|
|
|
|
|
Cyrus
Tabery
Biography & Resume
|
|
|
|
|
|
|
|
|
|
|
|
|
Interests
I am a native
of Austin and enjoy the outdoor activities
here including mountain biking, swimming and
fishing. However since beginning engineering
school at UT in 1997 these activities have
been a bit curtailed. My interests include
photolithography, molecular process modeling,
dynamics and control, transport and surface
phenomena, optics, and physical chemistry.
|
Experience
THE UNIVERSITY OF TEXAS AT AUSTIN
Dr. C. Grant Willson Research Group
April 1998-Present
Department of Chemical Engineering
Undergraduate
Thesis: Photoresist Characterization and
Lithography Simulation for Photomask
Fabrication; Undergraduate research continues
in semiconductor fabrication; lithography
simulation, reticle enhansement techniques,
photoresist development, l=257 nm resist
formulation and process development for
optical pattern generators.
IBM MICROELECTRONICS
Burlington, VT, May 1999-August 1999
Reticle
imaging development, process improvement and
implementation. Designed bake, exposure, and
processing for new resist system. Created
qualification plan for implementing new
alternating phase shifting reticle imaging
process.
|
Undergraduate
Accomplishments
SPIE's 1st
BACUS Scholarship Recipient, Fall 1999
Best Poster
Award at BACUS, Fall 1999
Celanese
Undergraduate Research Presentation Winner,
1998-1999
OXE Chemical
Engineering Honor Society Member 1998, Officer
2000
EXCEL
Undergraduate Research Experience, Summer 1998
NSF Math
Modeling Program, Summer 1996
NSF Young
Scholars Program for Future Engineers, Summer
1992
|
Reference
C. Grant
Willson
willson@che.utexas.edu
(512) 471-4342
Ben Rathsack
rathsack@mail.utexas.edu
(512)-471-6364 |
|
|
|
|
|
|
Last
updated Monday, February 14, 2000
© 2000 Photomask Lithography, Willson Research
Group,
University of Texas at Austin
Phone: 512.471.6364
Email:
rathsack@mail.utexas.edu
Site design by Arrion Smith
|
|
|
|
|
|
|
|
|
|
|
|