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157 Photoresist
Materials 1. “Resist Materials for 157 nm Microlithography: An Update” R. J. Hung, H. V. Tran, B. C. Trinque, T. Chiba, S. Yamada, D. P. Sanders, E. F. Connor, R. H. Grubbs, J. Klopp, J. M. J. Frechet, B. H. Thomas, G. J. Shafer, D. D. DesMarteau, W. Conley, and C. G. Willson. Proceedings of the SPIE , vol. 4345 – In Press. (Conference held in Santa Clara, CA. 2/2001)
2. "Dissolution behavior of fluoroalcohol substituted polystyrenes," Daniel S. Hall, Brian Osborn, Kyle Patterson, Sean D. Burns, and C. Grant Willson. Proceedings of the SPIE , vol. 4345 – In Press. (Conference held in Santa Clara, CA. 2/2001)
3. “Polymers for 157 nm Photoresist Applications: A Progress Report,” K. Patterson, M. Yamachika, R. Hung, C. Brodsky, S. Yamada, M. Somervell, B. Osborn, D. Hall, G. Dukovic, J. Byers, W. Conley, and C. G. Willson. Proceedings of SPIE Vol. 3999, 365-374 (2000).
4. “Synthesis of Siloxanes and Silsesquioxanes for 157 nm Microlithography,” H. V. Tran, R. J. Hung, D. A. Loy, D. R. Wheeler, J. Byers, W. Conley, and C. G. Willson. Proceedings of the American Chemical Society Division of Polymeric Materials: Science and Engineering, Vol. 84, 213 (2001).
5. “157 nm Resist Materials: A Progress Report,” T. Chiba, R. J. Hung, S. Yamada, B. Trinque, M. Yamachika, C. Brodsky, K. Patterson, A. V. Heyden, A. Jamison, S-H. Lin, M. Somervell, J. Byers, W. Conley, and C. G. Willson. J. Photopolym. Sci. Technol., Vol 13, 657-664 (2000)
6. "Top Surface Imaging at 157nm," Andrew Jamieson, Mark H. Somervell, Hoang Vi Tran, Raymond Hung, Scott A MacDonald, C. Grant Willson Proceedings of the SPIE , vol. 4345 – In Press. (Conference held in Santa Clara, CA. 2/2001)
7. Poster presentations from 2nd International Symposium on 157nm Lithography, Dana Point, California May 2001
Presentations at Sematech 157 nm Resist Advisory Group Meeting, Austin TX -- 9-11-01.
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