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157 Photoresist
Materials Poster presentations from 2nd International Symposium on 157nm Lithography, Dana Point, California May 2001
1. Synthesis of Alicyclic Polymers for 157nm Photoresists by Pd(2+) Catalyzed Vinyl Addition Polymerization, Raymond J. Hung*, Brian P.Osborn*, C. Grant Willson*, Daniel P. Sanders**, Eric F. Connor**, Robert H. Grubbs**
*University of Texas - Austin, **California Institute of Technology
2. Development of Mass Persistent Photoresists, Matthew J. Pinnow*, Peter Tattersall*, Ben F. Noyes III*, Hoang Vi Tran*, Sungseo Cho*, C. Grant Willson*, Dan Sanders**, Eric Connor**, Robert Grubbs**, John Klopp***, Jean Fréchet***
*University of Texas - Austin, **California Institute of Technology, ***University of California, Berkeley
3. Norbornene- Carbon Monoxide Copolymerization & Dissolution Inhibitor Study, Takashi Chiba*, Raymond J. Hung*, Shintaro Yamada*, Thomas Mrozek*, Charles R. Chambers Jr.*, C. Grant Willson*
*University of Texas - Austin
4. Poly[2-(Trifluoromethyl) Acrylates] for 157 nm Applications, Brian C. Trinque*, Jennifer Wunderlich*, Takashi Chiba*, Matthew J. Pinnow*, C. Grant Willson*
*University of Texas - Austin
5. Tricyclononenes: New Alicyclic Monomers for 157 Photoresists, Raymond J. Hung*, Brian P. Osborn*, C. Grant Willson*, Daniel P. Sanders**, Eric F. Connor**, Robert H. Grubbs**
*University of Texas - Austin, **California Institute of Technology
6. 157nm Photoresists: Synthesis of Partially Fluorinated Copolymers of Norbornene (and its derivatives) With Tetrafluoroethylene, Brian H. Thomas*, Greg Shafer*, Darryl D. DesMarteau*, Takashi Chiba**, Grant Willson**, Will Conley***, Daniel Miller****
*Clemson University, **University of Texas - Austin, ***Motorola Assignee to Intl SEMATECH, Austin, TX, ****Intl SEMATECH, Austin, TX
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