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Development
of 157 Photoresist Materials
Publications 1. Development of Mass Persistent Photoresists, Matthew J. Pinnow*, Peter Tattersall*, Ben F. Noyes III*, Hoang Vi Tran*, Sungseo Cho*, C. Grant Willson*, Dan Sanders**, Eric Connor**, Robert Grubbs**, John Klopp***, Jean Fréchet***
*University of Texas - Austin, **California Institute of Technology, ***University of California, Berkeley |
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