Austin,
TX, 8/97 – present
Chemical Engineering, Ph.D. Candidate
GPA 3.9/4.0
Advisor:
Professor C. Grant Willson
Photoresist characterization and optical
microlithography simulation
Photoresist development rate and kinetics
modeling for 365 nm laser photomask
fabrication processes
Simulation based formulation of a
non-chemically amplified resist for a new 257
nm laser photomask tool.
Manufacturing collaborations with ETEC
Systems, Inc and the Dupont Photomask Reticle
Technology Center. Skills: Lithography
simulation, Labview, Visual basic,
photokinetics and thin film polymers
UNIVERSITY OF ILLINOIS
Champaign/Urbana, IL, May 1996
Chemical Engineering, BS, GPA 4.96/5.0
PROCTER AND GAMBLE
Cincinnati, OH, 6/96 –7/97
Research and Product Development: Full-time
process development of Cascade dish washing
detergent in the Laundry and Cleaning Products
Division
HANRATTY RESEARCH GROUP
Urbana, IL, 1/95 - 5/96
Undergraduate Research: Research in fluid
mechanics on the development of an optical
technique that measures spatial wave slopes at
an air/water interfaces
3M COMPANY
St. Paul, MN, 5/95 - 8/95
Process Engineering Internship: Process
development of an electrostatic coating
process for pavement marking adhesive tape in
a manufacturing technology group of the
Traffic Control Materials Division
PROCTER & GAMBLE
Cincinnati, OH, 5/94 - 8/94
Research and Development Internship:
Research on particulate (pigment/ iron oxide)
stain removal with heavy duty liquid laundry
detergents in a products research team of the
Laundry and Cleaning Products Division
