|
||||||||||
|
Development of 157 Photoresist Materials The purpose of this document is to provide timely public access to the 157 nm resist development work being done in our laboratories under contract from International SEMATECH.It is our goal and SEMATECH's goal to disseminate this information as rapidly and widely as possible in hope that doing so will accelerate the availability of 157 nm resist materials to the members of International SEMATECH.
Vinyl addition polymerization of alicyclics Our project of systematically replacing hydrogen with fluorine on alicyclic units to their decrease absorbance is an ongoing project (see etch resistance section).However, preliminary results are encouraging enough to indicate that alicyclic units might be useful in 157 nm photoresist designs. Promising alicyclic monomer units can be readily prepared from the fluorinated acrylates described in the previous section. Additional alicyclic monomers can be envisioned from other fluorinated acrylates and olefins such as the pentafluoroisopropenyl acetate(1) or 3-bromo-1,1-difluoro-propene(2) shown below. This provides a pool of potential monomers to produce promising photoresist polymer candidates via transition metal-catalyzed vinyl addition polymerization. Several monomers have been prepared and experiments to produce polymers are underway.
2)H. Muramatsu, P. Tarrant, J. Org. Chem. 1964, 29, 1796.
2nd Annual Symposium on 157 nm Lithography: UT Poster on Vinyl Addition Polymerization
Original page created 05/28/00
Revised on 1/30/01 | |||||||||
|
|
||||||||||
