Process & Projects
The process can be summarized as the following:- Start with standard 6025 quartz reticle blanks with generated mesas
- Deposit Chrome onto the reticle
- Spin on e-beam resist
- Write the desired pattern with e-beam lithography and develop
- Transfer the pattern into the chrome layer with RIE etch
- Transfer the pattern into the quartz with ICP quartz etch
- Complete the template by stripping of the chrome and resist