Updates

Published Articles

 Go to Submitted Articles
1.
(1)		 Jacobson, S. J.; Willson, C. Grant; Rapoport, H. “Mechanism of Cystine Racemization in Strong Acid,” Journal of Organic Chemistry 39(8) 1074-1077 (1974)
2.
(2)		 Slama, J. T.; Willson, C. Grant; Rapoport, H. “Porphyrin-Protein Bond of Cytochrome,” Journal of the American Chemical Society 97(22) 6556-6562 (1975)
3.
(3)		 Willson, C. Grant; Gilon, C.; Donzel, B.; and Goodman, M. “Synthesis of Pyroglutamyl-histidyl-thiazolidine-4--carboxamide, a Biologically Active Analog of Thyrotrophin Releasing Factor,” Biopolymers 15(11) 2317-2322 (1976)
4.
(5)		 Chorev, M. ; Willson, C. Grant; Goodman, M. “A General Approach to Retro-Isometric Linear Peptide Synthesis,” Journal of the American Chemical Society 99(24) 8075-8076 (1977)
5.
(6)		 Chorev, M. ; Willson, C. Grant; Goodman, M. “A Three-Point Model for the Dipeptide Sweetner-Receptor Interaction,” Peptides - Proceedings of the Fifth American Peptide Symposium 572-574 (1977)
6.
(4)		 Slama, J. T.; Willson, C. Grant; Grimshaw, C. E.; Rapoport, H. “Stereochemistry of the Porphyrin-Protein Bond of Cytochrome c. Stereochemistry Comparison of Rhodospirillum Rubrum, Yeast and Horse Heart Porphyrins c,” Biochemistry 16(8) 1750-1754 (1977)
7.
(7)		 Willson, C. Grant; Goodman, M.; Rivier, J.; Vale, W. “Topochemically Related Hormone Structures. The Synthesis of Retro-Analogs of LRF.,” Peptides - Proceedings of the Fifth American Peptide Symposium 579-581 (1977)
8.
(9)		 Gipstein, E. ; Willson, C. Grant., and Sachdev, H. S. “Synthesis and Polymerization of Alkyl a-(Alkylsulfonyl)acrylates,” Journal of Organic Chemistry 45(8) 1486-1489 (1980)
9.
(8)		 MacDonald, Scott. A.; Willson, C. Grant; Chorev, Michael.; Vernacchia, Fred. S.; Goodman, Murray. “Peptide Sweetners. 3. Effect of Modifying the Peptide Bond on the Sweet Taste of L-Aspartyl-L-phenylalanine Methyl Ester and Its Analogues,” Journal of Medical Chemistry 23(4) 413-420 (1980)
10.
(10)		 MacDonald, S. A.; Schierling, T. D.; Willson, C. Grant. “Poly-(N-alkyl)-o-nitroamides): A New Class of Photosensitive Polymers,” Journal of Organic Coatings and Plastics Chemistry 43 264-267 (1980)
11.
(11)		 Grant, Barbara D.; Clecak, Nicholas J.; Twieg, Robert J.; Willson, C. Grant. “Deep UV Photoresists I. Meldrum's Diazo Sensitizer,” IEEE Transactions on Electron Devices(11) 1300-1305 (1981)
12.
(12)		 O'Sullivan, D. ; Price, P. B.; Kinoshita, K.; Willson, C. G. “Correlative Studies of Track-Etch Behaviour and Chemical Development of Lithographic Polymer Resists,” Nucl.Tracks, Meth., Inst.Appl. 344-345 (1981)
13.
(14)		 Frechet, Jean M. J.; Farrall, Jean M.; Willson, C. Grant. “Chemical Modification of Poly(Methyl Acrylate) via Metalation and a-substitution,” Polym.Bull.Berlin 7(11) 567-573 (1982)
14.
(15)		 Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant. “Résines pour UV lointain mettant an oeuvre un mécanisme d'amplification chimique,” Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82 260 (1982)
15.
(17)		 Frechet, Jean M. J.; Farrall, M. Jean; Willson, C. Grant. “Preparation of Highly Substituted Polysulfones by Chemical Modification,” Org.Coat.& Appl.Poly.Sci.Proc. 46 335-339 (1982)
16.
(24)		 Hofer, Donald C.; Willson, C. Grant; Neureuther, Andrew R.; Hakey, Mark. “Characterization of the induction effect at mid-ultraviolet exposure: application to AZ2400 at 313 nm,” Optical Microlithography--Technology for the Mid-1980s, Proc.SPIE 334 196-205 (1982)
17.
(22)		 Ito, Hiroshi ; Dolores C.; Willson, C. Grant. “Polymerization of Methyl a-(Trifluoromethyl)acrylate and a-(Trifluoromethyl)acrylonitrile and Copolymerization of These Monomers with Methyl Methacryl,” Macromolecules 1982(15) 915-920 (1982)
18.
(29)		 Ito, Hiroshi ; Willson, C. Grant “Chemical Amplification in the Design of Dry Developing Resist Materials,” Technical Papers, Regional Technical Conference, Society of Plastic Engineers 331-353 (1982)
19.
(13)		 Jain, K. ; Willson, C. G.; and Lin, B. J. “Ultrafast high resolution contact lithography using excimer lasers,” Proc.SPIE 334 259-262 (1982)
20.
(19)		 Jain, K. ; Willson, C. G.; Lin, B. J. “Fine-Line High Speed Excimer Laser Lithography,” Proc.IEEE 92-93 (1982)
21.
(21)		 Jain, K. ; Willson, C. G.; Lin, B. J. “Ultrafast, High-Resolution Contact Lithography with Excimer Lasers,” IBM J.Res.Develop. 26(2) 151-159 (1982)
22.
(27)		 Jain, K. ; Willson, C. G.; Lin, B. J. “Ultrafast Deep UV Lithography with Excimer Lasers,” IEEE Electron Device Lett.(3) 53-55 (1982)
23.
(18)		 MacDonald, S. A.; Willson, C. Grant. “Poly(N-alkyl-o-nitroamides): A New Class of Thermally Stable, Photosensitive Polymers,” ACS Sym.Ser. 184(6) 73-81 (1982)
24.
(26)		 MacDonald, Scott A.; Miller, Robert D.; Willson, C. Grant; Feinberg, G. M.; Gleason, R. T.; Halverson, R. M.; MacIntyre, M. W.; Motsiff, W. T. “Image Reversal: The Production of a Negative Image in a Positive Photoresist,” Kodak Microelectronics Sem. 23 114-117 (1982)
25.
(25)		 O'Sullivan, D. ; Price, P. B.; Kinoshita, K.; Willson, C. G. “Predicting Radiation Sensitivity of Polymers,” J.Elecrochem.Soc. 129(4) 811-813 (1982)
26.
(16)		 Willson, C. Grant; Ito, Hiroshi; Frechet, J. M. J. “L\\\\\\\\\\\\\\\'amplification chimique appliquée au développement de polymères utilisables comme résines de lithographie,” Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82 261 (1982)
27.
(20)		 Willson, C. Grant; Frechet, Jean M. J. “New UV Resists with Negative or Positive Tone,” Proc.IEEE 92-93 (1982)
28.
(23)		 Willson, C. Grant; Ito, Hiroshi; Frechet, Jean M. J.; Houlihan, Frank. “Chemical Amplification in the Design of Polymers for Resist Applications,” International Union of Pure and Applied Chemistry 28 448 (1982)
29.
(28)		 Willson, C. Grant; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G. “Poly(methyl a-trifluoromethylacrylate) as a positive electron beam resist,” Technical Papers, Regional Technical Conference, Society of Plastic Engineers 207-219 (1982)
30.
(31)		 Ito, Hiroshi ; MacDonald, Scott; Willson, C. Grant. “Organic Resist Materials: Exploring the Limits of Sensitivity and Resolution,” RJ 4083(45481) (1983)
31.
(34)		 Ito, Hiroshi ; Willson, C. Grant “Chemical Amplification in the Design of Dry Developing Resist Materials,” Polymer Eng.& Sci. 23(18) 1012-1018 (1983)
32.
(41)		 Ito, Hiroshi ; Eichler, E.; Willson, C. Grant. “Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins,” Polymer 24 998-1000 (1983)
33.
(42)		 Ito, Hiroshi ; Willson, C. Grant; Fréchet, Jean M.; Farrall, M. J.; and Eichler, Eva. “Synthesis of Poly(p-hydroxy-a-methylstyrene) by Cationic Polymerization and Chemical Modification,” Macromolecules 16(4) 510-517 (1983)
34.
(32)		 Jain, K. ; Rice, S.; Lin, B. J. “Ultrafast Deep UV Lithography Using Excimer Lasers,” Polym.Eng.Sci. 23(18) 1019-1021 (1983)
35.
(38)		 Jain, K. ; Willson, C. G.; Rice, S.; Pederson, L.; and Lin, B. J. “Ultrafast Deep UV Lithography with Excimer Lasers,” Introduction to Microlithography: Theory, Materials, and Processing, ACS Sym.Ser. 219 363 (1983)
36.
(36)		 MacDonald, Scott A.; Ito, Hiroshi; Willson, C. Grant “Advances in the design of organic resist materials,” Microelectron.Eng. 1(3) 269-293 (1983)
37.
(43)		 MacDonald, S. A.; Steinmann, F.; Ito, H.; Lee, W-Y.; and Willson, C. G. “The Development of Oxygen Reactive Ion Etch Barriers Based on Poly(trimethylstannylstyrene),” Polym.Mat.Sci.& Eng. 104-106 (1983)
38.
(37)		 Miller, R. D.; Willson, C. G.; McKean, D. R.; Tompkins, T.; Clecak, Nicholas; Michl, J.; Downing, J. “Semiempirical Calculations of Electronic Spectra: Utility in the Design of Mid-UV Sensitizers,” Org.Coat.& Appl.Poly.Sci.Proc. 48 54-57 (1983)
39.
(40)		 Thompson, L. F.; Willson, C. G.; and Bowden, M. J. “,” Introduction to Microlithography: Theory, Materials, and Processing, ACS Symposium Series 219 (1983)
40.
(30)		 Willson, C. Grant; “Organic Resist Materials - Theory and Chemistry,” ACS Sym.Ser. 219(3) 87-159 (1983)
41.
(33)		 Willson, Grant C.; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G. “Poly(Methyl a-Trifluoromethylacrylate) as a Positive Electron Beam Resist,” Polymer Eng.& Sci. 23(18) 1000-1003 (1983)
42.
(35)		 Willson, Grant C.; Miller, Robert; McKean, Dennis; Clecak, Nicholas; Tompkins, Terry; Hofer, Donald. “Design of a Positive Resist for Projection Lithography in the Mid-UV,” Polymer Eng.& Sci. 23(18) 1004-1011 (1983)
43.
(39)		 Willson, G. C.; Frechet, J. M. J.; and Farrall, M. J. “Chemical Modification of Poly(styrenesulfone),” Polym.Sci.& Technol. 21 25-31 (1983)
44.
(52)		 Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G. “Photochemistry of Ketone Polymers in the Solid Phase: Thin Film Studies of Vinyl Ketone Polymers,” Materials for Microlithography, ACS Symposium Series 266(19) 389-398 (1984)
45.
(56)		 Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G. “Photochemistry of Ketone Polymers. 18. Thin Film Studies of Vinyl Ketone Polymers,” Polym.Prep. 25(1) 296-297 (1984)
46.
(47)		 Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant; Neureuther, Andrew R. “Contrast enhanced UV lithography with polysilanes,” Advances in Resist Technology, Proc.SPIE 469 108-116 (1984)
47.
(48)		 Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant. “Polysilane bilayer UV lithography,” Advances in Resist Technology, Proc.SPIE 469 16-23 (1984)
48.
(44)		 Ito, Hiroshi ; Willson, C. Grant “Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing,” ACS Sym.Ser. 212(2) 11-23 (1984)
49.
(57)		 Ito, H. ; Willson, C. G.; Frechet, J. M. J.; Farrall, M. J.; Eichler, E. “Synthesis of Poly(p-hydroxy-a-methylstyrene),” Polym.Prep. 25(1) 158-159 (1984)
50.
(51)		 MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E. “Radiolysis of Poly(isopropenyl t-butyl ketone),” Materials for Microlithography, ACS Symposium Series 266(7) 179-186 (1984)
51.
(59)		 MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E. “Radiolysis of Poly(t-butylisopropenyl ketone),” Polym.Prep. 25(1) 298-299 (1984)
52.
(46)		 Miller, R. D.; McKean, D. R.; Tompkins, T. L.; Clecak, Nicholas; Willson, C. Grant. Michl, J., and Downing, J. “Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers,” Polymers in Electronics, ACS Sym.Ser. 243(3) 25-40 (1984)
53.
(54)		 Miller, R. D.; Hofer, D.; Willson, C. G. “Soluble Polysilanes: A New Class of Radiation Sensitive Polymers,” Polym.Prep. 25(1) 307-308 (1984)
54.
(58)		 Miller, R. D.; Hofer, D.; McKean, D. R.; Willson, C. G.; West, R.; Trefonas, P. T. “Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers,” Materials for Microlithography, ACS Symposium Series(14) 293-310 (1984)
55.
(50)		 Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H. “Application of the Photo-Fries Rearrangement to Polymeric Imaging Systems,” Polym.Prep. 25(1) 313-314 (1984)
56.
(53)		 Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H. “The Photo-Fries Rearrangement and Its Use in Polymeric Imaging Systems,” Materials for Microlithography, ACS Symposium Series 266(13) 269-292 (1984)
57.
(49)		 Thompson, L. F.; Willson, C. G.; Fréchet, J. M. J. “,” (ed.) Materials for Microlithography: Radiation-Sensitive Polymers, ACS Symposium Series 266 (1984)
58.
(45)		 Willson, C. Grant; Ito, Hiroshi; MacDonald, Scott. “Resist Materials: A View of the Future,” SEMI (1984)
59.
(55)		 Willson, C. Grant; “Advances in Resist Technology,” Proc.SPIE 469 195-201 (1984)
60.
(63)		 Fréchet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G. “Chemical Amplification in the Design of Radiation-Sensitive Polymers,” Society of Plastic Engineers, Inc. (1985)
61.
(67)		 Fréchet, Jean M. J.; Tessier, T. G.; Willson, C. Grant; Ito, Hiroshi. “Poly[p-(formyloxy)styrene]: Synthesis and Radiation-Induced Decarbonylation,” Macromolecules 18(3) 317-321 (1985)
62.
(69)		 Fréchet, J. M. J.; Houlihan, F. M.; Willson, C. G. “Polycarbonates Derived from o-Nitrobenzyl Glycidyl Ether: Synthesis and Radiation Sensitivity,” Polym.Mat.Sci.& Eng. 53 268-272 (1985)
63.
(70)		 Fréchet, J. M. J.; Bouchard, F.; Houlihan, F.; Kryczka, B.; Willson, C. G. “Novel Highly Substituted Polycarbonates: Synthesis and Properties of Polymers Derived from 1,4-bis-(2-hydroxy-2-propyl)benzyne and Analogs,” Polym.Mat.Sci.& Eng. 53 263-267 (1985)
64.
(71)		 Fréchet, Jean M. J.; Houlihan, Francis M.; Bouchard, F.; Kryczka, Boguslaw; Willson, C. Grant. “Design, Synthesis, and Study of Novel, Thermally Depolymerizable Polycarbonates,” J.Chem.Soc., Chem.Commun. 1514-1516 (1985)
65.
(60)		 Hinsberg, W. D.; Willson, C. Grant.; Kanazawa, K. K. “Use of a Quartz Crystal Microbalance Rate Monitor to Examine Photoproduct Effects of Resist Dissolution,,” Advances in Resist Technology and Processing II, Proc.SPIE 539 6-13 (1985)
66.
(65)		 Houlihan, F. ; Bouchard, F.; Frechet, J. M. J.; Willson, C. Grant. “Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, enols, and thiols with di-tert-butyl dicarbonate,” Canadian J.Chemistry 63(1) 153-162 (1985)
67.
(66)		 Hult, Anders. ; MacDonald, Scott A.; Willson, C. Grant. “Photoinitiated Interfacial Cationic Polymerization,” Macromolecules 18(10) 1804-1809 (1985)
68.
(62)		 MacDonald, Scott A.; Labadie, Jeff W.; Willson, C. Grant. “Organotin Polymers: Synthesis and Resist Properties,” Polymer Preprints 26(2) 343-344 (1985)
69.
(64)		 MacDonald, Scott A.; Ito, Hiroshi; Hiraoka, Hiroyuki; Willson, C. Grant. “A New Oxygen Plasma Developable UV Sensitive Resist,” Photopolymers Principles--Processes and Materials , Technical Papers, Regional Technical Conference, 177-196 (1985)
70.
(68)		 MacDonald, Scott A.; Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant. “Resist Materials,” Microelectronic Engineering 3(104) 277-278 (1985)
71.
(72)		 Neureuther, A. R.; Hofer, D.; Willson, C. G. “Design of Contrast Enhancement Processes for Optical Lithography,” Microcircuit Eng. 53-60 (1985)
72.
(61)		 Willson, C. Grant; Hult, A.; MacDonald, Scott A. “Photoinitiated Interfacial Cationic Polymerization,” Polym.Mat.Sci.& Eng. 52 339-344 (1985)
73.
(83)		 Allen, R. D.; MacDonald, S. A.; and Willson, C. Grant. “A One Layer MLR Resist,” Polym.Mat.Sci.& Eng. 55 290-291 (1986)
74.
(75)		 Fréchet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Eichler, Eva; Kryczka, Boguslav; Willson, C. Grant. “Design and synthesis of novel allylic and benzylic copolycarbonates susceptible to acidolytic or thermolytic depolymerization,” Makromol.Chem., Rapid Commun. 7(3) 121-126 (1986)
75.
(77)		 Fréchet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Kryczka, Boguslaw; Eichler, Eva; Clecak, Nicholas; Willson, C. Grant. “New Approach to Imaging Incorporating Chemical Amplification: Synthesis and Preliminary Evaluation of Novel Resists Based on Tertiary Copolycarbonates,” J.Imaging Sci. 30(2) 59-64 (1986)
76.
(80)		 Fréchet, Jean M. J.; Iizawa, Takashi; Bouchard, Francine; Stanciulescu, Maria; Willson, C. Grant; Clecak, Nicholas. “New Condensation Polymers as Resist Materials Capable of Chemical Amplification,” Polym.Mat.Sci.& Eng. 55 299-303 (1986)
77.
(78)		 Hinsberg, W. D.; Willson, C. Grant.; and Kanazawa, K. K. “Measurement of Thin-Film Dissolution Kinetics Using a Quartz Crystal Microbalance,” J.Elecrochem.Soc. 133(7) 1448-1451 (1986)
78.
(74)		 Houlihan, F. M.; Bouchard, F.; Fréchet, J. M. J.; Willson, C. Grant. “Thermally Depolymerizable Polycarbonates. 2. Synthesis of Novel Linear Tertiary Copolycarbonates by Phase-Transfer Catalysis,” Macromolecules 19(1) 13-19 (1986)
79.
(76)		 Ito, Hiroshi ; MacDonald, Scott A.; Willson, C. Grant; Moore, J. W.; Gharapetian, H. M.; Guillet, James E. “Reactivity and Polymerization of Isopropenyl tert-Butyl Ketone: A Twisted a,b-Unsaturated Enone,” Macromolecules 19(7) 1839-1844 (1986)
80.
(79)		 Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Organotin Polymers: Synthesis and Resist Properties,” J.Imaging Sci. 30(4) 169-173 (1986)
81.
(82)		 Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Poly(alkylnylstannanes): A new class of main chain organotin polymers,” Polymer Bulletin, Berlin, 16(5) 427-431 (1986)
82.
(85)		 MacDonald, S. A.; Allen, R. D.; Clecak, Nicholas; Willson, C. Grant.; Frechet, J. M. J. “A 2-layer resist system derived from trimethylsilystyrene,” Advances in Resist Technology and Processing III, Proc.SPIE 631 28-33 (1986)
83.
(87)		 MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. Grant. “A Single Layer, Multilevel Resist: Limited Penetration E-Beam Lithography,” Polym.Mat.Sci.& Eng.(2559) 721-723 (1986)
84.
(81)		 Miller, R. D.; Hofer, D.; Fickes, G. N.; Willson, C. Grant.; Marinero, E.; Trefonas, P.; West, R. “Soluble Polysilanes: An Interesting New Class of Radiation Sensitive Materials,” Polym.Eng.Sci. 26(16) 1129-1134 (1986)
85.
(86)		 Miller, R. D.; Fickes, G. N.; Hofer, D.; Sooriyakumaran, R.; Willson, C. Grant.; Guillet, J. E.; Moore, J. “Soluble Polysilanes for Lithography,” Polym.Mat.Sci.& Eng. 55 599-603 (1986)
86.
(73)		 Willson, Grant C.; Ito, Hiroshi; Fréchet, Jean M. J.; Tessier, Theodore G.; Houlihan, Francis M. “Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution,” J.Elecrochem.Soc. 133(1) 181-187 (1986)
87.
(84)		 Willson, C. G.; (ed.) “Advances in Resist Technology and Processing III,” Proc.SPIE 631 346 (1986)
88.
(88)		 Willson, C. G.; “Polymers in Microlithography,” Polym.Mat.Sci.& Eng. 55 1-2 (1986)
89.
(96)		 Allen, R. D.; MacDonald, S. A.; Willson, C. G. “A "One-Layer" Multilayer Resist,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(9) 101-109 (1987)
90.
(91)		 Fréchet, Jean M. J.; Bouchard, Francine; Eichler, Eva; Houlihan, Francis M.; Iizawa, Takashi; Kryczka, Boguslaw; Willson, C. Grant. “Thermally Depolymerizable Polycarbonates V. Acid Catalyzed Thermolysis of Allylic and Benzylic Polycarbonates: A New Route to Resist Imaging,” Polymer Journal 19(1) 31-49 (1987)
91.
(94)		 Fréchet, J. M. J.; Eichler, E.; Stanciulescu, M.; Iizawa, T.; Bouchard, F.; Houlihan, F. M.; Willson, C. G. “Acid-Catalyzed Thermolytic Depolymerization of Polycarbonates: A New Approach to Dry-Developing Resist Materials,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(12) 138-148 (1987)
92.
(95)		 Ito, Hiroshi ; Willson, C. Grant; Frechet, Jean M. J “Positive/negative mid UV resists with high thermal stability,” Advances in Resist Technology and Processing IV, Proc.SPIE, 771 24-31 (1987)
93.
(89)		 Jiang, Ying ; Fréchet, Jean M. J.; Willson, C. Grant. “Poly(vinyl-t-butyl carbonate)synthesis and thermolysis to poly(vinyl alcohol),” Polym.Bull.Berlin 17(1) 1-6 (1987)
94.
(98)		 Kutal, C. ; Willson, C. Grant. “Photoinitiated Cross-Linking and Image Formation in Thin Polymer Films Containing a Transition Metal Compound,” J.Elecrochem.Soc. 134(9) 138-148 (1987)
95.
(99)		 Kutal, C. ; Willson, C. G. “Crosslinking and Image Formation in Thin Polymer Films Containing a Photosensitive Transition Metal Compound,” J.Chem.Soc., Chem.Ed. 2280-2285 (1987)
96.
(100)		 Kutal, C. ; Willson, C. G. “Inorganic Photoinitiators for Photolithographic Applications,” Photochemistry and Photophysics of Coordination Compounds (Berlin) 307-312 (1987)
97.
(90)		 Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Polymerization of 1-(Trimethylstannyl)alkyl Methacrylates: A New Class of Organotin Polymers and a Novel Case of Degradative Chain Transfer to Polymer,” Macromolecules 20(1) 10-15 (1987)
98.
(102)		 Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “New Synthetic Approach to Organotin Polymers,” Proc.PMSE (Germany) 56 867 (1987)
99.
(97)		 MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. G. “A Single-Layer, Multilevel Resist: Limited-Penetration Elecron-Beam Lithography,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(29) 350-357 (1987)
100.
(92)		 Miller, R. D.; Hofer, D.; Rabolt, J.; Sooriyakumaran, R.; Willson, C. G.; Fickes, G. N.; Guillet, J. E.; Moore, J. “Soluble Polysilanes in Photolithography,” Polymers for High Technology--Electronics and Photonics, ACS Sym.Ser. 346(15) 170-187 (1987)
101.
(93)		 Turner, Richard S.; Ahn, K. D.; Willson, C. G. “Thermally Stable, Deep-UV Resist Materials,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(17) 200-210 (1987)
102.
(101)		 Willson, C. G.; Miller, R. D.; McKean, D. R.; Pederson, L. A. “New Diazoketone Dissolution Inhibitors for Deep UV Photolithography,” Advances in Resist Technology and Processing IV, Proc.SPIE 771 2-11 (1987)
103.
(113)		 Fréchet, Jean M. J.; Kallman, Neil; Kryczka, Boguslav; Eichler, Eva; Houlihan, Francis M.; Willson, C. Grant. “Novel derivatives of poly(4-hydroxystyrene) with easily removable teriary, allylic, or benzylic ethers,” Polym.Bull.Berlin 20(5) 427-434 (1988)
104.
(106)		 Hinsberg, William D.; MacDonald, Scott A.; Pederson, L.; Willson, C. Grant. “Zero-Misalignment Lithographic Process Using a Photoresist with Wavelength-Selected Tone,” Advances in Resist Technology and Processing V, Proc.SPIE 920 2-12 (1988)
105.
(107)		 Hinsberg, W. D.; MacDonald, S. A.; Pederson, L.; Willson, C. G. “Self-Aligning Lithography using a Dual-Tone Resist: A Lithographic Analogue of Color Photography,” Photo.Sci.& Eng. 94-97 (1988)
106.
(109)		 Ito, H. ; Pederson, L. A.; MacDonald, S. A.; Cheng, Y. Y.; Lyerla, J. R.; Willson, C. G. “A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System,” J.Elecrochem.Soc. 135(6) 1504-1508 (1988)
107.
(111)		 Iwayanagi, Takao ; Ueno, Takumi; Nonogaki, Saburo; Ito, Hiroshi; Willson, C. Grant. “Materials and Processes for Deep-UV Lithography,” Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS 218(3) 109-224 (1988)
108.
(105)		 McKean, Dennis R.; MacDonald, Scott A.; Clecak, Nicholas J.; Willson, C. Grant. “Novolac based deep-UV resists,” Advances in Resist Technology and Processing V, Proc.SPIE 920 60-66 (1988)
109.
(103)		 Neureuther, Andrew R.; Willson, C. Grant. “Reduction in x-ray lithography shot noise exposure limit by dissolution phenomena,” J.Vac.Sci.Technol.B 6(1) 167-173 (1988)
110.
(114)		 Seligson, Daniel ; Ito, Hiroshi; Willson, C. Grant. “The impact of high-sensitivity resist materials on x-ray lithography,” J.Vac.Sci.Technol.B 6(6) 2268-2273 (1988)
111.
(104)		 Umbach, C. P.; Broers, A. N.; Willson, C. G.; Koch, R.; Laibowitz, R. B. “Nanolithography with an acid catalyzed resist,” J.Vac.Sci.Technol.B 6(1) 319-322 (1988)
112.
(110)		 Umbach, C. P.; Broers, A. N.; Koch, R.; Willson, C. G.; Laibowitz, R. B. “Nanolithography with a high-resolution STEM,” IBM J.Res.Develop. 32(4) 454-461 (1988)
113.
(108)		 Willson, G. C.; Schellenberg, F. M.; Sperley, K. M.; Brock, P. J.; Levenson, M. D. “Photodeformable polymer system for holography,” CLEO Conf.Lasers Electro Opt., Tech.Dig. 7 198 (1988)
114.
(112)		 Willson, Grant C.; Bowden, Murrae “Organic Resist Materials,” Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS 218(2) 75-108 (1988)
115.
(128)		 Eich, Manfred ; Reck, Berndt; Yoon, Do Y.; Willson, C. Grant; Bjorklund, Gary C. “Novel second-order nonlinear optical polymers via chemical cross-linking-induced vitrification under electric field,” J.Applied Physics 66(7) 3241-3247 (1989)
116.
(115)		 Fréchet, Jean M. J.; Eichler, Eva; Gauthier, Sylvie; Kryczka, Boguslav; Willson, C. G. “Imaging Processes Based on Side-Chain Modification of Polymers: Synthesis and Study of Allylic and Benzylic Ethers Derived from Poly(vinylphenols),” The Effects of Radiation on High-Technology Polymers, ACS Symposium Series 381(10) 155-171 (1989)
117.
(118)		 Fréchet, Jean M. J.; Willson, C. Grant; Iizawa, T.; Nishikubo, T.; Igarashi, K.; Fahey, J. “New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals,” Polymers in Microlithography: Materials and Processes, ACS Symposium Series 412(7) 100-112 (1989)
118.
(119)		 Fréchet, Jean M. J.; Matuszczak, Steven; Willson, C. Grant; Reck, B. “Nonswelling Negative Resists Incorporating Chemical Amplification,” Polymers in Microlithography: Materials and Processes, ACS Symposium Series 412(5) 74-85 (1989)
119.
(120)		 Fréchet, J. M. J.; Matuszczak, S.; Reck, B.; Willson, C. G. “Photocrosslinking Based on Electrophilic Aromatic Substitution and its Application to Resists Incorporating Chemical Amplification,” Polym.Mat.Sci.& Eng. 60 147-150 (1989)
120.
(122)		 Fréchet, J. M. J.; Stanciulescu, M.; Iizawa, T.; Willson, C. G. “Self-Developing Imaging Systems Based on Polyesters and Polyethers,” Polym.Mat.Sci.& Eng. 60 170-173 (1989)
121.
(123)		 Fréchet, J. M. J.; Fahey, J.; Willson, C. G.; Iizawa, T.; Nishikubo, T. “Synthesis of Polyformals and Their Use as Dry-Developing Imaging Systems,” Polym.Mat.Sci.& Eng. 60 174-178 (1989)
122.
(132)		 Fréchet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G. “Chemical Amplification in the Design of Radiation-Sensitive Polymers,” Functional Polymers, Proc.IUCCP Sym. 6 193-200 (1989)
123.
(131)		 Green, M. M.; Reidy, M. P.; Johnson, R. J.; Darling, G.; O'Leary, D. J.; Willson, C. G. “Macromolecular Stereochemistry: The Out-of-Proportion Influence of Optically Active Comonomers on the Conformational Characteristics of Polyiscyanates,” Journal of the American Chemical Society 111 3452 (1989)
124.
(125)		 Hinsberg, W. D.; MacDonald, S. A.; Pederson, L. A.; Willson, C. G. “A Lithographic Analog of Color Photography: Self-Aligning Photolithography Using a Resist with Wavelength-Dependent Tone,” J.Imaging Sci. 33(4) 129-135 (1989)
125.
(121)		 Kutal, C. ; Willson, C. G. “Photosensitive materials for imaging applications,” J.Inf.Rec.Mater. 17(5/6) 373-378 (1989)
126.
(126)		 Kutal, Charles ; Weit, Scott K.; Willson, C. Grant. “New inorganic photoinitiators for deep-UV resist materials,” Polym.Mat.Sci.& Eng. 61 412-416 (1989)
127.
(124)		 Reck, B. ; Allen, R. D.; Twieg, R. J.; Willson, C. G. Matuszczak, S., Stover, H. D. H., Li, N. H., and Fréchet, J. M. J. “Novel Photoresist Design Based on Eletrophilic Aromatic Substitution,” Polym.Eng.Sci. 29(14) 960-964 (1989)
128.
(129)		 Reck, Berndt ; Eich, Manfred; Jungbauer, Dietmar; Twieg, Robert J.; Willson, C. Grant; Yoon, Do Y.; Bjorklund, Gary C. “Crosslinked epoxy polymers with large and stable nonlinear optical susceptibilities,” Nonlinear Optical Properties of Organic Materials II, Proc.SPIE 1147(2) 74-83 (1989)
129.
(133)		 Schellenberg, F. M.; Willson, C. G.; Levenson, M. D.; Sperley, K. M.; Brock P. J. “Photosensitized Polystyrene as a High Efficiency Relief Hologram Medium,” Practical Holography III, Proc.SPIE 1051 31-43 (1989)
130.
(127)		 Stover, H. ; Matuszczak, S.; Chin, R.; Shimizu, K.; Willson, C. G.; Fréchet, J. M. J. “Acid-Catalyzed Rearrangement of Aromatic Ethers: Model Studies and Application to Imaging,” Polym.Mat.Sci.& Eng. 61 412-416 (1989)
131.
(116)		 Willson, Grant C.; Bowden, Murrae J. “Resist materials for microelectronics (Part 1),” Chemtech 19(2) 102-111 (1989)
132.
(117)		 Willson, Grant C.; Bowden, Murrae J. “Recent advances in organic resist materials (Part 2),” Chemtech 19(3) 182-189 (1989)
133.
(130)		 Willson, Grant C.; “Proceedings of The Almaden Symposium 4th International Conference on Unconventional Photoactive Solids,” 183 511 (1989)
134.
(142)		 Bjorklund, G. C.; Ducharme, S.; Jungbauer, D.; Moerner, J. D.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D. “Organic Nonlinear Optical Materials for Frequency Doubling, Modulation, and Switching,” Proc.Symp.Optics & Electronics for Organic Materials (1990)
135.
(136)		 Brock, Phillip J.; Willson, C. Grant; Swalen, Jerome D.; Jurich, Mark C.; Miller, Robert D.; Clecak, Nick J.; Logan, Tony; Frechet, J. M. J. “Generation of Optical Disk Servo Patterns by Lithographic Imaging of Photodeformable Polymers,” Optical Data Storage, Proc.SPIE 1316 235-247 (1990)
136.
(137)		 Fréchet, J. M. J.; Kryczka, B.; Matuszczak, S.; Reck, B.; Stanciulescu, M.; Willson, C. G. “Chemically Amplified Imaging Materials Based on Acid-Catalyzed Reactions of Polyesters or Electrophilic Crosslinking Processes,” J.Photopolym.Sci.& Tech 3(3) 235-247 (1990)
137.
(139)		 Jungbauer, D. ; Reck, B.; Twieg, R.; Yoon, D. Y.; Willson, C. G.; Swalen, J. D. “Highly efficient and stable nonlinear optical polymers via chemical crosslinking under electric field,” Appl.Phys.Lett. 56(26) 2610-2612 (1990)
138.
(147)		 Kapitza, Heinrich ; Zentel, Rudolf; Twieg, Robert J.; Nguyen, Cattien; Vallerien, Sven Uwe; Kremer, Friedrich; Willson, C. Grant. “Ferroelectric Liquid Crystalline Polysiloxanes with High Spontaneous Polarization and Possible Applications in Nonlinear Optics,” Advanced Materials 2(11) 539-543 (1990)
139.
(140)		 Kutal, Charles ; Weit, Scott K.; MacDonald, Scott A.; Willson, C. Grant. “New Inorganic Photoinitiators For Deep-UV Resist Materials,” J.Coat.Technol. 62(786) 63-67 (1990)
140.
(135)		 Maltabes, John G.; Holmes, Steven J.; Morrow, James R.; Barr, Roger L.; Hakey, Mark; Reynolds, Gregg; Brunsvold, William R.; Willson, C. Grant; Clecak, Nick; MacDonald, Scott; Ito, Hiroshi. “1X Deep UV Lithography With Chemical Amplification for 1-Micron DRAM Production,” Advances in Resist Technology and Processing VII, Proc.SPIE 1262 2-7 (1990)
141.
(138)		 McKean, Dennis R.; Hinsberg, William D.; Sauer, Thomas P.; Willson, C. Grant; Vicari, Richard; Gordon, Douglas J. “Methylated poly(4-hydroxystyrene) - A new resin for deep-ultraviolet resist application,” J.Vac.Sci.Technol.B 1466-1469 (1990)
142.
(144)		 McKean, Dennis R.; MacDonald, Scott A.; Johnson, Robert D.; Clecak, Nicholas J.; Willson, C. Grant. “Characterization of a Novolac-Based Three-Component Deep-UV Resist,” Chem.Mater. 2(5) 619-624 (1990)
143.
(145)		 McKean, D. R.; Sauer, T. P.; Hinsberg, W. D.; Willson, C. G. “Synthesis, Characterization, and Lithographic Behavior of Methylated Poly(4-hydroxystyrene),” Polym.Prep. 31(2) 599-600 (1990)
144.
(141)		 Page, R. H.; Jurich, M. C.; Reck, B.; Sen, A.; Twieg, R. J.; Swalen, J. D.; Willson, C. G. “Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films,” J.Opt.Soc.Am.B 7(7) 1239-1250 (1990)
145.
(146)		 Pawlowski, G. ; Sauer, T.; Dammel, R.; Gordon, D. J.; Hinsberg, W.; McKean, D.; Lindley, C. R.; Merrem, H.-J.; Roschert, H.; Vicari, R.; Willson, C. G. “Modified Polyhydroxystyrenes as Matrix Resins for Dissolution Inhibition Type Photoresists,” Advances in Resist Technology and Processing VII, Proc.SPIE 1262 391-400 (1990)
146.
(143)		 Swalen, J. D.; Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Moerner, W. E.; Smith, B. A.; Twieg, R.; Yoon, D.; Willson, C. G. “Organic nonlinear optical materials and their device applications for frequency doubling, modulation, and switching,” Nonlinear Optical Properties of Organic Materials III, Proc.SPIE 1337 2-11 (1990)
147.
(134)		 Willson, G. C.; MacDonald, S. A.; Ito, H.; Frechet, J. M. J. “Recent Progress in Organic Resist Materials,” Polym.for Microelec.(1) 3-18 (1990)
148.
(149)		 Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Jungbauer, D.; Moerner, W. E.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D. “Applications of Organic Second Order Nonlinear Optical Materials,” Materials for nonlinear optics: chemical perspectives, ACS Sym.Ser.(13) 216-225 (1991)
149.
(169)		 Ebert, M. ; Lux, M.; Smith, B. A.; Twieg, R.; Willson, C. G.; Yoon, D. Y. “Nonlinear Optical Properties of Linear Epoxy Polymers with Pendant Sulfonyl Tolan Groups,” Polym.Prep. 32(3) 130-131 (1991)
150.
(150)		 Embs, F. W.; Neher, D.; Wegner, G.; Miller, R. D.; Sooriyakumaran, R.; Willson, C. G. “Preparation of Oriented Mono and Multilayers of Poly(bis-butoxyphenylsilane) by the Langmuir-Blodgett-Technique,” Polym.Prep. 31(2) 298-299 (1991)
151.
(161)		 Embs, F. W.; Wegner, G.; Neher, D.; Albouy, P.; Miller, R. D.; Willson, C. G.; Schrepp, W. “Preparation of Oriented Multilayers of Poly(silane)s by the Langmuir-Blodgett Technique,” Macromolecules 24(18) 5068-5075 (1991)
152.
(154)		 Fahey, J. T.; Fréchet, J. M. J.; Clecak, N.; Willson, C. G. “Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles,” Polym.Mat.Sci.& Eng. 64 241-269 (1991)
153.
(163)		 Fréchet, J. M. J.; Matuszczak, S.; Lee, S. M.; Fahey, J.; and Willson, C. G. “Chemically Amplified Resists Based on Polymer Side-Chain Rearrangement or Electrophilic Crosslinking,” Photopolymers: Principles - Processes and Materials, Society of Plastic Engineers, Inc. 31-40 (1991)
154.
(164)		 Fréchet, Jean M. J.; Matuszczak, Steven; Reck, Berndt; Stover, Harald D. H.; Willson, C. Grant. “Chemically Amplified Imaging Materials Based on Electrophilic Aromatic Substitution: Poly[4-(acetoxymethyl)styrene-co-4-(hydroxy)styrene],” Macromolecules 24(8) 1746-1754 (1991)
155.
(162)		 Johannsmann, D. ; Embs, F.; Willson, C. G.; Wegner, G.; Knoll, W. “Visco-elastic properties of thin films probed with a quartz crystal resonator,” Makromol.Chem., Makromol.Symp. 46 247-251 (1991)
156.
(158)		 Jungbauer, D. ; Teraoka, I.; Yoon, D. Y.; Reck, B.; Swalen, J. D.; Twieg, R.; Willson, C. G. “Second-order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores,” J.Applied Physics 69(12) 8011-8017 (1991)
157.
(152)		 Kutal, Charles ; Weit, Scott K.; Allen, Robert D.; MacDonald, Scott A.; Willson, C. Grant. “Novel Base-Generating Photoinitiators for Deep-UV Lithography,” Advances in Resist Technology and Processing VIII, Proc.SPIE 1466 362-367 (1991)
158.
(148)		 MacDonald, Scott A.; Schlosser, Hubert; Ito, Hiroshi; Clecak, Nicholas J.; Willson, C. Grant. “Plasma-Developable Photoresist Systems Based on Chemical Amplification,” Chem.Mater. 3 435-442 (1991)
159.
(153)		 MacDonald, S. A.; Clecak, N. J.; Wendt, H. R.; Willson, C. G.; Snyder, C. D.; Knors, C. J.; Deyoe, N. B.; Maltabes, J. G.; Morrow, J. R.; McGuire, A. E.; Holmes, S. J. “Airborne Chemical Contamination of a Chemically Amplified Resist,” Advances in Resist Technology and Processing VIII, Proc.SPIE 1466 2-12 (1991)
160.
(159)		 Matuszczak, Steven ; Cameron, James F.; Fréchet, Jean M. J.; Willson, C. Grant. “Photogenerated Amines and their Use in the Design of a Positive-tone Resist Material based on Electrophilic Aromatic Substitution,” J.Mater.Chem. 1(6) 1045-1050 (1991)
161.
(168)		 Neher, D. ; Mittler-Neher S.; Cha, M.; Stegeman, G.; Embs, F. W.; Wegner, G.; Miller, R. D.; Willson, C. G. “Determination of the Orientational Order Parameters , in a Polysilane LB Film via Polarization Dependent THG,” Nonlinear Optical Properties of Organic Materials IV, Proc.SPIE 1560 335-343 (1991)
162.
(165)		 Stöver, Harald D. H.; Matuszczak, Steven; Willson, C. Grant; Fréchet, Jean M. J. “Design of Polymeric Imaging Materials Based on Electrophilic Aromatic Substitution: Model Studies,” Macromolecules 24(8) 1741-1745 (1991)
163.
(167)		 Swalen, J. D.; Bjorklund, G. C.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Jurich, M.; Moerner, W. E.; Reck, B.; Smith, B. A.; Twieg, R.; Willson, C. G.; Zentel, R. “Poled Epoxy Polymers for Optoelectronics,” Organic Molecules for Nonlinear Optics and Photonics 94 433-445 (1991)
164.
(151)		 Teraoka, I. ; Jungbauer, D.; Reck, B.; Yoon, D. Y.; Twieg, R.; Willson, C. G. “Stability of nonlinear optical characteristics and dielectric relaxations of poled amorphous polymers with main-chain chromophores,” J.Applied Physics 69(4) 2568-2576 (1991)
165.
(157)		 Twieg, R. ; Bjorklund, G.; Eich, M.; Herminghaus, S.; Jungbauer, D.; Reck, B.; Smith, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D.; Zentel, R. “Polymeric Nonlinear Optoelectronic Materials, Challenges and Opportunities,” Polym.Mat.Sci.& Eng. 64 66-67 (1991)
166.
(166)		 Twieg, R. ; Burland, D.; Lux, M.; Moylan, C.; Nguyen, C.; Walsh, P.; Willson, C. G.; Zentel, R. “Synthetic Approaches to NLO Polymers,” Polym.Prep. 32(3) 80-81 (1991)
167.
(156)		 Willson, Grant C.; “Advances in Organic Resist Materials,” Polym.Mat.Sci.& Eng. 64 18-20 (1991)
168.
(160)		 Yoon, D. Y.; Jungbauer; D., Teraoka, I.; Reck, B.; Zentel, R.; Twieg, R.; Swalen, J. D.; and Willson, C. G. “Second-Order NLO and Relaxation Properties of Poled Polymers,” Polym.Prep. 32(3) 102-104 (1991)
169.
(155)		 Zentel, Rudolf ; Willson, C. Grant “New photoresists based on poly(trans-1,2-cyclohexylene diisocyanate),” Makromol.Chem., Rapid Commun. 12(8) 513-516 (1991)
170.
(172)		 Betterton, K. ; Ebert, M.; Haeussling, L.; Lux, M. G.; Twieg, R. J.; Willson, C. G.; Yoon, D. “Strategies for Crosslinking NLO-Polymers Across the Chromophore,” Proc.Am.Chem.Soc. 66 312-313 (1992)
171.
(171)		 Fréchet, J. M. J.; Lee, S. M.; Matuszczak, S.; Shacham-Diamand, Y.; MacDonald, S. A.; Willson, C. G. “Novel Chemically Amplified Dry-Developing Imaging Materials for High Resolution Microlithography,” Journal of Photopolymer Science and Technology 5(1) 17-30 (1992)
172.
(173)		 MacDonald, Scott A.; Schlosser, Hubert; Clecak, Nicholas J.; Willson, C. Grant. “A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal,” Chem.Mater. 4 1364-1368 (1992)
173.
(176)		 Twieg, R. ; Ebert, M.; Jungbauer, D.; Lux, M.; Reck, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D. Y.; Zentel, R. “Nonlinear Optical Epoxy Polymers with Polar Tolan Chromophores,” Mol.Cryst.Liq.Cryst. 217 19-24 (1992)
174.
(174)		 Wallraff, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturtevant, J. L. “A Chemically Amplified Photoresist for Visible Laser Direct Imaging,” J.Imaging Sci. 36(5) 468-476 (1992)
175.
(175)		 Wallraff, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturtevant, J. L. “A Chemically Amplified Photoresist for Visible Laser Direct Imaging,” Polym.Mat.Sci.& Eng. 66 49-51 (1992)
176.
(170)		 Zentel, R. ; Poths, H.; Kremer, F.; Jungbauer, D.; Twieg, R.; Willson, C. G.; Yoon, D. “Polymeric Liquid Crystals: Structural Basis for Ferroelectric and Nonlinear Optical Properties,” Polymers for Advanced Technologies 3 211-217 (1992)
177.
(177)		 Fahey, J. T.; Shimizu, K.; Fréchet, J. M. J.; Clecak, N.; Willson, C. G. “Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles,” Journal of Polymer Science, Part A: Polymer Chemistry 31(1) 1-11 (1993)
178.
(179)		 Fréchet, J. M. J.; Cameron, J. F.; Chung, C. M.; Haque, S. A.; Willson, C. G. “Photogenerated Base as Catalyst for Imidization Reactions: A new design of photosensitive polymers,” Polym.Bull.Berlin 30 369-375 (1993)
179.
(180)		 Leung, Man-kit ; Fréchet, Jean M. J.; Cameron, James F.; Willson, C. Grant. “Photogenerated base and chemical amplification: a new resist based on catalyzed decarboxylation,” Polym.Mat.Sci.& Eng. 68 30-31 (1993)
180.
(178)		 MacDonald, Scott A.; Hinsberg, William D.; Wendt, H. Russell; Clecak, Nicholas J.; Willson, C. Grant; Snyder, Clinton D. “Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem,” Chem.Mater. 5 348-356 (1993)
181.
(182)		 Willson, C. G.; Cameron, J. F., MacDonald, S. A., Niesert, C. P., Frechet, J. M. J., Leung, M. K., and Ackmann, A. “Recent Advances in Chemically Amplified Resist Materials,” Polym.Mat.Sci.& Eng., Proc.ACS 68 60 (1993)
182.
(183)		 Willson, C. G.; Cameron, J. F.; MacDonald, S. A.; Niesert C.-P.; Fréchet, J. M. J.; Leung, M. K., Ackmann, A. “Resist Materials Design: Base-catalyzed Chemical Amplification,” Advances in Resist Technology and Processing X, Proc.SPIE 1925 354-365 (1993)
183.
(181)		 Zentel, Rudolf ; Jungbauer, Dietmar; Twieg, Robert J.; Yoon, Do Y.; Willson, C. Grant. “Synthesis and non-linear optical characteristics of crosslinked and linear epoxy polymers with pendant tolane chromophores,” Makromol.Chem. 194 859-868 (1993)
184.
(185)		 Lee, Ming S.; Fréchet, Jean M. J.; Willson, C. Grant. “Photocrosslinking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities,” Macromolecules 27 5154 (1994)
185.
(184)		 MacDonald, Scott A.; Willson, C. Grant; Fréchet, Jean M. J. “Chemical Amplification in High-Resolution Imaging Systems,” Accounts of Chemical Research 27(6) 151-158 (1994)
186.
(189)		 Ahn, Kwang-Duk ; Willson, C. Grant. “Synthesis of Polymers Having N-Hydroxymaleimide Units by Thermolysis of N-(Isopropyloxycarbonyloxy)maleimide Polymers,” Bull.Korean Chem.Soc. 16(5) 443-449 (1995)
187.
(191)		 Ahn, Kwang-Duk ; Koo, Deok-II; Willson, C. Grant. “Synthesis and polymerization of t-BOC protected maleimide monomers: N-(t-butyloxycarbonyloxy)maleimide and N-[p-(t-butyloxycarbonyloxy)phenyl]-maleimide,” Polymer 36(13) 2621-2628 (1995)
188.
(195)		 Brown, Smart ; Ackmann, Paul; Wenner, Val; Lowell, John; Ostrout, Wayne; Willson, C. Grant. “Passive evaluation of surface and bulk ionic deposition from resist removal using surface photovoltage,” Proc.SEMI/IEEE Advanced Semiconductor Manufacturing Conference and Workshop (ASMC) 316-321 (1995)
189.
(192)		 Cameron, James F.; Willson, C. Grant; Fréchet, Jean M. J. “New Photolabile Amino Protecting Groups: Photogeneration of Amines from [(3',5'-Dimethoxybenzoinyl)oxy]carbonyl Carbamates,” J.Chem.Soc., Chem.Commun. 923-924 (1995)
190.
(190)		 Leung, Man-kit ; Fréchet, Jean M. J.; Cameron, James F.; Willson, C. Grant. “Design and Synthesis of Photoactive Polymer Systems Base on Amine-Catalyzed Intramolecular Imidization of Polymer Side Chains,” Macromolecules 28(13) 4693-4700 (1995)
191.
(196)		 McKean, Dennis R.; Russell, Thomas P.; Hinsberg, William D.; Hofer, Don; Renaldo, Alfred E.; Willson, C. Grant. “Thick film positive photoresist. Development and resolution enhancement technique,” J.Vac.Sci.Technol.B 13(6) 3000-3006 (1995)
192.
(186)		 Renaldo, Alfred F.; Lauchlan, Laurie J., Hofer, Donald C., Hinsberg, William D., McKean, Dennis R., Santini, Hugo A., and Willson, C. Grant. “Lithographic performance of a positive photoresist for thick-film applications,” Advances in Resist Technology and Processing XII, Proc.SPIE 2438 853-866 (1995)
193.
(187)		 Tsiartas, Pavlos C.; Simpson, Logan L.; Qin, Anwei; Willson, C. Grant; Krukonis, Val J.; Gallagher-Wetmore, P. M. “Effect of Molecular Weight Distribution on the Dissolution Properties of Novolac Blends,” Advances in Resist Technology and Processing XII, Proc.SPIE 2438 261-271 (1995)
194.
(188)		 Tsiartas, P. C.; Simpson, L. L.; Willson, C. G.; Allen, R. D.; Krukonis, V. J. Gallagher-Wetmore, P. M. “Molecular weight, ionic strength and temperature effects on the dissolution rate of low molecular weight Novolac fractions,” Proc.PMSE 72 209 (1995)
195.
(193)		 Willson, Grant C.; Herr, Daniel. “Advances in photoresists will require coordinated university research effort,” Solid State Technology 199-200 (1995)
196.
(194)		 Willson, G. C.; “Polymeric photoimaging materials,” Proc.PMSE 73 455 (1995)
197.
(204)		 Allen, Robert D.; Sooriyakumaran, Ratnam; Opitz, Juliann; Wallraff, Gregory M.; DiPietro, Richard A.; Breyta, Gregory; Hofer, Donald C.; Kunz, Roderick R.; Jayaraman, Saikumar; Shick, Robert; Goodall, Brian; Okoroanyanwu, Uzodinma; and Willson, C. Grant. “Protecting Groups for 193-nm Photoresists,” Advances in Resist Technology and Processing XIII, Proc.SPIE 2724 334-343 (1996)
198.
(205)		 Allen, R. D.; Sooriyakumaran, R.; Opitz J.; Wallraff G. M.; Breyta G.; DiPietro R. A.; Hofer D. C.; Okoroanyanwu U. and Willson C. G. “Progress in 193 nm Positive Resists,” Journal of Photopolymer Science and Technology 9(3) 465-474 (1996)
199.
(200)		 Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J. “Design and development of new photobase generators derived from a-keto carbamates,” Polym.Mat.Sci.& Eng., Proc.ACS 74 284-285 (1996)
200.
(201)		 Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J. “Photogeneration of amines from a-keto carbamates: New photocatalysis for polymer modification,” Polym.Mat.Sci.& Eng., Proc.ACS 74 323-324 (1996)
201.
(202)		 Cameron, James F.; Willson, C. Grant; Fréchet, Jean M. J. “Photogeneration of Amines from a-Keto Carbamates: Photochemical Studies,” Journal of the American Chemical Society 118(51) 12925-12937 (1996)
202.
(197)		 Henderson, Clifford L.; Tsiartas, Pavlos C.; Simpson, Logan L.; Clayton, Kelly D.; Pancholi, Sanju; Pawloski, Adam R.; Willson, C. Grant. “Factors Affecting the Dissolution Rate of Novolac Resins II: Developer Composition Effects,” Advances in Resist Technology and Processing XIII, Proc.SPIE 2724 481-490 (1996)
203.
(198)		 Lin, Quinhuang ; Simpson, Logan; Steinhäusler, Thomas; Wilder, Michelle; Willson, C. Grant; Havard, Jennifer; Fréchet, Jean M. J. “Water-Soluble Resist for "Environmentally Friendly" Lithography,” Metrology, Inspection, and Process Control for Microlithography X, Proc.SPIE 2725 308-318 (1996)
204.
(199)		 Willson, C. G.; Cameron, J. F.; Frechet, J. M. J. “Photogeneration of amines and application to chemically amplified resist design,” Polym.Mat.Sci.& Eng., Proc.ACS 74 437 (1996)
205.
(203)		 Willson, C. G.; “Comments on,” Journal of Polymer Science, Part A: Polymer Chemistry 34 3229-3230 (1996)
206.
(206)		 Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang. “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc.SPIE 3051 529-540 (1997)
207.
(220)		 Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; Henke, Wolfgang. “Influence of optical nonlinearities of photoresists on the photolithographic process: applications,” Emerging Lithographic Technologies, Proc.SPIE 3048 (1997)
208.
(232)		 Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc. SPIE 3051 529-540 (1997)
209.
(224)		 Ficner, Stanley ; Dammel, Ralph R.; Perez, Yvette; Gardiner, Allen; Willson, C. Grant. “Refractive Indices In Thick Photoresist Films As A Function Of Bake Conditions And Film Exposures,” Proc.SPIE 3049 838-849 (1997)
210.
(211)		 Fréchet, Jean M. J.; Leung, Man-kit; Urankar, Edward J.; Willson, C. Grant; Cameron, James F.; MacDonald, Scott A.; Niesert, Claus P. “Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation,” Chem.Mater. 9(12) 2887-2893 (1997)
211.
(213)		 Gardiner, Allen B.; Qin, Anwei; Henderson, Clifford L.; Pancholi, Sanju; Koros, William J.; Willson, C. Grant; Dammel, Ralph R.; Mack, Chris; Hinsberg, William D. “Diffusivity Measurements in Polymers II: Residual Casting Solvent Measurement by Liquid Scintillation Counting,” Proc.SPIE 3049 850-860 (1997)
212.
(223)		 Havard, Jennifer M.; Fréchet, Jean M. J.; Pasini, Dario; Mar, Brenda; Yamada, Shintaro; Medeiros, David; Willson, C. Grant. “Design of a positive tone water-soluble resist,” Proc.SPIE 3049 437-447 (1997)
213.
(216)		 Henderson, Clifford L.; Willson, C. Grant; Dammel, Ralph R.; Synowicki, Ron A. “Bleaching-Induced Changes in the Dispersion Curves of DNQ Photoresists,” Proc.SPIE 3049 585-595 (1997)
214.
(217)		 Henderson, Clifford L.; Pancholi, Sanju; Chowdhury, Sajed A.; Willson, C. Grant; Dammel, Ralph R. “Photoresist Characterization for Lithography Simulation Part 2: Exposure Parameter Measurements,” Proc.SPIE 3049 816-828 (1997)
215.
(218)		 Henderson, Clifford L.; Tsiartas, Pavlos C.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Willson, C. Grant; Dammel, Ralph R. “Photoresist Characterization for Lithography Simulation Part 3: Development Parameter Measurements,” Proc.SPIE 3049 805-815 (1997)
216.
(219)		 Henderson, Clifford L.; Tsiartas, Pavlos C.; Flanagin, Lewis W.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Chinwalla, Ammar N.; and Willson, C. Grant. “Photoresist Characterization for Lithography Simulation Part 4: Processing Effects on Resist Parameters,” Proc.SPIE 3049 212-223 (1997)
217.
(226)		 Leeson, Michael J.; Pawloski, Adam; Levering, Vrad; Yueh, Wang; and Willson, C. Grant. “Tailoring of a Photoactive Compound For Non-Chemically Amplified 248nm Resist Formulations,” Proc.SPIE 3049 861-870 (1997)
218.
(221)		 Lin, Quinhuang ; Steinhäusler, Thomas; Simpson, Logan; Wilder, Michelle; Medeiros, David R.; Willson, C. Grant; Havard, Jennifer; and Fréchet, Jean M. J. “A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist,” Chem.Mater. 9(8) 1725-1730 (1997)
219.
(228)		 Lin, Quinhuang ; Katnani, Ahmad; Willson, C. Grant. “Effects of Crosslinking Agent on Lithographic Performance of Negative-Tone Resists Based on Poly(p-hydroxystyrene),” Proc.SPIE 3049 974-987 (1997)
220.
(212)		 Mack, C. A.; Mueller, K. E.; Gardiner, A. B.; Qiu, A.; Dammel, R. R.; Koros, W. G.; Willson, C. G. “Diffusivity Measurements in Polymers, Part 1: Lithographic Modeling Results,” Proc.SPIE 3049 355-362 (1997)
221.
(208)		 McAdams, Christopher L.; Tsiartas, Pavlos C., and Willson, C. Grant. “Structure-Function Correlation Studies of Dissolution Inhibitors for Novolac-based Photoresists,” Polym.Mat.Sci.& Eng. 77 437-438 (1997)
222.
(209)		 Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; Willson, C. Grant; Schröeder, U. Paul. “Synthesis, Polymorphism and Electro-optic Properties of a New Class of Ligated Twin Sc* Liquid Crystals,” Polym.Prep. 38(1) 412-413 (1997)
223.
(214)		 Mueller, Katherine E.; Koros, William J.; Wang, Yvonne Y.; and Willson, C. Grant. “Diffusivity Measurements in Polymers, Part III: Quartz Crystal Microbalance Techniques,” Proc.SPIE 3049 871-878 (1997)
224.
(215)		 Mueller, Katherine E.; Koros, William J.; Mack, Chris A.; and Willson, C. Grant. “Diffusivity Measurements in Polymers, Part IV: Acid Diffusion in Chemically Amplified Resists,” Proc.SPIE 3049 706-711 (1997)
225.
(229)		 Niu, Jason Q.; Fréchet, Jean M. J.; Okoroanyanwu, U.; Byers, J. D.; Willson, C. Grant. “Novel functional nortricyclene polymers and copolymers for 248 and 193 nm chemically amplified resists,” Proc.SPIE 3049 113-123 (1997)
226.
(222)		 Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey; Medeiros, David; Willson, C. Grant; Niu, Quingshang J.; Frechet, Jean M. J.; Allen, Robert. “New Single Layer Positive Photoresists for 193 nm Photolithography,” Proc.SPIE 3049 92-103 (1997)
227.
(230)		 Okoroanyanwu, U. ; Byers, J.; Shimokawa, T.; Patterson, K.; Willson, C.G. “Alicyclic Polymers for 193 nm Lithography,” Proc. 11th International Conference on Photopolymers, SPE 1 (1997)
228.
(231)		 Okoroanyanwu, U. ; Byers, J.; Shimokawa, T.; Webber, S.; Willson, C. G. “Deprotection Kinetics of New 193 nm Resists Derived from Alicyclic Polymers,” Proc. Am. Chem. Soc. Div. Polym. Mater.: Sci. and Eng., Las Vegas 77 469-470 (1997)
229.
(210)		 Tsiartas, Pavlos C.; Flanagin, Lewis W.; Henderson, Clifford L.; Hinsberg, William D.; Sanchez, Isaac C.; Bonnecaze, Roger T.; Willson, C. Grant. “The Mechanism of Phenolic Polymer Dissolution: A New Perspective,” Macromolecules 30(16) 4656-4664 (1997)
230.
(207)		 Willson, Grant C.; Dammel, Ralph A.; and Reiser, Arnost. “Photoresist Materials: A Historical Perspective,” Proc.SPIE 3049 28-41 (1997)
231.
(225)		 Willson, G. C.; Yueh, W.; Leeson, M. J.; Steinhäusler, T.; McAdams, C. L.; Dammel, R. R.; Sounik, J. R.; Aslam, M.; Vicari, R.; and Sheehan, M. T. “Non-chemically amplified 248 nm resist materials,” Proc.SPIE 3049 226-237 (1997)
232.
(227)		 Zhang, Linda P.; Eckert, Andrew R.; Willson, C. Grant; Webber, Stephen E.; Byers, Jeffrey. “Acid Diffusion through Polymer Films,” Proc.SPIE 3049 898-909 (1997)
233.
(242)		 Byers, Jeffrey ; Patterson, Kyle; Cho, Sungseo, McCallum; Martin, and Willson, C. Grant. “Recent Advancements In Cycloolefin Based Resists For ArF Lithography,” J.Photopolym.Sci.& Tech. 11(3) 465-474 (1998)
234.
(247)		 Erdmann, Andreas ; Henderson, Clifford; Willson, C. Grant; Dammel, Ralph R. “Some aspects of thick film resist performance and modeling,” Proc. SPIE 3333 1201-1211 (1998)
235.
(238)		 Flanagin, Lewis W.; McAdams, Christopher L.; Tsiartas, Pavlos C.; Henderson, Clifford L.; Hinsberg, William D.; and Willson, C. Grant. “Probabilistic model for the mechanism of phenolic polymer dissolution,” Proc. SPIE 3333 268-277 (1998)
236.
(234)		 Hashemi, Javad ; Wilson, James; James, Darryl; Kamala, Girish, Holtz, Mark; Khurts, Kurtis; Combs, Bret; Hale, Michael; Willson, C. Grant. “Design and Testing of a Three Dimensional Shock—Recovery System,” Proc. of the 3rd World Conference on Integrated Design and Proc. Tech., Berlin Germany 5 29-43 (1998)
237.
(237)		 Havard, Jennifer M.; Pasini, Dario; Fréchet, Jean M. J.; Medeiros, David; Yamada, Shintaro; Willson, C. Grant. “Design and Preliminary Studies of Environmentally Enhanced Water-castable, Water-developable Positive Tone Resists: Model and Feasibility Studies,” Polymers for Micro- and Nano- Patterning Science Technology, ACS Symp. Series 706 262-275 (1998)
238.
(245)		 Havard, Jennifer ; Pasini, Dario; Frechet, Jean M. J.; Medeiros, David; Patterson, Kyle; Yamada, Shintaro. “The design and study of water-soluble positive- and negative-tone imaging materials,” Proc. SPIE 3333 111-121 (1998)
239.
(252)		 Henderson, C. L.; Scheer, S. A.; Tsiartas, P. C.; Rathsack, B. M.; Sagan, J. P.; Dammel, R. R.; Erdmann, A.; Willson, C. G. “Modeling Parameter Extraction for DNQ-Novolac Thick Film Resists,” Proc. SPIE 3333 256-267 (1998)
240.
(246)		 Mack, Chris A.; Mueller, Katherine E.; Gardiner, Allen; Sagan, J. P.; Dammel, Ralph R.; Willson, C. Grant. “Modeling of solvent diffusion in photoresist,” J. Vac. Sci. Technol., B 16(6) 3779-3783 (1998)
241.
(241)		 McAdams, Christopher L.; Tsiartas, Pavlos; and Willson, C. Grant. “The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: An Adaptation of the Probabilistic Approach,” Polymeric Materials for Micro- and Nano- Patterning, ACS Symp Series 706 292-305 (1998)
242.
(251)		 McAdams, Christopher L.; Flanagin, Lewis W.; Henderson, Clifford L.; Pawloski, Adam R.; Tsiartas, Pavlos; Willson, C. Grant. “The Dissolution of Phenolic Polymers in Aqueous Base: The Influence of Polymer Structure,” Proc. SPIE 3333 1171-1179 (1998)
243.
(240)		 Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; and Willson, C. Grant. “Laterally Linked Liquid Crystal Dimers with Electro-optic Properties,” Chem.Mater. 10(7) 1805-1813 (1998)
244.
(233)		 Okoroanyanwu, Uzodinma ; Byers, Jeffrey D.; Cao, Ti; Webber, Stephen E.; Willson, C. Grant. “Deprotection Kinetics of Alicylic Polymer Resist Systems Designed for 193 nm Lithography,” ACS Symp Ser. 706 174-190 (1998)
245.
(235)		 Okoroanyanwu, Uzodinma ; Byers, Jeffrey D.; Cao, Ti; Webber, Stephen E.; Willson, C. Grant. “Monitoring Photoacid Generation in Chemically Amplified Resist Systems,” Proc. SPIE 3333 747-757 (1998)
246.
(243)		 Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey; and Willson, C. Grant. “Alicylic Polymers for 193 nm Resist Applications: Synthesis and Characterization,” Chemistry of Materials 10(11) 3319-3327 (1998)
247.
(244)		 Okoroanyanwu, Uzodinma ; Byers, Jeffrey; Shimokawa, Tsutomu; and Willson, C. Grant. “Alicylic Polymers for 193 nm Resist Applications: Lithographic Evaluation,” Chemistry of Materials 10(11) 3328-3333 (1998)
248.
(250)		 Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey D.; Willson, C. Grant. “Pd(II) catalyzed addition polymerization an ring opening metathesis polymerization of alicyclic monomers: routes to new matrix resins for 193nm photolithography,” J. Mol. Catal. A: Chem. 133(1-2) 93-114 (1998)
249.
(239)		 Patterson, Kyle ; Okoroanyanwu, Uzodinma; Shimokawa, Tsutomu; Cho, Sungseo; Byers, Jeffrey; Willson, C. Grant. “Improving the Performance of 193nm Photoresists Based on Alicyclic Polymers,” Proc. SPIE 3333 425-437 (1998)
250.
(249)		 Postnikov, Sergei V.; Somervell, Mark H.; Henderson, Clifford L.; Katz, Steven; Willson, C. Grant; Byers, Jeffrey; Qin, Anwei; Lin, Qinghuang “Top surface imaging through silylation,” Proc. SPIE 3333 997-1008 (1998)
251.
(236)		 Rau, Nicholas ; Neureuther, Andrew; Ogawa, Taro; Kubena, Randy; Stratton, Fred; Fields, Charles; Willson, C. Grant. “Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure,” Proc. SPIE 3333 1413-1419 (1998)
252.
(248)		 Yamada, Shintaro ; Medeiros, David R.; Patterson, Kyle; Jen, Wei-Lun K.; Rager, Timo; Lin, Qinghuang; Lenci, Carlos; Byers, Jeffrey; Havard, Jennifer M.; Pasini, Dario; Frechet, Jean M. J.; Willson, C. Grant. “Postitive and negative tone water processable photoresists: a progress report,” Proc. SPIE 3333 245-253 (1998)
253.
(274)		 Brodsky, Colin J.; C. Grant Willson. “Interfacial Cationic Graft Polymerization Lithography,” Polym. Mat. Sci. Eng. 81 83-84 (1999)
254.
(265)		 Burns, Sean D.; Gardiner, Allen B.; Krukonis, V.J.; Wetmore, Paula M.; Qin, Anwei; Willson, C. Grant. “The Measurement of Concentration Gradients in Resist Films by a ‘Halt Development’ Technique,” Proceedings of the American Chemical Society Division of Polymeric Materials: Science and Engineerin 81 81-84 (1999)
255.
(262)		 Colburn, M. ; Johnson, S.; Damle, S.; Bailey, T.; Choi, B.; Wedlake, M.; Michaelson, T.; Sreenivasan, S.V.; Ekerdt, J.; and Willson, C. G. “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning,” Proc. SPIE 3676 379-389 (1999)
256.
(256)		 Flanagin, Lewis W.; McAdams, Christopher L.; Hinsberg, William D.; Sanchez, Isaac C.; Willson, C. Grant. “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Macromolecules 32(16) 5337-5343 (1999)
257.
(257)		 Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant. “Molecular Model of Phenolic Polymer Dissolution in Photolithography,” Journ. Poly. Sci., Physics 37 2103-2113 (1999)
258.
(270)		 Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant. “Surface Roughness Development During Photoresists Dissolution,” J. Vac. Sci. & Tech., B 17(4) 1371-1379 (1999)
259.
(273)		 Flanagin, Lewis W.; Christopher L. McAdams; William D. Hinsberg; Isaac C. Sanchez; Willson, C. Grant. “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Polym. Mat. Sci. Eng. 81 469-472 (1999)
260.
(260)		 Hale, Michael A.; Medeiros, David R.; Dombrowski, Katherine D.; Willson, C. Grant. “X-Ray Diffraction and Torsional Viscosity Investigations of Laterally Linked Sc* Liquid Crystal Dimers,” Chem. Matls. 11(9) 2515-2519 (1999)
261.
(253)		 Havard, Jennifer M.; Vladimirov, Nikolay; and Frechet, Jean M. J. “Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate,” Macromolecules 32 86-94 (1999)
262.
(254)		 Havard, Jennifer ; Shim, S. Y.; Frechet, J.M.J.; Lin, Qinghuang; Medeiros, David R.; Willson, C. Grant; Byers, Jeffrey D. “Design of Photoresists with Reduced Environmental Impact. I. Water-soluble Resists Based on Photocrosslinking of Poly (vinyl alcohol),” Chem. Matls. 11 719-725 (1999)
263.
(255)		 Havard, Jennifer ; Yoshida, M., Pasini; D., Vladimirov, N.; Frechet, Jean M. J.; Medeiros, David R.; Patterson, Kyle; Yamada, Shintaro; Willson, C. Grant; Byers, Jeffrey D. “Design of Photoresists with Reduced Environmental Impact. II. Water-Soluble Resists Based on Photocrosslinking of Poly (2-Isopropenyl-2-oxazoline),” Journ. Poly. Sci. 37(9) 1225-1236 (1999)
264.
(272)		 Kyle, Patterson ; Mikio Yamachika; Sungseo Cho; Timo Rager; Shintaro Yamada; Jeffery Byers; Willson,C. Grant. “Design of Alicyclic Polymers for 193 nm Photoresists Offering Enhanced Post-Exposure Delay Stability,” Polym. Mat. Sci. Eng. 81 43-44 (1999)
265.
(269)		 Medeiros, David R.; Hale, Michael A..; Hung, Raymond J.P.; Leitko, Jeffrey K.; Willson, C. Grant. “Ferroelectric cyclic oligosiloxane liquid crystals,” J. Matls. Chem. 9 1453-1460 (1999)
266.
(258)		 Pasini, Dario ; Low, Eric; Meagley, Robert P.; Frechet, Jean M. J.; Willson, C. Grant; Byers, Jeffrey D. “Carbon-Rich Cyclopolymers: Their Synthesis, Etch Resistance, and Application to 193nm Microlithography,” Proc. SPIE 3678 94-101 (1999)
267.
(266)		 Postnikov, Sergei ; Stewart, Michael; Tran, Hoang Vi; Nierode, Mark; Medeiros, David; Cao, T.; Byers, Jeffrey; Webber, Stephen; Willson, C. Grant. “Study of resolution limits due to intrinsic bias in chemically amplified photoresists,” J. Vac. Sci. Technol. B 17(6) 3335-3338 (1999)
268.
(259)		 Rathsack, B. M.; C. E. Tabery, S. A. Scheer, C. L. Henderson; M. Pochkowski, C. Philbin, F. Kalk; P. D. Buck and Willson,C. G. “Optical Lithography Simulation and Photoresist Optimization for Photomask Fabrication,” Proc. SPIE 3678 1215-1226 (1999)
269.
(263)		 Rathsack, Benjamin M.; Tabery, Cyrus E.; Philbin, CeCe; Willson, C. Grant. “Lithography Simulation of Sub-0.30 Micron Resist Features for Photomask Fabrication using I-line Optical Pattern Generators,” Proc. SPIE 3873 484-492 (1999)
270.
(264)		 Rathsack, Benjamin M.; Tabery, Cyrus E.; Stachowiak, Timothy B; Dallas, Tim; Xu, Cheng-Bai; Pochkowski, Mike; Willson, C. Grant. “Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator,” Proc. SPIE 3873 80-91 (1999)
271.
(267)		 Ruchhoeft, P. ; Colburn, Matthew; Choi, Byung; Johnson, Stephen; Bailey, Todd; Damle, Shilpa; Stewart, Michael; Ekerdt, John; Sreenivasan, S. V., Wolfe, Jack; Willson, C. Grant. “Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography,” J. Vac. Sci. Technol. B 17(6) 2965-2969 (1999)
272.
(275)		 Somervell, Mark H.; Jeffery Byers; Willson, C. Grant. “Sources of Line Edge Roughness in a Negative Tone, top Surface Imaging System,” Polym. Mat. Sci. Eng. 81 28-29 (1999)
273.
(268)		 Stewart, Michael ; Postnikov, Sergei; Tran, Hoang V.; Medeiros, David; Nierode, M. A.; Cao, T.; Byers, Jeff; Webber, Steven; Willson, C. Grant. “Measurement of Acid Diffusivity in Thin Polymer Films Above and Below Tg,” Proc. ACS, Polym. Mat. Sci. Eng. Div. 81 58 (1999)
274.
(261)		 Yamachika, Mikio ; Patterson, Kyle; Cho, Sungseo; Rager, Timo; Yamada, Shintaro; Byers, Jeffrey; Paniez, P. J.; Mortini, B.; Gally, S.; Sassoulas, P-O.; Willson, C. Grant. “Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists,” Jour. Photopoly. Sci. and Tech. 12(4) 553-559 (1999)
275.
(271)		 Yamada, Shintaro ; Timo Rager; Jordan Owens; Jeffery Byers; Morton Nielsen; Willson, C. Grant. “The design and study of water-processable positive-tone photoresists,” Polym. Mat. Sci. Eng. 81 87-88 (1999)
276.
(290)		 Bailey, Todd ; Choi, Byung Jin; Colburn, Matthew; Meissl, Mario; Shaya, S.; Ekerdt, John G.; Sreenivasan, S.V.; Willson, C. G. “Step and flash imprint lithography: Template suface treatment and defect analysis,” J. Vac. Sci. Tech. B. 18(6) 3572-3577 (2000)
277.
(295)		 Bailey, T. ; B. J. Choi; M. Colburn; A. Grot; M. Meissl; M. Stewart; J. G. Ekerdt; S. V. Sreenivasan; Willson, C. G. “Step and Flash Imprint Lithography: A Technology Review,” Future Electron Devices, Tokyo 11(4) 54 (2000)
278.
(291)		 Brodsky, Colin ; Byers, Jeff; Conley, Will; Hung, Raymond; Yamada, Shintaro; Patterson, Kyle; Somervell, Mark; Trinque, Brian; Tran, Hoang Vi; Cho, Sungseo; Chiba, Takashi; Lin, Shang-Ho; Jamieson, Andrew; Johnson, Heather; Vander Heyden, Tony; Willson, C. Grant. “157nm Resist Materials: A Progress Report,” J. Vac. Sci. Technol. B 18 3396-3401 (2000)
279.
(292)		 Brodsky, Colin ; Heather F. Johnson; Brian C. Trinque; Willson, C. Grant. “Graft Polymerization Lithography: Extending Top Surface Imaging,” Forefront of Lithographic Materials Research 187-196 (2000)
280.
(294)		 Burns, S. D.; M .D. Stewart; J. N. Hilfiker; R. A. Synowicki; G. M. Schmid; C. Brodsky; Willson, C. G. “Determining Free Volume Changes During the PEB and PAB of a chemically Amplified Resist,” Forefront of Lithographic Materials Research 323-334 (2000)
281.
(283)		 Chiba, Takashi ; Hung, Raymond; Yamada, Shintaro; Trinque, Brian; Yamachika, Mikio; Brodsky, Colin; Patterson, Kyle; Vander Heyden, Anthony; Jamieson, Andrew, Lin, Shang-Ho, Somervell, Mark; Byers, Jeffrey; Conley, Will; Willson, C. Grant. “157 nm Resist Materials: A Progress Report,” J. Photopolym Sci Technol. 13(4) 657-664 (2000)
282.
(281)		 Cho, Sungseo ; Vander Heyden, Anthony; Byers, Jeffrey; Willson, C. Grant. “Negative tone 193 nm resists,” Proc. SPIE 3999 62-73 (2000)
283.
(286)		 Colburn, Matthew ; Grot, Annette; Amistoso, Marie; Choi, Byung Jin; Bailey, Todd; Ekerdt, John; Sreenivasan, S.V.; Hollenhorst, James; Willson, C. Grant. “Step and Flash Imprint Lithography for sub-100nm Patterning,” Proc. SPIE 3999 453-457 (2000)
284.
(282)		 Hale, Michael ; Clausi, Dominic; Willson, C. Grant; Dallas, Tim. “Ultrahigh pressure cell for materials synthesis,” Review of Scientific Instruments 71(7) 2784-2790 (2000)
285.
(293)		 Owens, J. ; S. Yamada; Willson, C. Grant. “The design and study of aqueous – processable positive – tone photoresists,” Forefront of Lithographic Materials Research 229-238 (2000)
286.
(284)		 Patterson, Kyle ; Somervell, Mark; Willson C. Grant. “Challenges in Materials Design for 157 nm Photoresists,” Solid State Technology 43 41 (2000)
287.
(287)		 Patterson, Kyle ; Yamachika, Mikio; Hung, Raymond; Brodsky, Colin; Yamada, Shintaro; Somervell, Mark; Osborn Brian; Hall, Daniel; Dukovic, Gordana; Byers, Jeffrey; Conley, Willard; and Willson, C. Grant. “Polymers for 157nm Photoresist Applications: A Progress Report,” Proc. SPIE 3999 365-374 (2000)
288.
(289)		 Rager, Timo ; Willson, C. Grant. “Synthesis and Characterization of Diastereomerically Pure Tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylic acid Derivatives,” Helvetica Chemica Acta 83 2769-2782 (2000)
289.
(277)		 Rathsack, Benjamin ; Tabery, Cyrus; Stachowiak, Timothy; Albelo, Jeff; and Willson, C. Grant. “Simulation Based Formulation of a Non-Chemically Amplified Resist for 257 nm Laser Mask Fabrication,” Proc. SPIE 3999 598-608 (2000)
290.
(279)		 Schmid, Gerard ; Singh, Vivek; Flanagin, Lewis; Stewart, Michael; Burns, Sean; and Willson, C. Grant “Recent Advances in a Molecular Level Lithography Simulation,” Proc. SPIE 3999 675-685 (2000)
291.
(278)		 Somervell, Mark ; Fryer, David; Osborn, Brian; Patterson, Kyle; Cho, Sungseo; Byers, Jeffrey; and Willson, C. Grant. “Using Alicyclic Polymers in Top Surface Imaging Systems to Reduce Line Edge Roughness,” Proc. SPIE 3999 270-282 (2000)
292.
(285)		 Somervell, Mark ; Fryer, David; Osborn, Brian; Patterson, Kyle; Byers, Jeffrey; Willson, C. Grant “A Study of the Fundamental Contributions to Line Edge Roughness in a 193nm, Top Surface Imaging System,” J. Vac. Sci. & Tech. B 18(5) 2251-2559 (2000)
293.
(280)		 Stewart, Michael ; Somervell, Mark; Tran, Hoang Vi; Postnikov, Sergei; and Willson, C. Grant. “Study of Acid Transport Using IR Spectroscopy and SEM,” Proc. SPIE 3999 665-674 (2000)
294.
(288)		 Stewart, Michael D.; Patterson, Kyle; Somervell, Mark H.; Willson, C. Grant. “Organic imaging materials: A view of the future,” J. of Physical Organic Chemistry 13(12) 767-774 (2000)
295.
(296)		 Willson, Grant C.; McAdams Christopher L.; Yueh Wang.; Osborn Brian P. “Synthesis of comb poly (4-hydroxystyrene) using conventional and “living” free-radical polymerization,” Polym. Prepr. (ACS, DIV. Polym. Chem.) 41 946-947 (2000)
296.
(297)		 Wilson, James N.; Hashemi, Javad; James, Darryl; Guven, Necip; Dallas, Tim; Kuhrts, Kurtis; Combs, Bret; Hale, Michael; Willson, C. Grant. “Metallurgical analysis and computer simulation of a solid steel sphere under shock loading,” AIP Conference Proceedings 505 479-482 (2000)
297.
(276)		 Yamada, Shintaro ; Owens, Jordan; Rager, Timo; Nielsen, Morton; Byers, Jeffery D.; Willson, C. Grant. “The Design and Study of Aqueous-Processable Positive Tone Photoresists,” Proc. SPIE 3999 569-578 (2000)
298.
(298)		 Bailey, T. ; Smith, B. J.; Colburn, M.; Meissl; M.; Sreenivasan, S. V.; Ekerdt, J. G.; Willson, C. G. “Step and Flash Imprint Lithography: Defect Analysis,” J. Vac. Sci. Tech. B 19(6) 2806 (2001)
299.
(301)		 Brodsky, C. ; Trinque, B., Johnson, H. and Willson, C. G. “Advances in Graft Polymerization Lithography,” Proc. SPIE 4343 415-420 (2001)
300.
(311)		 Burns, S. ; Gardiner, A.; Krukonis, V.; Wetmore, P.; Schmid, G.; Lutkenhaus, J.; Flanagin, L.; and Willson, C. G. “Understanding Nonlinear Dissolution Rates in Photoresists,” Proc. SPIE 4345 37-49 (2001)
301.
(299)		 Choi, B. J.; Sreenivasan, S. V.; Johnson,S.; Colburn, M.; Willson, C. G. “Design of Orientation Stages for Step and Flash Imprint Lithography,” Amer Soc Precision Eng 25(3) 192-199 (2001)
302.
(300)		 Choi, B. J.; Meissl, M., Colburn, M., Bailey, T., Ruchhoeft, P., Sreenivasan, S.V., Prins, F. Banerjee, S., Ekerdt, J. and Willson, C. G. “Layer-to-Layer Alignment for Step and Flash Imprint Lithography,” Proc. SPIE 4343 436-439 (2001)
303.
(305)		 Colburn, M. ; T. Bailey, B.J. Choi, J.G. Ekerdt, S.V. Sreenivasan, Willson, C.G. “Development and Advantages of Step-and-Flash Lithography,” Solid State Technology 46(7) 67 (2001)
304.
(317)		 Colburn, M. ; Grot, A., Choi, B. J., Amistoso, M., Bailey, T., Sreenivasan, S.V., Ekerdt, J., and Willson, C. G. “Patterning non-flat substrates with a low pressure, room temperature imprint lithography process,” Jour. of Vac. Sci. & Tech. B 19(6) 2162-2172 (2001)
305.
(318)		 Colburn, M. ; Suez, I., Choi, B. J., Meissl, M., Bailey, T., Sreenivasan, S.V., Ekerdt, J. G., and Willson, C. G. “Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers,” Jour. of Vac. Sci. & Tech. B 19(6) 2685-2689 (2001)