Publications
- Lin, Michael W.; Chao, Huang-Lin; Hao, Jianjun; Kim, Eui K.; Palmieri, Frank; Kim, Woon C.; Dickey, Michael; Ho, Paul S.; Willson, C. G. Planarization for reverse-tone step and flash imprint lithography. Proceedings of SPIE-The International Society for Optical Engineering (2006), 6151(Pt. 2, Emerging Lithographic Technologies X), 61512G/1-61512G/12.
- Hao, Jianjun; Lin, Michael W.; Palmieri, Frank; Nishimura, Yukio; Chao, Huang-Lin; Stewart, Michael D.; Collins, Austin; Jen, Kane; Willson, C. Grant. Photocurable silicon-based materials for imprinting lithography. Proceedings of SPIE-The International Society for Optical Engineering (2007), 6517(Pt. 2, Emerging Lithographic Technologies XI), 651729/1-651729/9
- Lin, Michael W.; Chao, Brook; Hao, Jianjun; K. Osberg; Ho, Paul S., Willson, C. Grant. Simulation and design of planarizing materials for reverse-tone step and flash imprint lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS (accepted for publication – Sept 2007).