Cyrus Tabery
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APD
Lithography Development, AMD
Lithography design,
resolution enhancement techniques, reticle design and OPC,
and process and materials for advanced memory and
processor products.
Ph: 408-749-3599
(43599)
Email:
cyrus.tabery@amd.com
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Undergraduate (Chemical
Engineering), 2000
The University of Texas at
Austin
Research Area at Willson
Research Group:
- Semiconductor fabrication
- Lithography
simulation
- Reticle enhancement
techniques
- Photoresist development
- 257 nm resist
formulation
- Process development for
optical pattern generators.
Worked under supervision of:
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