| Dissolution Inhibitors |
| Along with our work to create polymer structures for 157 photoresists, we have explored compounds as dissolution inhibitors. This approach will allow us to formulate a photoresist as a three-component system. Carbon monoxide copolymers are one of the component choices. We have synthesized and examined several compounds as the dissolution inhibitor properties. |
| Recent dissolution inhibitor work: |
| Poster displayed at the 2001 2nd Annual 157 Symposium in Dana Point: CANorbornene-Carbon Monoxide Copolymerization & Dissolution Inhibitor Study |
| ACS SW Regional presentation: Dissolution Inhibitors for 157nm Lithography |
| SPIE 2003: Dissolution Inhibitors for 157nm Lithography |
| Below is a summary of the experiments. |
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| Future Work |
| More inhibitors |
| We will synthesize and test 1,3- analogues of 1,4-HFAB derivatives as shown below. |
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| We will test if alkoxymethyl ether groups work to inhibit the dissolution of a polymer that has hexafluoropropanol moieties, since we learned that the hexafluoropropanol moiety tends to make some form of a complex with ethers. |
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| Our exploration to find efficient dissolution inhibitors does not stop at this point. We will seek out more compounds and test their properties of solubility, inhibition, and absorbance. |
| Imaging work |
| We will test our materials including carbon monoxide copolymers as dissolution inhibitors by imaging in the near future. |
| Version History |
| Original page created 05/21/01 |
| Updated 06/23/03 |