Mass
Persistent
Materials

Introduction

Archive

Publications
 
 

 

 

Development of 157 Photoresist Materials

Publications

1. Development of Mass Persistent Photoresists, Matthew J. Pinnow*, Peter Tattersall*, Ben F. Noyes III*, Hoang Vi Tran*, Sungseo Cho*, C. Grant Willson*, Dan Sanders**, Eric Connor**, Robert Grubbs**, John Klopp***, Jean Fréchet***

 

*University of Texas - Austin, **California Institute of Technology, ***University of California, Berkeley