Published Articles


1.
(1)
Jacobson, S. J.; Willson, C. Grant; Rapoport, H. “Mechanism of Cystine Racemization in Strong Acid,” Journal of Organic Chemistry 39(8) 1074-1077 (1974)
2.
(2)
Slama, J. T.; Willson, C. Grant; Rapoport, H. “Porphyrin-Protein Bond of Cytochrome,” Journal of the American Chemical Society 97(22) 6556-6562 (1975)
3.
(3)
Willson, C. Grant; Gilon, C.; Donzel, B.; and Goodman, M. “Synthesis of Pyroglutamyl-histidyl-thiazolidine-4--carboxamide, a Biologically Active Analog of Thyrotrophin Releasing Factor,” Biopolymers 15(11) 2317-2322 (1976)
4.
(4)
Slama, J. T.; Willson, C. Grant; Grimshaw, C. E.; Rapoport, H. “Stereochemistry of the Porphyrin-Protein Bond of Cytochrome c. Stereochemistry Comparison of Rhodospirillum Rubrum, Yeast and Horse Heart Porphyrins c,” Biochemistry 16(8) 1750-1754 (1977)
5.
(5)
Chorev, M. ; Willson, C. Grant; Goodman, M. “A General Approach to Retro-Isometric Linear Peptide Synthesis,” Journal of the American Chemical Society 99(24) 8075-8076 (1977)
6.
(6)
Chorev, M. ; Willson, C. Grant; Goodman, M. “A Three-Point Model for the Dipeptide Sweetner-Receptor Interaction,” Peptides - Proceedings of the Fifth American Peptide Symposium 572-574 (1977)
7.
(7)
Willson, C. Grant; Goodman, M.; Rivier, J.; Vale, W. “Topochemically Related Hormone Structures. The Synthesis of Retro-Analogs of LRF.,” Peptides - Proceedings of the Fifth American Peptide Symposium 579-581 (1977)
8.
(8)
MacDonald, Scott. A.; Willson, C. Grant; Chorev, Michael.; Vernacchia, Fred. S.; Goodman, Murray. “Peptide Sweetners. 3. Effect of Modifying the Peptide Bond on the Sweet Taste of L-Aspartyl-L-phenylalanine Methyl Ester and Its Analogues,” Journal of Medical Chemistry 23(4) 413-420 (1980)
9.
(9)
Gipstein, E. ; Willson, C. Grant., and Sachdev, H. S. “Synthesis and Polymerization of Alkyl a-(Alkylsulfonyl)acrylates,” Journal of Organic Chemistry 45(8) 1486-1489 (1980)
10.
(10)
MacDonald, S. A.; Schierling, T. D.; Willson, C. Grant. “Poly-(N-alkyl)-o-nitroamides): A New Class of Photosensitive Polymers,” Journal of Organic Coatings and Plastics Chemistry 43 264-267 (1980)
11.
(11)
Grant, Barbara D.; Clecak, Nicholas J.; Twieg, Robert J.; Willson, C. Grant. “Deep UV Photoresists I. Meldrum's Diazo Sensitizer,” IEEE Transactions on Electron Devices(11) 1300-1305 (1981)
12.
(12)
O'Sullivan, D. ; Price, P. B.; Kinoshita, K.; Willson, C. G. “Correlative Studies of Track-Etch Behaviour and Chemical Development of Lithographic Polymer Resists,” Nucl.Tracks, Meth., Inst.Appl. 344-345 (1981)
13.
(13)
Jain, K. ; Willson, C. G.; and Lin, B. J. “Ultrafast high resolution contact lithography using excimer lasers,” Proc.SPIE 334 259-262 (1982)
14.
(14)
Frechet, Jean M. J.; Farrall, Jean M.; Willson, C. Grant. “Chemical Modification of Poly(Methyl Acrylate) via Metalation and a-substitution,” Polym.Bull.Berlin 7(11) 567-573 (1982)
15.
(15)
Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant. “R?sines pour UV lointain mettant an oeuvre un m?canisme d'amplification chimique,” Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82 260 (1982)
16.
(16)
Willson, C. Grant; Ito, Hiroshi; Frechet, J. M. J. “L\\\\\\\\\\\\\\\'amplification chimique appliqu?e au d?veloppement de polym?res utilisables comme r?sines de lithographie,” Colloque Internationale sur la Microlithographie: Microcircuit Engineering 82 261 (1982)
17.
(17)
Frechet, Jean M. J.; Farrall, M. Jean; Willson, C. Grant. “Preparation of Highly Substituted Polysulfones by Chemical Modification,” Org.Coat.& Appl.Poly.Sci.Proc. 46 335-339 (1982)
18.
(18)
MacDonald, S. A.; Willson, C. Grant. “Poly(N-alkyl-o-nitroamides): A New Class of Thermally Stable, Photosensitive Polymers,” ACS Sym.Ser. 184(6) 73-81 (1982)
19.
(19)
Jain, K. ; Willson, C. G.; Lin, B. J. “Fine-Line High Speed Excimer Laser Lithography,” Proc.IEEE 92-93 (1982)
20.
(20)
Willson, C. Grant; Frechet, Jean M. J. “New UV Resists with Negative or Positive Tone,” Proc.IEEE 92-93 (1982)
21.
(21)
Jain, K. ; Willson, C. G.; Lin, B. J. “Ultrafast, High-Resolution Contact Lithography with Excimer Lasers,” IBM J.Res.Develop. 26(2) 151-159 (1982)
22.
(22)
Ito, Hiroshi ; Dolores C.; Willson, C. Grant. “Polymerization of Methyl a-(Trifluoromethyl)acrylate and a-(Trifluoromethyl)acrylonitrile and Copolymerization of These Monomers with Methyl Methacryl,” Macromolecules 1982(15) 915-920 (1982)
23.
(23)
Willson, C. Grant; Ito, Hiroshi; Frechet, Jean M. J.; Houlihan, Frank. “Chemical Amplification in the Design of Polymers for Resist Applications,” International Union of Pure and Applied Chemistry 28 448 (1982)
24.
(24)
Hofer, Donald C.; Willson, C. Grant; Neureuther, Andrew R.; Hakey, Mark. “Characterization of the induction effect at mid-ultraviolet exposure: application to AZ2400 at 313 nm,” Optical Microlithography--Technology for the Mid-1980s, Proc.SPIE 334 196-205 (1982)
25.
(25)
O'Sullivan, D. ; Price, P. B.; Kinoshita, K.; Willson, C. G. “Predicting Radiation Sensitivity of Polymers,” J.Elecrochem.Soc. 129(4) 811-813 (1982)
26.
(26)
MacDonald, Scott A.; Miller, Robert D.; Willson, C. Grant; Feinberg, G. M.; Gleason, R. T.; Halverson, R. M.; MacIntyre, M. W.; Motsiff, W. T. “Image Reversal: The Production of a Negative Image in a Positive Photoresist,” Kodak Microelectronics Sem. 23 114-117 (1982)
27.
(27)
Jain, K. ; Willson, C. G.; Lin, B. J. “Ultrafast Deep UV Lithography with Excimer Lasers,” IEEE Electron Device Lett.(3) 53-55 (1982)
28.
(28)
Willson, C. Grant; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G. “Poly(methyl a-trifluoromethylacrylate) as a positive electron beam resist,” Technical Papers, Regional Technical Conference, Society of Plastic Engineers 207-219 (1982)
29.
(29)
Ito, Hiroshi ; Willson, C. Grant “Chemical Amplification in the Design of Dry Developing Resist Materials,” Technical Papers, Regional Technical Conference, Society of Plastic Engineers 331-353 (1982)
30.
(30)
Willson, C. Grant; “Organic Resist Materials - Theory and Chemistry,” ACS Sym.Ser. 219(3) 87-159 (1983)
31.
(31)
Ito, Hiroshi ; MacDonald, Scott; Willson, C. Grant. “Organic Resist Materials: Exploring the Limits of Sensitivity and Resolution,” RJ 4083(45481) (1983)
32.
(32)
Jain, K. ; Rice, S.; Lin, B. J. “Ultrafast Deep UV Lithography Using Excimer Lasers,” Polym.Eng.Sci. 23(18) 1019-1021 (1983)
33.
(33)
Willson, Grant C.; Ito, Hiroshi; Miller, Dolores C.; Tessier, T. G. “Poly(Methyl a-Trifluoromethylacrylate) as a Positive Electron Beam Resist,” Polymer Eng.& Sci. 23(18) 1000-1003 (1983)
34.
(34)
Ito, Hiroshi ; Willson, C. Grant “Chemical Amplification in the Design of Dry Developing Resist Materials,” Polymer Eng.& Sci. 23(18) 1012-1018 (1983)
35.
(35)
Willson, Grant C.; Miller, Robert; McKean, Dennis; Clecak, Nicholas; Tompkins, Terry; Hofer, Donald. “Design of a Positive Resist for Projection Lithography in the Mid-UV,” Polymer Eng.& Sci. 23(18) 1004-1011 (1983)
36.
(36)
MacDonald, Scott A.; Ito, Hiroshi; Willson, C. Grant “Advances in the design of organic resist materials,” Microelectron.Eng. 1(3) 269-293 (1983)
37.
(37)
Miller, R. D.; Willson, C. G.; McKean, D. R.; Tompkins, T.; Clecak, Nicholas; Michl, J.; Downing, J. “Semiempirical Calculations of Electronic Spectra: Utility in the Design of Mid-UV Sensitizers,” Org.Coat.& Appl.Poly.Sci.Proc. 48 54-57 (1983)
38.
(38)
Jain, K. ; Willson, C. G.; Rice, S.; Pederson, L.; and Lin, B. J. “Ultrafast Deep UV Lithography with Excimer Lasers,” Introduction to Microlithography: Theory, Materials, and Processing, ACS Sym.Ser. 219 363 (1983)
39.
(39)
Willson, G. C.; Frechet, J. M. J.; and Farrall, M. J. “Chemical Modification of Poly(styrenesulfone),” Polym.Sci.& Technol. 21 25-31 (1983)
40.
(40)
Thompson, L. F.; Willson, C. G.; and Bowden, M. J. “Introduction to Microlithography: Theory, Materials, and Processing,” ACS Symposium Series 219 (1983)
41.
(41)
Ito, Hiroshi ; Eichler, E.; Willson, C. Grant. “Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins,” Polymer 24 998-1000 (1983)
42.
(42)
Ito, Hiroshi ; Willson, C. Grant; Fr?chet, Jean M.; Farrall, M. J.; and Eichler, Eva. “Synthesis of Poly(p-hydroxy-a-methylstyrene) by Cationic Polymerization and Chemical Modification,” Macromolecules 16(4) 510-517 (1983)
43.
(43)
MacDonald, S. A.; Steinmann, F.; Ito, H.; Lee, W-Y.; and Willson, C. G. “The Development of Oxygen Reactive Ion Etch Barriers Based on Poly(trimethylstannylstyrene),” Polym.Mat.Sci.& Eng. 104-106 (1983)
44.
(44)
Ito, Hiroshi ; Willson, C. Grant “Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing,” ACS Sym.Ser. 212(2) 11-23 (1984)
45.
(45)
Willson, C. Grant; Ito, Hiroshi; MacDonald, Scott. “Resist Materials: A View of the Future,” SEMI (1984)
46.
(46)
Miller, R. D.; McKean, D. R.; Tompkins, T. L.; Clecak, Nicholas; Willson, C. Grant. Michl, J., and Downing, J. “Semiempirical Calculations of Electronic Spectra: Use in the Design of Mid-UV Sensitizers,” Polymers in Electronics, ACS Sym.Ser. 243(3) 25-40 (1984)
47.
(47)
Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant; Neureuther, Andrew R. “Contrast enhanced UV lithography with polysilanes,” Advances in Resist Technology, Proc.SPIE 469 108-116 (1984)
48.
(48)
Hofer, Donald C.; Miller, Robert D.; Willson, C. Grant. “Polysilane bilayer UV lithography,” Advances in Resist Technology, Proc.SPIE 469 16-23 (1984)
49.
(49)
Thompson, L. F.; Willson, C. G. (ed.); Fr?chet, J. M. J. “Materials for Microlithography: Radiation-Sensitive Polymers,” ACS Symposium Series 266 (1984)
50.
(50)
Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H. “Application of the Photo-Fries Rearrangement to Polymeric Imaging Systems,” Polym.Prep. 25(1) 313-314 (1984)
51.
(51)
MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E. “Radiolysis of Poly(isopropenyl t-butyl ketone),” Materials for Microlithography, ACS Symposium Series 266(7) 179-186 (1984)
52.
(52)
Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G. “Photochemistry of Ketone Polymers in the Solid Phase: Thin Film Studies of Vinyl Ketone Polymers,” Materials for Microlithography, ACS Symposium Series 266(19) 389-398 (1984)
53.
(53)
Tessier, T. G.; Frechet, J. M. J.; Willson, C. G.; Ito, H. “The Photo-Fries Rearrangement and Its Use in Polymeric Imaging Systems,” Materials for Microlithography, ACS Symposium Series 266(13) 269-292 (1984)
54.
(54)
Miller, R. D.; Hofer, D.; Willson, C. G. “Soluble Polysilanes: A New Class of Radiation Sensitive Polymers,” Polym.Prep. 25(1) 307-308 (1984)
55.
(55)
Willson, C. Grant; “Advances in Resist Technology,” Proc.SPIE 469 195-201 (1984)
56.
(56)
Guillet, J. E.; Li, S. K. L.; MacDonald, S. A.; Willson, C. G. “Photochemistry of Ketone Polymers. 18. Thin Film Studies of Vinyl Ketone Polymers,” Polym.Prep. 25(1) 296-297 (1984)
57.
(57)
Ito, H. ; Willson, C. G.; Frechet, J. M. J.; Farrall, M. J.; Eichler, E. “Synthesis of Poly(p-hydroxy-a-methylstyrene),” Polym.Prep. 25(1) 158-159 (1984)
58.
(58)
Miller, R. D.; Hofer, D.; McKean, D. R.; Willson, C. G.; West, R.; Trefonas, P. T. “Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers,” Materials for Microlithography, ACS Symposium Series(14) 293-310 (1984)
59.
(59)
MacDonald, S. A.; Ito, H.; Willson, C. G.; Moore, J. W.; Gharapetian, H. M.; Guillet, J. E. “Radiolysis of Poly(t-butylisopropenyl ketone),” Polym.Prep. 25(1) 298-299 (1984)
60.
(60)
Hinsberg, W. D.; Willson, C. Grant.; Kanazawa, K. K. “Use of a Quartz Crystal Microbalance Rate Monitor to Examine Photoproduct Effects of Resist Dissolution,,” Advances in Resist Technology and Processing II, Proc.SPIE 539 6-13 (1985)
61.
(61)
Willson, C. Grant; Hult, A.; MacDonald, Scott A. “Photoinitiated Interfacial Cationic Polymerization,” Polym.Mat.Sci.& Eng. 52 339-344 (1985)
62.
(62)
MacDonald, Scott A.; Labadie, Jeff W.; Willson, C. Grant. “Organotin Polymers: Synthesis and Resist Properties,” Polymer Preprints 26(2) 343-344 (1985)
63.
(63)
Fr?chet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G. “Chemical Amplification in the Design of Radiation-Sensitive Polymers,” Society of Plastic Engineers, Inc. (1985)
64.
(64)
MacDonald, Scott A.; Ito, Hiroshi; Hiraoka, Hiroyuki; Willson, C. Grant. “A New Oxygen Plasma Developable UV Sensitive Resist,” Photopolymers Principles--Processes and Materials , Technical Papers, Regional Technical Conference, 177-196 (1985)
65.
(65)
Houlihan, F. ; Bouchard, F.; Frechet, J. M. J.; Willson, C. Grant. “Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, enols, and thiols with di-tert-butyl dicarbonate,” Canadian J.Chemistry 63(1) 153-162 (1985)
66.
(66)
Hult, Anders. ; MacDonald, Scott A.; Willson, C. Grant. “Photoinitiated Interfacial Cationic Polymerization,” Macromolecules 18(10) 1804-1809 (1985)
67.
(67)
Fr?chet, Jean M. J.; Tessier, T. G.; Willson, C. Grant; Ito, Hiroshi. “Poly[p-(formyloxy)styrene]: Synthesis and Radiation-Induced Decarbonylation,” Macromolecules 18(3) 317-321 (1985)
68.
(68)
MacDonald, Scott A.; Frechet, Jean M. J.; Ito, Hiroshi; Willson, C. Grant. “Resist Materials,” Microelectronic Engineering 3(104) 277-278 (1985)
69.
(69)
Fr?chet, J. M. J.; Houlihan, F. M.; Willson, C. G. “Polycarbonates Derived from o-Nitrobenzyl Glycidyl Ether: Synthesis and Radiation Sensitivity,” Polym.Mat.Sci.& Eng. 53 268-272 (1985)
70.
(70)
Fr?chet, J. M. J.; Bouchard, F.; Houlihan, F.; Kryczka, B.; Willson, C. G. “Novel Highly Substituted Polycarbonates: Synthesis and Properties of Polymers Derived from 1,4-bis-(2-hydroxy-2-propyl)benzyne and Analogs,” Polym.Mat.Sci.& Eng. 53 263-267 (1985)
71.
(71)
Fr?chet, Jean M. J.; Houlihan, Francis M.; Bouchard, F.; Kryczka, Boguslaw; Willson, C. Grant. “Design, Synthesis, and Study of Novel, Thermally Depolymerizable Polycarbonates,” J.Chem.Soc., Chem.Commun. 1514-1516 (1985)
72.
(72)
Neureuther, A. R.; Hofer, D.; Willson, C. G. “Design of Contrast Enhancement Processes for Optical Lithography,” Microcircuit Eng. 53-60 (1985)
73.
(73)
Willson, Grant C.; Ito, Hiroshi; Fr?chet, Jean M. J.; Tessier, Theodore G.; Houlihan, Francis M. “Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution,” J.Elecrochem.Soc. 133(1) 181-187 (1986)
74.
(74)
Houlihan, F. M.; Bouchard, F.; Fr?chet, J. M. J.; Willson, C. Grant. “Thermally Depolymerizable Polycarbonates. 2. Synthesis of Novel Linear Tertiary Copolycarbonates by Phase-Transfer Catalysis,” Macromolecules 19(1) 13-19 (1986)
75.
(75)
Fr?chet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Eichler, Eva; Kryczka, Boguslav; Willson, C. Grant. “Design and synthesis of novel allylic and benzylic copolycarbonates susceptible to acidolytic or thermolytic depolymerization,” Makromol.Chem., Rapid Commun. 7(3) 121-126 (1986)
76.
(76)
Ito, Hiroshi ; MacDonald, Scott A.; Willson, C. Grant; Moore, J. W.; Gharapetian, H. M.; Guillet, James E. “Reactivity and Polymerization of Isopropenyl tert-Butyl Ketone: A Twisted a,b-Unsaturated Enone,” Macromolecules 19(7) 1839-1844 (1986)
77.
(77)
Fr?chet, Jean M. J.; Bouchard, Francine; Houlihan, Francis M.; Kryczka, Boguslaw; Eichler, Eva; Clecak, Nicholas; Willson, C. Grant. “New Approach to Imaging Incorporating Chemical Amplification: Synthesis and Preliminary Evaluation of Novel Resists Based on Tertiary Copolycarbonates,” J.Imaging Sci. 30(2) 59-64 (1986)
78.
(78)
Hinsberg, W. D.; Willson, C. Grant.; and Kanazawa, K. K. “Measurement of Thin-Film Dissolution Kinetics Using a Quartz Crystal Microbalance,” J.Elecrochem.Soc. 133(7) 1448-1451 (1986)
79.
(79)
Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Organotin Polymers: Synthesis and Resist Properties,” J.Imaging Sci. 30(4) 169-173 (1986)
80.
(80)
Fr?chet, Jean M. J.; Iizawa, Takashi; Bouchard, Francine; Stanciulescu, Maria; Willson, C. Grant; Clecak, Nicholas. “New Condensation Polymers as Resist Materials Capable of Chemical Amplification,” Polym.Mat.Sci.& Eng. 55 299-303 (1986)
81.
(81)
Miller, R. D.; Hofer, D.; Fickes, G. N.; Willson, C. Grant.; Marinero, E.; Trefonas, P.; West, R. “Soluble Polysilanes: An Interesting New Class of Radiation Sensitive Materials,” Photo. Sci. & Eng. 26(16) 1129-1134 (1986)
82.
(82)
Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Poly(alkylnylstannanes): A new class of main chain organotin polymers,” Polymer Bulletin, Berlin, 16(5) 427-431 (1986)
83.
(83)
Allen, R. D.; MacDonald, S. A.; and Willson, C. Grant. “A One Layer MLR Resist,” Polym.Mat.Sci.& Eng. 55 290-291 (1986)
84.
(84)
Willson, C. G.; (ed.) “Advances in Resist Technology and Processing III,” Proc.SPIE 631 346 (1986)
85.
(85)
MacDonald, S. A.; Allen, R. D.; Clecak, Nicholas; Willson, C. Grant.; Frechet, J. M. J. “A 2-layer resist system derived from trimethylsilystyrene,” Advances in Resist Technology and Processing III, Proc.SPIE 631 28-33 (1986)
86.
(86)
Miller, R. D.; Fickes, G. N.; Hofer, D.; Sooriyakumaran, R.; Willson, C. Grant.; Guillet, J. E.; Moore, J. “Soluble Polysilanes for Lithography,” Polym.Mat.Sci.& Eng. 55 599-603 (1986)
87.
(87)
MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. Grant. “A Single Layer, Multilevel Resist: Limited Penetration E-Beam Lithography,” Polym.Mat.Sci.& Eng.(2559) 721-723 (1986)
88.
(88)
Willson, C. G.; “Polymers in Microlithography,” Polym.Mat.Sci.& Eng. 55 1-2 (1986)
89.
(89)
Jiang, Ying ; Fr?chet, Jean M. J.; Willson, C. Grant. “Poly(vinyl-t-butyl carbonate)synthesis and thermolysis to poly(vinyl alcohol),” Polym.Bull.Berlin 17(1) 1-6 (1987)
90.
(90)
Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “Polymerization of 1-(Trimethylstannyl)alkyl Methacrylates: A New Class of Organotin Polymers and a Novel Case of Degradative Chain Transfer to Polymer,” Macromolecules 20(1) 10-15 (1987)
91.
(91)
Fr?chet, Jean M. J.; Bouchard, Francine; Eichler, Eva; Houlihan, Francis M.; Iizawa, Takashi; Kryczka, Boguslaw; Willson, C. Grant. “Thermally Depolymerizable Polycarbonates V. Acid Catalyzed Thermolysis of Allylic and Benzylic Polycarbonates: A New Route to Resist Imaging,” Polymer Journal 19(1) 31-49 (1987)
92.
(92)
Miller, R. D.; Hofer, D.; Rabolt, J.; Sooriyakumaran, R.; Willson, C. G.; Fickes, G. N.; Guillet, J. E.; Moore, J. “Soluble Polysilanes in Photolithography,” Polymers for High Technology--Electronics and Photonics, ACS Sym.Ser. 346(15) 170-187 (1987)
93.
(93)
Turner, Richard S.; Ahn, K. D.; Willson, C. G. “Thermally Stable, Deep-UV Resist Materials,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(17) 200-210 (1987)
94.
(94)
Fr?chet, J. M. J.; Eichler, E.; Stanciulescu, M.; Iizawa, T.; Bouchard, F.; Houlihan, F. M.; Willson, C. G. “Acid-Catalyzed Thermolytic Depolymerization of Polycarbonates: A New Approach to Dry-Developing Resist Materials,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(12) 138-148 (1987)
95.
(95)
Ito, Hiroshi ; Willson, C. Grant; Frechet, Jean M. J “Positive/negative mid UV resists with high thermal stability,” Advances in Resist Technology and Processing IV, Proc.SPIE, 771 24-31 (1987)
96.
(96)
Allen, R. D.; MacDonald, S. A.; Willson, C. G. “A ,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(9) 101-109 (1987)
97.
(97)
MacDonald, S. A.; Pederson, L. A.; Patlach, A. M.; Willson, C. G. “A Single-Layer, Multilevel Resist: Limited-Penetration Elecron-Beam Lithography,” Polymers for High Technology--Electronics and Photonics, ACS Symposium Series 346(29) 350-357 (1987)
98.
(98)
Kutal, C. ; Willson, C. Grant. “Photoinitiated Cross-Linking and Image Formation in Thin Polymer Films Containing a Transition Metal Compound,” J.Elecrochem.Soc. 134(9) 138-148 (1987)
99.
(99)
Kutal, C. ; Willson, C. G. “Crosslinking and Image Formation in Thin Polymer Films Containing a Photosensitive Transition Metal Compound,” J.Chem.Soc., Chem.Ed. 2280-2285 (1987)
100.
(100)
Kutal, C. ; Willson, C. G. “Inorganic Photoinitiators for Photolithographic Applications,” Photochemistry and Photophysics of Coordination Compounds (Berlin) 307-312 (1987)
101.
(101)
Willson, C. G.; Miller, R. D.; McKean, D. R.; Pederson, L. A. “New Diazoketone Dissolution Inhibitors for Deep UV Photolithography,” Advances in Resist Technology and Processing IV, Proc.SPIE 771 2-11 (1987)
102.
(102)
Labadie, Jeff W.; MacDonald, Scott A.; Willson, C. Grant. “New Synthetic Approach to Organotin Polymers,” Proc.PMSE (Germany) 56 867 (1987)
103.
(103)
Neureuther, Andrew R.; Willson, C. Grant. “Reduction in x-ray lithography shot noise exposure limit by dissolution phenomena,” J.Vac.Sci.Technol.B 6(1) 167-173 (1988)
104.
(104)
Umbach, C. P.; Broers, A. N.; Willson, C. G.; Koch, R.; Laibowitz, R. B. “Nanolithography with an acid catalyzed resist,” J.Vac.Sci.Technol.B 6(1) 319-322 (1988)
105.
(105)
McKean, Dennis R.; MacDonald, Scott A.; Clecak, Nicholas J.; Willson, C. Grant. “Novolac based deep-UV resists,” Advances in Resist Technology and Processing V, Proc.SPIE 920 60-66 (1988)
106.
(106)
Hinsberg, William D.; MacDonald, Scott A.; Pederson, L.; Willson, C. Grant. “Zero-Misalignment Lithographic Process Using a Photoresist with Wavelength-Selected Tone,” Advances in Resist Technology and Processing V, Proc.SPIE 920 2-12 (1988)
107.
(107)
Hinsberg, W. D.; MacDonald, S. A.; Pederson, L.; Willson, C. G. “Self-Aligning Lithography using a Dual-Tone Resist: A Lithographic Analogue of Color Photography,” Photo. Sci. & Eng. 94-97 (1988)
108.
(108)
Willson, G. C.; Schellenberg, F. M.; Sperley, K. M.; Brock, P. J.; Levenson, M. D. “Photodeformable polymer system for holography,” CLEO Conf.Lasers Electro Opt., Tech.Dig. 7 198 (1988)
109.
(109)
Ito, H. ; Pederson, L. A.; MacDonald, S. A.; Cheng, Y. Y.; Lyerla, J. R.; Willson, C. G. “A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System,” J.Elecrochem.Soc. 135(6) 1504-1508 (1988)
110.
(110)
Umbach, C. P.; Broers, A. N.; Koch, R.; Willson, C. G.; Laibowitz, R. B. “Nanolithography with a high-resolution STEM,” IBM J.Res.Develop. 32(4) 454-461 (1988)
111.
(111)
Iwayanagi, Takao ; Ueno, Takumi; Nonogaki, Saburo; Ito, Hiroshi; Willson, C. Grant. “Materials and Processes for Deep-UV Lithography,” Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS 218(3) 109-224 (1988)
112.
(112)
Willson, Grant C.; Bowden, Murrae “Organic Resist Materials,” Electronic and Photonic Applications of Polymers, Advances in Chemistry Series, ACS 218(2) 75-108 (1988)
113.
(113)
Fr?chet, Jean M. J.; Kallman, Neil; Kryczka, Boguslav; Eichler, Eva; Houlihan, Francis M.; Willson, C. Grant. “Novel derivatives of poly(4-hydroxystyrene) with easily removable teriary, allylic, or benzylic ethers,” Polym.Bull.Berlin 20(5) 427-434 (1988)
114.
(114)
Seligson, Daniel ; Ito, Hiroshi; Willson, C. Grant. “The impact of high-sensitivity resist materials on x-ray lithography,” J.Vac.Sci.Technol.B 6(6) 2268-2273 (1988)
115.
(115)
Fr?chet, Jean M. J.; Eichler, Eva; Gauthier, Sylvie; Kryczka, Boguslav; Willson, C. G. “Imaging Processes Based on Side-Chain Modification of Polymers: Synthesis and Study of Allylic and Benzylic Ethers Derived from Poly(vinylphenols),” The Effects of Radiation on High-Technology Polymers, ACS Symposium Series 381(10) 155-171 (1989)
116.
(116)
Willson, Grant C.; Bowden, Murrae J. “Resist materials for microelectronics (Part 1),” Chemtech 19(2) 102-111 (1989)
117.
(117)
Willson, Grant C.; Bowden, Murrae J. “Recent advances in organic resist materials (Part 2),” Chemtech 19(3) 182-189 (1989)
118.
(118)
Fr?chet, Jean M. J.; Willson, C. Grant; Iizawa, T.; Nishikubo, T.; Igarashi, K.; Fahey, J. “New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals,” Polymers in Microlithography: Materials and Processes, ACS Symposium Series 412(7) 100-112 (1989)
119.
(119)
Fr?chet, Jean M. J.; Matuszczak, Steven; Willson, C. Grant; Reck, B. “Nonswelling Negative Resists Incorporating Chemical Amplification,” Polymers in Microlithography: Materials and Processes, ACS Symposium Series 412(5) 74-85 (1989)
120.
(120)
Fr?chet, J. M. J.; Matuszczak, S.; Reck, B.; Willson, C. G. “Photocrosslinking Based on Electrophilic Aromatic Substitution and its Application to Resists Incorporating Chemical Amplification,” Polym.Mat.Sci.& Eng. 60 147-150 (1989)
121.
(121)
Kutal, C. ; Willson, C. G. “Photosensitive materials for imaging applications,” J.Inf.Rec.Mater. 17(5/6) 373-378 (1989)
122.
(122)
Fr?chet, J. M. J.; Stanciulescu, M.; Iizawa, T.; Willson, C. G. “Self-Developing Imaging Systems Based on Polyesters and Polyethers,” Polym.Mat.Sci.& Eng. 60 170-173 (1989)
123.
(123)
Fr?chet, J. M. J.; Fahey, J.; Willson, C. G.; Iizawa, T.; Nishikubo, T. “Synthesis of Polyformals and Their Use as Dry-Developing Imaging Systems,” Polym.Mat.Sci.& Eng. 60 174-178 (1989)
124.
(124)
Reck, B. ; Allen, R. D.; Twieg, R. J.; Willson, C. G. Matuszczak, S., Stover, H. D. H., Li, N. H., and Fr?chet, J. M. J. “Novel Photoresist Design Based on Eletrophilic Aromatic Substitution,” Photo. Sci. & Eng. 29(14) 960-964 (1989)
125.
(125)
Hinsberg, W. D.; MacDonald, S. A.; Pederson, L. A.; Willson, C. G. “A Lithographic Analog of Color Photography: Self-Aligning Photolithography Using a Resist with Wavelength-Dependent Tone,” J.Imaging Sci. 33(4) 129-135 (1989)
126.
(126)
Kutal, Charles ; Weit, Scott K.; Willson, C. Grant. “New inorganic photoinitiators for deep-UV resist materials,” Polym.Mat.Sci.& Eng. 61 412-416 (1989)
127.
(127)
Stover, H. ; Matuszczak, S.; Chin, R.; Shimizu, K.; Willson, C. G.; Fr?chet, J. M. J. “Acid-Catalyzed Rearrangement of Aromatic Ethers: Model Studies and Application to Imaging,” Polym.Mat.Sci.& Eng. 61 412-416 (1989)
128.
(128)
Eich, Manfred ; Reck, Berndt; Yoon, Do Y.; Willson, C. Grant; Bjorklund, Gary C. “Novel second-order nonlinear optical polymers via chemical cross-linking-induced vitrification under electric field,” J.Applied Physics 66(7) 3241-3247 (1989)
129.
(129)
Reck, Berndt ; Eich, Manfred; Jungbauer, Dietmar; Twieg, Robert J.; Willson, C. Grant; Yoon, Do Y.; Bjorklund, Gary C. “Crosslinked epoxy polymers with large and stable nonlinear optical susceptibilities,” Nonlinear Optical Properties of Organic Materials II, Proc.SPIE 1147(2) 74-83 (1989)
130.
(130)
Willson, Grant C.; “Proceedings of The Almaden Symposium 4th International Conference on Unconventional Photoactive Solids,” 183 511 (1989)
131.
(131)
Green, M. M.; Reidy, M. P.; Johnson, R. J.; Darling, G.; O'Leary, D. J.; Willson, C. G. “Macromolecular Stereochemistry: The Out-of-Proportion Influence of Optically Active Comonomers on the Conformational Characteristics of Polyiscyanates,” Journal of the American Chemical Society 111 3452 (1989)
132.
(132)
Fr?chet, J. M. J.; Houlihan, F. M.; Bouchard, F.; Eichler, E.; Hult, A.; Allen, R.; MacDonald, S.; Ito, H.; Willson, C. G. “Chemical Amplification in the Design of Radiation-Sensitive Polymers,” Functional Polymers, Proc.IUCCP Sym. 6 193-200 (1989)
133.
(133)
Schellenberg, F. M.; Willson, C. G.; Levenson, M. D.; Sperley, K. M.; Brock P. J. “Photosensitized Polystyrene as a High Efficiency Relief Hologram Medium,” Practical Holography III, Proc.SPIE 1051 31-43 (1989)
134.
(134)
Willson, G. C.; MacDonald, S. A.; Ito, H.; Frechet, J. M. J. “Recent Progress in Organic Resist Materials,” Polym.for Microelec.(1) 3-18 (1990)
135.
(135)
Maltabes, John G.; Holmes, Steven J.; Morrow, James R.; Barr, Roger L.; Hakey, Mark; Reynolds, Gregg; Brunsvold, William R.; Willson, C. Grant; Clecak, Nick; MacDonald, Scott; Ito, Hiroshi. “1X Deep UV Lithography With Chemical Amplification for 1-Micron DRAM Production,” Advances in Resist Technology and Processing VII, Proc.SPIE 1262 2-7 (1990)
136.
(136)
Brock, Phillip J.; Willson, C. Grant; Swalen, Jerome D.; Jurich, Mark C.; Miller, Robert D.; Clecak, Nick J.; Logan, Tony; Frechet, J. M. J. “Generation of Optical Disk Servo Patterns by Lithographic Imaging of Photodeformable Polymers,” Optical Data Storage, Proc.SPIE 1316 235-247 (1990)
137.
(137)
Fr?chet, J. M. J.; Kryczka, B.; Matuszczak, S.; Reck, B.; Stanciulescu, M.; Willson, C. G. “Chemically Amplified Imaging Materials Based on Acid-Catalyzed Reactions of Polyesters or Electrophilic Crosslinking Processes,” J.Photopolym.Sci.& Tech 3(3) 235-247 (1990)
138.
(138)
McKean, Dennis R.; Hinsberg, William D.; Sauer, Thomas P.; Willson, C. Grant; Vicari, Richard; Gordon, Douglas J. “Methylated poly(4-hydroxystyrene) - A new resin for deep-ultraviolet resist application,” J.Vac.Sci.Technol.B 1466-1469 (1990)
139.
(139)
Jungbauer, D. ; Reck, B.; Twieg, R.; Yoon, D. Y.; Willson, C. G.; Swalen, J. D. “Highly efficient and stable nonlinear optical polymers via chemical crosslinking under electric field,” Appl.Phys.Lett. 56(26) 2610-2612 (1990)
140.
(140)
Kutal, Charles ; Weit, Scott K.; MacDonald, Scott A.; Willson, C. Grant. “New Inorganic Photoinitiators For Deep-UV Resist Materials,” J.Coat.Technol. 62(786) 63-67 (1990)
141.
(141)
Page, R. H.; Jurich, M. C.; Reck, B.; Sen, A.; Twieg, R. J.; Swalen, J. D.; Willson, C. G. “Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films,” J.Opt.Soc.Am.B 7(7) 1239-1250 (1990)
142.
(142)
Bjorklund, G. C.; Ducharme, S.; Jungbauer, D.; Moerner, J. D.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D. “Organic Nonlinear Optical Materials for Frequency Doubling, Modulation, and Switching,” Proc.Symp.Optics & Electronics for Organic Materials (1990)
143.
(143)
Swalen, J. D.; Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Moerner, W. E.; Smith, B. A.; Twieg, R.; Yoon, D.; Willson, C. G. “Organic nonlinear optical materials and their device applications for frequency doubling, modulation, and switching,” Nonlinear Optical Properties of Organic Materials III, Proc.SPIE 1337 2-11 (1990)
144.
(144)
McKean, Dennis R.; MacDonald, Scott A.; Johnson, Robert D.; Clecak, Nicholas J.; Willson, C. Grant. “Characterization of a Novolac-Based Three-Component Deep-UV Resist,” Chem.Mater. 2(5) 619-624 (1990)
145.
(145)
McKean, D. R.; Sauer, T. P.; Hinsberg, W. D.; Willson, C. G. “Synthesis, Characterization, and Lithographic Behavior of Methylated Poly(4-hydroxystyrene),” Polym.Prep. 31(2) 599-600 (1990)
146.
(146)
Pawlowski, G. ; Sauer, T.; Dammel, R.; Gordon, D. J.; Hinsberg, W.; McKean, D.; Lindley, C. R.; Merrem, H.-J.; Roschert, H.; Vicari, R.; Willson, C. G. “Modified Polyhydroxystyrenes as Matrix Resins for Dissolution Inhibition Type Photoresists,” Advances in Resist Technology and Processing VII, Proc.SPIE 1262 391-400 (1990)
147.
(147)
Kapitza, Heinrich ; Zentel, Rudolf; Twieg, Robert J.; Nguyen, Cattien; Vallerien, Sven Uwe; Kremer, Friedrich; Willson, C. Grant. “Ferroelectric Liquid Crystalline Polysiloxanes with High Spontaneous Polarization and Possible Applications in Nonlinear Optics,” Advanced Materials 2(11) 539-543 (1990)
148.
(148)
MacDonald, Scott A.; Schlosser, Hubert; Ito, Hiroshi; Clecak, Nicholas J.; Willson, C. Grant. “Plasma-Developable Photoresist Systems Based on Chemical Amplification,” Chem.Mater. 3 435-442 (1991)
149.
(149)
Bjorklund, G. C.; Ducharme, S.; Fleming, W.; Jungbauer, D.; Moerner, W. E.; Swalen, J. D.; Twieg, R.; Willson, C. G.; Yoon, D. “Applications of Organic Second Order Nonlinear Optical Materials,” Materials for nonlinear optics: chemical perspectives, ACS Sym.Ser.(13) 216-225 (1991)
150.
(150)
Embs, F. W.; Neher, D.; Wegner, G.; Miller, R. D.; Sooriyakumaran, R.; Willson, C. G. “Preparation of Oriented Mono and Multilayers of Poly(bis-butoxyphenylsilane) by the Langmuir-Blodgett-Technique,” Polym.Prep. 31(2) 298-299 (1991)
151.
(151)
Teraoka, I. ; Jungbauer, D.; Reck, B.; Yoon, D. Y.; Twieg, R.; Willson, C. G. “Stability of nonlinear optical characteristics and dielectric relaxations of poled amorphous polymers with main-chain chromophores,” J.Applied Physics 69(4) 2568-2576 (1991)
152.
(152)
Kutal, Charles ; Weit, Scott K.; Allen, Robert D.; MacDonald, Scott A.; Willson, C. Grant. “Novel Base-Generating Photoinitiators for Deep-UV Lithography,” Advances in Resist Technology and Processing VIII, Proc.SPIE 1466 362-367 (1991)
153.
(153)
MacDonald, S. A.; Clecak, N. J.; Wendt, H. R.; Willson, C. G.; Snyder, C. D.; Knors, C. J.; Deyoe, N. B.; Maltabes, J. G.; Morrow, J. R.; McGuire, A. E.; Holmes, S. J. “Airborne Chemical Contamination of a Chemically Amplified Resist,” Advances in Resist Technology and Processing VIII, Proc.SPIE 1466 2-12 (1991)
154.
(154)
Fahey, J. T.; Fr?chet, J. M. J.; Clecak, N.; Willson, C. G. “Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles,” Polym.Mat.Sci.& Eng. 64 241-269 (1991)
155.
(155)
Zentel, Rudolf ; Willson, C. Grant “New photoresists based on poly(trans-1,2-cyclohexylene diisocyanate),” Makromol.Chem., Rapid Commun. 12(8) 513-516 (1991)
156.
(156)
Willson, Grant C.; “Advances in Organic Resist Materials,” Polym.Mat.Sci.& Eng. 64 18-20 (1991)
157.
(157)
Twieg, R. ; Bjorklund, G.; Eich, M.; Herminghaus, S.; Jungbauer, D.; Reck, B.; Smith, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D.; Zentel, R. “Polymeric Nonlinear Optoelectronic Materials, Challenges and Opportunities,” Polym.Mat.Sci.& Eng. 64 66-67 (1991)
158.
(158)
Jungbauer, D. ; Teraoka, I.; Yoon, D. Y.; Reck, B.; Swalen, J. D.; Twieg, R.; Willson, C. G. “Second-order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores,” J.Applied Physics 69(12) 8011-8017 (1991)
159.
(159)
Matuszczak, Steven ; Cameron, James F.; Fr?chet, Jean M. J.; Willson, C. Grant. “Photogenerated Amines and their Use in the Design of a Positive-tone Resist Material based on Electrophilic Aromatic Substitution,” J.Mater.Chem. 1(6) 1045-1050 (1991)
160.
(160)
Yoon, D. Y.; Jungbauer; D., Teraoka, I.; Reck, B.; Zentel, R.; Twieg, R.; Swalen, J. D.; and Willson, C. G. “Second-Order NLO and Relaxation Properties of Poled Polymers,” Polym.Prep. 32(3) 102-104 (1991)
161.
(161)
Embs, F. W.; Wegner, G.; Neher, D.; Albouy, P.; Miller, R. D.; Willson, C. G.; Schrepp, W. “Preparation of Oriented Multilayers of Poly(silane)s by the Langmuir-Blodgett Technique,” Macromolecules 24(18) 5068-5075 (1991)
162.
(162)
Johannsmann, D. ; Embs, F.; Willson, C. G.; Wegner, G.; Knoll, W. “Visco-elastic properties of thin films probed with a quartz crystal resonator,” Makromol.Chem., Makromol.Symp. 46 247-251 (1991)
163.
(163)
Fr?chet, J. M. J.; Matuszczak, S.; Lee, S. M.; Fahey, J.; and Willson, C. G. “Chemically Amplified Resists Based on Polymer Side-Chain Rearrangement or Electrophilic Crosslinking,” Photopolymers: Principles - Processes and Materials, Society of Plastic Engineers, Inc. 31-40 (1991)
164.
(164)
Fr?chet, Jean M. J.; Matuszczak, Steven; Reck, Berndt; Stover, Harald D. H.; Willson, C. Grant. “Chemically Amplified Imaging Materials Based on Electrophilic Aromatic Substitution: Poly[4-(acetoxymethyl)styrene-co-4-(hydroxy)styrene],” Macromolecules 24(8) 1746-1754 (1991)
165.
(165)
St?ver, Harald D. H.; Matuszczak, Steven; Willson, C. Grant; Fr?chet, Jean M. J. “Design of Polymeric Imaging Materials Based on Electrophilic Aromatic Substitution: Model Studies,” Macromolecules 24(8) 1741-1745 (1991)
166.
(166)
Twieg, R. ; Burland, D.; Lux, M.; Moylan, C.; Nguyen, C.; Walsh, P.; Willson, C. G.; Zentel, R. “Synthetic Approaches to NLO Polymers,” Polym.Prep. 32(3) 80-81 (1991)
167.
(167)
Swalen, J. D.; Bjorklund, G. C.; Fleming, W.; Herminghaus, S.; Jungbauer, D.; Jurich, M.; Moerner, W. E.; Reck, B.; Smith, B. A.; Twieg, R.; Willson, C. G.; Zentel, R. “Poled Epoxy Polymers for Optoelectronics,” Organic Molecules for Nonlinear Optics and Photonics 94 433-445 (1991)
168.
(168)
Neher, D. ; Mittler-Neher S.; Cha, M.; Stegeman, G.; Embs, F. W.; Wegner, G.; Miller, R. D.; Willson, C. G. “Determination of the Orientational Order Parameters , in a Polysilane LB Film via Polarization Dependent THG,” Nonlinear Optical Properties of Organic Materials IV, Proc.SPIE 1560 335-343 (1991)
169.
(169)
Ebert, M. ; Lux, M.; Smith, B. A.; Twieg, R.; Willson, C. G.; Yoon, D. Y. “Nonlinear Optical Properties of Linear Epoxy Polymers with Pendant Sulfonyl Tolan Groups,” Polym.Prep. 32(3) 130-131 (1991)
170.
(170)
Zentel, R. ; Poths, H.; Kremer, F.; Jungbauer, D.; Twieg, R.; Willson, C. G.; Yoon, D. “Polymeric Liquid Crystals: Structural Basis for Ferroelectric and Nonlinear Optical Properties,” Polymers for Advanced Technologies 3 211-217 (1992)
171.
(171)
Fr?chet, J. M. J.; Lee, S. M.; Matuszczak, S.; Shacham-Diamand, Y.; MacDonald, S. A.; Willson, C. G. “Novel Chemically Amplified Dry-Developing Imaging Materials for High Resolution Microlithography,” Journal of Photopolymer Science and Technology 5(1) 17-30 (1992)
172.
(172)
Betterton, K. ; Ebert, M.; Haeussling, L.; Lux, M. G.; Twieg, R. J.; Willson, C. G.; Yoon, D. “Strategies for Crosslinking NLO-Polymers Across the Chromophore,” Proc.Am.Chem.Soc. 66 312-313 (1992)
173.
(173)
MacDonald, Scott A.; Schlosser, Hubert; Clecak, Nicholas J.; Willson, C. Grant. “A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal,” Chem.Mater. 4 1364-1368 (1992)
174.
(174)
Wallraff, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturtevant, J. L. “A Chemically Amplified Photoresist for Visible Laser Direct Imaging,” J.Imaging Sci. 36(5) 468-476 (1992)
175.
(175)
Wallraff, G. M.; Allen, R. D.; Hinsberg, W. D.; Willson, C. G.; Simpson, L. L.; Webber, S. E.; Sturtevant, J. L. “A Chemically Amplified Photoresist for Visible Laser Direct Imaging,” Polym.Mat.Sci.& Eng. 66 49-51 (1992)
176.
(176)
Twieg, R. ; Ebert, M.; Jungbauer, D.; Lux, M.; Reck, B.; Swalen, J.; Teraoka, I.; Willson, C. G.; Yoon, D. Y.; Zentel, R. “Nonlinear Optical Epoxy Polymers with Polar Tolan Chromophores,” Mol.Cryst.Liq.Cryst. 217 19-24 (1992)
177.
(177)
Fahey, J. T.; Shimizu, K.; Fr?chet, J. M. J.; Clecak, N.; Willson, C. G. “Resist System Based on the Cationic Photocrosslinking of Poly(4-hydroxystyrene) and Polyfunctional Electrophiles,” Journal of Polymer Science, Part A: Polymer Chemistry 31(1) 1-11 (1993)
178.
(178)
MacDonald, Scott A.; Hinsberg, William D.; Wendt, H. Russell; Clecak, Nicholas J.; Willson, C. Grant; Snyder, Clinton D. “Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem,” Chem.Mater. 5 348-356 (1993)
179.
(179)
Fr?chet, J. M. J.; Cameron, J. F.; Chung, C. M.; Haque, S. A.; Willson, C. G. “Photogenerated Base as Catalyst for Imidization Reactions: A new design of photosensitive polymers,” Polym.Bull.Berlin 30 369-375 (1993)
180.
(180)
Leung, Man-kit ; Fr?chet, Jean M. J.; Cameron, James F.; Willson, C. Grant. “Photogenerated base and chemical amplification: a new resist based on catalyzed decarboxylation,” Polym.Mat.Sci.& Eng. 68 30-31 (1993)
181.
(181)
Zentel, Rudolf ; Jungbauer, Dietmar; Twieg, Robert J.; Yoon, Do Y.; Willson, C. Grant. “Synthesis and non-linear optical characteristics of crosslinked and linear epoxy polymers with pendant tolane chromophores,” Makromol.Chem. 194 859-868 (1993)
182.
(182)
Willson, C. G.; Cameron, J. F., MacDonald, S. A., Niesert, C. P., Frechet, J. M. J., Leung, M. K., and Ackmann, A. “Recent Advances in Chemically Amplified Resist Materials,” Polym.Mat.Sci.& Eng., Proc.ACS 68 60 (1993)
183.
(183)
Willson, C. G.; Cameron, J. F.; MacDonald, S. A.; Niesert C.-P.; Fr?chet, J. M. J.; Leung, M. K., Ackmann, A. “Resist Materials Design: Base-catalyzed Chemical Amplification,” Advances in Resist Technology and Processing X, Proc.SPIE 1925 354-365 (1993)
184.
(184)
MacDonald, Scott A.; Willson, C. Grant; Fr?chet, Jean M. J. “Chemical Amplification in High-Resolution Imaging Systems,” Accounts of Chemical Research 27(6) 151-158 (1994)
185.
(185)
Lee, Ming S.; Fr?chet, Jean M. J.; Willson, C. Grant. “Photocrosslinking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities,” Macromolecules 27 5154 (1994)
186.
(186)
Renaldo, Alfred F.; Lauchlan, Laurie J., Hofer, Donald C., Hinsberg, William D., McKean, Dennis R., Santini, Hugo A., and Willson, C. Grant. “Lithographic performance of a positive photoresist for thick-film applications,” Advances in Resist Technology and Processing XII, Proc.SPIE 2438 853-866 (1995)
187.
(187)
Tsiartas, Pavlos C.; Simpson, Logan L.; Qin, Anwei; Willson, C. Grant; Krukonis, Val J.; Gallagher-Wetmore, P. M. “Effect of Molecular Weight Distribution on the Dissolution Properties of Novolac Blends,” Advances in Resist Technology and Processing XII, Proc.SPIE 2438 261-271 (1995)
188.
(188)
Tsiartas, P. C.; Simpson, L. L.; Willson, C. G.; Allen, R. D.; Krukonis, V. J. Gallagher-Wetmore, P. M. “Molecular weight, ionic strength and temperature effects on the dissolution rate of low molecular weight Novolac fractions,” Proc.PMSE 72 209 (1995)
189.
(189)
Ahn, Kwang-Duk ; Willson, C. Grant. “Synthesis of Polymers Having N-Hydroxymaleimide Units by Thermolysis of N-(Isopropyloxycarbonyloxy)maleimide Polymers,” Bull.Korean Chem.Soc. 16(5) 443-449 (1995)
190.
(190)
Leung, Man-kit ; Fr?chet, Jean M. J.; Cameron, James F.; Willson, C. Grant. “Design and Synthesis of Photoactive Polymer Systems Base on Amine-Catalyzed Intramolecular Imidization of Polymer Side Chains,” Macromolecules 28(13) 4693-4700 (1995)
191.
(191)
Ahn, Kwang-Duk ; Koo, Deok-II; Willson, C. Grant. “Synthesis and polymerization of t-BOC protected maleimide monomers: N-(t-butyloxycarbonyloxy)maleimide and N-[p-(t-butyloxycarbonyloxy)phenyl]-maleimide,” Polymer 36(13) 2621-2628 (1995)
192.
(192)
Cameron, James F.; Willson, C. Grant; Fr?chet, Jean M. J. “New Photolabile Amino Protecting Groups: Photogeneration of Amines from [(3',5'-Dimethoxybenzoinyl)oxy]carbonyl Carbamates,” J.Chem.Soc., Chem.Commun. 923-924 (1995)
193.
(193)
Willson, Grant C.; Herr, Daniel. “Advances in photoresists will require coordinated university research effort,” Solid State Technology 199-200 (1995)
194.
(194)
Willson, G. C.; “Polymeric photoimaging materials,” Proc.PMSE 73 455 (1995)
195.
(195)
Brown, Smart ; Ackmann, Paul; Wenner, Val; Lowell, John; Ostrout, Wayne; Willson, C. Grant. “Passive evaluation of surface and bulk ionic deposition from resist removal using surface photovoltage,” Proc.SEMI/IEEE Advanced Semiconductor Manufacturing Conference and Workshop (ASMC) 316-321 (1995)
196.
(196)
McKean, Dennis R.; Russell, Thomas P.; Hinsberg, William D.; Hofer, Don; Renaldo, Alfred E.; Willson, C. Grant. “Thick film positive photoresist. Development and resolution enhancement technique,” J.Vac.Sci.Technol.B 13(6) 3000-3006 (1995)
197.
(197)
Henderson, Clifford L.; Tsiartas, Pavlos C.; Simpson, Logan L.; Clayton, Kelly D.; Pancholi, Sanju; Pawloski, Adam R.; Willson, C. Grant. “Factors Affecting the Dissolution Rate of Novolac Resins II: Developer Composition Effects,” Advances in Resist Technology and Processing XIII, Proc.SPIE 2724 481-490 (1996)
198.
(198)
Lin, Quinhuang ; Simpson, Logan; Steinh?usler, Thomas; Wilder, Michelle; Willson, C. Grant; Havard, Jennifer; Fr?chet, Jean M. J. “Water-Soluble Resist for ,” Metrology, Inspection, and Process Control for Microlithography X, Proc.SPIE 2725 308-318 (1996)
199.
(199)
Willson, C. G.; Cameron, J. F.; Frechet, J. M. J. “Photogeneration of amines and application to chemically amplified resist design,” Polym.Mat.Sci.& Eng., Proc.ACS 74 437 (1996)
200.
(200)
Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J. “Design and development of new photobase generators derived from a-keto carbamates,” Polym.Mat.Sci.& Eng., Proc.ACS 74 284-285 (1996)
201.
(201)
Cameron, J. F.; Willson, C. G.; and Frechet, J. M. J. “Photogeneration of amines from a-keto carbamates: New photocatalysis for polymer modification,” Polym.Mat.Sci.& Eng., Proc.ACS 74 323-324 (1996)
202.
(202)
Cameron, James F.; Willson, C. Grant; Fr?chet, Jean M. J. “Photogeneration of Amines from a-Keto Carbamates: Photochemical Studies,” Journal of the American Chemical Society 118(51) 12925-12937 (1996)
203.
(203)
Willson, C. G.; “Comments on,” Journal of Polymer Science, Part A: Polymer Chemistry 34 3229-3230 (1996)
204.
(204)
Allen, Robert D.; Sooriyakumaran, Ratnam; Opitz, Juliann; Wallraff, Gregory M.; DiPietro, Richard A.; Breyta, Gregory; Hofer, Donald C.; Kunz, Roderick R.; Jayaraman, Saikumar; Shick, Robert; Goodall, Brian; Okoroanyanwu, Uzodinma; and Willson, C. Grant. “Protecting Groups for 193-nm Photoresists,” Advances in Resist Technology and Processing XIII, Proc.SPIE 2724 334-343 (1996)
205.
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Allen, R. D.; Sooriyakumaran, R.; Opitz J.; Wallraff G. M.; Breyta G.; DiPietro R. A.; Hofer D. C.; Okoroanyanwu U. and Willson C. G. “Progress in 193 nm Positive Resists,” Journal of Photopolymer Science and Technology 9(3) 465-474 (1996)
206.
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Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang. “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc.SPIE 3051 529-540 (1997)
207.
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Willson, Grant C.; Dammel, Ralph A.; and Reiser, Arnost. “Photoresist Materials: A Historical Perspective,” Proc.SPIE 3049 28-41 (1997)
208.
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McAdams, Christopher L.; Tsiartas, Pavlos C., and Willson, C. Grant. “Structure-Function Correlation Studies of Dissolution Inhibitors for Novolac-based Photoresists,” Polym.Mat.Sci.& Eng. 77 437-438 (1997)
209.
(209)
Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; Willson, C. Grant; Schr?eder, U. Paul. “Synthesis, Polymorphism and Electro-optic Properties of a New Class of Ligated Twin Sc* Liquid Crystals,” Polym.Prep. 38(1) 412-413 (1997)
210.
(210)
Tsiartas, Pavlos C.; Flanagin, Lewis W.; Henderson, Clifford L.; Hinsberg, William D.; Sanchez, Isaac C.; Bonnecaze, Roger T.; Willson, C. Grant. “The Mechanism of Phenolic Polymer Dissolution: A New Perspective,” Macromolecules 30(16) 4656-4664 (1997)
211.
(211)
Fr?chet, Jean M. J.; Leung, Man-kit; Urankar, Edward J.; Willson, C. Grant; Cameron, James F.; MacDonald, Scott A.; Niesert, Claus P. “Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation,” Chem.Mater. 9(12) 2887-2893 (1997)
212.
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Mack, C. A.; Mueller, K. E.; Gardiner, A. B.; Qiu, A.; Dammel, R. R.; Koros, W. G.; Willson, C. G. “Diffusivity Measurements in Polymers, Part 1: Lithographic Modeling Results,” Proc.SPIE 3049 355-362 (1997)
213.
(213)
Gardiner, Allen B.; Qin, Anwei; Henderson, Clifford L.; Pancholi, Sanju; Koros, William J.; Willson, C. Grant; Dammel, Ralph R.; Mack, Chris; Hinsberg, William D. “Diffusivity Measurements in Polymers II: Residual Casting Solvent Measurement by Liquid Scintillation Counting,” Proc.SPIE 3049 850-860 (1997)
214.
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Mueller, Katherine E.; Koros, William J.; Wang, Yvonne Y.; and Willson, C. Grant. “Diffusivity Measurements in Polymers, Part III: Quartz Crystal Microbalance Techniques,” Proc.SPIE 3049 871-878 (1997)
215.
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Mueller, Katherine E.; Koros, William J.; Mack, Chris A.; and Willson, C. Grant. “Diffusivity Measurements in Polymers, Part IV: Acid Diffusion in Chemically Amplified Resists,” Proc.SPIE 3049 706-711 (1997)
216.
(216)
Henderson, Clifford L.; Willson, C. Grant; Dammel, Ralph R.; Synowicki, Ron A. “Bleaching-Induced Changes in the Dispersion Curves of DNQ Photoresists,” Proc.SPIE 3049 585-595 (1997)
217.
(217)
Henderson, Clifford L.; Pancholi, Sanju; Chowdhury, Sajed A.; Willson, C. Grant; Dammel, Ralph R. “Photoresist Characterization for Lithography Simulation Part 2: Exposure Parameter Measurements,” Proc.SPIE 3049 816-828 (1997)
218.
(218)
Henderson, Clifford L.; Tsiartas, Pavlos C.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Willson, C. Grant; Dammel, Ralph R. “Photoresist Characterization for Lithography Simulation Part 3: Development Parameter Measurements,” Proc.SPIE 3049 805-815 (1997)
219.
(219)
Henderson, Clifford L.; Tsiartas, Pavlos C.; Flanagin, Lewis W.; Pancholi, Sanju N.; Chowdhury, Sajed A.; Dombrowski, Katherine D.; Chinwalla, Ammar N.; and Willson, C. Grant. “Photoresist Characterization for Lithography Simulation Part 4: Processing Effects on Resist Parameters,” Proc.SPIE 3049 212-223 (1997)
220.
(220)
Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; Henke, Wolfgang. “Influence of optical nonlinearities of photoresists on the photolithographic process: applications,” Emerging Lithographic Technologies, Proc.SPIE 3048 (1997)
221.
(221)
Lin, Quinhuang ; Steinh?usler, Thomas; Simpson, Logan; Wilder, Michelle; Medeiros, David R.; Willson, C. Grant; Havard, Jennifer; and Fr?chet, Jean M. J. “A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist,” Chem.Mater. 9(8) 1725-1730 (1997)
222.
(222)
Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey; Medeiros, David; Willson, C. Grant; Niu, Quingshang J.; Frechet, Jean M. J.; Allen, Robert. “New Single Layer Positive Photoresists for 193 nm Photolithography,” Proc.SPIE 3049 92-103 (1997)
223.
(223)
Havard, Jennifer M.; Fr?chet, Jean M. J.; Pasini, Dario; Mar, Brenda; Yamada, Shintaro; Medeiros, David; Willson, C. Grant. “Design of a positive tone water-soluble resist,” Proc.SPIE 3049 437-447 (1997)
224.
(224)
Ficner, Stanley ; Dammel, Ralph R.; Perez, Yvette; Gardiner, Allen; Willson, C. Grant. “Refractive Indices In Thick Photoresist Films As A Function Of Bake Conditions And Film Exposures,” Proc.SPIE 3049 838-849 (1997)
225.
(225)
Willson, G. C.; Yueh, W.; Leeson, M. J.; Steinh?usler, T.; McAdams, C. L.; Dammel, R. R.; Sounik, J. R.; Aslam, M.; Vicari, R.; and Sheehan, M. T. “Non-chemically amplified 248 nm resist materials,” Proc.SPIE 3049 226-237 (1997)
226.
(226)
Leeson, Michael J.; Pawloski, Adam; Levering, Vrad; Yueh, Wang; and Willson, C. Grant. “Tailoring of a Photoactive Compound For Non-Chemically Amplified 248nm Resist Formulations,” Proc.SPIE 3049 861-870 (1997)
227.
(227)
Zhang, Linda P.; Eckert, Andrew R.; Willson, C. Grant; Webber, Stephen E.; Byers, Jeffrey. “Acid Diffusion through Polymer Films,” Proc.SPIE 3049 898-909 (1997)
228.
(228)
Lin, Quinhuang ; Katnani, Ahmad; Willson, C. Grant. “Effects of Crosslinking Agent on Lithographic Performance of Negative-Tone Resists Based on Poly(p-hydroxystyrene),” Proc.SPIE 3049 974-987 (1997)
229.
(229)
Niu, Jason Q.; Fr?chet, Jean M. J.; Okoroanyanwu, U.; Byers, J. D.; Willson, C. Grant. “Novel functional nortricyclene polymers and copolymers for 248 and 193 nm chemically amplified resists,” Proc.SPIE 3049 113-123 (1997)
230.
(230)
Okoroanyanwu, U. ; Byers, J.; Shimokawa, T.; Patterson, K.; Willson, C.G. “Alicyclic Polymers for 193 nm Lithography,” Proc. 11th International Conference on Photopolymers, SPE 1 (1997)
231.
(231)
Okoroanyanwu, U. ; Byers, J.; Shimokawa, T.; Webber, S.; Willson, C. G. “Deprotection Kinetics of New 193 nm Resists Derived from Alicyclic Polymers,” Proc. Am. Chem. Soc. Div. Polym. Mater.: Sci. and Eng., Las Vegas 77 469-470 (1997)
232.
(232)
Erdmann, Andreas ; Henderson, Clifford L.; Willson, C. Grant; and Henke, Wolfgang “Influence of optical nonlinearities of photoresists on the photolithographic process: Basics,” Optical Microlithography X, Proc. SPIE 3051 529-540 (1997)
233.
(233)
Okoroanyanwu, Uzodinma ; Byers, Jeffrey D.; Cao, Ti; Webber, Stephen E.; Willson, C. Grant. “Deprotection Kinetics of Alicylic Polymer Resist Systems Designed for 193 nm Lithography,” ACS Symp Ser. 706 174-190 (1998)
234.
(234)
Hashemi, Javad ; Wilson, James; James, Darryl; Kamala, Girish, Holtz, Mark; Khurts, Kurtis; Combs, Bret; Hale, Michael; Willson, C. Grant. “Design and Testing of a Three Dimensional Shock?Recovery System,” Proc. of the 3rd World Conference on Integrated Design and Proc. Tech., Berlin Germany 5 29-43 (1998)
235.
(235)
Okoroanyanwu, Uzodinma ; Byers, Jeffrey D.; Cao, Ti; Webber, Stephen E.; Willson, C. Grant. “Monitoring Photoacid Generation in Chemically Amplified Resist Systems,” Proc. SPIE 3333 747-757 (1998)
236.
(236)
Rau, Nicholas ; Neureuther, Andrew; Ogawa, Taro; Kubena, Randy; Stratton, Fred; Fields, Charles; Willson, C. Grant. “Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure,” Proc. SPIE 3333 1413-1419 (1998)
237.
(237)
Havard, Jennifer M.; Pasini, Dario; Fr?chet, Jean M. J.; Medeiros, David; Yamada, Shintaro; Willson, C. Grant. “Design and Preliminary Studies of Environmentally Enhanced Water-castable, Water-developable Positive Tone Resists: Model and Feasibility Studies,” Polymers for Micro- and Nano- Patterning Science Technology, ACS Symp. Series 706 262-275 (1998)
238.
(238)
Flanagin, Lewis W.; McAdams, Christopher L.; Tsiartas, Pavlos C.; Henderson, Clifford L.; Hinsberg, William D.; and Willson, C. Grant. “Probabilistic model for the mechanism of phenolic polymer dissolution,” Proc. SPIE 3333 268-277 (1998)
239.
(239)
Patterson, Kyle ; Okoroanyanwu, Uzodinma; Shimokawa, Tsutomu; Cho, Sungseo; Byers, Jeffrey; Willson, C. Grant. “Improving the Performance of 193nm Photoresists Based on Alicyclic Polymers,” Proc. SPIE 3333 425-437 (1998)
240.
(240)
Medeiros, David R.; Hale, Michael A.; Leitko, Jeffrey K.; and Willson, C. Grant. “Laterally Linked Liquid Crystal Dimers with Electro-optic Properties,” Chem.Mater. 10(7) 1805-1813 (1998)
241.
(241)
McAdams, Christopher L.; Tsiartas, Pavlos; and Willson, C. Grant. “The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: An Adaptation of the Probabilistic Approach,” Polymeric Materials for Micro- and Nano- Patterning, ACS Symp Series 706 292-305 (1998)
242.
(242)
Byers, Jeffrey ; Patterson, Kyle; Cho, Sungseo, McCallum; Martin, and Willson, C. Grant. “Recent Advancements In Cycloolefin Based Resists For ArF Lithography,” J.Photopolym.Sci.& Tech. 11(3) 465-474 (1998)
243.
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Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey; and Willson, C. Grant. “Alicylic Polymers for 193 nm Resist Applications: Synthesis and Characterization,” Chemistry of Materials 10(11) 3319-3327 (1998)
244.
(244)
Okoroanyanwu, Uzodinma ; Byers, Jeffrey; Shimokawa, Tsutomu; and Willson, C. Grant. “Alicylic Polymers for 193 nm Resist Applications: Lithographic Evaluation,” Chemistry of Materials 10(11) 3328-3333 (1998)
245.
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Havard, Jennifer ; Pasini, Dario; Frechet, Jean M. J.; Medeiros, David; Patterson, Kyle; Yamada, Shintaro. “The design and study of water-soluble positive- and negative-tone imaging materials,” Proc. SPIE 3333 111-121 (1998)
246.
(246)
Mack, Chris A.; Mueller, Katherine E.; Gardiner, Allen; Sagan, J. P.; Dammel, Ralph R.; Willson, C. Grant. “Modeling of solvent diffusion in photoresist,” J. Vac. Sci. Technol., B 16(6) 3779-3783 (1998)
247.
(247)
Erdmann, Andreas ; Henderson, Clifford; Willson, C. Grant; Dammel, Ralph R. “Some aspects of thick film resist performance and modeling,” Proc. SPIE 3333 1201-1211 (1998)
248.
(248)
Yamada, Shintaro ; Medeiros, David R.; Patterson, Kyle; Jen, Wei-Lun K.; Rager, Timo; Lin, Qinghuang; Lenci, Carlos; Byers, Jeffrey; Havard, Jennifer M.; Pasini, Dario; Frechet, Jean M. J.; Willson, C. Grant. “Postitive and negative tone water processable photoresists: a progress report,” Proc. SPIE 3333 245-253 (1998)
249.
(249)
Postnikov, Sergei V.; Somervell, Mark H.; Henderson, Clifford L.; Katz, Steven; Willson, C. Grant; Byers, Jeffrey; Qin, Anwei; Lin, Qinghuang “Top surface imaging through silylation,” Proc. SPIE 3333 997-1008 (1998)
250.
(250)
Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu; Byers, Jeffrey D.; Willson, C. Grant. “Pd(II) catalyzed addition polymerization an ring opening metathesis polymerization of alicyclic monomers: routes to new matrix resins for 193nm photolithography,” J. Mol. Catal. A: Chem. 133(1-2) 93-114 (1998)
251.
(251)
McAdams, Christopher L.; Flanagin, Lewis W.; Henderson, Clifford L.; Pawloski, Adam R.; Tsiartas, Pavlos; Willson, C. Grant. “The Dissolution of Phenolic Polymers in Aqueous Base: The Influence of Polymer Structure,” Proc. SPIE 3333 1171-1179 (1998)
252.
(252)
Henderson, C. L.; Scheer, S. A.; Tsiartas, P. C.; Rathsack, B. M.; Sagan, J. P.; Dammel, R. R.; Erdmann, A.; Willson, C. G. “Modeling Parameter Extraction for DNQ-Novolac Thick Film Resists,” Proc. SPIE 3333 256-267 (1998)
253.
(253)
Havard, Jennifer M.; Vladimirov, Nikolay; and Frechet, Jean M. J. “Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate,” Macromolecules 32 86-94 (1999)
254.
(254)
Havard, Jennifer ; Shim, S. Y.; Frechet, J.M.J.; Lin, Qinghuang; Medeiros, David R.; Willson, C. Grant; Byers, Jeffrey D. “Design of Photoresists with Reduced Environmental Impact. I. Water-soluble Resists Based on Photocrosslinking of Poly (vinyl alcohol),” Chem. Maters. 11 719-725 (1999)
255.
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Havard, Jennifer ; Yoshida, M., Pasini; D., Vladimirov, N.; Frechet, Jean M. J.; Medeiros, David R.; Patterson, Kyle; Yamada, Shintaro; Willson, C. Grant; Byers, Jeffrey D. “Design of Photoresists with Reduced Environmental Impact. II. Water-Soluble Resists Based on Photocrosslinking of Poly (2-Isopropenyl-2-oxazoline),” Journ. Poly. Sci. 37(9) 1225-1236 (1999)
256.
(256)
Flanagin, Lewis W.; McAdams, Christopher L.; Hinsberg, William D.; Sanchez, Isaac C.; Willson, C. Grant. “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Macromolecules 32(16) 5337-5343 (1999)
257.
(257)
Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant. “Molecular Model of Phenolic Polymer Dissolution in Photolithography,” Journ. Poly. Sci., Physics 37 2103-2113 (1999)
258.
(258)
Pasini, Dario ; Low, Eric; Meagley, Robert P.; Frechet, Jean M. J.; Willson, C. Grant; Byers, Jeffrey D. “Carbon-Rich Cyclopolymers: Their Synthesis, Etch Resistance, and Application to 193nm Microlithography,” Proc. SPIE 3678 94-101 (1999)
259.
(259)
Rathsack, B. M.; C. E. Tabery, S. A. Scheer, C. L. Henderson; M. Pochkowski, C. Philbin, F. Kalk; P. D. Buck and Willson,C. G. “Optical Lithography Simulation and Photoresist Optimization for Photomask Fabrication,” Proc. SPIE 3678 1215-1226 (1999)
260.
(260)
Hale, Michael A.; Medeiros, David R.; Dombrowski, Katherine D.; Willson, C. Grant. “X-Ray Diffraction and Torsional Viscosity Investigations of Laterally Linked Sc* Liquid Crystal Dimers,” Chem. Maters. 11(9) 2515-2519 (1999)
261.
(261)
Yamachika, Mikio ; Patterson, Kyle; Cho, Sungseo; Rager, Timo; Yamada, Shintaro; Byers, Jeffrey; Paniez, P. J.; Mortini, B.; Gally, S.; Sassoulas, P-O.; Willson, C. Grant. “Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists,” Jour. Photopoly. Sci. and Tech. 12(4) 553-559 (1999)
262.
(262)
Colburn, M. ; Johnson, S.; Damle, S.; Bailey, T.; Choi, B.; Wedlake, M.; Michaelson, T.; Sreenivasan, S.V.; Ekerdt, J.; and Willson, C. G. “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning,” Proc. SPIE 3676 379-389 (1999)
263.
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Rathsack, Benjamin M.; Tabery, Cyrus E.; Philbin, CeCe; Willson, C. Grant. “Lithography Simulation of Sub-0.30 Micron Resist Features for Photomask Fabrication using I-line Optical Pattern Generators,” Proc. SPIE 3873 484-492 (1999)
264.
(264)
Rathsack, Benjamin M.; Tabery, Cyrus E.; Stachowiak, Timothy B; Dallas, Tim; Xu, Cheng-Bai; Pochkowski, Mike; Willson, C. Grant. “Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator,” Proc. SPIE 3873 80-91 (1999)
265.
(265)
Burns, Sean D.; Gardiner, Allen B.; Krukonis, V.J.; Wetmore, Paula M.; Qin, Anwei; Willson, C. Grant. “The Measurement of Concentration Gradients in Resist Films by a ?Halt Development? Technique,” Proceedings of the American Chemical Society Division of Polymeric Materials: Science and Engineerin 81 81-84 (1999)
266.
(266)
Postnikov, Sergei ; Stewart, Michael; Tran, Hoang Vi; Nierode, Mark; Medeiros, David; Cao, T.; Byers, Jeffrey; Webber, Stephen; Willson, C. Grant. “Study of resolution limits due to intrinsic bias in chemically amplified photoresists,” J. Vac. Sci. Technol. B 17(6) 3335-3338 (1999)
267.
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Ruchhoeft, P. ; Colburn, Matthew; Choi, Byung; Johnson, Stephen; Bailey, Todd; Damle, Shilpa; Stewart, Michael; Ekerdt, John; Sreenivasan, S. V., Wolfe, Jack; Willson, C. Grant. “Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography,” J. Vac. Sci. Technol. B 17(6) 2965-2969 (1999)
268.
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Stewart, Michael ; Postnikov, Sergei; Tran, Hoang V.; Medeiros, David; Nierode, M. A.; Cao, T.; Byers, Jeff; Webber, Steven; Willson, C. Grant. “Measurement of Acid Diffusivity in Thin Polymer Films Above and Below Tg,” Proc. ACS, Polym. Mat. Sci. Eng. Div. 81 58 (1999)
269.
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Medeiros, David R.; Hale, Michael A..; Hung, Raymond J.P.; Leitko, Jeffrey K.; Willson, C. Grant. “Ferroelectric cyclic oligosiloxane liquid crystals,” J. Materials Chem. 9 1453-1460 (1999)
270.
(270)
Flanagin, Lewis W.; Singh, Vivek K.; Willson, C. Grant. “Surface Roughness Development During Photoresists Dissolution,” J. Vac. Sci. & Tech., B 17(4) 1371-1379 (1999)
271.
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Yamada, Shintaro ; Timo Rager; Jordan Owens; Jeffery Byers; Morton Nielsen; Willson, C. Grant. “The design and study of water-processable positive-tone photoresists,” Polym. Mat. Sci. Eng. 81 87-88 (1999)
272.
(272)
Kyle, Patterson ; Mikio Yamachika; Sungseo Cho; Timo Rager; Shintaro Yamada; Jeffery Byers; Willson,C. Grant. “Design of Alicyclic Polymers for 193 nm Photoresists Offering Enhanced Post-Exposure Delay Stability,” Polym. Mat. Sci. Eng. 81 43-44 (1999)
273.
(273)
Flanagin, Lewis W.; Christopher L. McAdams; William D. Hinsberg; Isaac C. Sanchez; Willson, C. Grant. “Mechanism of Phenolic Polymer Dissolution: Importance of Acid-Base Equilibria,” Polym. Mat. Sci. Eng. 81 469-472 (1999)
274.
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Brodsky, Colin J.; C. Grant Willson. “Interfacial Cationic Graft Polymerization Lithography,” Polym. Mat. Sci. Eng. 81 83-84 (1999)
275.
(275)
Somervell, Mark H.; Jeffery Byers; Willson, C. Grant. “Sources of Line Edge Roughness in a Negative Tone, top Surface Imaging System,” Polym. Mat. Sci. Eng. 81 28-29 (1999)
276.
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Yamada, Shintaro ; Owens, Jordan; Rager, Timo; Nielsen, Morton; Byers, Jeffery D.; Willson, C. Grant. “The Design and Study of Aqueous-Processable Positive Tone Photoresists,” Proc. SPIE 3999 569-578 (2000)
277.
(277)
Rathsack, Benjamin ; Tabery, Cyrus; Stachowiak, Timothy; Albelo, Jeff; and Willson, C. Grant. “Simulation Based Formulation of a Non-Chemically Amplified Resist for 257 nm Laser Mask Fabrication,” Proc. SPIE 3999 598-608 (2000)
278.
(278)
Somervell, Mark ; Fryer, David; Osborn, Brian; Patterson, Kyle; Cho, Sungseo; Byers, Jeffrey; and Willson, C. Grant. “Using Alicyclic Polymers in Top Surface Imaging Systems to Reduce Line Edge Roughness,” Proc. SPIE 3999 270-282 (2000)
279.
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Schmid, Gerard ; Singh, Vivek; Flanagin, Lewis; Stewart, Michael; Burns, Sean; and Willson, C. Grant “Recent Advances in a Molecular Level Lithography Simulation,” Proc. SPIE 3999 675-685 (2000)
280.
(280)
Stewart, Michael ; Somervell, Mark; Tran, Hoang Vi; Postnikov, Sergei; and Willson, C. Grant. “Study of Acid Transport Using IR Spectroscopy and SEM,” Proc. SPIE 3999 665-674 (2000)
281.
(281)
Cho, Sungseo ; Vander Heyden, Anthony; Byers, Jeffrey; Willson, C. Grant. “Negative tone 193 nm resists,” Proc. SPIE 3999 62-73 (2000)
282.
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Hale, Michael ; Clausi, Dominic; Willson, C. Grant; Dallas, Tim. “Ultrahigh pressure cell for materials synthesis,” Review of Scientific Instruments 71(7) 2784-2790 (2000)
283.
(283)
Chiba, Takashi ; Hung, Raymond; Yamada, Shintaro; Trinque, Brian; Yamachika, Mikio; Brodsky, Colin; Patterson, Kyle; Vander Heyden, Anthony; Jamieson, Andrew, Lin, Shang-Ho, Somervell, Mark; Byers, Jeffrey; Conley, Will; Willson, C. Grant. “157 nm Resist Materials: A Progress Report,” J. Photopolym Sci Technol. 13(4) 657-664 (2000)
284.
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Patterson, Kyle ; Somervell, Mark; Willson C. Grant. “Challenges in Materials Design for 157 nm Photoresists,” Solid State Technology 43 41 (2000)
285.
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Somervell, Mark ; Fryer, David; Osborn, Brian; Patterson, Kyle; Byers, Jeffrey; Willson, C. Grant “A Study of the Fundamental Contributions to Line Edge Roughness in a 193nm, Top Surface Imaging System,” J. Vac. Sci. & Tech. B 18(5) 2251-2559 (2000)
286.
(286)
Colburn, Matthew ; Grot, Annette; Amistoso, Marie; Choi, Byung Jin; Bailey, Todd; Ekerdt, John; Sreenivasan, S.V.; Hollenhorst, James; Willson, C. Grant. “Step and Flash Imprint Lithography for sub-100nm Patterning,” Proc. SPIE 3999 453-457 (2000)
287.
(287)
Patterson, Kyle ; Yamachika, Mikio; Hung, Raymond; Brodsky, Colin; Yamada, Shintaro; Somervell, Mark; Osborn Brian; Hall, Daniel; Dukovic, Gordana; Byers, Jeffrey; Conley, Willard; and Willson, C. Grant. “Polymers for 157nm Photoresist Applications: A Progress Report,” Proc. SPIE 3999 365-374 (2000)
288.
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Stewart, Michael D.; Patterson, Kyle; Somervell, Mark H.; Willson, C. Grant. “Organic imaging materials: A view of the future,” J. of Physical Organic Chemistry 13(12) 767-774 (2000)
289.
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Rager, Timo ; Willson, C. Grant. “Synthesis and Characterization of Diastereomerically Pure Tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylic acid Derivatives,” Helvetica Chemica Acta 83 2769-2782 (2000)
290.
(290)
Bailey, Todd ; Choi, Byung Jin; Colburn, Matthew; Meissl, Mario; Shaya, S.; Ekerdt, John G.; Sreenivasan, S.V.; Willson, C. G. “Step and flash imprint lithography: Template suface treatment and defect analysis,” J. Vac. Sci. Tech. B. 18(6) 3572-3577 (2000)
291.
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Brodsky, Colin ; Byers, Jeff; Conley, Will; Hung, Raymond; Yamada, Shintaro; Patterson, Kyle; Somervell, Mark; Trinque, Brian; Tran, Hoang Vi; Cho, Sungseo; Chiba, Takashi; Lin, Shang-Ho; Jamieson, Andrew; Johnson, Heather; Vander Heyden, Tony; Willson, C. Grant. “157nm Resist Materials: A Progress Report,” J. Vac. Sci. Technol. B 18 3396-3401 (2000)
292.
(292)
Brodsky, Colin ; Heather F. Johnson; Brian C. Trinque; Willson, C. Grant. “Graft Polymerization Lithography: Extending Top Surface Imaging,” Forefront of Lithographic Materials Research 187-196 (2000)
293.
(293)
Owens, J. ; S. Yamada; Willson, C. Grant. “The design and study of aqueous ? processable positive ? tone photoresists,” Forefront of Lithographic Materials Research, Forefront of Lithographic Materials Research, Proc 12t 229-238 (2000)
294.
(294)
Burns, S. D.; M .D. Stewart; J. N. Hilfiker; R. A. Synowicki; G. M. Schmid; C. Brodsky; Willson, C. G. “Determining Free Volume Changes During the PEB and PAB of a chemically Amplified Resist,” Forefront of Lithographic Materials Research, Proc 12th Conf. on Photopolymers, McAfee, NJ 323-334 (2000)
295.
(295)
Bailey, T. ; B. J. Choi; M. Colburn; A. Grot; M. Meissl; M. Stewart; J. G. Ekerdt; S. V. Sreenivasan; Willson, C. G. “Step and Flash Imprint Lithography: A Technology Review,” Future Electron Devices, Tokyo 11(4) 54 (2000)
296.
(296)
Willson, Grant C.; McAdams Christopher L.; Yueh Wang.; Osborn Brian P. “Synthesis of comb poly (4-hydroxystyrene) using conventional and ?living? free-radical polymerization,” Polym. Prepr. (ACS, DIV. Polym. Chem.) 41 946-947 (2000)
297.
(297)
Wilson, James N.; Hashemi, Javad; James, Darryl; Guven, Necip; Dallas, Tim; Kuhrts, Kurtis; Combs, Bret; Hale, Michael; Willson, C. Grant. “Metallurgical analysis and computer simulation of a solid steel sphere under shock loading,” AIP Conference Proceedings 505 479-482 (2000)
298.
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Bailey, T. ; Smith, B. J.; Colburn, M.; Meissl; M.; Sreenivasan, S. V.; Ekerdt, J. G.; Willson, C. G. “Step and Flash Imprint Lithography: Defect Analysis,” J. Vac. Sci. Tech. B 19(6) 2806 (2001)
299.
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Choi, B. J.; Sreenivasan, S. V.; Johnson,S.; Colburn, M.; Willson, C. G. “Design of Orientation Stages for Step and Flash Imprint Lithography,” Amer Soc Precision Eng 25(3) 192-199 (2001)
300.
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Choi, B. J.; Meissl, M., Colburn, M., Bailey, T., Ruchhoeft, P., Sreenivasan, S.V., Prins, F. Banerjee, S., Ekerdt, J. and Willson, C. G. “Layer-to-Layer Alignment for Step and Flash Imprint Lithography,” Proc. SPIE 4343 436-439 (2001)
301.
(301)
Brodsky, C. ; Trinque, B., Johnson, H. and Willson, C. G. “Advances in Graft Polymerization Lithography,” Proc. SPIE 4343 415-420 (2001)
302.
(302)
Rathsack, B. ; Tabery, C., Albelo, Jeff, Buck, P., and Willson, C. G. “Characterization of an Acetal Based Chemically Amplified Resist for 257 nm Laser Mask Fabrication,” Proc. SPIE 4186 8163-8168 (2001)
303.
(303)
Erdmann, Andreas ; Henderson, Clifford; Willson, C. Grant. “Impact of exposure induced refractive index changes of photoresists on the photolithographic process,” Journal of Applied Physics 89(12) 8163-8168 (2001)
304.
(304)
Gardiner, Allen ; Burns, Sean; Qin, Anwei; Willson, C. Grant. “Determination of Residual Casting Solvent Concentration Gradients in Resist Films by a ?Halt Development? Technique,” Jour. of Vac. Scie. & Tech. B 19(1) 136-141 (2001)
305.
(305)
Colburn, M. ; T. Bailey, B.J. Choi, J.G. Ekerdt, S.V. Sreenivasan, Willson, C.G. “Development and Advantages of Step-and-Flash Lithography,” Solid State Technology 46(7) 67 (2001)
306.
(306)
Willson, C. G.; Stewart, M. “Future resists,” Microlithography World (Special 10th Anniversary Issue) 10(3) 14 (2001)
307.
(307)
Tran, H. V.; Hung, R.J., Chiba, T., Yamada, S., Mrozek, T., Hsieh, Y-T., Chambers, C.R. Osborn, B.P.,Trinque, B.C., Pinoow, M.J., Sanders, D.P., Conner, E.F., Grubbs, R.H., Conley, W., MacDonald, S.A., Willson, C. G. “Fluoropolymer Resist Materials for 157 nm Microlithography,” J. Photopolym. Sci. Technol 14 669-674 (2001)
308.
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Hung, R. ; Tran, H.V., Trinque, B., Chiba, T., Yamada, S., Sanders, D., Connor, E., Grubbs, R., Klopp, J., Frechet, M.J., Thomas, B., Shafer, G., DesMarteau, Conley, W., Willson, C. G. “Resist Materials for 157 nm Microlithography: An Update,” Proc. SPIE 4345 385-395 (2001)
309.
(309)
Schmid, G. ; Smith, M., Mack, C., Singh, V., Burns, S. and Willson, C. G. “Understanding Molecular Level Effects during Post Exposure Processing,” Proc. SPIE 4345 1037-1047 (2001)
310.
(310)
Jamieson, A. ; Somervell, M., Tran, H.V., Hung, R., MacDonald, S., Willson, C. G. “Top Surface Imaging at 157 nm,” Proc. SPIE 4345 406-416 (2001)
311.
(311)
Burns, S. ; Gardiner, A.; Krukonis, V.; Wetmore, P.; Schmid, G.; Lutkenhaus, J.; Flanagin, L.; and Willson, C. G. “Understanding Nonlinear Dissolution Rates in Photoresists,” Proc. SPIE 4345 37-49 (2001)
312.
(312)
Stewart, M. ; Schmid, G., Postnikov, S., Willson, C. G. “Mechanistic Understanding of Line End Shortening,” Proc. SPIE 4345 10-18 (2001)
313.
(313)
Hall, D. ; Osborn, B., Patterson, K., Burns, S., and Willson, C. G. “Dissolution Behavior of Fluoroalcohol-Substituted Polystyrenes,” Proc. SPIE 4345 1066-1072 (2001)
314.
(314)
Rathsack, Benjamin M.; Peter I. Tattersall, Cyrus E. Tabery, Kathleen Lou, Tim B. Stachowiak, David R. Medeiros, Jeff A. Albelo, Peter Y. Pirogovsky, Dennis R. Mckean and Willson, C. Grant. “The Rational Design of Bleachable Non-Chemically Amplified DUV Photoactive Compunds,” Proc. SPIE 4345 543- xx (2001)
315.
(315)
Lehar, Octavia P.; Mark Spak, Stephen Meyer, Ralph R. Dammel, Colin Brodsky and Willson, C. Grant. “Resist Re-Hydration During Thick Film Processing,” Proc. SPIE 4345 463-474 (2001)
316.
(316)
Klopp, John ; Pasini, Dario; Byers, Jeffrey; Willson, C. Grant; Frechet, Jean M.J. “Microlithographic Assessment of a Novel Family Transparent and Etch Resistant Chemically Amplified 193nm Resists Based on Cyclopolymers,” Chem Mater. 13 4147-4153 (2001)
317.
(317)
Colburn, M. ; Grot, A., Choi, B. J., Amistoso, M., Bailey, T., Sreenivasan, S.V., Ekerdt, J., and Willson, C. G. “Patterning non-flat substrates with a low pressure, room temperature imprint lithography process,” Jour. of Vac. Sci. & Tech. B 19(6) 2162-2172 (2001)
318.
(318)
Colburn, M. ; Suez, I., Choi, B. J., Meissl, M., Bailey, T., Sreenivasan, S.V., Ekerdt, J. G., and Willson, C. G. “Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers,” Jour. of Vac. Sci. & Tech. B 19(6) 2685-2689 (2001)
319.
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Stewart, M. D.; Willson, C. G. “Photoresists,” Encyclopedia of Materials: Science and Technology (Book Chapter) 6973-6978 (2001)
320.
(320)
Schmid, Gerard M.; Michael D. Stewart; Vivek K. Singh; Willson, C.G. “Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists,” Jour. of Vac. Sci. & Tech. B 20(1) 185-190 (2002)
321.
(321)
Burns, S. ; Schmid G.; Tsiartas P.; Willson C. G. “Advancements to the Critical Ionization Dissolution Model,” Jour. of Vac. Sci. & Tech. B 20(2) 537-543 (2002)
322.
(322)
Trinque, B. ; Chiba, T., Hung, R., Chambers, C., Pinnow, M., Tran, H.V., Wunderlich, J., Hsieh, Y., Thomas, B., Shafer, G., Shafer, D., DesMartequ, D., Conley, W. and Willson, C. G. “Recent Advances in Resists for 157nm Microlithography,” Jour. of Vac. Sci. & Tech. B 20(2) 531-536 (2002)
323.
(323)
Resnick, D. J.; D.P. Mancini, S.V. Sreenivasan, Willson, C.G. “Release Layers for Contact and Imprint Lithography,” Semiconductor International, June 2002 71-80 (2002)
324.
(324)
Bailey, T. C.; D.J. Resnick, D. Mancini, K.J. Nordquist, W.J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, and Willson, C.G. “Template Fabrication Schemes for Step and Flash Imprint Lithography,” Microelectronic Engineering 61-62 461-467 (2002)
325.
(325)
Tran, H. V.; Hung, R. J.; Chiba, T.; Yamada, S.; Mrozek, T.; Hsieh, Y.-T.; Chambers, C. R.; Osborn, B. P.; Trinique, B. C.; Pinnow, M. J.; MacDonald, S. A.; and Willson, C. G. “Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications: II. Fluorinated Norbornenes - Synthesis, Polymerization, and Initial Imaging Results,” Macromolecules 35(17) 6539-6549 (2002)
326.
(326)
Bailey, T. C.; Johnson, S. C.; Sreenivasan, S. V.; Ekerdt, J. G.; Willson, C. G. “Step and Flash Imprint Lithography: An Effective Nanoscale Patterning Method,” J. Photopolymer Sci. Tech. 15(3) 481 (2002)
327.
(327)
Sreenivasan, S. V.; Willson, C. G.; Schumaker, N. E.; and Resnick, D. J. “Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography,” Proc. SPIE 4688 903-909 (2002)
328.
(328)
Willson, G. C.; Trinique, B. C., Osborn, B. P., Chambers, C. R., Hsieh, Y., Kusumoto, S., Zimmerman, P., Miller, D. and Conley, W. “Fluorinated Polymers and Dissolution Inhibitors for 157nm Microlithography,” ACS Preprint, 224:012-Fluor Part 1, Aug. 18 (2002)
329.
(329)
Resnick, D. J.; Dauksher, W. J.; Mancini, D.; Nordquist, K. J.; Ainley, E.; Gehoski, K.; Baker, J. H.; Bailey T. C.; Choi, B. J.; Johnson, S.; Sreenivasan, S. V.; Ekerdt, J. G.; and Willson, C. G. “High Resolution Templates for Step and Flash Imprint Lithography,” Proc. SPIE: Emerging Lithographic Technologies VI 4688 205-213 (2002)
330.
(330)
Dauksher, W. J.; Nordquist, K. J.; Mancini, D. P., Resnick, D. J., Baker, J. H.; Hooper, A. E.; Talin, A. A.; Bailey, T. C.; Lemonds, A. M.; Sreenivasan, S.V.; Ekerdt, J. G.; Willson, C. G. “Characterization of and Imprint Results using ITO-based Step and Flash Imprint Lithography Templates,” J. Vac. Sci. Tech. B 20(6) (2002)
331.
(331)
Mancini, D. P.; Gehoski, K. A., Ainley, E., Nordquist, K. J., Resnick, D. J., Bailey, T. C., Sreenivasan S. V., Ekerdt, J. G., Willson, C. G. “Hydrogen Silsesquioxane for Direct E-beam Patterning of Step and Flash Imprint Lithography Templates,” J. Vac. Sci. Tech. B 20(6) (2002)
332.
(332)
Resnick, D. J.; Bailey, T.C., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissi, M. Sreenivasan, S.V., Ekert, J.G., Willson.C. G. “New Methods for Fabricating Step and Flash Imprint Lithography Templates,” Proc .SPIE 4608 176-181 (2002)
333.
(333)
Willson, G. C.; Trinque, B. C., Osborn, B. P., Chambers, C. R, Hsieh, Y. T., Chiba, T., Zimmerman, P., Miller, D., Conley, W. “The Design of Resist Materials for 157nm Lithography,” J. of Photopolymer Sci. and Tech. 15(4) 583-590 (2002)
334.
(334)
Lin, Eric K.; Soles, Christopher L.; Goldfarb, Dario L.; Trinque, Brian C.,: Burns, Sean D.; Jones, Ronald L.; Lenhart, Joseph L.; Angelopoulos, Marie; Willson, C. Grant; Satija, Shil K.; Wu, Wen-li. “Direct Measurement of the Reaction Front in Chemically Amplified Photoresists,” Science 297 372-375 (2002)
335.
(335)
Schmid, Gerard M.; Burns, Sean D., Tsiartas, Pavlos C., and Willson, C. Grant. “Electrostatic Effects During Dissolution Of Positive Tone Photoresists,” Journal of Vacuum Science & Technology, B 20(6) 2913 (2002)
336.
(336)
Sreenivasan, S. V.; Willson, C. G.; Schumaker, N. E.; Resnick, D. J. “Low-cost nanostructure patterning using step and flash imprint lithography,” Proc. SPIE 4608 187-194 (2002)
337.
(337)
Stewart, Michael D.; Tran, Hoang Vi, Schmid, Gerard M., Stachowiak, Timothy B., Becker, Darren J., Willson, C. Grant. “Acid Catalyst Mobility in Resist Resins,” Journal of Vacuum Science & Technology, B 20(6) (2003)
338.
(338)
Trinque, Brian C.; Chambers, Charles R., Osborn, Brian P., Callahan, Ryan P., Lee, Geun Su, Kusumoto, Shiro, Sanders, Daniel P., Grubbs, Robert H., Conley, Willard E., Willson, C. Grant. “Vacuum-UV Influenced Design of Polymers and Dissolution Inhibitors For Next Generation Photolithography,” Journal of Fluorine Chemistry 122 17-26 (2003)
339.
(339)
Sanders, D. P.; Connor, E. F.; Grubbs, R. H.; Hung, R. J.; Osborn, B. P.; Chiba, T.; Mac Donald, S. A.; Willson, C. G.; Conley, W. “Metal-Catalyzed Addition Polymers for 157nm Resist Applications. Synthesis and Polymerization of Partially Flourinated, Ester-Functionalized Tricyclo[4.2.1.02,5]non-7-enes.,” Macromolecules 36(5) 1534-1542 (2003)
340.
(340)
Grayson, S. M.; Willson, C. G. “Self-orienting and self-assembling mesoscale amphiphilic hydrogels,” Polym. Mat. Sci. Eng. 89 219-220 (2003)
341.
(341)
Meiring, Jason E.; Matthew J. Schmid, Scott Grayson; Benjamen M. Rathsack; David M. Johnson, Romy Kirby, , Ramakrishnan Kannappan, Kalpana Manthiram; Jennifer Stotts; Zachary Hogan; Ryan J. Russell, Michael V. Pishko, Andrew D. Ellington, Willson, C. Grant. “Hydrogel biosensors arrays indexed through shape recognition,” Polym. Mat. Sci. Eng. 89 217-218 (2003)
342.
(342)
Willson, Grant C.; Trinque, Brian C. “The evolution of materials for the photolithographic process,” J. Photopoly. Sci. Tech. 16(4) 621-627 (2003)
343.
(343)
Sharif, Iqbal ; DesMarteau, Darryl; Ford, Larry; Shafer, Gregory J.; Thomas, Brian; Conley, Will; Zimmerman, Paul; Miller, Daniel; Lee, Guen Su; Chambers, Charles R.; Trinque, Brian C.; Chiba, Takashi; Osborn, Brian P.; Willson, C. Grant. “Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report,” Proc. SPIE 5039 33-42 (2003)
344.
(344)
Stewart, Michael D.; Schmid, Gerard M.; Goldfarb, Dario L.; Angelopoulos, Marie; Willson, C. Grant. “Diffusion-induced line-edge roughness,” Proc. SPIE 5039 415-422 (2003)
345.
(345)
Conley, Will ; Trinque, Brian C.; Miller, Daniel; Caporale, Stefan; Osborn, Brian P.; Kumamoto, Shiro; Pinnow, Matthew J.; Callahan, Ryan; Chambers, Charles R.; Lee, Guen Su; Zimmerman, Paul; Willson, C. Grant. “Negative photoresist for 157-nm microlithography: a progress report,” Proc. SPIE 5039 622-626 (2003)
346.
(346)
Chambers, Charles R.; Kusumoto, Shiro; Lee, Guen Su; Vasudev, Alok; Walthal, Leonidas; Osborn, Brian P.; Zimmerman, Paul; Conley, Will; Willson, C. Grant. “Dissolution inhibitors for 157-nm photolithography,” Proc. SPIE 5039 93-102 (2003)
347.
(347)
Burns, Sean D.; Schmid, Gerard M.; Trinque, Brian C.; Willson, James; Wunderlich, Jennifer; Tsiartas, Pavlos C.; Taylor, James C.; Burns, Ryan L.; Willson, C. Grant. “Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry,” Proc. SPIE 5039 1063-1075 (2003)
348.
(348)
Jones, Ronald L.; Hu, Tengjiao; Prabhu, Vivek M.; Soles, Christopher L.; Lin, Eric K.; Wu, Wen-li; Goldfarb, Dario L.; Angelopoulos, Marie; Trinque, Brian; Willson, C. Grant. “Deprotection volume characteristics and line-edge morphology in chemically amplified resists,” Proc. SPIE 5039 1031-1040 (2003)
349.
(349)
Smith, Britain J.; Stacey, Nicholas A.; Donnelly, J. P.; Onsongo, David M.; Bailey, Todd C.; Mackay, Chris J.; Resnick, Douglas J.; Dauksher, William J.; Mancini, David P.; Nordquist, Kevin J.; Sreenivasan, S. V.; Banerjee, Sanjay K.; Ekerdt, John G.; Willson, C. Grant. “Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device,” Proc. SPIE 5037 1029-1034 (2003)
350.
(350)
Resnick, Douglas J.; Dauksher, William J.; Mancini, David P.; Nordquist, Kevin J.; Bailey, Todd C.; Johnson, Stephen C.; Stacey, Nicholas A.; Ekerdt, John G.; Willson, C. Grant; Sreenivasan, S. V.; Schumaker, Norman E. “Imprint lithography: lab curiosity or the real NGL,” Proc. SPIE 5037 12-23 (2003)
351.
(351)
Johnson, Stephen C.; Bailey, Todd C.; Dickey, Michael D.; Smith, Britain J.; Kim, Eunha K.; Jamieson, Andrew T.; Stacey, Nicholas A.; Ekerdt, John G.; Willson, C. Grant; Mancini, David P.; Dauksher, William J.; Nordquist, Kevin J.; Resnick, Douglas J. “Advances in Step and Flash Imprint Lithography,” Proc. SPIE 5037 197-202 (2003)
352.
(352)
Johnson, Heather F.; Ozair, Sahban N.; Jamieson, Andrew T.; Trinque, Brian C.; Brodsky, Colin C.; Willson, C. Grant. “Cationic graft polymerization lithography,” Proc. SPIE 5037 943-951 (2003)
353.
(353)
Trinque, Brian C.; Osborn, Brian P.; Chambers, Charles R.; Hsieh, Yu-Tsai; Corry, Schuyler; Chiba, Takashi; Hung, Ryamond J.; Tran, Hoang Vi; Zimmerman, Paul; Miller, Daniel; Conley, Willard; Willson, C. Grant. “Advances in Resists for 157nm Microlithography,” Proc. SPIE 4690 58-68 (2003)
354.
(354)
Conley, Willard ; Miller, Daniel; Chambers, Charles; Osborn, Brian; Hung, Raymond J.; Tran, Hoang Vi; Trinque, Brian C.; Pinnow, Matthew; Chiba, Takashi; McDonald, Scott; Zimmerman, Paul; Dammel, Ralph; Rmano, Andrew; Willson, C. Grant. “Dissolution Inhibitors for 157nm Microlithography,” Proc. SPIE 4690 69-75 (2003)
355.
(355)
Conley, Will ; Trinque, Brian C.; Miller, Daniel; Zimmerman, Paul; Kudo, Takanori; Dammel, Ralph; Romano, Andrew; and Willson, C. Grant. “Negative Photoresist for 157nm Microlithography: A Progress Report,” Proc. SPIE 4690 94-109 (2003)
356.
(356)
Lin, Eric K.; Soles, Christopher L.; Goldfarb, Dario L.; Trinque, Brian C.; Burns, Sean D.; Jones, Ronald L.; Lenhart, Joseph L., Angelopoulos, Marie; Willson, C. Grant; Satija, Sushil K; Wu, Wen-li. “Measurement of the Spatial Evolution of the deprotection Reaction Front with Nanometer Resolution using Neutron Reflectometry,” Proc. SPIE 4690 313-320 (2003)
357.
(357)
Burns, Sean D.; Medeiros, David R.; Johnson, Heather F.; Wallraff, Gregory M.; Hinsberg, William D.; Willson, C. Grant. “The Effect of Humidity on Deprotection Kinetics in Chemically Amplified Resists,” Proc. SPIE 4690 321-331 (2003)
358.
(358)
Schmid, Gerard M.; Burns, Sean D.; Stewart, Michael D.; Willson, C. Grant. “Mesoscale Simulation of Positive Tone Chemically Amplified Photoresists,” Proc. SPIE 4690 381-390 (2003)
359.
(359)
Stewart, Michael D.; Becker, Darren J.; Stachowiak, Timothy B.; Schmid, Gerard M.? Michaelson, Timothy B.; Tran, Hoang Vi; Willson, C. Grant. “Acid Mobility in Chemically Amplified Photoresists,” Proc. SPIE 4690 943-951 (2003)
360.
(360)
Jamieson, Andrew ; Willson, C. Grant; Hsu, Yautzong; Brodie, Alan. “A Hydrogen Silsesquioxane Bilayer Resist Process for Low-Voltage Electron Beam Lithography,” Proc. SPIE 4690 1171-1179 (2003)
361.
(361)
Johnson, S. ; Resnick, D. J.; Mancini, D.; Nordquist, K.; Dauksher, W. J.; Gehoski, K.; Baker, J.H.; Baker, L.; Dues, A.; Hooper, A.; Bailey, T.C.; Sreenivasan, S.V.; Ekerdt, J.G.; Willson, C. G. “Fabrication of Multi-tiered structures on step and flash imprint lithography templates,” Microelectronic Engineering 67-68 221-228 (2003)
362.
(362)
Resnick, D. J.; Dauksher, W.J.; Mancini, D. P.; Nordquist, K. J.; Bailey, T.C.; Johnson, S. C.; Stacey, N. A.; Ekerdt, J. G.; Willson, C. G.; Sreenivasan, S.V.; Schumaker, N. E. “Imprint lithography for integrated circuit fabrication,” Jour. of Vac. Sci. & Tech., B: Microelectronics and Nanometer Structures?Processing, Measurement, an 21(6) (2003)
363.
(363)
Resnick, D. J.; Dauksher, W.J.; Mancini, D. P.; Nordquist, K. J.; Bailey, T.C.; Johnson, S. C.; Stacey, N. A.; Ekerdt, J. G.; Willson, C. G.; Sreenivasan, S. V. “Improved step and flash imprint lithography templates for nanofabrication,” Microelectronic Engineering 69(2-4) (2003)
364.
(364)
Schmid, Matthew ; Meiring, Jason; Kirby, Romy; Manthiram, Kalpana; Grayson, Scott; Ellington, Andrew; Willson, C. Grant. “Functionalizing hydrogel based biosensors with DNA oligomers for single nucleotide polymorphism detection,” Polym. Mater. Sci. Eng. 89 215-216 (2003)
365.
(365)
Schmid, Gerard M.; Burns, Sean D., Tsiartas, Pavlos C., and Willson, C. Grant. “Electrostatic Effects During Dissolution Of Positive Tone Photoresists,” Virtual Journal of Nanoscale Science & Technology (2003)
366.
(366)
Yamada, Shintaro ; Mrozek, Thomas; Rager, Timo; Owens, Jordan; Rangel, Jose; Willson, C. Grant; Byers, Jeffery. “Toward Environmentally Friendly Photolithographic Materials: A New Class of Water-Soluble Photoresists,” Macromolecules 37(2) 377-384 (2004)
367.
(367)
Kim, Eui K.; Stacey, N.A.; Smith, B. J.; Dickey, M.D., Johnson, S.C.; Trinque, B.C.; Willson, C. G. “Vinyl Ethers in Ultraviolet Curable Formulations for Step and Flash Imprint Lithography,” Jour. Vac. Sci. & Tech., B: Microelectronics and Nanometer Structures?Processing, Measurement, and Phenomena 22 131-135 (2004)
368.
(368)
Chambers, C. R.; Kusumoto, S.; Osborn, B. P.; Vasudeve, A.; Ootani, M.; Walthal, L.; McMichael, H.; Zimmerman, P. A.; Conley, W. E.; Willson, C. G. “Design of dissolution inhibitors for chemically amplified photolithographic systems,” Proc. SPIE 5376 360-368 (2004)
369.
(369)
Taylor, J. C.; Chambers, C. R.; Deschner, Ryan; LeSuer, R. J.; Conley, W. E.; Burns, S. D.; Willson, C. G. “Implications of immersion lithography on 193nm photoresists,” Proc. SPIE 5376 34-43 (2004)
370.
(370)
Tatersall, P. I.; Breslin, D.; Grayson, S. M.; Heath, W. H.; Lou, K.; McAdams, C.L.; McKean, D.; Rathsack, B. M.; Willson, C. G. “Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists,” Chem. Mater. 16(9) 1770-1774 (2004)
371.
(371)
Leeson, M. J.; Yueh, W.; Tattersall, P. I.; Pawloski, A.; Grayson, S. M.; Willson, C. G. “Synthesis and Reactivity of 3-Diazo-4-oxocoumarins for Photolithographic Applications,” Chem. Mater. 16(9) 1763-1769 (2004)
372.
(372)
LeSuer, R. J.; Fan, F. F.; Bard, A. J.; Taylor, C.; Tsiartas, P.; Willson, C. G.; Conley, W.; Feit, G.; Kunz, R. “Using scanning electrochemical microscopy t probe chemistry at the solid-liquid interface in chemically amplified immersion lithography,” Proc. SPIE 5376 115-125 (2004)
373.
(373)
Schmid, G. M.; Stewart, M. D.; Wang, C. Y.; Vogt, B. D.; Prabhu, V. M.; Lin, E. K.; Willson, C. G. “Resolution limitations in chemically amplified photoresist systems,” Proc. SPIE 5376 333-341 (2004)
374.
(374)
Colburn, Matthew ; Choi, Byung Jin; Sreenivasan, S.V.; Bonnecaze, Roger T.; Willson, C. Grant. “Ramifications of Lubrication Theory on Imprint Lithography,” Microelectronic Engineering 75(3) 321-329 (2004)
375.
(375)
Burns, R. L.; Johnson, S. C.; Schmid, G. M.; Kim, E. K.; Dickey, M. D.; Meiring, J.; Burns, S. D.; Stacey, N. A.; Willson, C. G. “Mesoscale modeling for SFIL simulating polymerization kinetics and densification,” Proc. SPIE 5374 348-360 (2004)
376.
(376)
Xu, F. ; Stacey, N.; Watts, M.; Truskett, V.; McMackin, I.; Choi, Jin; Schumaker, P.; Thompson, E.; Babs, D.; Sreenivasan, S.V.; Willson, C. G.; Schumaker, N. “Development of Imprint Materials for the Step and Flash Imprint Lithography Process,” Proc. SPIE 5374 232-241 (2004)
377.
(377)
Michaelson, Timothy ; Jamieson, Andrew; Pawloski, Adam R.; Byers, Jeffrey; Acheta, Alden; Willson, C. Grant. “Understanding the Role of Base Quenchers in Photoresists,” Proc. SPIE 5376 1282-1293 (2004)
378.
(378)
Jones, Ronald L.; Hu, Tengjiao; Lin, Eric K.; Wu, Wen-Li; Goldfarb, Dario L.; Angelopoulos, Marie; Trinque, Brian; Schmid, Gerard M.; Stewart, Michael D.; Willson, C. Grant. “Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists,” Journal of Polymer Science, Part B: Polymer Physics 42 3063-3069 (2004)
379.
(379)
Yan, X. ; Liu, G.; Dickey, M.; Willson, C. G. “Preparation of Porous Polymer Membranes Using Nano- or Micro-pillar Arrays as Templates,” Polymer 45 8469-8474 (2004)
380.
(380)
Meiring, J. E.; Schmid, M. J.; Grayson, S. M.; Rathsack, B. M.; Johnson, D. M.; Kirby, R.; Kannappan, R.; Manthiram, K.; Hsia, B.; Hogan, Z. L.; Ellington, A. D.; Pishko, M. V. and Willson, C. G. “Hydrogel Biosensor Array Platform Indexed by Shape,” Chem. Mater. 16 5574-5580 (2004)
381.
(381)
Jamieson, A. T.; Willson, C. G.; Brodie, A.; Hsu, Y. “Low voltage Electron Beam Lithography Resist Processes: Top Surface Imaging and Hydrogen Silisequioxane Bilayer,” JM3 3(3) 442-449 (2004)
382.
(382)
Schmid, Gerard M.; Stewart, Michael D.; Burns, Sean D.; Willson, C. Grant. “Mesoscale Monte Carlo Simulation of Photoresist Processing,” J. Electrochemical Soc. 151(2) (2004)
383.
(383)
Resnick, Douglas J.; Sreenivasan, S.V.; Willson, C. Grant. “Step and Flash Imprint Lithography,” Materials Today 8(2) 34-42 (2005)
384.
(384)
Yan, Xiaohu Yan; Liu, Guojun; Dickey, Michael; Willson, C. Grant. “Preparation of porous polymer membranes using nano- or micro-pillar arrays as templates,” Polymer 45 8469-8474 (2004)
385.
(385)
Schmid, Gerard ; Burns, Sean; Stewart, Michael; Stewart, Michael; Tsiartas, Pavlos; Meiring, Jason; and Willson, C. Grant. “Mesoscale Monte Carlo simulation of positive-tone, chemically amplified photoresist processing,” Polym. Mater. Sci. Eng. 90 285-286 (2004)
386.
(386)
Dickey, Michael ; Willson, C. G. “Effects of oxygen on step and flash imprint lithography photopolymerization kinetics,” Polym. Mater. Sci. Eng. 90 24-25 (2004)
387.
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Johnson, Heather ; Ozair, Sahban; Winters, Kristina; Willson, C. G. “Designing materials for cationic graft lithography,” Polym. Mater. Sci. Eng. 42 3063-3069 (2004)
388.
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Rathsack, Benjamin ; Medeiros, David; Willson, C. Grant. “Resists for Mask Making,” (Chapter 15) Handbook of PHotomask Manufacturing Technology. CRC Press, ISBN 0-8247-5274-7 (2005)
389.
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Gates, B. D.; Xu, Q.; Stewart, M.; Deschner, R.; Willson, C. G.; Whitesides, G. M. “New Approaches to Nanofabrication: Molding, Printing, and Other Techniques,” Chem. Rev. 105 1171-1196 (2005)
390.
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Stewart, M. D.; Johnson, S. C.; Sreenivasan, S. V.; Resnick, D. J.; Willson, C. G. “Nanofabrication with step and flash imprint lithography,” J. Microlith., Microfab., Microsyst. 4(1) 011002 (2005)
391.
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Michaelson, Tim ; Pawloski, Adam; Acheta, Alden; Nishimura, Yukio; Willson, C. G. “The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness,” Proc. SPIE 368-379 (2005)
392.
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Meiring, Jason ; Michaelson, Timothy B.; Jamieson, Andrew; Schmid, Gerard M.; Willson, C. Grant. “Using Mesoscale Simulation to Explore Photoresist Line Edge Roughness,” Proc. SPIE 5753 350-360 (2005)
393.
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Taylor, Christopher J.; Shayib, Ramzy; Goh, Sumarlin; Chambers, Charles R.; Conley, Will; Lin, Shang-Ho; Willson, C. Grant. “Fluids and resists for hyper NA immersion lithography,” Proc. SPIE 5753 836-846 (2005)
394.
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Conley, Will ; LeSuer, Robert J.; Fan, Frank F.; Bard, Allen J.; Taylor, Chris; Tsiartas, Pavlos; Willson, C. Grant; Romano, Andrew; Dammel, Ralph. “Understanding the Photoresist Surface-Liquid Interface for ArF Immersion Lithography,” Proc. SPIE 5753 64-77 (2005)
395.
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Kim, E. K.; Ekerdt, J. E.; Willson, C. G. “Importance of evaporation in the design of materials for step and flash imprint lithography,” J. Vac Sci. Technol. B 23(4) (2005)
396.
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Stewart, Michael D.; Wetzel, J.T.; Schmid, G.M.; Palmieri, F.; Thompson, E.; Kim, E. K.; Wang, D.; Sotoodeh, K.; Jen, K.; Johnson, S.C.; Hao, J.; Dickey, M.D.; Nishimura, Y.; Laine, R.M.; Resnick, D.J.; Willson, C. Grant. “Direct Imprinting of Dielectric Materials for Dual Damascene Processing,” Proc. SPIE 5751 210-218 (2005)
397.
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Tsiartas, Pavlos C.; Schmid, Gerard M.; Johnson, Heather F.; Stewart, Michael D.; Willson, C. Grant. “Quantifying acid generation efficiency for photoresist applications,” J. Vac. Sci Technol. B 23(1) 224-228 (2005)
398.
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Nishimura, Yukio ; Michaelson, Timothy B.; Meiring, Jason E.; Stewart, Michael D.; Willson, C. Grant. “Line Edge Roughness in Chemically Amplified Resist: Speculation, Simulation and Application,” Jour. of Photopolymer Science and Technology 18(4) 457-465 (2005)
399.
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Taylor, Christopher ; LeSuer, Robert J.; Chambers, Charles R.; Fan, Fu-Ren F.; Bard, Allen J.; Conley, Willard E.; Willson, C. Grant. “Experimental Techniques for Detection of Components Extracted from Model 193 nm Immersion Lithography Photoresists,” Chem. Mater. 17 4194-4203 (2005)
400.
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Dickey, M. D.; Burns, R. L.; Kim, E. K.; Johnson, S. C.; Stacey, N. A.; Willson, C. G. “A Study of the Kinetics of Step and Flash Imprint Lithography Photopolymerization,” AIChE Journal 51(8) 2547-2555 (2005)
401.
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Conley, N. R.; Hung, R. J.; Willson, C. Grant. “A New Synthetic Route to Authentic N-Substituted Aminomaleimides,” J. Org. Chem. 70(11) 4553-4555 (2005)
402.
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MacDonald, Susan ; Hughes, Greg; Stewart, Michael; Palmieri, Frank; Willson, C. Grant. “Design and Fabrication of Highly Complex Topographic Nano-imprint Template for Dual Damascene Full 3-D Imprinting,” Proc. SPIE 5992 59922 (2005)
403.
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Dickey, Michael D.; Willson, C. Grant. “Kinetic Parameters for Step and Flash Imprint Lithography Photopolymerization,” AIChE Journal 52(2) 777-784 (2006)
404.
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Pawloski, Adam R.; Acheta, Alden, Levinson, Harry J.; Michaelson, Timothy B.; Jamieson, Andrew; Nishimura, Yukio; Willson, C. Grant. “Line Edge Roughness and Intrinsic Bias for Two Methacrylate Polymer Resist Systems,” J. Microlith., Microfab., Microsyst. 5(2) 023001-1--16 (2006)
405.
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Yan, Xiaohu ; Liu, Guojun; Hu, Jiwen; Willson, C. Grant. “Co-aggregation of B-C and D-C Diblock Copolymers with H-Bonding C blocks in Block-selective Solvents,” Macromolecules 39(5) 1906-1912 (2006)
406.
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Kim, E. K.; Stewart, M. D.; Wu, K.; Palmieri, F.L.; Dickey, M. D.; Ekerdt, J. G. and Willson, C. G. “Vinyl Ether Formulations for Step and Flash Imprint Lithography,” J. Vac. Sci. Technol. B 23(6) 2967-2971 (2005)
407.
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Holcombe, Thomas W; Dickey, Michael; Willson, C. Grant. “A New Method for Covalently Bonding Functionality to ITO Films,” Southwest Joint Regional Meeting of ACS (2005)
408.
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Wu, K. ; Bailey, T. C.; Willson, C. G.; Ekerdt, J. G. “Surface Hydration and Its Effect on Fluorinated SAM Formation on SiO2 Surfaces,” Langmuir 21 11795-11801 (2005)
409.
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Johnson, S. ; Burns, R.; Kim, E. K.; Dickey, M.; Schmid, G.; Meiring, J.; Burns, S.; Willson, C. G. “Effects of etch barrier densification on step and flash imprint lithography,” J. Vac. Sci. Technol. B 23(6) 2553-2556 (2005)
410.
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Stewart, Michael D.; Willson, C. Grant. “Imprint Materials for Nanoscale Devices,” MRS Bulletin 30 947-951 (2005)
411.
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Dickey, M. D.; Stewart, M. D.; Willson, C. G. “An Automated Statistical Process Control Study of Inline Mixing Using Spectrophotemetric Detection,” Jour. of Chem. Ed. 83(1) 110-113 (2006)
412.
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Kim, E. K.; Willson, C. Grant. “Thermal analysis for step and flash imprint lithography during UV curing process,” Microelectronic Engineering 82(2) 212-217 (2006)
413.
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Dickey, Michael D.; Gupta, Suresh; Leach, K. Amanda; Collister, Elizabeth; Willson, C. Grant; Russell, Thomas P. “Novel 3-D Structures in Polymer Films by Coupling External and Internal Fields,” Langmuir 22(9) 4315-4318 (2006)
414.
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Costner, Elizabeth ; Taylor, J. Christopher; Caporale, Stefan; Wojtczak, William; Dewulf, Dean; Conley, Will; Willson, C. Grant. “New High Index Fluids for Immersion Lithography,” Proc. SPIE 6153 6153OB-1-10 (2006)
415.
(415)
Palmieri, Frank ; Stewart, Michael D.; Wetzel, Jeff; Hao, Jianjun; Nishimura, Yukio; Jen, Kane; Flannery, Colm; Li, Bin; Chao, Huang-Lin; Young, Soo; Kim, Woon Chun; Ho, Paul S.; Willson, C. Grant. “Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics,” Proc. SPIE 6151 6151-6159 (2006)
416.
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Lin, Michael W.; Chao, Huang-Lin; Kim, Eui K.; Palmieri, Frank; Kim, Woon C.; Dickey, Michael; Ho, Paul S.; Willson, C. G. “Planarization for reverse-tone step and flash imprint lithography,” Proc. SPIE 6151 61512G (2006)
417.
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Tsiartas, Pavlos C.; Dickey, Michael D.; Allrich, Keris E.; Willson, C. G. “Photocurable Pillar Arrays Formed via AC- and Ultrasound-Induced Electrohydrodynamic Instabilities,” Proc. SPIE 6151 920-926 (2006)
418.
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Schmid, Gerard M.; Stewart, Michael D.; Wetzel, Jeffrey; Palmieri, Frank; Hao, Jianjun; Nishimura, Yukio; Jen, Kane; Kim, Eui Kyoon; Resnick, Douglas J.; Liddle, Alexander; Willson, C. Grant. “Implementation of an imprint damascene process for interconnect fabrication,” JVST 24(3) 1283-1291 (2006)
419.
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Schmid, Matthew J.; Manthiram, Kalpana; Grayson, Scott M.; Willson, James C.; Meiring, Jason E.; Bell, Kathryn M.; Ellington, Andrew D. and Willson, C. Grant. “Feature Multiplexing?Improving the Efficiency of Microarray Devices,” Angew. Chem. 45(20) 3338-3341 (2006)
420.
(420)
Hao, Jianjun ; Palmieri, Frank; Stewart, Michael D.; Nishimura, Yukio; Chao, Huang-Lin; Collins, Austin; Willson, C. Grant. “Octa(hydridotetramethyldisiloxanyl) silsesquioxane as a synthetic template for patternable dielectric materials,” Polymer Preprints (ACS, Division of Polymer Chemistry) 47(2) 1158-1159 (2006)
421.
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Grayson, Scott M.; Long, Brian K.; Kusomoto, Shiro; Osborn, Brian P.; Callahan, Ryan P.; Chambers, Charles R.; Willson, C. Grant. “Synthesis and Characterization of Norbornanediol Isomers and Their Fluorinated Analogues,” JOC 71(1) 341-344 (2006)
422.
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Dickey, Michael D.; Collister, Elizabeth; Raines, Allen; Tsiartas, Pavlos; Holcombe, Tom; Sreenivasan, S. V.; Bonnecaze, Roger T.; Willson, C. Grant. “Photocurable Pillar Arrays Formed via Electrohydrodynamic Instabilities,” Chem. Mat. 18(8) 2043-2049 (2006)
423.
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Willson, C. Grant; “Materials for step and flash lithography,” ACS PMSE Preprints 94 731 (2006)
424.
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Willson, Grant C.; “Organic Imaging Materials: A View of the Future,” Polymer Preprints 47(1) 530 (2006)
425.
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Koh, K. ; Liu, G.; Willson, C. G. “Grafting and Patterned Grafting of Block Copolymer Nanotubes onto Inorganic Substrates,” J. Am. Chem. Soc. 128 15921-15927 (2006)
426.
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Hao, J ; Lin, M., Palmieri, F., Nishimura, Y., Chao, H-L, Stewart, M.D., Collins, A., Jen, K., Willson, C.G. “Photocurable silicon-based material for imprinting lithography,” SPIE 6517 6517-80 (2007)
427.
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Jen, W L; Palmieri, F., Chao, B., Lin, M., Hao, J., Owens, J., Sotoodeh, K., Cheung, R., Willson, C. Grant. “Multilevel step and flash imprint lithography for direct patterning of dielectrics,” SPIE 6517 6517-19 (2007)
428.
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Long, Brian K; Keitz, B. Keith, Willson, C. Grant. “Materials for step and flash imprint lithography (S-FIL),” Journal of Materials Chemistry 17(34) 3575-3579 (2007)
429.
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Palmieri, Frank ; Adams, Jacob; Long, Brian; Heath, William; Tsiartas, Pavlos; Willson, C. Grant. “Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists,” ACS Nano 1(4) 307-312 (2007)
430.
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Vegh, J J; Nest, D; Graves, D. B.; Bruce, R.; Engelmann, S.;Kwon, T.;Phaneuf, R. J.; Oehrlein, G. S.; Long, B.K.; Willson, C. G. “Near-surface modification of polystyrene by Ar+: Molecular dynamics simulations and experimental validation,” Applied Physics Letters 91 233113 (2007)
431.
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Wu, K. ; Wang, X.; Kim, E. K.; Willson, C. G. and Ekerdt, J. G. “Experimental and Theoretical Investigation on Surfactant Segregation in Imprint Lithography,” Langmuir 23 1166-1170 (2007)
432.
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Ito, Hiroshi ; Trinque, Brian C.; Kasai, Paul; Willson, C. Grant. “Penultimate Effect in Radical Copolymerization of 2-Trifluoromethylacrylates,” Journal of Polymer Science Part A: Polymer Chemistry 46(5) 1559-1565 (2008)
433.
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Byers, Jeffrey ; Lee, Saul; Jen, Kane; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant. “Double exposure materials: simulation study of feasibility,” Journal of Photopolymer Science and Technology 20(5) 707-717 (2007)
434.
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Lee, Saul ; Carmichael, Peter; Meiring, Jason; Dickey, Michael; Grayson, Scott; Bonnecaze, Roger T.; Willson, C. Grant. “Modeling of self-assembly dynamics of photolithographically patterned muffins biosensor arrays.,” Materials Research Society Symposium Proceedings (2007)
435.
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Adams, Jacob R; Callahan, Ryan P.; Durand, WIlliam J.; Steger, Christy L.; Willson, C. Grant. “Functionalized norbornene polyacetals for use in photoresist applications,” PMSE Preprints 97 78-79 (2007)
436.
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Dickey, Michael D.; Raines, Allen; Collister, Elizabeth; Bonnecase, Roger T.; Sreenivasan, S. V.; Willson, C. Grant “High-aspect ratio polymeric pillar arrays formed via electrohydrodynamic patterning,” Journal of Materials Science 43(1) 117-122 (2008)
437.
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Heath, William ; Palmieri, Frank; Adams, Jacob; Long, Brian; Chute, Jerred; Holcombe, Thomas; Zieren, Shelley; Truitt, Matthew; White, Jeffery; Willson, C. Grant. “Degradable Cross-Linkers and Strippable Imaging Materials for S-FIL,” Macromolecules 41 719-726 (2008)
438.
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Tao, L. ; Ramachandran, S.; Nelson, C. T.; Lin, M.; Overzet, L. J.; Goeckner, M.; Lee, G.; Willson, C. G.; Wu, W.; Hu, W. “Durable diamond-like carbon templates for UV nanoimprint lithography,” Nanotechnology 19, 105302-104308 (2008)
439.
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Nishimura, I ; Heath, W. H.; Matsumoto, K.; Jen, W. L.; Lee, S. S.; Neikirk, C.; Shimokawa, T.; Ito, J.; Fujiware, K.; Willson, C. G. “Non-chemically Amplified Resists for 193nm Lithography,” Proc. SPIE 6923, 69231C-1 (2008)
440.
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Costner, E. ; Matsumoto, K.; Long, Brian K.; Taylor, J. C.; Wojtczak, W.; Willson, C. G. “New High Index Fluids: Exploiting Anomalous Dispersion for Immersion Lithography,” Proc. SPIE 6923, 69230B-1 (2008)
441.
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Matsumoto, K. ; Costner, E.; Nishimura, I., Ueda, M.; Willson, C. G. “High Index Resists for 193 nm Immersion Lithography,” Proc. SPIE 6923, 692305-1 (2008)
442.
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Lin, Michael ; Chao, Brook; Hao, Jianjun; Osberg, Kyle; Ho, Paul S.; Willson, C. Grant. “Simulation and Design of Planarizing Materials for Reverse-Tone Step and Flash I,” J. Micro/Nanolith. MEMS MOEMS 7(2), 023008-1-19 (2008)
443.
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Chao, Brook ; Palmieri, F.;Jen, Wei-Lun;McMichael, D. H.;Willson, C. G.;Owens, J.;Berger, R.;Sotoodeh, K.;Wilks, B.;Pham, J.;Carpio, R.;LaBelle, E;Wetzel, J.; “Dual Damascene BEOL processing using multilevel step and flash imprint lithography,” Proc. SPIE 6921 69210C (2008)
444.
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Taylor, J.C. ; Costner, Elizabeth A.; Goh, Sumarlin; Wojtczak, W.; Dewulf, D.; Willson, C. G. “The effect of added salts on the optical properties of water for high index immersion lithography fluids,” JVST, B: 26(2) 506-513 (2008)
445.
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Lin, Michael W. ; Hellebusch, Daniel J.; Wu, Kai; Kim, Eui Kyoon; Lu, Kuan; Tao, Li; Liechti, Kenneth M.; Ekerdt, John G.; Ho, Paul S.; Hu, Walter; Willson, C. Grant. “Interfacial adhesion studies for step and flash imprint lithography,” Proc. SPIE 6921, (2008)
446.
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Lee, Saul ; Byers, Jeffrey; Jen, Kane; Zimmerman, Paul; Rice, Bryan; Turro, Nicholar J.; Willson, C. Grant. “An Analysis of double exposure lithography options,” Proc. SPIE 6924, 69242A-69242A-1 (2008)
447.
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Long, Brian K. ; Keitz, B. Keith; Webb, R. Chad; Willson, C. Grant. “Photocross-linkable polymers for electro-optic applications,” Abstracts of Papers, 235th ACS National Meeting, New Orleans, LA United States, April 6-10, (2008)
448.
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Matsumoto, Kazuya Costner, E; “High Index Resist for 193nm Immersion Lithography.,” Macromolecules 41(15) 5674-5680 (2008)
449.
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Lin, Michael W. ; Hellebusch, Daniel J.; Wu, Kai; Kim, Eui K.; Lu, Kuan H.; Liechti, Kenneth M.; Ekerdt, John G.; Ho, Paul S.; Willson, C. Grant “The Role of Surfactants in Adhesion Reduction for Step and Flash Imprint Lithography,” J. Micro/Nanolith. MEMS MOEMS 7(3) 03300 (2008)
450.
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Ito, Hiroshi ; Willson, C. Grant. “Chemical Amplification Resists: Enabler of Moore?s Law,” Abstracts of Paper, 236th National Meeting, Philadelphia, PA August 17-19 (2008)
451.
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Willson, C. Grant ; Roman, Bernard J. “The future of lighography: SEMATECH Litho Froum 2008,” ACS Nano 2(7) 1323-8 (2008)
452.
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O?Connor, N. ; Berro, A. J.; Lancaster, J. R.; Gu, X.; Jockusch, S.; Nagai, T.; Ogata, T.; Lee, S.; Zimmerman, P.; Willson, C. G.; Turro, N. J. “Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography,” Chem. Mater. 20, 7374-7 (2008)
453.
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Weiss, Paul S.; Bonnell, Dawn A.; Hammond, Paula T.; Willson, C. Grant; Lewis, Penelope A. “Long-Term Impact,” ACS Nano 2(12) 2425-2426 (2008)
454.
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Weiss, Paul S.; Bonnell, Dawn A.; Hammond, Paula T.; Willson, C. Grant; Lewis, Penelope A. “Our Paper Anniversary,” ACS Nano 2(8) 1505-1506 (2008)
455.
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Lee, Saul ; Jen, Kane; C. Grant Willson; Jeffrey Byers; Paul Zimmerman; Nicholas J. Turro. “Materials modeling and development for use in double-exposure lithography applications,” J. Micro/Nanolith. MEMS MOEMS 8(1), 011011, Jan-Mar (2009)
456.
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Costner, Elizabeth ; Lin, Michael W.; Jen, Wei-Lun; Willson, C. Grant. “Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication.,” Annu. Rev. Mater. Res. 39, 155-80 (2009)
457.
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Meiring, Jason E. ; Lee, Saul; Costner, Elizabeth; Schmid, Matthew J.; Michaelson, Timothy B.; Willson, C. Grant. “Pattern recognition of shape-encoded hydrogel biosensor arrays,” Optical Engineering 48(3), 037 (2009)
458.
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Bruce, R. L. ; Engelmann, S.; Lin, T.; Kwon, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson, C. G.; Vegh, J. J.; Nest, D.; Graves, D. B.; Alizadeh, A. “Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma,” J. Vac. Sci. Technol. B 27(3), 1142-1155, May/Jun (2009)
459.
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Gu, Xinyu ; Berro, Adam J.; Cho, Younjin; Jen, Kan; Lee, Saul; Ngai, Tomoki; Ogata, Toshiyuki; Durand, William J.; Sundaresan, Arun; Lancaser, Jeffery R.; Jockusch, Stefan; Zimmerman, Paul; Turro, Nicholas J.; Willson, C. Grant. “Fundamental study of optical threshold layer approach towards double exposure lithography,” Proc. SPIE 7273, 72731C (2009)
460.
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Chauhan, Siddharth ; Somervell, Mark; Scheer, Steven; Mack, Chris; Bonnecaze, Roger T.; Willson, C. Grant “Polymer Dissolution Model: An Energy Adaptation of the Critical Ionization Theory,” Proc. SPIE 7273 (Pt.2, Advances in Resist Materials and Processing Technology XXVI), 7273 727336-1 (2009)
461.
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Strahan, Jeff R.; Adams, Jacob; Jen, Wei-Lun; Vanleenhove, Anja; Neikirk, Colin C.; Rochelle, Timothy; Gronheid, Roel; Willson, C. Grant. “Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists,” Proc. SPIE 7273, 72733G/1-72733G/10 (2009)
462.
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Costner, Elizabeth A. ; Long, Brian K.; Navar, Carlos; Jockusch, Steffen; Lei, Xuegong; Zimmerman, Paul; Campion, Alan; Turro, Nicholas J.; Willson, C. Grant. “Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction,” J. Phys. Chem. A. 113(33), 9337-9347 (2009)
463.
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Chauhan, Siddharth ; Palmieri, Frank; Bonnecaze, Roger T.; Willson, C. Grant. “Feature Filling Modeling for Step and Flash Imprint Lithography,” Jour. of Vac. Sci. & Tech. B: Microelectronics and Nanometer Structures?Processing, Measurement, and Phenomena, 27(4), 1926-1932 (2009)
464.
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Chauhan, Siddharth ; Palmieri, Frank; Bonnecaze, Roger T.; Willson, C. Grant “Pinning at Template Feature Edges for Step and Flash Imprint Lithography,” Journal of Applied Physics 106(3), 034902/1-034902/6 (2009)
465.
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Gronheid, Roel ; Fonseca, Carlos; Leeson, Michael J.; Adams, Jacob R.; Strahan, Jeffrey R.; Willson, C. Grant; Smith, Bruce W. “EUV resist requirements: absorbance and acid yield.,” Proc. SPIE, 7273 (Pt. 2, Advances in Resist Materials and Processing Technology XXVI), 2/1-2/8 (2009)
466.
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Takei, Satoshi ; Yoon, Sangwoong; Ohashi, Tomoya; Horiguchi, Yusuke; Nakajima, Yasuyuki; Lin, Michael W.; Willson, C. Grant. “Correlation Between Simulation and Experiment Using UV Curable Gap Fill Materials for Global Planarization,” International Journ. Nanoscience 8(1/02), 103-106 (2009)
467.
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Willson, C. Grant ; “A Decade of Step and Flash Lithography,” Journal of Photopolymer Science and Technology, 22(2), 147-153 (2009)
468.
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Strahan, Jeffrey R. ; Adams, Jacob R.; Jen, Wei-Lun; Vanleenhove, Anja; Neikirk, Colin C.; Rochelle, Timothy; Gronheid, Roel; Willson, C. Grant. “Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists,” J. Micro/Nanolith. MEMS MOEMS 8(4), 043011, Oct-Dec (2009)
469.
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Gu, Xinyu ; Bates, Christopher; Cho, Younjin; Costner, Elizabeth; Marzuka, Fernando; Nagai, Tomoki; Ogata, Toshiyuki; Shi, Chuan; Sundaresan, Arun K.; Turro, Nicholas; Bristol, Robert; Zimmerman, Paul; Willson, C. Grant. “A New Materials-based Pitch Division Technique,” Journal of Photopolymer Science and Technology 22(6) 773-781 (2009)
470.
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Berro, Adam J.; Gu, Xinyu; O\'Conner, Naphtali; Jockusch, Steffen; Nagai, Tomoki; Ogata Toshiyuki; Zimmerman, Paul; Rice, Bryan J.: Adolph, Elizabeth; Byargeon, Travis “Optical Threshold Layer and Intermediate State Two-Photon PAG Approaches to Double Exposure Lithography,” Proc. SPIE 7273 72731B (2009)
471.
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Takei, Satoshi ; Lin, Michael W.; Yoon, Sangwoong; Ohashi, Tomoya; Nakajima, Yasuyuki; Willson, C. Grant “Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyse,” Proc. SPIE 7273 72730W (2009)
472.
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Ogawa, Tsuyoshi ; Takei, Satoshi; Jacobsson, Michael; Deschner, Ryan; Bell, William; Lin, Michael W.; Hagiwara, Yuji; Hanabata, Makoto; Willson, C. Grant “Planarizing Material for Reverse-Tone Step and Flash Imprint Lithography,” Proc. SPIE 7637 763708 (2010)
473.
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Chauhan, Siddharth ; Somervell, Mark; Carcasi, Michael; Scheer, Steven; Bonnecaze, Roger T.; Mack, Chris; Willson, C. Grant “Particle Generation during Photoresist Dissolution,” Proc. SPIE 7639 763933 (2010)
474.
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Gu, Xinyu ; Bates, Christopher M.; Cho, Younjin; Kawakami, Takanori; Nagai, Tomoki; Ogata, Toshiyuki; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Robert; Zi “Photobase Generator Assisted Pitch Division,” Proc. SPIE 7639 763906 (2010)
475.
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Bruce, R. L.; Weilnboeck, F.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson, C. G.; Vegh, J. J.; Nest, D.; Graves, D. B. “Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films,” Journal of Applied Physics 107 084310 (2010)
476.
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Carcasi, Michael ; Somervell, Mark; Scheer, Steven; Chauhan, Siddharth; Strahan, Jeffrey; Willson, C. G. “Extension of 248 nm Monte Carlo, Mesoscale Models to 193 nm Platforms,” Proc. SPIE 7639 76392K (2010)
477.
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Takei, Satoshi ; Ogawa, Tsuyoshi; Deschner, Ryan; Jen, Kane; Nihira, Takayasu; Hanabata, Makoto; Willson, C. Grant “Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography,” Japanese Journal of Applied Physics 49 075201 (2010)
478.
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Bruce, R. L.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Bell, W.; Long, B.; Willson, C. G. “Molecular Structure Effects on Dry Etching Behavior of Si-containing Resists in Oxygen Plasma,” J. Vac. Sci. Technol. B 28(4) (2010)
479.
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Mueller, Brennen K.; Strahan, Jeffrey R.; Bates, Christopher M.; Lee, Jonathan A.; Ellison, Christopher J.; Willson, C. Grant. “Silicon-containing molecules for nano-imprint lithography,” Polymer Preprints (ACS, Division of Polymer Chemistry) 51(1) 807-808 (2010)
480.
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Bates, Christopher M.; Strahan, Jeffrey R.; Mueller, Brennen K.; Schulze, Morgan W.; Ellison, Christopher J.; Willson, C. Grant “Anionic polymerization of silicon-containing diblock copolymers,” Polymer Preprints (ACS, Division of Polymer Chemistry) 51(1) 357-358 (2010)
481.
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Takei, Satoshi ; Ogawa, Tsuyoshi; Dechner, Ryan; Hanabata, M.; Willson, C. Grant “Advanced step and flash nanoimprint lithography using UV-sensitive hard mask underlayer material,” Micro & Nano Letters 5 117 (2010)
482.
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Strahan, Jeffrey R.; Bates, Christopher M.; Mueller, Brennen K.; Lee, Jonathan A.; Katzenstein, Joshua M.; Ellison, Christopher J.; Willson, C. Grant “Expanding surface treatment options for controlling block copolymer orientation,” Polymer Preprints (ACS, Division of Polymer Chemistry) 51(1) 51-52 (2010)
483.
(483)
Bates, Christopher M.; Strahan, Jeffrey R.; Santos, Logan J.; Mueller, Brennen K.; Bamgbade, Benjamin O.; Lee, Jonathan A.; Katzenstein, Joshua M.; Ellison, Christopher J.; “Polymeric Crosslinked Surface Treatments for Controlling Block Copolymer Orientation in Thin Films,” Langmuir 27(5) 2000-2006 (2011)
484.
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Cushen, Julia D.; Bates, Christopher M.; Schulze, Morgan W.; Rausch, Erica L.; Willson, C. Grant; Ellison, Christopher J. “Analysis of the Flory-Huggins interaction parameter of silicon-containing block copolymers,” PMSE Preprints (2011)
485.
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Willson, C. Grant; “Advances in photoresist materials,” PMSE Preprints (2011)
486.
(486)
Cho, Younjin ; Gu, Xinyu; Hagiwara, Yuji; Kawakami, Takanori; Ogata, Toshiyuki; Rawlings, Brandon; Li, Yongjun; Sundaresan, Arun K.; Turro, Nicholas J.; Bristol, Rob “Polymer-bound photobase generators and photoacid generators for pitch division lithography,” Proc. SPIE 7972 797221-279221-8 (2011)
487.
(487)
Ogawa, Tsuyoshi ; Hellebusch, Daniel J.; Lin, Michael W.; Jacobsson, B. Michael; Bell, William; Willson, C. Grant “Reactive fluorinated surfactant for step and flash imprint lithography,” Proc. SPIE 7970 79700T-79700T-7 (2011)
488.
(488)
Takei, Satoshi ; Ogawa, T.; Willson, C. Grant “Study of fluorinated silicon-based resist material and photoreactive underlayer for defect reduction in step and repeat ultraviolet nanoimprint lithog,” Micro Nano Lett. 6 422 (2011)
489.
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Santos, Logan J.; Bates, Christopher M.; Cushen, Julia D.; Bamgbade, Benjamin O.; Ellison, Christopher J.; Willson, C. Grant “Solvent Annealing to Control Silicon-Containing Block Copolymer Orientation,” ACS Proceedings (2011)
490.
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Bates, Christopher M.; Strahan, Jeffrey R.; Santos, Logan J.; Mueller, Brennen K.; Bamgbade, Benjamin O.; Lee, Jonathan A.; Katzenstein, Joshua M.; Ellison, Christopher J.; “Single- and Dual-Component Cross-Linked Polymeric Surface Treatments for Controlling Block Copolymer Orientation,” ACS Proceedings (2011)
491.
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Gu, Xinyu ; Cho, Younjin; Kawakami, Takanori; Rawlings, Brandon; Mesch, Ryan; Ogata, Toshiyuki; Seshimo, Takehiro; Wang, Wade; Sundaresan, Arun K.; Gronheid, Nich “Photobase generator enabled pitch division,” Proc. SPIE (2011)
492.
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Bruce, R. L.; F. Weilnboeck, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson, and A. Alizadeh “On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists ,” Journal of Vacuum Science & Technology B 29(4) 041604-1 (2011)
493.
(493)
Willson, C. G.; “Organosilicon polymers for microelectronics,” ACS Proceedings (2011)
494.
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Tierney, Heather L.; Bonnell, Dawn A.; Buriak, Jillian M.; Hafner, Jason H.; Hammond, Paula T.; Javey, Ali; Kotov, Nicholas A.; Nordlander, Peter; et al; “ACS Nano in 2011 and Looking Forward to 2012,” ACS Nano 5(12) 9301 (2011)
495.
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Cushen, Julia D.; Bates, Christopher M.; Rausch, Erica L.; Dean, Leon M.; Zhou, Sunshine X.; Willson, C. Grant; Ellison, Christopher J. “Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-D,L-lactide) with Sub-10 nm Domains,” Macromolecules 45(21) 8722-8728 (2012)
496.
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Hagiwara, Yuji ; Mesch Ryan A; Kawakami Takanori; Okazaki Masahiro; Jockusch Steffen; Li Yongjun; Turro Nicholas J; Willson Carlton Grant “The Design and Synthesis of a Photo-Aromatization Based Two-Stage Photobase Generator for Pitch Division Lithography,” The Journal of Organic Chemistry (2012)
497.
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Mesch, Ryan A.; Kawakami, Takanori; Hagiwara, Yuji; Kim, Taeho; Wang, Wade; Gu, Xinyu; Sundaresan, Arun K.; Turro, Nicholas J.; Blackwell, James; Willson, C. G. “Synthesis and characterization of ,” ACS Proceedings (2012)
498.
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Chen, Christopher H.; Moerdyk, Jonathan P.; Deschner, Ryan P.; Bielawski, Christopher W.; Willson, Carlton G. “Synthesis and applications of latent olefin metathesis catalyst featuring bidentate schiff base ligand,” PMSE Preprints (2012)
499.
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Turro, Nicholas J.; Li Yongjun; Jockusch Steffen; Hagiwara Yuji; Okazaki Masahiro; Mesch Ryan A; Schuster David I; Willson Carlton Grant “Study of a Two-stage Photobase Generator (PBG) for Photolithography in Microelectronics,” The Journal of Organic Chemistry 78(5) 1735 - 1741 (2012)
500.
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Bates, Christopher M.; Seshimo, Takehiro; Chen, Christopher H.; Cushen, Julia D.; Durand, William J.; Santos, Logan J.; Ellison, Christopher J.; Willson, C. G. “Spin-on top coat surface treatments for thin film block copolymer orientation control,” PMSE Preprints (2012)
501.
(501)
Wei-Lun, K. Jen; Rawlings, Brandon M.; Strahan, Jeffrey R.; Hellebusch, Daniel J.; Durand, William J.; Willson, C. Grant “Self-aligned patterning on a flexible substrate using a dual-tone, thermally activated photoresist,” Journal of Vacuum Science & Technology, B 30(1) 011603/1 (2012)
502.
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Bonnell, Dawn A.; Hafner, Jason H.; Hersam, Mark C.; Kotov, Nicholas A.; Buriak, Jillian M.; Hammond, Paula T.; Javey, Ali; Nordlander, Peter; Parak, Wolfgang J.; et al “Recycling Is Not Always Good: The Dangers of Self-Plagiarism,” ACS Nano 6(1) 1 (2012)
503.
(503)
Bates, Christopher M.; Seshimo, Takehiro; Maher, Michael J.; Durand, William J.; Cushen, Julia D.; Dean, Leon M.; Blachut, Gregory; Ellison, Christopher J.; Willson, C. Grant “Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains,” Science 338(6108) 775 (2012)
504.
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Cushen, Julia D.; Otsuka, Issei; Bates, Christopher M.; Halila, Sami; Fort, Sebastien; Rochas, Cyrille; Easley, Jeffrey A.; Rausch, Erica L.; Thio, Anthony; et al “Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications,” ACS Nano 6(4) 3424-3433 (2012)
505.
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Cushen, Julia D.; Otsuka, Issei; Bates, Christopher M.; Halila, Sami; Fort, Sebastien; Borsali, Redouane; Easley, Jeffrey A.; Rausch, Erica L.; Thio, Anthony; et al “Oligosaccharide/silicon-containing block copolymers for nanolithography,” PMSE Preprints (2012)
506.
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Tang, Hao ; Deschner, Ryan; Cho, Younjin; Sermas, Patrick; Maurer, Alejandro; Allen, Peter; Ellington, Andrew D.; Willson, C. G. “Investigation of poly(methyl methacrylate) copolymers for DNA conjugation,” PMSE Preprints (2012)
507.
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Deschner, Ryan ; Tang, Hao; Allen, Peter; Cho, Younjin; Lo, Kelvin; Sermas, Patrick; Maurer, Alejandro; Ellington, Andrew D.; Willson, C. Grant “DNA-mediated self-assembly of lithographically-patterned particles,” PMSE Preprints (2012)
508.
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Seshimo, Takehiro ; Bates, Christopher M.; Dean, Leon M.; Cushen, Julia D.; Durand, William J.; Maher, Michael J.; Ellison, Christopher J.; Willson, C. Grant “Block copolymer orientation control using a top-coat surface treatment,” Journal of Photopolymer Science and Technology 25(1) 125-130 (2012)
509.
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Tang, Hao ; Deschner, Ryan; Allen, Peter; Cho, Younjin; Sermas, Patrick; Maurer, Alejandro; Ellington, Andrew D.; Willson, C. Grant “Analysis of DNA-Guided Self-Assembly of Microspheres Using Imaging Flow Cytometry,” Journal of the American Chemical Society 134(37) 15245 (2012)
510.
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Zhai, Yujia ; Palard, Marylene; Mathew, Leo; Hussain, Muhammad Mustafa; Willson, C. Grant; Tutuc, Emanuel; Banerjee, Sanjay K. “Fabrication of three-dimensional MIS nano-capacitor based on nano-imprinted single crystal silicon nanowire arrays,” Micro and Nanosystems 4(4) 333-338 (2012)
511.
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Ogawa, Tsuyoshi ; Satoshi Takei, C. Grant Willson “Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography,” J. Vac. Sci. Technol. B 31(1) 011601-1 (2013)
512.
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Bonnell, Dawn A; Buriak, Jillian M.; Chan, Warren C. W.; Hafner, Jason H.; Hammond, Paula T.; Hersam, Mark C.; Javey, Ali; Kotov, Nicholas A.; et al “We Take It Personally,” ACS Nano 7(2) 1823 (2013)
513.
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Ellison, Christopher J; Cushen, Julia D.; Willson, C. Grant “Thin film block copolymer assembly in mixtures of highly selective solvents,” Journal of Photopolymer Science and Technology 26(1) 45-47 (2013)
514.
(514)
Bates, Christopher M; Pantoja, Marco A. Bedolla; Strahan, Jeffrey R.; Dean, Leon M.; Mueller, Brennen K.; Ellison, Christopher J.; Nealey, Paul F.; Willson, C. Grant “Synthesis and thin-film orientation of poly(styrene-block-trimethylsilylisoprene),” Journal of Polymer Science, Part A: Polymer Chemistry 51(2) 290-297 (2013)
515.
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Wang, Wade ; Ryan A.; Kawakami, Takanori; Hagiwara, Yuji; Kim, Taeho; Turro, Nicholas; Blackwell, James; Willson, C. Grant “Synthesis and characterization of novel two-stage photobase generators for pitch division lithography,” Abstracts of Papers, 245th ACS National Meeting & Exposition 431 (2013)
516.
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Janes, Dustin W.; Thode, Christopher J.; Lee, Jeong In; Willson, C. Grant; Nealey, Paul F.; Ellison, Christopher J. “Replicating thin film block copolymer patterns with light activated chemistries,” Abstracts of Papers, 245th ACS National Meeting & Exposition 559 (2013)
517.
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Bates, Christopher M; Maher, Michael J.; Thio, Anthony; Dean, Leon M.; Cushen, Julia D.; Durand, William J.; Blachut, Greg; Li, Litan; Ellison, Christopher J.; Willson, C. “Polarity-switching top coats for silicon-containing block copolymer orientation control,” Journal of Photopolymer Science and Technology 26(2) 223-224 (2013)
518.
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Bates, Christopher M; Seshimo, Takehiro; Maher, Michael J.; Durand, William J.; Cushen, Julia D.; Dean, Leon M.; Blachut, Gregory; Chen, Christopher H.; et al. “Polarity-switching top coat polymers enable thin film block copolymer orientation control,” Abstracts of Papers, 245th ACS National Meeting & Exposition 119 (2013)
519.
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Maher, Michael J; Bates, Christopher M.; Seshimo, Takehiro; Durand, William J.; Cushen, Julia D.; Blachut, Gregory; Dean, Leon M.; Thio, Anthony; et al. “Orientation of block copolymer domains via polarity switching top coats,” Abstracts of Papers, 246th ACS National Meeting & Exposition 265 (2013)
520.
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Janes, Dustin W.; Thode, Christopher J.; Willson, C. Grant; Nealey, Paul F.; Ellison, Christopher J. “Light-Activated Replication of Block Copolymer Fingerprint Patterns,” Macromolecules 46(11) 4510-4519 (2013)
521.
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DeKosky, Brandon J; Ippolito, Gregory C.; Deschner, Ryan P.; Lavinder, Jason J.; Wine, Yariv; Rawlings, Brandon M.; Varadarajan, Navin; Giesecke, Claudia; et al. “High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire,” Nature Biotechnology 31(2) 166-169 (2013)
522.
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Dean, Leon M; Christopher M.; Cushen, Julia D.; Seshimo, Takehiro; Maher, Michael J.; Durand, William J.; Blachut, Gregory; Ellison, Christopher J.; Willson, C. G. “Block copolymer nanostructures for roll to roll manufacturing of photovoltaic devices,” Abstracts of Papers, 245th ACS National Meeting & Exposition (2013)
523.
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Ogawa, Tsuyoshi ; Daniel J. Hellebusch; Michael W. Lin; B. Michael Jacobsson; William Bell; C. Grant Willson J. “Reactive fluorinated surfactant for step and flash imprint lithography ,” Micro/Nanolith. MEMS MOEMS 12(3) 031114 (2013)
524.
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Kim, Sangwon ; Christopher M.; Thio, Anthony; Cushen, Julia D.; Ellison, Christopher J.; Willson, C. Grant; Bates, Frank S. “Consequences of Surface Neutralization in Diblock Copolymer Thin Films,” ACS Nano 7(11) 9905-9919 (2013)
525.
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Parak, Wolfgang J; Chan, Warren C. W.; Hafner, Jason H.; Hammond, Paula T.; Hersam, Mark C.; Javey, Ali; Khademhosseini, Ali; Kotov, Nicholas A.; Mulvaney, Paul; et al. “Be Critical but Fair,” ACS Nano 7(10) 8313-8316 (2013)
526.
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Bates, Christopher M. ; Maher, Michael J.; Janes, Dustin W.; Ellison, Christopher J.; Willson, C. Grant “Block copolymer lithography,” Macromolecules 47(1) 2-12 (2014)
527.
(527)
Takei, Satoshi ; Ogawa, Tsuyoshi; Deschner, Ryan; Willson, Carlton Grant “Reduction of pattern peeling in step-and-flash imprint lithography,” Microelectronic Engineering 116 44-50 (2014)
528.
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Chan, Warren C. W. ; Gogotsi, Yury; Hafner, Jason H.; Hammond, Paula T.; Hersam, Mark C.; Javey, Ali; Kagan, Cherie R.; Khademhosseini, Ali; et al. “Exciting Times for Nano,” ACS Nano 7(12) 10437-10439 (2013)
529.
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Maher, Michael J. ; Bates, Christopher M.; Blachut, Gregory; Sirard, Stephen; Self, Jeffrey L.; Carlson, Matthew C.; Dean, Leon M.; Cushen, Julia D.; et al. “Interfacial Design for Block Copolymer Thin Films,” Chemistry of Materials 26(3) 1471-1479 (2014)
530.
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Deschner, Ryan ; Tang, Hao; Allen, Peter; Hall, Cecilia; Hlis, Rocco; Ellington, Andrew; Willson, C. Grant “Progress Report on the Generation of Polyfunctional Microscale Particles for Programmed Self-Assembly,” Chemistry of Materials 26(3) 1457-1462 (2014)
531.
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Janes, Dustin W.; McCoy, Bradley D.; Inoue, Takejiro; Madan, Ishita; Thode, Christopher J.; Willson, C. G.; Nealey, Paul F.; et al “Photochemical transfer printing of block copolymer patterns,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
532.
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Zhou, Sunshine X.; Janes, Dustin W.; Cushen, Julia D.; Willson, C. Grant; Ellison, Christopher J. “Chemically and structurally modified PS-b-PMMA block copolymers for lithography applications,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
533.
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Ellison, Christopher J.; Janes, Dustin W.; Thode, Christopher J.; Willson, C. Grant; Nealey, Paul F. “Photochemical replication of thin film block copolymer patterns,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
534.
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Carlson, Matthew ; Maher, Michael; Bates, Christopher; Self, Jeffrey; Ellison, Christopher; Willson, C. Grant “Top coats confer orientation control of block copolymer domains,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
535.
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Blachut, Gregory ; Bates, Christopher M.; Durand, William J.; Maher, Michael J.; Ellison, Christopher J.; Willson, C. G. “Polymeric materials for the orientation control of block copolymer microphase separation in thin films,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
536.
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Okazaki, Masahiro ; Willson, Carlton G. “Polymerization and characterization of 1-methyleneisochroman-3-one,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
537.
(537)
Maher, Michael J.; Bates, Christopher M.; Blachut, Gregory; Cushen, Julia D.; Carlson, Matthew C.; Self, Jeffrey L.; Durand, William J.; Dean, Leon M.; Ellison, Chris “New top coat design controls orientation of sub-10 nm block copolymer domains,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
538.
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Lane, Austin P.; Bates, Chris; Willson, C. Grant; DiLauro, Anthony M.; Phillips, Scott “Synthesis of poly(phthalaldehyde)-containing block copolymers for lithographic applications,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
539.
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Mori, Kazunori ; Bates, Christopher M.; Cushen, Julie D.; Blachut, Gregory; Zhou, Sunshine; Maher, Michael J.; Ellison, Christopher J.; Willson, C. G. “Synthesis of tin-containing block copolymer,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
540.
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Mesch, Ryan A; Wang, Wade; Matsuzawa, Kensuke; Phillips, Scott; Willson, C. G. “Aromatizing self-immolating polymers for use in extreme ultra violet light resists,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
541.
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Matsuzawa, Kensuke ; Mesch, Ryan; Willson, Carlton “Self-depropagating polyester for extreme ultra violet photoresists,” Abstracts of Papers, 247th ACS National Meeting & Exposition (2014)
542.
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Zhai, Yujia ; Mathew, Leo; Raob, Rajesh; Sreenivasan, S. V.; Willson, C. Grant; Banerjee, Sanjay K. “Vertical finFET with Salicide Contact for Potential Power Applications,” ECS Journal of Solid State Science and Technology 3(10) (2014)
543.
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Willson, C. Grant; Blachut, Gregory; Maher, Michael J.; Durand, William J.; Bates, C.; Carlson, Matthew C.; Self, Jeffrey L.; Lane, Austin O.; Asano, Yusuke; Sirard, Steven; Hayes, Colin O.; Ellison, Christopher J. “Block Copolymers for DSA in the 100 A Regime,” JPST 27(4) (2014)
544.
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Cushen, Julia D.; Shanmuganathan, Kadhiravan; Janes, Dustin W.; Willson, C. Grant; Ellison, Christopher J. “Synthesis of Amphiphilic Naturally-​Derived Oligosaccharide-​block-​Wax Oligomers and Their Self-​Assembly,” ACS Macro Letters 3(9) 839-844 (2014)
545.
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Mori, Kazunori ; Blachut, Gregory; Bates, Christopher M.; Maher, Michael; Strahan, J.r.; Sirard, Steven M.; Durand, William J.; Ellison, Christopher J.; Willson, C. Gr “A Study of Tin Containing Block Copolymers,” JPST 27(4) (2014)
546.
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Bell, William K; Rawlings, Brandon M.; Long, Brian K.; Webb, R. Chad; Keitz, B. Keith; Haeussling, Lukas; Willson, C. Grant “Poling and crosslinking processes in NLO polymers,” Journal of Polymer Science, Part A: Polymer Chemistry 52(19) 2769-2775 (2014)
547.
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Durand, William J.; Blachut, Gregory; Maher, Michael J.; Sirard, Stephen; Tein, Summer; Carlson, Matthew C.; Asano, Yusuke; Zhou, Sunshine X.; Lane, Austin P.; Bates, Ch “Design of high-​χ block copolymers for lithography,” Journal of Polymer Science, Part A: Polymer Chemistry 53(2) 344-352 (2015)
548.
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Maher, Michael J.; Bates, Christopher M.; Blachut, Gregory; Carlson, Matthew C.; Self, Jeffrey L.; Janes, Dustin W.; Durand, William J.; Lane, Austin P.; Ellison, Chris “Photopatternable interfaces for block copolymer lithography,” ACS Macro Letters 3(8) 824-828 (2014)
549.
(549)
Piner, Richard ; Lee, Alvin; Wang, Xiaohan; Willson, C. Grant; Magnuson, Carl; Chou, Harry “ The effects of silicon and aluminum content in copper on the growth of CVD graphene,” APS 2015 (2015)
550.
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Hayes, Colin O.; William K. Bell, Benjamin R. Cassidy, and C. Grant Willson “Synthesis and Characterization of a Two Stage, Nonlinear Photobase Generator,” The Journal of organic chemistry 80(15) 7530-7535 (2015)
551.
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Cushen, Julia D.; Lei Wan, Gregory Blachut, Michael J. Maher, Thomas R. Albrecht, Christopher J. Ellison, C. Grant Willson, and Ricardo Ruiz “Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST.,” ACS applied materials & interfaces 7(24) 13476-13483 (2015)
552.
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Chan, Warren W.C.; Sharon Glotzer, Yury Gogotsi, Jason H. Hafner, Paula T. Hammond, Mark C. Hersam, Ali Javey et al. “Grand Plans for Nano.,” ACS nano 9(12) 11503-11505 (2015)
553.
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Maher, Michael J.; Charles T. Rettner, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, William J. Durand, Christopher J. Ellison, Daniel P. Sanders, et al. “Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films.,” ACS applied materials & interfaces 7(5) 3323-3328 (2015)
554.
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Pandav, Gunja ; William J. Durand, Christopher J. Ellison, C. Grant Willson, and Venkat Ganesan “Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes.,” Soft matter 11(47) 9107-9114 (2015)
555.
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Janes, Dustin W.; Takejiro Inoue, Bradley D. McCoy, Ishita Madan, Paul F. Nealey, C. Grant Willson, and Christopher J. Ellison “Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns.,” Journal of Photopolymer Science and Technology 27(4) 435-440 (2014)
556.
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Chan, Warren C.W.; Chan, Warren CW, Yury Gogotsi, Jason H. Hafner, Paula T. Hammond, Mark C. Hersam, Ali Javey, Cherie R. Kagan et al. “A Year for Nanoscience.,” ACS nano 8(12) 11901-11903 (2014)
557.
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Maher, Michael J.; Christopher M. Bates, William J. Durand, Gregory Blachut, Dustin W. Janes, Joy Y. Cheng, Daniel P. Sanders, C. Grant Willson, and Christopher J. Ellis “Interfacial Layers with Photoswitching Surface Energy for Block Copolymer Alignment and Directed Self-Assembly.,” Journal of Photopolymer Science and Technology 28(5) 611-615 (2015)
558.
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Mueller, Brennen K.; Jared M. Schwartz, Alexandra E. Sutlief, William K. Bell, Colin O. Hayes, Edmund Elce, C. Grant Willson, and Paul A. Kohl. “Chemically Amplified, Positive Tone, Polynorbornene Dielectric for Microelectronics Packaging.,” ECS Journal of Solid State Science and Technology 4(1) (2015)
559.
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Ogawa, Tsuyoshii B.; Michael Jacobsson, Ryan Deschner, William Bell, Michael W. Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, and C. Grant Willson “Planarizing material for reverse-tone step and flash imprint lithography.,” Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3) 031302-031302 (2014)
560.
(560)
HAYES, Colin O; Brennen K. Mueller, Philip Liu, William K. Bell, Jared M. Schwartz, R. Paxton Thedford, Paul A. Kohl, C. Grant Willson “Directly patternable benzocyclobutene and methacrylate silsesquioxanes for microelectronics packaging,” Journal of the Ceramic Society of Japan 123(1441) 800 -804 (2016)
561.
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Hayes, Colin O.; Mueller B.K., Liu P., Bell W.K., Schwartz J.M., Thedford R.P., Kohl P.A., Willson C.G. “Directly patternable benzocyclobutene and methacrylate silsesquioxanes for microelectronics packaging.,” Journal of the Ceramic Society of Japan 123(14441) 800-804 (2015)
562.
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Chauhan, Siddharth ; Mark Somervell, Michael Carcasi, Steven Scheer, Roger T. Bonnecaze, Chris A. Mack, and C. Grant Willson. “Mesoscale modeling: a study of particle generation and line-edge roughness.,” Journal of Micro/Nanolithography, MEMS, and MOEMS 13(1) 013012-013012 (2014)
563.
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Dick, Andrew R.; William K. Bell, Brendan Luke, Erin Maines, Brennan Mueller, Paul A. Kohl, Brandon Rawlings, and C. Grant Willson. “Directly patternable dielectric based on fluorinated polyimide.,” SPIE Advanced Lithography 94251D (2015)
564.
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Durand, William J.; Matthew C. Carlson, Michael J. Maher, Gregory Blachut, Logan J. Santos, Summer Tein, Venkat Ganesan, Christopher J. Ellison, and C. Grant Willson “Experimental and Modeling Study of Domain Orientation in Confined Block Copolymer Thin Films,” Macromolecules 49(1) 308-316 (2016)
565.
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Matsuzawa, Kensuke ; Ryan Mesch, Mike Olah, Wade Wang, Scott T. Phillips, and C. Grant Willson. “Aromatizing unzipping polyester for EUV photoresist.,” SPIE Advanced Lithography 94251Q (2015)
566.
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Lane, AP ; MJ Maher, CG Willson, CJ Ellison “Photopatterning of Block Copolymer Thin Films,” ACS Macro Letters 5(4) 460-465 (2016)
567.
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Maher, Michael J.; Kazunori Mori, Stephen M. Sirard, Andrew M. Dinhobl, Christopher M. Bates, Emir Gurer, Gregory Blachut, Austin P. Lane, Will “Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers,” ACS Macro Letters 5(3) 391-395 (2016)
568.
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Sirard, Stephen ; Laurent Azarnouche ; Emir Gurer ; William Durand ; Michael Maher ; Kazunori Mori ; Gregory Blachut ; Dustin Janes ; Yusuke Asano ; Yasunobu Someya ; D “Interactions between plasma and block copolymers used in directed self-assembly patterning,” SPIE Advanced Lithography. International Society for Optics and Photonics (2016)
569.
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Wang, Xiaohan ; Chou, Harry; Tao, Li; Dick, Andrew; Dolocan, Andrei; Akinwande, Deji; Willson, C. Grant “Direct observation of PMMA removal from graphene surface,” APS March Meeting (2016)
570.
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Sunday, Daniel ; Maher, Michael; Blachut, Gregory; Asano, Yusuke; Tein, Summer; Willson, C. Grant; Ellison, Christopher; Kline, R. Joseph “Characterizing the interfaces of block copolymers with high χ,” APS March Meeting 2016 (2016)
571.
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Hayes, Colin O.; Peng-hao Chen, R. Paxton Thedford, Christopher J. Ellison, Guangbin Dong, and C. Grant Willson “Effect of Ring Functionalization on the Reaction Temperature of Benzocyclobutene Thermoset Polymers,” Macromolecules (2016)
572.
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Tsai, Hsinyu ; Hiroyuki Miyazoe ; Ankit Vora ; Teddie Magbitang ; Noel Arellano ; Chi-Chun Liu ; Michael J. Maher ; William J. Durand ; Simon J. Dawes ; James J. Buc “High chi block copolymer DSA to improve pattern quality for FinFET device fabrication,” SPIE Advanced Lithography. International Society for Optics and Photonics, March 25 9779 (2016)
573.
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Sirard, Stephen, Laurent Aza ; William Durand, Michael Maher, Kazunori Mori, Gregory Blachut, Dustin Janes, Yusuke Asano, Yasunobu Someya, Diane Hymes, David Graves, Chris Ellison and Grant Willson “Plasma etch of block copolymers for lithography,” SPIE 15 April 2 (2016)
574.
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Azarnouche, Laurent ; Stephen M. Sirard, William J. Durand, Gregory Blachut, Emir Gurer, Diane J. Hymes, Christopher J. Ellison, Carlton G. Willson and David B. Graves “Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications,” J. Vac. Sci. Technol B 34 061602 (2016)
575.
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Someya, Yasunobu ; Yusuke Asano, Michael J. Maher, Gregory Blachut, Austin P. Lane, Stephen Sirard, Christopher J. Ellison, C. Grant Willson “Synthesis and Characterization of Si-containing Block Co-polymers with Resolution beyond 10 nm,” Journal of Photopolymer Science and Technology 95(5) 701-704 (2016)
576.
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Dick, Andrew R.; William K. Bell, Brendan Luke, Erin Maines, Brennen Mueller, Brandon Rawlings, Paul A. Kohl, C. Grant Willson “High aspect ratio patterning of photosensitive polyimide with low thermal expansion coefficient and low dielectric constant,” J. Micro/Nanolith 15(3) 033503 (2016)
577.
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Kagan, Cherie R.; Laura E. Fernandez, Yury Gogotsi, Paula T. Hammond, Mark C. Hersam, André E. Nel, Reginald M. Penner, C. Grant Willson, and Paul S. Weiss “Nano Day: Celebrating the Next Decade of Nanoscience and Nanotechnology,” ACS Nano 10(10) 9093-9103 (2016)
578.
(578)
Blachut, Gregory ; Stephen M. Sirard, Michael J. Maher, Yusuke Asano, “A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymers,” Chem. Mater 28(24) 8951-8961 (2016)
579.
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Zhou, Sunshine X.; Dustin W. Janes, Chae Bin Kim, C. Grant Willson, and Christopher J. Ellison “Designing Intrablock Attractions To Increase the χ Parameter of a Symmetric Diblock Copolymer,” Macromolecules 49(21) 8332-8340 (2016)
580.
(580)
Sunday, Daniel F.; Michael Maher, Summer Tein, Matthew C. Carlson, Christopher J. Ellison, C. Grant Willson, and R. Joseph Kline “Quantifying the Interface Energy of Block Copolymer Top Coats,” ACS Macro Lett. 5(12) 1306-1311 (2016)
581.
(581)
Maher, Michael J.; Jeffrey L. Self, Pawer Stasiak, Gregory Blachut, Christopher J. Ellison, Mark W. Matsen, Christopher M. Bates, and C. Grant Willson “Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films,” ACS Nano 10(11) 10152-10160 (2016)
582.
(582)
Wang, Xiaohan ; Dolocan, Andrei; Chou, Harry; Tao, Li; Dick, Andrew; Akinwande, Deji; Willson, C. Grant “Direct Observation of Poly(Methyl Methacrylate) Removal from Graphene Surface,” Chemistry of Materials 29(5) 2033-2039 (2017)
583.
(583)
Chopra, Meghali J.; Rahul Verma; Austin Lane; C. G. Willson; Roger T. Bonnecaze “A Method to Accelerate Creation of Plasma Etch Recipes using Physics and Bayesian Statistics,” Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI 101490X (2017)
584.
(584)
Chan, Warren W. C.; Manish Chhowalla, Sharon Glotzer, Yury Gogotsi, Jason H. Hafner, Paula T. Hammond, Mark C. Hersam, Ali Javey, Cherie R. Kagan, Ali Khademhosseini, “Nanoscience and Nanotechnology Impacting Diverse Fields of Science, Engineering, and Medicine,” ACS Nano 10(12) 10615-10617 (2016)
585.
(585)
Lane, Austin ; Yang, Xiaomin; Maher, Michael; Blachut, Gregory; Asano, Yusuke; Someya, Yasunobu; Mallavarapu, Akhila; Sirard, Stephen; Ellison, Christopher; Willson, “Directed Self-Assembly and Pattern Transfer of 5 nm Block Copolymer Lamellae,” ACS Nano 11(8) 7656-7665 (2017)
586.
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Ellison, Christopher J; C. Grant Willson, Dustin Janes, Gregory Blachut, Yasunobu Soymeya, Paulina A. Rincon Delgadillo, Geert Vandenberghe, Arjun Si “High-χ, Si-Containing Block Copolymers and Process Strategies for Directing Their Self-Assembly,” Journal of Photopolymer Science and Technology 30(2) 187-190 (2017)
587.
(588)
Na, Seung Ryul ; Xiaohan Wang, Richard D. Piner, Rui Huang, C. Grant Willson, and Kenneth M. Liechti “Cracking of polycrystalline graphene on copper under tension,” ACS Nano 10(10) 9616-9625 (2016)
588.
(589)
Chan, Warren ; Manish Chhowalla, Sharon Glotzer, Yury Gogotsi, Jason H. Hafner, Paula T. Hammond, Mark C. Hersam, Ali Javey, Cherie R. Kagan, C. Grant Willson “Our First and Next Decades at ACS Nano,” ACS Nano 11(8) 7553–7555 (2017)
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