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Resist
Modeling Parameters
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Simulated
Aerial Images from Alta 3500 |
Simulated
CD (nm) |
Alta3500
400.img |
400 |
Alta3500
500.img |
500 |
Alta3500
1000.img |
1000 |
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Hoya
Substrate Optical Properties |
l (nm) |
n |
k |
257 |
2.0987 |
0.6460 |
365 |
1.6325 |
0.2832 |
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Optical
Properties of Photoresist's at i-line |
Resist |
A
(1/mm) |
B
(1/mm) |
C
(cm2/mJ) |
nune |
nexp |
IP3600 |
0.8607 |
0.1074 |
010142 |
1.6947 |
1.6887 |
PF88A5 |
0.7044 |
0.0400 |
0.0105 |
1.7006 |
1.6863 |
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PFI
88A dissolution properties |
Notch
Model Fit |
|
Developer |
0.23N |
0.26N |
Rmax
(nm/sec) |
48 |
88 |
Rmin
(nm/sec) |
0.001 |
0.002 |
Mthnotch |
0.411 |
0.503 |
n |
3.39 |
3.36 |
n_notch |
58.82 |
31.44 |
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iP
3600 dissolution properties |
Advanced
Mack
Model Fit |
|
Developer |
0.26N |
0.23N |
0.2N |
Rmax
(nm/sec) |
253 |
120 |
45 |
Rmin
(nm/sec) |
0.008 |
0.001 |
0.001 |
Rresin
(nm/sec) |
14.3 |
5 |
5 |
n |
3.6783 |
4.1664 |
5.6734 |
l |
13.8612 |
10.5352 |
7.1904 |
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Last
updated Monday, February 14, 2000
© 2000 Photomask Lithography, Willson Research
Group,
University of Texas at Austin
Phone: 512.471.6364
Email:
rathsack@mail.utexas.edu
Site design by Arrion Smith
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