414)	Costner, Elizabeth ; Taylor, J. Christopher; Caporale, Stefan; Wojtczak, William; Dewulf, Dean; Conley, Will; Willson, C. Grant. “New High Index Fluids for Immersion Lithography,” Proc. SPIE 6153 6153OB-1-10 (2006)
	409. (403)	Dickey, Michael D.; Willson, C. Grant. “Kinetic Parameters for Step and Flash Imprint Lithography Photopolymerization,” AIChE Journal 52(2) 777-784 (2006)
	410. (411)	Dickey, M. D.; Stewart, M. D.; Willson, C. G. “An Automated Statistical Process Control Study of Inline Mixing Using Spectrophotemetric Detection,” Jour. of Chem. Ed. 83(1) 110-113 (2006)
	411. (413)	Dickey, Michael D.; Gupta, Suresh; Leach, K. Amanda; Collister, Elizabeth; Willson, C. Grant; Russell, Thomas P. “Novel 3-D Structures in Polymer Films by Coupling External and Internal Fields,” Langmuir 22(9) 4315-4318 (2006)
	412. (422)	Dickey, Michael D.; Collister, Elizabeth; Raines, Allen; Tsiartas, Pavlos; Holcombe, Tom; Sreenivasan, S. V.; Bonnecaze, Roger T.; Willson, C. Grant. “Photocurable Pillar Arrays Formed via Electrohydrodynamic Instabilities,” Chem. Mat. 18(8) 2043-2049 (2006)
	413. (421)	Grayson, Scott M.; Long, Brian K.; Kusomoto, Shiro; Osborn, Brian P.; Callahan, Ryan P.; Chambers, Charles R.; Willson, C. Grant. “Synthesis and Characterization of Norbornanediol Isomers and Their Fluorinated Analogues,” JOC 71(1) 341-344 (2006)
	414. (420)	Hao, Jianjun ; Palmieri, Frank; Stewart, Michael D.; Nishimura, Yukio; Chao, Huang-Lin; Collins, Austin; Willson, C. Grant. “Octa(hydridotetramethyldisiloxanyl) silsesquioxane as a synthetic template for patternable dielectric materials,” Polymer Preprints (ACS, Division of Polymer Chemistry) 47(2) 1158-1159 (2006)
	415. (410)	Kim, E. K.; Willson, C. Grant. “Thermal analysis for step and flash imprint lithography during UV curing process,” Microelectronic Engineering 82(2) 212-217 (2006)
	416. (416)	Lin, Michael W.; Chao, Huang-Lin; Kim, Eui K.; Palmieri, Frank; Kim, Woon C.; Dickey, Michael; Ho, Paul S.; Willson, C. G. “Planarization for reverse-tone step and flash imprint lithography,” Proc. SPIE 6151 61512G (2006)
	417. (415)	Palmieri, Frank ; Stewart, Michael D.; Wetzel, Jeff; Hao, Jianjun; Nishimura, Yukio; Jen, Kane; Flannery, Colm; Li, Bin; Chao, Huang-Lin; Young, Soo; Kim, Woon Chun; Ho, Paul S.; Willson, C. Grant. “Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics,” Proc. SPIE 6151 6151-6159 (2006)
	418. (404)	Pawloski, Adam R.; Acheta, Alden, Levinson, Harry J.; Michaelson, Timothy B.; Jamieson, Andrew; Nishimura, Yukio; Willson, C. Grant. “Line Edge Roughness and Intrinsic Bias for Two Methacrylate Polymer Resist Systems,” J. Microlith., Microfab., Microsyst. 5(2) 023001-1--16 (2006)
	419. (418)	Schmid, Gerard M.; Stewart, Michael D.; Wetzel, Jeffrey; Palmieri, Frank; Hao, Jianjun; Nishimura, Yukio; Jen, Kane; Kim, Eui Kyoon; Resnick, Douglas J.; Liddle, Alexander; Willson, C. Grant. “Implementation of an imprint damascene process for interconnect fabrication,” JVST 24(3) 1283-1291 (2006)
	420. (419)	Schmid, Matthew J.; Manthiram, Kalpana; Grayson, Scott M.; Willson, James C.; Meiring, Jason E.; Bell, Kathryn M.; Ellington, Andrew D. and Willson, C. Grant. “Feature Multiplexing—Improving the Efficiency of Microarray Devices,” Angew. Chem. 45(20) 3338-3341 (2006)
	421. (417)	Tsiartas, Pavlos C.; Dickey, Michael D.; Allrich, Keris E.; Willson, C. G. “Photocurable Pillar Arrays Formed via AC- and Ultrasound-Induced Electrohydrodynamic Instabilities,” Proc. SPIE 6151 920-926 (2006)
	422. (423)	Willson, C. Grant; “Materials for step and flash lithography,” ACS PMSE Preprints 94 731 (2006)
	423. (424)	Willson, Grant C.; “Organic Imaging Materials: A View of the Future,” Polymer Preprints 47(1) 530 (2006)
	424. (0)	Willson, C G; “Organic Imaging Materials: A View of the Future,” Polymer Preprint 47(1) 530 (2006)
	425. (405)	Yan, Xiaohu ; Liu, Guojun; Hu, Jiwen; Willson, C. Grant. “Co-aggregation of B-C and D-C Diblock Copolymers with H-Bonding C blocks in Block-selective Solvents,” Macromolecules 39(5) 1906-1912 (2006)
	426. (433)	Adams, Jacob R; Callahan, Ryan P.; Durand, WIlliam J.; Steger, Christy L.; Willson, C. Grant. “Functionalized norbornene polyacetals for use in photoresist applications,” PMSE Preprints 97 78-79 (2007)
	427. (432)	Byers, Jeffrey ; Lee, Saul; Jen, Kane; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant. “Double exposure materials: simulation study of feasibility,” Journal of Photopolymer Science and Technology 20(5) 707-717 (2007)
	428. (425)	Hao, J ; Lin, M., Palmieri, F., Nishimura, Y., Chao, H-L, Stewart, M.D., Collins, A., Jen, K., Willson, C.G. “Photocurable silicon-base material for imprinting lithography,” SPIE 6517 6517-80 (2007)
	429. (426)	Jen, W L; Palmieri, F., Chao, B., Lin, M., Hao, J., Owens, J., Sotoodeh, K., Cheung, R., Willson, C. Grant. “Multilevel step and flash imprint lithography for direct patterning of dielectrics,” SPIE 6517 6517-19 (2007)
	430. (427)	Long, Brian K; Keitz, B. Keith, Willson, C. Grant. “Materials for step and flash imprint lithography (S-FIL),” Journal of Materials Chemistry 17(34) 3575-3579 (2007)
	431. (428)	Palmieri, Frank ; Adams, Jacob; Long, Brian; Heath, William; Tsiartas, Pavlos; Willson, C. Grant. “Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists,” ACS Nano 1(4) 307-312 (2007)
	432. (429)	Vegh, J J; Nest, D; Graves, D. B.; Bruce, R.; Engelmann, S.;Kwon, T.;Phaneuf, R. J.; Oehrlein, G. S.; Long, B.K.; Willson, C. G. “Near-surface modification of polystyrene by Ar+: Molecular dynamics simulations and experimental validation,” Applied Physics Letters 91 233113 (2007)
	433. (430)	Wu, K. ; Wang, X.; Kim, E. K.; Willson, C. G. and Ekerdt, J. G. “Experimental and Theoretical Investigation on Surfactant Segregation in Imprint Lithography,” Langmuir 23 1166-1170 (2007)
	434. (441)	Chao, Brook ; Palmieri, F.;Jen, Wei-Lun;McMichael, D. H.;Willson, C. G.;Owens, J.;Berger, R.;Sotoodeh, K.;Wilks, B.;Pham, J.;Carpio, R.;LaBelle, E;Wetzel, J.; “Dual Damascene BEOL processing using multilevel step and flash imprint lithography,” Proc. SPIE 6921 69210C (2008)
	435. (438)	Costner, E. ; Matsumoto, K.; Long, Brian K.; Taylor, J. C.; Wojtczak, W.; Willson, C. G. “New High Index Fluids: Exploiting Anomalous Dispersion for Immersion Lithography,” Proc. SPIE 6923, 69230B-1 (2008)
	436. (434)	Dickey, Michael D; Raines, Allen; Collister, Elizabeth; Bonnecase, Roger T.; Sreenivasan, S. V.; Willson, C. Grant “High-aspect ratio polymeric pillar arrays formed via electrohydrodynamic patterning,” Journal of Materials Science 43(1) 117-122 (2008)
	437. (435)	Heath, William ; Palmieri, Frank; Adams, Jacob; Long, Brian; Chute, Jerred; Holcombe, Thomas; Zieren, Shelley; Truitt, Matthew; White, Jeffery; Willson, C. Grant. “Degradable Cross-Linkers and Strippable Imaging Materials for S-FIL,” Macromolecules 41 719-726 (2008)
	438. (431)	Ito, Hiroshi ; Trinque, Brian C.; Kasai, Paul; Willson, C. Grant. “Penultimate Effect in Radical Copolymerization of 2-Trifluoromethylacrylates,” Journal of Polymer Science Part A: Polymer Chemistry 46(5) 1559-1565 (2008)
	439. (444)	Lee, Saul ; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholar J.; Willson, C. Grant. “An Analysis of double exposure lithography options,” Proc. SPIE 6924, 69242A-69242A-1 (2008)
	440. (447)	Lin, Michael W. ; Hellebusch, Daniel J.; Wu, Kai; Kim, Eui K.; Lu, Kuan H.; Liechti, Kenneth M.; Ekerdt, John G.; Ho, Paul S.; Willson, C. Grant “The Role of Surfactants in Adhesion Reduction for Step and Flash Imprint Lithography,” J. Micro/Nanolith. MEMS MOEMS 7(3) 03300 (2008)
	441. (443)	Lin, Michael W. ; Hellebusch, Daniel J.; Wu, Kai; Kim, Eui Kyoon; Lu, Kuan; Tao, Li; Liechti, Kenneth M.; Ekerdt, John G.; Ho, Paul S.; Hu, Walter; Willson, C. Grant. “Interfacial adhesion studies for step and flash imprint lithography,” Proc. SPIE 6921, 69210E-69210E-1 (2008)
	442. (440)	Lin, Michael ; “Simulation and Design of Planarizing Materials for Reverse-Tone Step and Flash I,” J. Micro/Nanolith. MEMS MOEMS 7(2), 023008-1-19 (2008)
	443. (445)	Long, Brian K. ; Keitz, B. Keith; Webb, R. Chad; Willson, C. Grant. “Photocross-linkable polymers for electro-optic applications,” Abstracts of Papers, 235th ACS National Meeting, New Orleans, LA United States, April 6-10, (2008)
	444. (446)	Matsumoto, Kazuya Costner, E; “High Index Resist for 193nm Immersion Lithography.,” Macromolecules 41(15) 5674-5680 (2008)
	445. (439)	Matsumoto, K. ; Costner, E.; Nishimura, I., Ueda, M.; Willson, C. G. “High Index Resists for 193 nm Immersion Lithography,” Proc. SPIE 6923, 692305-1 (2008)
	446. (437)	Nishimura, I ; Heath, W. H.; Matsumoto, K.; Jen, W. L.; Lee, S. S.; Neikirk, C.; Shimokawa, T.; Ito, J.; Fujiware, K.; Willson, C. G. “Non-chemically Amplified Resists for 193nm Lithography,” Proc. SPIE 6923, 69231C-1 (2008)
	447. (436)	Tao, L. ; Ramachandran, S.; Nelson, C. T.; Lin, M.; Overzet, L. J.; Goeckner, M.; Lee, G.; Willson, C. G.; Wu, W.; Hu, W. “Durable diamond-like carbon templates for UV nanoimprint lithography,” Nanotechnology 19, 105302-104308 (2008)
	448. (442)	Taylor, J.C. ; Costner, Elizabeth A.; Goh, Sumarlin; Wojtczak, W.; Dewulf, D.; Willson, C. G. “The effect of added salts on the optical properties of water for high index immersion lithography fluids,” JVST, B: 26(2) 506-513 (2008)

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